Abstract: A compositional range of fusion-formable, high strain point sodium free, silicate, aluminosilicate and boroaluminosilicate glasses are described herein. The glasses can be used as substrates for photovoltaic devices, for example, thin film photovoltaic devices such as CIGS photovoltaic devices. These glasses can be characterized as having strain points?540° C., thermal expansion coefficient of from 6.5 to 10.5 ppm/° C., as well as liquidus viscosities in excess of 50,000 poise. As such they are ideally suited for being formed into sheet by the fusion process.

Abstract: A compositional range of fusion-formable, high strain point sodium free, silicate, aluminosilicate and boroaluminosilicate glasses are described herein. The glasses can be used as substrates for photovoltaic devices, for example, thin film photovoltaic devices such as CIGS photovoltaic devices. These glasses can be characterized as having strain points ?540° C., thermal expansion coefficient of from 6.5 to 10.5 ppm/° C., as well as liquidus viscosities in excess of 50,000 poise. As such they are ideally suited for being formed into sheet by the fusion process.

Abstract: A compositional range of fusion-formable, high strain point sodium free, silicate, aluminosilicate and boroaluminosilicate glasses are described herein. The glasses can be used as substrates for photovoltaic devices, for example, thin film photovoltaic devices such as CIGS photovoltaic devices. These glasses can be characterized as having strain points ?540° C., thermal expansion coefficient of from 6.5 to 10.5 ppm/° C., as well as liquidus viscosities in excess of 50,000 poise. As such they are ideally suited for being formed into sheet by the fusion process.

Abstract: Sodium-containing aluminosilicate and boroaluminosilicate glasses are described herein. The glasses can be used as substrates for photovoltaic devices, for example, thin film photovoltaic devices such as CIGS photovoltaic devices. These glasses can be characterized as having strain points ?540° C., thermal expansion coefficient of from 6.5 to 9.5 ppm/° C., as well as liquidus viscosities in excess of 50,000 poise. As such, they are ideally suited for being formed into sheet by the fusion process.

Abstract: Sodium-containing aluminosilicate and boroaluminosilicate glasses are described herein. The glasses can be used as substrates for photovoltaic devices, for example, thin film photovoltaic devices such as CIGS photovoltaic devices. These glasses can be characterized as having strain points ?540° C., thermal expansion coefficient of from 6.5 to 9.5 ppm/° C., as well as liquidus viscosities in excess of 50,000 poise. As such they are ideally suited for being formed into sheet by the fusion process.

Abstract: Sodium containing aluminosilicate and boroaluminosilicate glasses are described herein. The glasses can be used as substrates or superstrates for photovoltaic devices, for example, thin film photovoltaic devices such as CIGS photovoltaic devices. These glasses can be characterized as having strain points ?535° C., for example, ?570° C., thermal expansion coefficients of from 8 to 9 ppm/° C., as well as liquidus viscosities in excess of 50,000 poise. As such they are ideally suited for being formed into sheet by the fusion process.

Abstract: A compositional range of fusion-formable, high strain point sodium free, silicate, aluminosilicate and boroaluminosilicate glasses are described herein. The glasses can be used as substrates for photovoltaic devices, for example, thin film photovoltaic devices such as CIGS photovoltaic devices. These glasses can be characterized as having strain points?540° C., thermal expansion coefficient of from 6.5 to 10.5 ppm/° C., as well as liquidus viscosities in excess of 50,000 poise. As such they are ideally suited for being formed into sheet by the fusion process.

Abstract: A compositional range of fusion-formable, high strain point sodium free, silicate, aluminosilicate and boroaluminosilicate glasses are described herein. The glasses can be used as substrates for photovoltaic devices, for example, thin film photovoltaic devices such as CIGS photovoltaic devices. These glasses can be characterized as having strain points ?540° C., thermal expansion coefficient of from 6.5 to 10.5 ppm/° C., as well as liquidus viscosities in excess of 50,000 poise. As such they are ideally suited for being formed into sheet by the fusion process.

Abstract: Described herein are alkali-free, boroalumino silicate glasses exhibiting desirable physical and chemical properties for use as substrates in flat panel display devices, such as, active matrix liquid crystal displays (AMLCDs) and active matrix organic light emitting diode displays (AMOLEDs). In accordance with certain of its aspects, the glasses possess good dimensional stability as a function of temperature. The glasses comprise in mol percent on an oxide basis: 70-74.5 SiO2, 10.5-13.5 AL2O3, 0-2.5 B2O3, 3-7 MgO, 3-7 CaO, 0-4 SrO, 1.5-6 BaO, 0-0.3 SnO2, 0-03 CeO2, 0-0.5 As2O3, 0-0.5 Sb2O3, 0.01-0.08 Fe2O3 and F+Cl+BrRO/Al2O31.7 and 0.2MgO/RO0.45, RO being the sum of MgO, BaO, SrO and CaO.

Abstract: Methods are disclosed for treating zircon-containing forming structures, e.g., zircon isopipes, with one or more treatment glass compositions in which defect-causing reactions between the zircon of the forming structure and molten glass are suppressed at the delivery temperature of the treatment glass. The treatment compositions can be used during start-up of a forming structure, between runs of the same production glass on a given forming structure, and/or when transitioning between runs of two production glasses on a given forming structure. The treatment compositions can be used with production glasses that are ion-exchangeable.

Abstract: Sodium containing aluminosilicate and boroaluminosilicate glasses are described herein. The glasses can be used as substrates or superstrates for photovoltaic devices, for example, thin film photovoltaic devices such as CIGS photovoltaic devices. These glasses can be characterized as having strain points ?535° C., for example, ?570° C., thermal expansion coefficients of from 8 to 9 ppm/° C., as well as liquidus viscosities in excess of 50,000 poise. As such they are ideally suited for being formed into sheet by the fusion process.

Abstract: A process for making glass sheet with low compaction suitable for high temperature applications, such as low-temperature polysilicon-based TFT displays, and glass sheets thus made. The glass sheet desirably has an anneal point of at least 765° C., a CTE at most 42×10?7/° C. The process involves cooling the glass melt form a temperature corresponding to a viscosity of 1.0×1010 poise to a temperature corresponding to a viscosity of 1.0×1015 poise at a cooling rate CR, where CR?5° C./second. The absolute value of the measured compaction of the glass sheet desirably is at most 175 ppm upon being re-heated to 675° C. for a period of time.

Abstract: Sodium containing aluminosilicate and boroaluminosilicate glasses are described herein. The glasses can be used as substrates or superstrates for photovoltaic devices, for example, thin film photovoltaic devices such as CIGS photovoltaic devices. These glasses can be characterized as having strain points ?535° C., for example, ?570° C., thermal expansion coefficients of from 8 to 9 ppm/° C., as well as liquidus viscosities in excess of 50,000 poise. As such they are ideally suited for being formed into sheet by the fusion process.

Abstract: Described herein are alkali-free, boroalumino silicate glasses exhibiting desirable physical and chemical properties for use as substrates in flat panel display devices, such as, active matrix liquid crystal displays (AMLCDs). In accordance with certain of its aspects, the glasses possess good dimensional stability as a function of temperature.

Abstract: Described herein are alkali-free, boroalumino silicate glasses exhibiting desirable physical and chemical properties for use as substrates in flat panel display devices, such as, active matrix liquid crystal displays (AMLCDs) and active matrix organic light emitting diode displays (AMOLEDs). In accordance with certain of its aspects, the glasses possess good dimensional stability as a function of temperature. The glasses comprise in mol percent on an oxide basis: 70-74.5 SiO2, 10.5-13.5 AL2O3, 0-2.5 B2O3, 3-7 MgO, 3-7 CaO, 0-4 SrO, 1.5-6 BaO, 0-0.3 SnO2, 0-03 CeO2, 0-0.5 As2O3, 0-0.5 Sb2O3, 0.01-0.08 Fe2O3 and F+Cl+BrRO/Al2O31.7 and 0.2MgO/RO0.45, RO being the sum of MgO, BaO, SrO and CaO.

Abstract: Methods are disclosed for treating zircon-containing forming structures, e.g., zircon isopipes, with one or more treatment glass compositions in which defect-causing reactions between the zircon of the forming structure and molten glass are suppressed at the delivery temperature of the treatment glass. The treatment compositions can be used during start-up of a forming structure, between runs of the same production glass on a given forming structure, and/or when transitioning between runs of two production glasses on a given forming structure. The treatment compositions can be used with production glasses that are ion-exchangeable.

Abstract: Aluminoborosilicate glasses which may be useful in photovoltaic, photochromic, electrochromic, or Organic Light Emitting Diode (OLED) lighting applications are described.

Abstract: A rare-earth-containing glass material having a composition, expressed in mole percentages on and oxide basis, comprising: SiO2: 66-75 Al2O3: 11-17 B2O3: 0-4 MgO: 1-6.5 CaO: 2-7 SrO: 0-4 BaO: 0-4 Y2O3: 0-4 La2O3: 0-4 Y2O3+La2O3: 0.1-4. The inclusion of Y2O3 and/or La2O3 in the composition reduces the T2.3 of the glass thereby allowing higher annealing-point glasses to be produced. The glass is particularly useful for low-temperature polycrystalline silicon-based semiconductor devices.

Abstract: Described herein are alkali-free, boroalumino silicate glasses exhibiting desirable physical and chemical properties for use as substrates in flat panel display devices, such as, active matrix liquid crystal displays (AMLCDs). In accordance with certain of its aspects, the glasses possess good dimensional stability as a function of temperature.

Abstract: Methods are provided for reducing the dimensional changes of a glass substrate during a display manufacturing process. The reductions are achieved by increasing the fast relaxation exhibited by the glass. Test methods are provided for distinguishing the effects on dimensional changes of fast relaxation versus slow relaxation. Glass substrates which exhibit reduced dimensional changes during critical thermal cycles of display manufacturing processes are also disclosed.