Patents by Inventor Tomoharu YOSHINO

Tomoharu YOSHINO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240337014
    Abstract: Provided is a cobalt compound represented by the following general formula (1): where R1 to R7 each independently represent a hydrogen atom, a halogen atom, an alkyl group having 1 to 5 carbon atoms, a fluorine atom-containing alkyl group having 1 to 5 carbon atoms, a group represented by the following general formula (L-1), or a group represented by the following general formula (L-2); where R8 to R10 each independently represent an alkyl group having 1 to 5 carbon atoms, A1 and A2 each independently represent an alkanediyl group having 1 to 5 carbon atoms, and * represents a bonding site.
    Type: Application
    Filed: June 28, 2022
    Publication date: October 10, 2024
    Applicant: ADEKA CORPORATION
    Inventors: Tomoharu YOSHINO, Keisuke TAKEDA, Atsushi YAMASHITA
  • Publication number: 20240243010
    Abstract: An inhibitor for selectively depositing a thin film may include a compound represented by Formula 1 below: where, R1 is an aldehyde group, an amino group, a carbonyl group, a ketone group, a nitrile group, an acyl halide group, a substituted or unsubstituted C2 to C20 alkenyl group, or a substituted or unsubstituted C2 to C20 alkynyl group, R2 is a halogen atom, a substituted or unsubstituted C1 to C10 alkylhalide group, a substituted or unsubstituted C4 to C10 tertiary alkyl group, or a substituted or unsubstituted C1 to C10 alkylthio group, and n is an integer from 1 to 5. The inhibitor is adsorbed to a surface of a first layer but not adsorbed to a surface of a second layer. The first layer may include a metal-based material, and the second layer is different from the first layer and may include an insulating material.
    Type: Application
    Filed: January 3, 2024
    Publication date: July 18, 2024
    Applicant: ADEKA CORPORATION
    Inventors: JIHYUN LEE, EUN HYEA KO, SOYOUNG LEE, THANH CUONG NGUYEN, HOON HAN, BYUNGKEUN HWANG, HIROYUKI UCHIUZOU, KIYOSHI MURATA, TOMOHARU YOSHINO, YOUNJOUNG CHO
  • Patent number: 12022620
    Abstract: A tray-type component supply device includes a device main body, a magazine configured to be detachably held by the device main body and to accommodate multiple trays in each of which multiple components are arranged vertically, a shuttle mechanism configured to draw any of the trays from the magazine to enable the components to be supplied, a lifting/lowering mechanism configured to move the magazine or the shuttle mechanism up and down to select a tray to be drawn by the shuttle mechanism, and an automatic exchange section configured to exchange the magazine to be collected from the device main body and the magazine to be provided to the device main body.
    Type: Grant
    Filed: July 22, 2019
    Date of Patent: June 25, 2024
    Assignee: FUJI CORPORATION
    Inventors: Tomoharu Yoshino, Shunji Morikawa
  • Publication number: 20240167155
    Abstract: Provided is a tin compound, which is represented by the following general formula (1): in the formula (1), R1 and R2 each independently represent an alkyl group having 1 to 5 carbon atoms or an alkylsilyl group having 3 to 12 carbon atoms, R3 and R4 each independently represent an alkyl group having 1 to 5 carbon atoms, and R5 represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms.
    Type: Application
    Filed: March 9, 2022
    Publication date: May 23, 2024
    Applicant: ADEKA CORPORATION
    Inventors: Tomoharu YOSHINO, Atsushi YAMASHITA, Yoshiki OOE
  • Publication number: 20240018654
    Abstract: Provided is a method of producing a thin-film containing a zirconium atom on a surface of a substrate by an atomic layer deposition method, including: a step 1 of causing a raw material gas obtained by vaporizing a thin-film forming raw material containing a zirconium compound represented by the following general formula (1) to adsorb to the surface of the substrate to form a precursor thin-film; a step 2 of evacuating the raw material gas remaining unreacted; and a step 3 of causing the precursor thin-film to react with a reactive gas at a temperature of 240° C. or more and 450° C. or less to form the thin-film containing a zirconium atom on the surface of the substrate: wherein R1 and R2 each independently represent a hydrogen atom or an alkyl group having 1 to 3 carbon atoms, and R3 and R4 each independently represent an alkyl group having 1 to 3 carbon atoms, provided that a zirconium compound in which both of R1 and R2 represent hydrogen atoms is excluded.
    Type: Application
    Filed: November 16, 2021
    Publication date: January 18, 2024
    Applicant: ADEKA CORPORATION
    Inventors: Akihiro NISHIDA, Masako HATASE, Tomoharu YOSHINO, Yoshiki OOE, Chiaki MITSUI
  • Publication number: 20240018655
    Abstract: Provided is a method of producing a thin-film containing a hafnium atom on a surface of a substrate by an atomic layer deposition method, including: a step 1 of causing a raw material gas obtained by vaporizing a thin-film forming raw material containing a hafnium compound represented by the following general formula (1) to adsorb to the surface of the substrate to form a precursor thin-film; a step 2 of evacuating the raw material gas remaining unreacted; and a step 3 of causing the precursor thin-film to react with a reactive gas at a temperature of 300° C. or more and less than 450° C. to form the thin-film containing a hafnium atom on the surface of the substrate: wherein R1 and R2 each independently represent a hydrogen atom or an alkyl group having 1 to 3 carbon atoms, and R3 and R4 each independently represent an alkyl group having 1 to 3 carbon atoms.
    Type: Application
    Filed: November 16, 2021
    Publication date: January 18, 2024
    Applicant: ADEKA CORPORATION
    Inventors: Akihiro NISHIDA, Masako HATASE, Tomoharu YOSHINO, Yoshiki OOE, Chiaki MITSUI
  • Publication number: 20230369039
    Abstract: A method of manufacturing a semiconductor device is provided. The method includes providing a first layer having a first surface and a second layer having a second surface orthogonal to the first surface in a vertical direction, forming an inhibitor layer conformally on the first surface and the second surface, exposing the second surface by selectively removing the inhibitor layer on the second surface among the first surface and the second surface, the exposing of the second surface may include selectively removing an edge portion of the inhibitor layer on the first surface, the edge portion contacting the second surface, and forming an interest layer on the exposed second surface.
    Type: Application
    Filed: May 10, 2023
    Publication date: November 16, 2023
    Applicants: Samsung Electronics Co., Ltd., ADEKA CORPORATION
    Inventors: Eunhyea KO, Daihyun Kim, Thanh Cuong Nguyen, Soyoung Lee, Jihyun Lee, Hoon Han, Byungkeun Hwang, Hiroyuki Uchiuzou, Kiyoshi Murata, Tomoharu Yoshino, Youjoung Cho
  • Patent number: 11760771
    Abstract: A ruthenium compound represented by a general formula described in the specification, a raw material which is for forming a thin film and which contains the ruthenium compound, and a method of producing a thin film using the raw material for forming a thin film are provided.
    Type: Grant
    Filed: July 27, 2018
    Date of Patent: September 19, 2023
    Assignee: ADEKA CORPORATION
    Inventors: Tomoharu Yoshino, Masaki Enzu, Nana Okada, Masako Hatase
  • Publication number: 20230215723
    Abstract: To manufacture an integrated circuit (IC) device, a structure in which a first material film including silicon atoms and nitrogen atoms and a second material film devoid of nitrogen atoms is formed on a substrate. A carbonyl compound having a functional group without an ?-hydrogen is applied to the structure, and thus, an inhibitor is selectively formed only on an exposed surface of the first material film from among the first material film and the second material film.
    Type: Application
    Filed: December 29, 2022
    Publication date: July 6, 2023
    Applicant: ADEKA CORPORATION
    Inventors: EUNHYEA KO, Hoon Han, Soyoung Lee, Thanh Cuong Nguyen, Hiroyuki Uchiuzou, Kiyoshi Murata, Tomoharu Yoshino, Daekeon Kim, Younjoung Cho, Jiyu Choi, Byungkeun Hwang
  • Publication number: 20230151041
    Abstract: The present invention provides an amidinate compound represented by the following general formula (1) or a dimer compound thereof, and a method of producing a thin-film including using the compound as a raw material: where R1 and R2 each independently represent an alkyl group having 1 to 5 carbon atoms, R3 represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, M represents a metal atom or a silicon atom, and “n” represents the valence of the atom represented by M, provided that at least one hydrogen atom of R1 to R3 is substituted with a fluorine atom.
    Type: Application
    Filed: March 31, 2021
    Publication date: May 18, 2023
    Applicant: ADEKA CORPORATION
    Inventors: Tomoharu YOSHINO, Yoshiki OOE, Keisuke TAKEDA, Ryota FUKUSHIMA, Chiaki MITSUI, Atsushi YAMASHITA
  • Patent number: 11623935
    Abstract: Provided is a thin-film forming raw material, which is used in an atomic layer deposition method, including an alkoxide compound represented by the following general formula (1): where R1 represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, R2 and R3 each independently represent an alkyl group having 1 to 5 carbon atoms, and z1 represents an integer of from 1 to 3.
    Type: Grant
    Filed: December 3, 2019
    Date of Patent: April 11, 2023
    Assignee: ADEKA CORPORATION
    Inventors: Atsushi Sakurai, Masako Hatase, Tomoharu Yoshino, Akihiro Nishida, Atsushi Yamashita
  • Patent number: 11618762
    Abstract: A raw material for forming a thin film, comprising a compound represented by General Formula (1) below. wherein R1 represents an isopropyl group, R2 represents a methyl group, R3 and R4 each independently represent a linear or branched alkyl group having 1 to 5 carbon atoms, A represents a propane-1,2-diyl group and M represents copper, nickel, cobalt or manganese.
    Type: Grant
    Filed: September 30, 2021
    Date of Patent: April 4, 2023
    Assignee: ADEKA CORPORATION
    Inventors: Tomoharu Yoshino, Nana Okada, Akihiro Nishida, Atsushi Yamashita
  • Patent number: 11555044
    Abstract: The present invention provides a thin-film forming raw material, which is used in an atomic layer deposition method, including a compound represented by the following general formula (1): where R1 to R4 each independently represent an alkyl group having 1 to 5 carbon atoms, and A1 represents an alkanediyl group having 1 to 5 carbon atoms.
    Type: Grant
    Filed: September 24, 2019
    Date of Patent: January 17, 2023
    Assignee: ADEKA CORPORATION
    Inventors: Nana Okada, Tomoharu Yoshino, Atsushi Yamashita
  • Publication number: 20230002423
    Abstract: The present invention provides a tin compound represented by the following general formula (1) (in the formula (1), R1 to R4 each independently represent a hydrogen atom or an alkyl group having 1 to 12 carbon atoms, and R5 represents an alkanediyl group having 1 to 15 carbon atoms), a thin-film forming raw material including the compound, a thin-film formed by using the thin-film forming raw material, a method of using the compound as a precursor for producing the thin-film, and a method of producing a thin-film including: introducing a raw material gas obtained by vaporizing the thin-film forming raw material into a treatment atmosphere having a substrate set therein; and subjecting the tin compound in the raw material gas to decomposition and/or a chemical reaction in the treatment atmosphere, to thereby produce a thin-film containing a tin atom on a surface of the substrate.
    Type: Application
    Filed: October 12, 2020
    Publication date: January 5, 2023
    Applicant: ADEKA CORPORATION
    Inventors: Tomoharu YOSHINO, Yoshiki OOE, Atsushi YAMASHITA
  • Publication number: 20220346295
    Abstract: There is provided a pallet replacing device configured to be applied to a component supply device in which pallets, each holding components, are individually stored in multiple storage slots which are formed at predetermined heightward intervals inside a magazine, and the pallets are selectively drawn out to supply the components, the pallet replacing device, including a main body case, multiple replacing slots formed at the predetermined heightward intervals inside the main body case and configured to store the pallets therein, a positioning section configured to position the main body case in a predetermined position where the multiple pallets can individually move between the storage slots and the replacing slots, and a moving tool configured to be used for a batch moving operation for moving the multiple pallets altogether at one time between the storage slots and the replacing slots.
    Type: Application
    Filed: September 30, 2019
    Publication date: October 27, 2022
    Applicant: FUJI CORPORATION
    Inventors: Shunji MORIKAWA, Tomoharu YOSHINO
  • Publication number: 20220256747
    Abstract: A tray-type component supply device includes a device main body, a magazine configured to be detachably held by the device main body and to accommodate multiple trays in each of which multiple components are arranged vertically, a shuttle mechanism configured to draw any of the trays from the magazine to enable the components to be supplied, a lifting/lowering mechanism configured to move the magazine or the shuttle mechanism up and down to select a tray to be drawn by the shuttle mechanism, and an automatic exchange section configured to exchange the magazine to be collected from the device main body and the magazine to be provided to the device main body.
    Type: Application
    Filed: July 22, 2019
    Publication date: August 11, 2022
    Applicant: FUJI CORPORATION
    Inventors: Tomoharu YOSHINO, Shunji MORIKAWA
  • Publication number: 20220024953
    Abstract: Provided is a thin-film forming raw material, which is used in an atomic layer deposition method, including an alkoxide compound represented by the following general formula (1): where R1 represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, R2 and R3 each independently represent an alkyl group having 1 to 5 carbon atoms, and z1 represents an integer of from 1 to 3.
    Type: Application
    Filed: December 3, 2019
    Publication date: January 27, 2022
    Applicant: ADEKA CORPORATION
    Inventors: Atsushi SAKURAI, Masako HATASE, Tomoharu YOSHINO, Akihiro NISHIDA, Atsushi YAMASHITA
  • Publication number: 20220017554
    Abstract: A raw material for forming a thin film, comprising a compound represented by General Formula (1) below. (in the formula, R1 represents a linear or branched alkyl group having 1 to 5 carbon atoms, R2 represents hydrogen or a linear or branched alkyl group having 1 to 5 carbon atoms, R3 and R4 each independently represent a linear or branched alkyl group having 1 to 5 carbon atoms, A represents an alkanediyl group having 1 to 4 carbon atoms and M represents copper, iron, nickel, cobalt or manganese.
    Type: Application
    Filed: September 30, 2021
    Publication date: January 20, 2022
    Applicant: ADEKA CORPORATION
    Inventors: Tomoharu YOSHINO, Nana OKADA, Akihiro NISHIDA, Atsushi YAMASHITA
  • Publication number: 20210340162
    Abstract: The present invention provides a thin-film forming raw material, which is used in an atomic layer deposition method, including a compound represented by the following general formula (1): where R1 to R4 each independently represent an alkyl group having 1 to 5 carbon atoms, and A1 represents an alkanediyl group having 1 to 5 carbon atoms.
    Type: Application
    Filed: September 24, 2019
    Publication date: November 4, 2021
    Applicant: ADEKA CORPORATION
    Inventors: Nana OKADA, Tomoharu YOSHINO, Atsushi YAMASHITA
  • Patent number: 11161867
    Abstract: A raw material for forming a thin film, comprising a compound represented by General Formula (1) below. (in the formula, R1 represents a linear or branched alkyl group having 1 to 5 carbon atoms, R2 represents hydrogen or a linear or branched alkyl group having 1 to 5 carbon atoms, R3 and R4 each independently represent a linear or branched alkyl group having 1 to 5 carbon atoms, A represents an alkanediyl group having 1 to 4 carbon atoms and M represents copper, iron, nickel, cobalt or manganese.).
    Type: Grant
    Filed: October 5, 2017
    Date of Patent: November 2, 2021
    Assignee: ADEKA CORPORATION
    Inventors: Tomoharu Yoshino, Nana Okada, Akihiro Nishida, Atsushi Yamashita