Patents by Inventor Timothy J. Miller

Timothy J. Miller has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10023681
    Abstract: Catalyst compositions useful in the production of insulating polyurethane or polyisocyanurate foam are disclosed. The catalyst compositions impart increased stability of a mixture of the catalyst, a halogen-containing blowing agent, and a polyol. These catalyst compositions include amine/acid salts with a pH of <7.0 which can be used in combined with tertiary amine catalysts and metal-based or ammonium-based trimerization catalyst and at least one metal-based gel catalyst and optionally one or more of an additional catalyst described in (1) or (2). These improved catalysts can be used with any halogenated blowing agent, and provide substantial stability benefits with the use of hydrofluoroolefins and hydrofluorochloroolefins.
    Type: Grant
    Filed: July 26, 2013
    Date of Patent: July 17, 2018
    Assignee: Evonik Degussa GmbH
    Inventors: Juan Jesus Burdeniuc, Jean Louise Vincent, Tadao Yasue, Timothy J. Miller, Renee Jo Keller
  • Patent number: 9964073
    Abstract: A nuclear thermal rocket with a superconducting electric motor driven boost pump submerged within a tank of liquid hydrogen, where the boost pump is driven by both an electric motor and a turbine. The boost pump can be submerged in liquid hydrogen so that the electric motor operates as a superconducting motor. Also, a turbopump for a rocket engine can include both a turbine and an electric motor to drive the liquid oxidizer and liquid fuel pumps of the turbopump.
    Type: Grant
    Filed: November 20, 2014
    Date of Patent: May 8, 2018
    Assignee: Florida Turbine Technologies, Inc.
    Inventors: Alejandro Pinera, Timothy J Miller
  • Publication number: 20180087148
    Abstract: A method of processing a workpiece is disclosed, where the plasma chamber is first coated using a conditioning gas and optionally, a co-gas. The conditioning gas, which is disposed within a conditioning gas container may comprise a hydride of the desired dopant species and a filler gas, where the filler gas is a hydride of a Group 4 or Group 5 element. The remainder of the conditioning gas container may comprise hydrogen gas. Following this conditioning process, a feedgas, which comprises fluorine and the desired dopant species, is introduced to the plasma chamber and ionized. Ions are then extracted from the plasma chamber and accelerated toward the workpiece, where they are implanted without being first mass analyzed. In some embodiments, the desired dopant species may be boron.
    Type: Application
    Filed: November 10, 2017
    Publication date: March 29, 2018
    Inventors: Bon-Woong Koo, Christopher J. Leavitt, John A. Frontiero, Timothy J. Miller, Svetlana B. Radovanov
  • Publication number: 20180068830
    Abstract: An apparatus and methods of improving the ion beam quality of a halogen-based source gas are disclosed. Unexpectedly, the introduction of a noble gas, such as argon, to an ion source chamber may increase the percentage of desirable ion species, while decreasing the amount of contaminants and halogen-containing ions. This is especially beneficial in non-mass analyzed implanters, where all ions are implanted into the workpiece. In one embodiment, a first source gas, comprising a dopant and a halogen is introduced into an ion source chamber, a second source gas comprising a hydride, and a third source gas comprising a noble gas are also introduced. The combination of these three source gases produces an ion beam having a higher percentage of pure dopant ions than would occur if the third source gas were not used.
    Type: Application
    Filed: November 10, 2017
    Publication date: March 8, 2018
    Inventors: Bon-Woong Koo, Vikram M. Bhosle, John A. Frontiero, Nicholas P.T. Bateman, Timothy J. Miller, Svetlana B. Radovanov, Min-Sung Jeon, Peter F. Kurunczi, Christopher J. Leavitt
  • Patent number: 9865430
    Abstract: An apparatus and methods of improving the ion beam quality of a halogen-based source gas are disclosed. Unexpectedly, the introduction of a noble gas, such as argon, to an ion source chamber may increase the percentage of desirable ion species, while decreasing the amount of contaminants and halogen-containing ions. This is especially beneficial in non-mass analyzed implanters, where all ions are implanted into the workpiece. In one embodiment, a first source gas, comprising a dopant and a halogen is introduced into an ion source chamber, a second source gas comprising a hydride, and a third source gas comprising a noble gas are also introduced. The combination of these three source gases produces an ion beam having a higher percentage of pure dopant ions than would occur if the third source gas were not used.
    Type: Grant
    Filed: November 23, 2015
    Date of Patent: January 9, 2018
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Bon-Woong Koo, Vikram M. Bhosle, John A. Frontiero, Nicholas P.T. Bateman, Timothy J. Miller, Svetlana B. Radovanov, Min-Sung Jeon, Peter F. Kurunczi, Christopher J. Leavitt
  • Patent number: 9844581
    Abstract: A method of treating a cardiomyopathy in a subject includes administering directly to or expressing locally in a weakened, ischemic, and/or peri-infarct region of myocardial tissue of the subject an amount of SDF-1 effective to cause functional improvement in at least one of the following parameters: left ventricular volume, left ventricular area, left ventricular dimension, cardiac function, 6-minute walk test, or New York Heart Association (NYHA) functional classification.
    Type: Grant
    Filed: December 9, 2013
    Date of Patent: December 19, 2017
    Assignees: The Cleveland Clinic, Juventas Therapeutics, Inc.
    Inventors: Marc S. Penn, Rahul Aras, Joseph Pastore, Timothy J. Miller
  • Patent number: 9840772
    Abstract: A method of processing a workpiece is disclosed, where the plasma chamber is first coated using a conditioning gas and optionally, a co-gas. The conditioning gas, which is disposed within a conditioning gas container may comprise a hydride of the desired dopant species and a filler gas, where the filler gas is a hydride of a Group 4 or Group 5 element. The remainder of the conditioning gas container may comprise hydrogen gas. Following this conditioning process, a feedgas, which comprises fluorine and the desired dopant species, is introduced to the plasma chamber and ionized. Ions are then extracted from the plasma chamber and accelerated toward the workpiece, where they are implanted without being first mass analyzed. In some embodiments, the desired dopant species may be boron.
    Type: Grant
    Filed: May 11, 2017
    Date of Patent: December 12, 2017
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Bon-Woong Koo, Christopher J. Leavitt, John A. Frontiero, Timothy J. Miller, Svetlana B. Radovanov
  • Patent number: 9822977
    Abstract: An internal combustion engine with a piston having a piston head with a resonance cavity opening onto the head, and where a fuel nozzle located in a cylinder head is positioned to inject a fuel such as natural gas into the combustion chamber where resonance formed within the resonance cavity will ignite the fuel without the need of a spark plug. Inlet and exhaust ports in the cylinder head allow for air and combustion gas enter or leave the combustion chamber.
    Type: Grant
    Filed: February 4, 2015
    Date of Patent: November 21, 2017
    Assignee: Florida Turbine Technologies, Inc.
    Inventors: Timothy J Miller, Paul G Hicks
  • Patent number: 9793086
    Abstract: An ion implanter has a coating of low resistivity silicon carbide on one or more of the conductive surfaces that are exposed to ions. For example, ions are generated in an ion source chamber, and the interior surfaces of the walls are coated with low resistivity silicon carbide. Since silicon carbide is hard and resistant to sputtering, this may reduce the amount of contaminant ions that are introduced into the ion beam that is extracted from the ion source chamber. In some embodiments, the extraction electrodes are also coated with silicon carbide to reduce the contaminant ions introduced by these components.
    Type: Grant
    Filed: June 7, 2016
    Date of Patent: October 17, 2017
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Robert J. Mason, Shardul S. Patel, Robert H. Bettencourt, Timothy J. Miller
  • Publication number: 20170294330
    Abstract: An active substrate alignment system for an ion implanter, the system including a platen, a registration device adapted to selectively move a substrate engagement surface disposed adjacent the platen for limiting movement of a substrate disposed on the platen, a camera configured to capture an image of the substrate before the substrate is disposed on the platen, and a controller in communication with the camera and the registration device, the controller configured to command the registration device to move the substrate engagement surface based on the image to limit movement of the substrate in a predetermined manner.
    Type: Application
    Filed: September 4, 2015
    Publication date: October 12, 2017
    Inventors: Aaron P. Webb, Timothy J. Miller, Tammy Jo Pride, Christopher N. Grant, James D. Strassner, Charles T. Carlson
  • Patent number: 9780250
    Abstract: An improved method of doping a workpiece is disclosed. The method is particularly beneficial to the creation of interdigitated back contact (IBC) solar cells. A patterned implant is performed on one surface of the workpiece. A self-aligned masking process is then performed, which is achieved by exploiting the changes in surface properties caused by the patterned implant. The masking process includes applying a coating that preferentially adheres to the previously implanted regions. A blanket implant is then performed, which serves to implant the portions of the workpiece that are not covered by the coating. Thus, the blanket implant is actually a complementary implant, doping the regions that were not implanted by the first patterned implant. The coating is then optionally removed from the workpiece.
    Type: Grant
    Filed: January 14, 2016
    Date of Patent: October 3, 2017
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Vikram M. Bhosle, Timothy J. Miller, Tapash Chakraborty, Prerna Goradia, Robert J. Visser
  • Patent number: 9767987
    Abstract: A method of treating resist features comprises positioning, in a process chamber, a substrate having a set of patterned resist features on a first side of the substrate and generating a plasma in the process chamber having a plasma sheath adjacent to the first side of the substrate. The method may further comprise modifying a shape of a boundary between the plasma and the plasma sheath with a plasma sheath modifier so that a portion of the shape of the boundary is not parallel to a plane defined by a front surface of the substrate facing the plasma, wherein ions from the plasma impinge on the patterned resist features over a wide angular range during a first exposure.
    Type: Grant
    Filed: May 28, 2014
    Date of Patent: September 19, 2017
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Ludovic Godet, Patrick M. Martin, Timothy J. Miller, Vikram Singh
  • Publication number: 20170247791
    Abstract: A method of processing a workpiece is disclosed, where the plasma chamber is first coated using a conditioning gas and optionally, a co-gas. The conditioning gas, which is disposed within a conditioning gas container may comprise a hydride of the desired dopant species and a filler gas, where the filler gas is a hydride of a Group 4 or Group 5 element. The remainder of the conditioning gas container may comprise hydrogen gas. Following this conditioning process, a feedgas, which comprises fluorine and the desired dopant species, is introduced to the plasma chamber and ionized. Ions are then extracted from the plasma chamber and accelerated toward the workpiece, where they are implanted without being first mass analyzed. In some embodiments, the desired dopant species may be boron.
    Type: Application
    Filed: May 11, 2017
    Publication date: August 31, 2017
    Inventors: Bon-Woong Koo, Christopher J. Leavitt, John A. Frontiero, Timothy J. Miller, Svetlana B. Radovanov
  • Publication number: 20170202959
    Abstract: The present disclosure provides for an adjuvant composition that is suited for injectable as well as transdermal administration. The adjuvant composition generally comprises a lipophile, a polymer of acrylic or methacrylic acid, saline, cholesterol, a saponin, and sodium hydroxide. A vaccine composition is also provided for that generally includes the vaccine composition of the present disclosure and a DNA component. A method for vaccinating animals and humans utilizing the adjuvant composition of the present disclosure is also provided.
    Type: Application
    Filed: March 23, 2017
    Publication date: July 20, 2017
    Inventors: Timothy J Miller, Mary Ann Pfannenstiel
  • Publication number: 20170207361
    Abstract: An improved method of doping a workpiece is disclosed. The method is particularly beneficial to the creation of interdigitated back contact (IBC) solar cells. A patterned implant is performed on one surface of the workpiece. A self-aligned masking process is then performed, which is achieved by exploiting the changes in surface properties caused by the patterned implant. The masking process includes applying a coating that preferentially adheres to the previously implanted regions. A blanket implant is then performed, which serves to implant the portions of the workpiece that are not covered by the coating. Thus, the blanket implant is actually a complementary implant, doping the regions that were not implanted by the first patterned implant. The coating is then optionally removed from the workpiece.
    Type: Application
    Filed: January 14, 2016
    Publication date: July 20, 2017
    Inventors: Vikram M. Bhosle, Timothy J. Miller, Tapash Chakraborty, Prerna Goradia, Robert J. Visser
  • Patent number: 9709458
    Abstract: A hydrocarbon leak detection sensor having a hydrocarbon indicator paint applied to a surface exposed to a flow in which the presence of a hydrocarbon is detected. The sensor is located at a low point in a static drain line that is connected to a main fuel line of a liquid propellant rocket engine between a main fuel valve and a fuel injector of a combustion chamber. The sensor includes a housing with a flow inlet port and a flow outlet port with an optical device opposed to a removable plug that secures a target disk with a hydrocarbon indicator paint applied to an exposed surface. A light source is used to illuminate the hydrocarbon indicator that changes color from white to red in the presence of a hydrocarbon.
    Type: Grant
    Filed: February 16, 2015
    Date of Patent: July 18, 2017
    Assignee: Florida Turbine Technologies, Inc.
    Inventors: Elizabeth D Garvin, Timothy J Miller, Alex Pinera
  • Patent number: 9677171
    Abstract: A method of processing a workpiece is disclosed, where the plasma chamber is first coated using a conditioning gas and optionally, a co-gas. The conditioning gas, which is disposed within a conditioning gas container may comprise a hydride of the desired dopant species and a filler gas, where the filler gas is a hydride of a Group 4 or Group 5 element. The remainder of the conditioning gas container may comprise hydrogen gas. Following this conditioning process, a feedgas, which comprises fluorine and the desired dopant species, is introduced to the plasma chamber and ionized. Ions are then extracted from the plasma chamber and accelerated toward the workpiece, where they are implanted without being first mass analyzed. In some embodiments, the desired dopant species may be boron.
    Type: Grant
    Filed: June 6, 2014
    Date of Patent: June 13, 2017
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Bon-Woong Koo, Christopher J. Leavitt, John A. Frontiero, Timothy J. Miller, Svetlana B. Radovanov
  • Patent number: 9659677
    Abstract: A shielding device for shielding an edge of a semiconductor substrate can include a multisided frame defining a perimeter of an enclosed area, and a shield coupled to the frame. The shield may be configured to move between a first position where the shield is retracted to the perimeter and a second position where shield advanced into the enclosed area. A method for processing a semiconductor substrate includes placing a semiconductor substrate in position in an implantation chamber, covering edges of the semiconductor substrate by pushing shields into engagement with the edges, performing an ion implantation procedure, and retracting the shields from the edges.
    Type: Grant
    Filed: June 27, 2014
    Date of Patent: May 23, 2017
    Assignee: VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.
    Inventors: Aaron P. Webb, Charles T. Carlson, William T. Weaver, Timothy J. Miller, James D. Strassner
  • Patent number: 9636397
    Abstract: The present disclosure provides for an adjuvant composition that is suited for injectable as well as transdermal administration. The adjuvant composition generally comprises a lipophile, a polymer of acrylic or methacrylic acid, saline, cholesterol, a saponin, and sodium hydroxide. A vaccine composition is also provided for that generally includes the vaccine composition of the present disclosure and a DNA component. A method for vaccinating animals and humans utilizing the adjuvant composition of the present disclosure is also provided.
    Type: Grant
    Filed: March 24, 2016
    Date of Patent: May 2, 2017
    Assignee: Vaxliant, LLC
    Inventors: Timothy J Miller, Mary Ann Pfannenstiel
  • Publication number: 20170082070
    Abstract: A turbopump for a liquid rocket engine in which an oxidizer is pumped, where the turbopump is formed with a single piece rotor within a single piece housing by a metal additive manufacturing process, and where surfaces exposed to the oxidizer is coated with enamel glass to provide a smooth surface over the rough printed surface and to provide burn resistance to the base metal from exposure to the oxidizer such as oxygen. A Mondaloy coating can be used below the enamel glass coating to add additional burn resistance to the base metal.
    Type: Application
    Filed: August 3, 2016
    Publication date: March 23, 2017
    Inventors: Timothy J. Miller, Alex Pinera, Stephen M. Brooks, John W. Appleby, JR., Timothy G. Leonard