Patents by Inventor Tomio Uno

Tomio Uno has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6394415
    Abstract: A fluid control valve, which can control a fluid having a pressure in the order of 10 kg/cm2, has a response time in the order of several milliseconds can be made small in size, and a fluid supply/exhaust system that provides less gas counter flow in the event of a plurality of valves being used. A fluid control valve of the invention controls a fluid moving in a valve body by closing and opening a portion between a valve seat and a valve holder by use of a drive unit. The drive unit has a rod-shaped shaft for application of pressure through the valve seat and the valve holder, and a member “a” fixed around the rod-shaped shaft. The member “a” is made from a magnetic material, and has a space between it and the shaft. A coil provided in parallel to the shaft, moves the shaft via the member “a” up and down by electromagnetic induction, and makes use of a spring force to close and open a portion between the valve seat and the valve holder.
    Type: Grant
    Filed: July 27, 2000
    Date of Patent: May 28, 2002
    Assignees: Fujikin, Inc., Tohoku Steel Co., Ltd.
    Inventors: Tadahiro Ohmi, Migaku Takahashi, Michio Yamaji, Tsuyoshi Tanikawa, Nobukazu Ikeda, Ryosuke Dohi, Kouji Nishino, Naofumi Yasumoto, Hiroyuki Fukuda, Tomio Uno, Yasuyuki Yanai
  • Publication number: 20020005785
    Abstract: A method checks the flow rate for abnormalities while controlling the flow rate of fluid in a pressure-type flow controller FCS using an orifice—the pressure-type flow controller wherein with the upstream pressure P1 maintained about two or more times higher than the downstream pressure P2, the downstream flow rate QC is calculated by the equation QC=KP1 (K: constant) and wherein the control valve CV is controlled on the basis of the difference signal QY between the calculated flow rate QC and the set flow rate QS.
    Type: Application
    Filed: April 6, 2001
    Publication date: January 17, 2002
    Inventors: Tadahiro Ohmi, Seiichi Iida, Satoshi Kagatsume, Jun Hirose, Kazuo Fukasawa, Hiroshi Koizumi, Hideki Nagaoka, Tomio Uno, Kouji Nishino, Nobukazu Ikeda, Ryousuke Dohi, Eiji Ideta
  • Patent number: 6302130
    Abstract: A method and apparatus for detection of clogging of an orifice by measuring the upstream side pressure without breaking up the piping system in a flow rate control unit using an orifice, so as to extend the life of the flow rate control unit and enhance its safety. The apparatus of detecting clogging of an orifice in a pressure-type flow rate controller has a control valve (CV), an orifice (2), a pressure detector (14) for measuring the upstream pressure P1 therebetween, and a flow rate setting circuit (32) wherein, with the upstream pressure P1 maintained about two or more times higher than the downstream pressure P2, the downstream flow rate QC is calculated with the equation QC=KP1 (K=constant) and wherein the control valve (CV) is controlled by the difference signal QY between the calculated flow rate QC and the set flow rate QS.
    Type: Grant
    Filed: July 18, 2000
    Date of Patent: October 16, 2001
    Assignees: Fujikin Incorporated, Tokyo Electron Ltd.
    Inventors: Tadahiro Ohmi, Seiichi Iida, Satoshi Kagatsume, Jun Hirose, Kouji Nishino, Nobukazu Ikeda, Michio Yamaji, Ryousuke Dohi, Kazuhiro Yoshikawa, Mutsunori Koyomogi, Tomio Uno, Eiji Ideta, Takashi Hirose
  • Patent number: 6289923
    Abstract: An improved and reduced-size and low-cost gas supply system equipped with a pressure-type flow rate control unit, to be used, for instance, in semiconductor manufacturing facilities is disclosed. Transient flow rate characteristics are improved to prevent the gas from overshooting when the gas supply is started, and to raise the flow rate control accuracy and reliability of facilities. That eliminates non-uniformity of products or semiconductors and raises the production efficiency.
    Type: Grant
    Filed: June 2, 2000
    Date of Patent: September 18, 2001
    Assignees: Fujikin Incorporated, Tokyo Electron Ltd.
    Inventors: Tadahiro Ohmi, Satoshi Kagatsume, Nobukazu Ikeda, Kouji Nishino, Kazuhiro Yoshikawa, Eiji Ideta, Ryousuke Dohi, Tomio Uno, Michio Yamaji
  • Publication number: 20010004903
    Abstract: A fluid supply apparatus with a plurality of flow lines branching out from one regulator for adjustment of pressure, the flow lines being arranged in parallel, wherein a measure is taken that the operation, that is, opening or closing of one flow passage will have no transient effect on the steady flow of the other flow passages. For this purpose, each flow passage is provided with a time delay-type mass flow controller MFC so that when one closed fluid passage is opened, the mass flow controller on that flow passage reaches a set flow rate Qs in a specific delay time &Dgr;t from the starting point.
    Type: Application
    Filed: December 12, 2000
    Publication date: June 28, 2001
    Inventors: Tadahiro Ohmi, Satoshi Kagatsume, Kazuhiko Sugiyama, Yukio Minami, Kouji Nishino, Ryousuke Dohi, Katsunori Yonehana, Nobukazu Ikeda, Michio Yamaji, Jun Hirose, Kazuo Fukazawa, Hiroshi Koizumi, Hideki Nagaoka, Akihiro Morimoto, Tomio Uno, Eiji Ideta, Atsushi Matsumoto, Toyomi Uenoyama, Takashi Hirose
  • Patent number: 6193212
    Abstract: A fluid control valve, which can control a fluid having a pressure in the order of 10 kg/cm2, has a response time in the order of several milliseconds can be made small in size, and a fluid supply/exhaust system that provides less gas counter flow in the event of a plurality of valves being used. A fluid control valve of the invention controls a fluid moving in a valve body by closing and opening a portion between a valve seat and a valve holder by use of a drive unit. The drive unit has a rod-shaped shaft for application of pressure through the valve seat and the valve holder, and a member “a” fixed around the rod-shaped shaft. The member “a” is made from a magnetic material, and has a space between it and the shaft. A coil provided in parallel to the shaft, moves the shaft via the member “a” up and down by electromagnetic induction, and makes use of a spring force to close and open a portion between the valve seat and the valve holder.
    Type: Grant
    Filed: July 23, 1999
    Date of Patent: February 27, 2001
    Assignees: Tohoku Steel Co., Ltd., Fujiken Inc.
    Inventors: Tadahiro Ohmi, Migaku Takahashi, Michio Yamaji, Tsuyoshi Tanikawa, Nobukazu Ikeda, Ryosuke Dohi, Kouji Nishino, Naofumi Yasumoto, Hiroyuki Fukuda, Tomio Uno, Yasuyuki Yanai
  • Patent number: 6158679
    Abstract: An orifice for a pressure-type flow rate controller, which can be produced by a simple method at a low cost, that provides a linearity--between the pressure P1 on the upstream side of the orifice and the flow rate--over a wide range of the pressure ratio P2/P1 of the pressure P2 on the downstream side of the orifice to the upstream pressure P1 and that permits adjustment with ease of flow characteristics among a plurality of orifices. The orifice comprises an inlet taper 1 in the shape of a bugle and a short narrowed straight section 2 adjoining the inlet taper 1, both formed by cutting one opening end of a preliminary hole 6 made in an orifice plate D, and further comprises a short inner taper 3 and an enlarged straight section 4 connecting with the taper 3 which are formed by enlarging the preliminary hole 6 at the other opening end, the short inner taper 3 adjoining the narrowed straight section 2 on one side and neighboring the enlarged straight section 4 on the other side.
    Type: Grant
    Filed: June 16, 1999
    Date of Patent: December 12, 2000
    Assignees: Fujikin Incorporated, Tokyo Electron Ltd., Tadahiro Ohmi
    Inventors: Tadahiro Ohmi, Tetu Kagazume, Kazuhiko Sugiyama, Osamu Fukada, Susumu Ozawa, Yoshihiro Satou, Ryousuke Dohi, Tomio Uno, Kouji Nishino, Hiroyuki Fukuda, Nobukazu Ikeda, Michio Yamaji
  • Patent number: 6152168
    Abstract: A pressure-type flow rate control apparatus for use especially in the gas supply system in semiconductor manufacturing facilities. The flow control apparatus is provided with a bore-variable orifice, which permits easy switching of the fluid flow rate control range as well as size reduction of the pressure-type flow control apparatus, and offers other advantages including improved gas replaceability, prevention of dust formation, and reduced manufacturing costs of the flow control system.
    Type: Grant
    Filed: May 24, 1999
    Date of Patent: November 28, 2000
    Assignees: Fujikin Incorporated, Tadahiro Ohmi, Tokyo Electron Ltd.
    Inventors: Tadahiro Ohmi, Tetu Kagazume, Kazuhiko Sugiyama, Ryousuke Dohi, Tomio Uno, Kouji Nishino, Hiroyuki Fukuda, Nobukazu Ikeda, Michio Yamaji