Abstract: A system for forming a pattern on a part comprises a chamber base, a pressure vessel and a retaining device. The retaining device is positionable between the chamber base and the pressure vessel to secure a deformable mask therebetween. The system further comprises a first pressure source, a second pressure source and a third pressure source. The first pressure source provides a negative pressure within the chamber to draw the mask towards a part installed within the chamber base. The second pressure source provides a positive pressure within the pressure vessel to direct the mask towards the part so that the mask corresponds to at least one complex non-planar surface of the part. The third pressure source provides a negative pressure within pressure vessel. An exposure source exposes the part through the mask while the mask is deformed corresponding to the at least one complex non-planar surface of the part.

Abstract: A film photomask comprises a polymer substrate such as a photosensitive polymer than can be darkened. The photomask substrate is sensitive to light within a first wavelength range and is initially transparent to light within a second wavelength range that is utilized for product exposure operations to pattern a product using photomask. During a mask exposure operation, select regions of the photomask are exposed to light within the first wavelength range to selectively photodarken regions of the photomask substrate according to a desired pattern. The photodarkened regions are darkened sufficient to block light within the second wavelength range used for patterning a product through the photomask. Thus, no chemical processing is required to create a mask pattern. Moreover, the pattern is defined within/through the polymer material. The photomask may further comprise a filter that is applied to at least one side thereof for blocking light within the first wavelength range.

Abstract: A system for forming a pattern on a part comprises a chamber base, a pressure vessel and a retaining device. The retaining device is positionable between the chamber base and the pressure vessel to secure a deformable mask therebetween. The system further comprises a first pressure source, a second pressure source and a third pressure source. The first pressure source provides a negative pressure within the chamber to draw the mask towards a part installed within the chamber base. The second pressure source provides a positive pressure within the pressure vessel to direct the mask towards the part so that the mask corresponds to at least one complex non-planar surface of the part. The third pressure source provides a negative pressure within pressure vessel. An exposure source exposes the part through the mask while the mask is deformed corresponding to the at least one complex non-planar surface of the part.

Abstract: A pattern is formed on a non-planar surface by forming a layer of photoresist on a part having a surface comprising a non-planar surface area. A deformable mask is aligned over at least a portion of the non-planar surface area of the part such that the deformable mask substantially deforms in a manner corresponding to at least a portion of the non-planar surface area of the part. The photoresist on the part is exposed through the mask so as to transfer a desired pattern onto the part while the deformable mask is maintained in a deformed state.

Abstract: A film photomask comprises a polymer substrate such as a photosensitive polymer than can be darkened. The photomask substrate is sensitive to light within a first wavelength range and is initially transparent to light within a second wavelength range that is utilized for product exposure operations to pattern a product using photomask. During a mask exposure operation, select regions of the photomask are exposed to light within the first wavelength range to selectively photodarken regions of the photomask substrate according to a desired pattern. The photodarkened regions are darkened sufficient to block light within the second wavelength range used for patterning a product through the photomask. Thus, no chemical processing is required to create a mask pattern. Moreover, the pattern is defined within/through the polymer material. The photomask may further comprise a filter that is applied to at least one side thereof for blocking light within the first wavelength range.

Abstract: Electromagnetic radiation sensitive mask materials are provided. The mask materials are chosen such a first percentage of electromagnetic radiation at a first wavelength is transmitted through the mask material prior to the exposure of the mask material to electromagnetic radiation at a second wavelength and a second percentage of electromagnetic radiation at the first wavelength is transmitted through at least a portion of the mask material after the at least a portion of the mask material is exposed to electromagnetic radiation at the second wavelength. Methods of patterning substrates using electromagnetic radiation sensitive mask materials are also provided. Compositions for producing masks are provided, and systems are provided.

Abstract: Electromagnetic radiation sensitive mask materials are provided. The mask materials are chosen such a first percentage of electromagnetic radiation at a first wavelength is transmitted through the mask material prior to the exposure of the mask material to electromagnetic radiation at a second wavelength and a second percentage of electromagnetic radiation at the first wavelength is transmitted through at least a portion of the mask material after the at least a portion of the mask material is exposed to electromagnetic radiation at the second wavelength. Methods of patterning substrates using electromagnetic radiation sensitive mask materials are also provided. Compositions for producing masks are provided, and systems are provided.