Patents by Inventor Tomohide Katayama

Tomohide Katayama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220163888
    Abstract: A positive type resist composition capable of forming a pattern shape suitable for lift-off is provided. A positive type resist composition comprising (A) a certain polymer, (B) an acid generator having an imide group, (C) a dissolution rate modifier and (D) a solvent.
    Type: Application
    Filed: March 26, 2020
    Publication date: May 26, 2022
    Inventors: Kazumichi AKASHI, Yoshiko URABE, Rui ZHANG, Tomohide KATAYAMA
  • Publication number: 20220119568
    Abstract: To provide a novel polymer capable of reducing sublimate during film formation and a composition comprising the same. The polymer (A) according to the present invention comprises at least one structural unit selected from the group consisting of Unit (a), Unit (b), Unit (c) and Unit (d) having certain structures, wherein, na, nb, nc and nd, which are the numbers of repetition respectively of Units (a), (b), (c) and (d), satisfy the following formulae: na+nb>0, nc?0 and nd?0.
    Type: Application
    Filed: February 17, 2020
    Publication date: April 21, 2022
    Inventors: Hiroshi HITOKAWA, Tomohide KATAYAMA, Tomotsugu YANO, Rul ZHANG, Aritaka HISHIDA, Masato SUZUKI, Rikio KOZAKI, Toshiya OKAMURA
  • Patent number: 11221558
    Abstract: [Problem to be Solved] To provide a bottom antireflective coating forming composition which can show high etching resistance and can be crosslinked even at a relatively low temperature. Further, to provide a resist pattern manufacturing method and a device manufacturing method using the same. [Solution] The bottom antireflective coating forming composition comprises: a polymer A comprising specific repeating units; a low molecular crosslinking agent having a molecular weight of 100 to 3,000; and a solvent. The resist pattern manufacturing method and the device manufacturing method using the same are also provided.
    Type: Grant
    Filed: August 2, 2017
    Date of Patent: January 11, 2022
    Assignee: Merck Patent GmbH
    Inventors: Hiroshi Hitokawa, Tetsumasa Takaichi, Shunji Kawato, Tomohide Katayama
  • Patent number: 11079680
    Abstract: [Problem] To provide a high heat resistance resist composition and a pattern formation method using the composition. [Solution] The present invention provides a chemically amplified negative-type resist composition comprising a particular polymer and a particular crosslinking agent, and this composition makes it possible to form a resist pattern of high sensitivity, of excellent resolution and of strong heat-resistance.
    Type: Grant
    Filed: November 2, 2016
    Date of Patent: August 3, 2021
    Assignee: Merck Patent GmbH
    Inventors: Masato Suzuki, Hiroshi Hitokawa, Tomohide Katayama
  • Patent number: 11029599
    Abstract: The present invention relates to a photosensitive resin composition suitable for forming a thick film, which comprises (A) an alkali-soluble resin, (B) at least one plasticizer selected from a group consisting of an alkali-soluble vinyl resin and an acid-dissociable group containing vinyl resin, (C) an acid generator, and (D) an organic solvent.
    Type: Grant
    Filed: October 10, 2017
    Date of Patent: June 8, 2021
    Assignee: Merck Patent GmbH
    Inventors: Tetsumasa Takaichi, Shunji Kawato, Masato Suzuki, Kazumichi Akashi, Tomohide Katayama
  • Patent number: 10859916
    Abstract: [Problem] To provide a composition for forming a fine pattern having a good pattern shape even after being applied to a thick-film resist, a high size reduction rate and less defects, as well as a method for forming a fine pattern using the same. [Means for Solution] A composition comprising vinyl resin, an amine compound having a specific cage-type three-dimensional structure and a solvent, and a method for forming a fine pattern using the same.
    Type: Grant
    Filed: February 27, 2017
    Date of Patent: December 8, 2020
    Assignee: Merck Patent GmbH
    Inventors: Yoshihiro Miyamoto, Tomohide Katayama, Takayuki Sao
  • Publication number: 20200326623
    Abstract: An object is to provide a resist composition which can form fine resist patterns and keep them. Another object is to provide a negative tone lift off resist composition that defects of resist patterns made from the composition can be decreased. And another object is to provide a negative tone lift off resist composition that removability of resist patterns made from the composition is good. [Solution] The present invention provides a negative tone lift off resist composition comprising alkali soluble resin and cross linkers. And the present invention provides a method for manufacturing metal film patterns on a substrate. The present invention provides a method for a manufacturing a device comprising metal film patterns manufacturing method.
    Type: Application
    Filed: December 20, 2018
    Publication date: October 15, 2020
    Inventors: Tomohide KATAYAMA, Tomotsugu YANO, Masahiko KUBO
  • Publication number: 20190235382
    Abstract: The present invention relates to a photosensitive resin composition suitable for forming a thick film, which comprises (A) an alkali-soluble resin, (B) at least one plasticizer selected from a group consisting of an alkali-soluble vinyl resin and an acid-dissociable group containing vinyl resin, (C) an acid generator, and (D) an organic solvent.
    Type: Application
    Filed: October 10, 2017
    Publication date: August 1, 2019
    Inventors: TETSUMASA TAKAICHI, Shunji KAWATO, Masato SUZUKI, Kazumichi AKASHI, Tomohide KATAYAMA
  • Publication number: 20190171107
    Abstract: [Problem to be Solved] To provide a bottom antireflective coating forming composition which can show high etching resistance and can be crosslinked even at a relatively low temperature. Further, to provide a resist pattern manufacturing method and a device manufacturing method using the same. [Solution] The bottom antireflective coating forming composition comprises: a polymer A comprising specific repeating units; a low molecular crosslinking agent having a molecular weight of 1 00 to 3,000; and a solvent. The resist pattern manufacturing method and the device manufacturing method using the same are also provided.
    Type: Application
    Filed: August 2, 2017
    Publication date: June 6, 2019
    Inventors: Hiroshi HITOKAWA, Tetsumasa TAKAICHI, Shunji KAWATO, Tomohide KATAYAMA
  • Publication number: 20190079398
    Abstract: [Problem] To provide a composition for forming a fine pattern having a good pattern shape even after being applied to a thick-film resist, a high size reduction rate and less defects, as well as a method for forming a fine pattern using the same. [Means for Solution] A composition comprising vinyl resin, an amine compound having a specific cage-type three-dimensional structure and a solvent, and a method for forming a fine pattern using the same.
    Type: Application
    Filed: February 27, 2017
    Publication date: March 14, 2019
    Inventors: Yoshihiro MIYAMOTO, Tomohide KATAYAMA, Takayuki SAO
  • Publication number: 20190033717
    Abstract: [Problem] To provide a high heat resistance resist composition and a pattern formation method using the composition. [Solution] The present invention provides a chemically amplified negative-type resist composition comprising a particular polymer and a particular crosslinking agent, and this composition makes it possible to form a resist pattern of high sensitivity, of excellent resolution and of strong heat-resistance.
    Type: Application
    Filed: November 2, 2016
    Publication date: January 31, 2019
    Inventors: Masato SUZUKI, Hiroshi HITOKAWA, Tomohide KATAYAMA
  • Patent number: 10106428
    Abstract: [Problem] To provide a dispersion containing surface-modified silica nanoparticles highly dispersed in an organic dispersion medium and also having high transparency and storage stability. [Solution] Disclosed is a method for producing surface-modified silica nanoparticles comprising: preparing a first silica nanoparticle dispersion containing silica nanoparticles and an aqueous dispersion medium; replacing the aqueous dispersion medium in the first silica nanoparticle dispersion with an organic dispersion medium comprising at least one selected from cyclic esters or cyclic amides, to obtain a second silica nanoparticle dispersion; and mixing the second silica nanoparticle dispersion with a silane coupling agent represented by the formula (1): (each R1 is independently a hydrocarbon group of C1 to C20 and R2 is a hydrocarbon group of C1 to C3), to modify the surface of the silica nanoparticles.
    Type: Grant
    Filed: May 28, 2015
    Date of Patent: October 23, 2018
    Assignee: AZ Electronic Materials (Luxembourg) S.a.r.l.
    Inventors: Hiroshi Yanagita, Shigemasa Nakasugi, Hiroshi Hitokawa, Tomohide Katayama, Katsuyuki Sakamoto
  • Publication number: 20170190586
    Abstract: [Problem] To provide a dispersion containing surface-modified silica nanoparticles highly dispersed in an organic dispersion medium and also having high transparency and storage stability. [Solution] Disclosed is a method for producing surface-modified silica nanoparticles comprising: preparing a first silica nanoparticle dispersion containing silica nanoparticles and an aqueous dispersion medium; replacing the aqueous dispersion medium in the first silica nanoparticle dispersion with an organic dispersion medium comprising at least one selected from cyclic esters or cyclic amides, to obtain a second silica nanoparticle dispersion; and mixing the second silica nanoparticle dispersion with a silane coupling agent represented by the formula (1): (each R1 is independently a hydrocarbon group of C1 to C20 and R2 is a hydrocarbon group of C1 to C3), to modify the surface of the silica nanoparticles.
    Type: Application
    Filed: May 28, 2015
    Publication date: July 6, 2017
    Inventors: HIROSHI YANAGITA, Shigemasa NAKASUGI, Hiroshi HITOKAWA, Tomohide KATAYAMA, Katsuyuki SAKAMOTO
  • Patent number: 8852855
    Abstract: [Object] To provide a top anti-reflection coating composition equal or superior to known products in film-formability, in refractive index, in temporal stability and in safety; and also to provide a pattern formation method using the same. [Means] A top anti-reflection coating composition comprising a solvent, an alkylsulfonic acid having 10 to 18 carbon atoms, and a fluorine-containing polymer having a weight average molecular weight of 300000 to 800000 and represented by the formula (1): -Ax-By- (1). In the formula (1), A is a repeating unit represented by the formula (A): (R is a fluorine-containing alkylene group having 1 to 40 carbon atoms or R is a fluorine-containing alkylene group having 2 to 100 carbon atoms and an ether bond); B is a repeating unit capable of combining with A to form a copolymer; x and y are numbers indicating the polymerization ratios, provided that x is not equal to 0; and A and B may randomly combine with each other or may form blocks.
    Type: Grant
    Filed: April 11, 2012
    Date of Patent: October 7, 2014
    Assignee: AZ Electronic Materials USA Corp.
    Inventors: Takayuki Sao, Tomohide Katayama
  • Publication number: 20140030661
    Abstract: [Object] To provide a top anti-reflection coating composition equal or superior to known products in film-formability, in refractive index, in temporal stability and in safety; and also to provide a pattern formation method employing that. [Means] A top anti-reflection coating composition comprising a solvent, an alkylsulfonic acid having 10 to 18 carbon atoms, and a fluorine-containing polymer having a weight average molecular weight of 300000 to 800000 and represented by the formula (1): -Ax-By- (1). In the formula (1), A is a repeating unit represented by the formula (A): (R is a fluorine-containing alkylene group having 1 to 40 carbon atoms or R is a fluorine-containing alkylene group having 2 to 100 carbon atoms and an ether bond); B is a repeating unit capable of combining with A to form a copolymer; x and y are numbers indicating the polymerization ratios, provided that x is not equal to 0; and A and B may randomly combine with each other or may form blocks.
    Type: Application
    Filed: April 11, 2012
    Publication date: January 30, 2014
    Applicant: AZ ELECTRONIC MATERIALS USA CORP.
    Inventors: Takayuki Sao, Tomohide Katayama
  • Patent number: 8039202
    Abstract: The present invention relates to a positive bottom photoimageable antireflective coating composition which is capable of being developed in an aqueous alkaline developer, wherein the antireflective coating composition comprises a polymer comprising at least one recurring unit with a chromophore group and one recurring unit with a hydroxyl and/or a carboxyl group, a vinyl ether terminated crosslinking agent, and optionally, a photoacid generator and/or an acid and/or a thermal acid generator. The invention further relates to a process for using such a composition.
    Type: Grant
    Filed: October 24, 2007
    Date of Patent: October 18, 2011
    Assignee: AZ Electronic Materials USA Corp.
    Inventors: Yu Sui, Hengpeng Wu, Wenbing Kang, Mark O. Neisser, Tomohide Katayama, Shuji S. Ding-Lee, Aritaka Hishida, Joseph E. Oberlander, Medhat E. Toukhy
  • Publication number: 20110165523
    Abstract: The present invention provides a resist substrate treating solution and a method employing the solution for treating a resist substrate. This treating solution enables to remove efficiently resist residues remaining on a surface of the resist substrate after development, and further to miniaturize a resist pattern. The solution is used for treating a resist substrate having a developed photoresist pattern, and comprises a solvent incapable of dissolving the photoresist pattern and a polymer soluble in the solvent. The developed resist substrate is brought into contact with the treating solution, and then washed with a rinse solution such as water to remove efficiently resist residues remaining on the resist substrate surface. The solvent and the polymer are preferably water and a water-soluble polymer, respectively.
    Type: Application
    Filed: September 14, 2009
    Publication date: July 7, 2011
    Inventors: Xiaowei Wang, Wenbing Kang, Tomohide Katayama, Yuriko Matsuura, Tohru Koike
  • Publication number: 20080090184
    Abstract: The present invention relates to a positive bottom photoimageable antireflective coating composition which is capable of being developed in an aqueous alkaline developer, wherein the antireflective coating composition comprises a polymer comprising at least one recurring unit with a chromophore group and one recurring unit with a hydroxyl and/or a carboxyl group, a vinyl ether terminated crosslinking agent, and optionally, a photoacid generator and/or an acid and/or a thermal acid generator. The invention further relates to a process for using such a composition.
    Type: Application
    Filed: October 24, 2007
    Publication date: April 17, 2008
    Inventors: Yu Sui, Hengpeng Wu, Wenbing Kang, Mark Neisser, Tomohide Katayama, Shuji Ding-Lee, Aritaka Hishida, Joseph Oberlander, Medhat Toukhy
  • Publication number: 20050214674
    Abstract: The present invention relates to a positive bottom photoimageable antireflective coating composition which is capable of being developed in an aqueous alkaline developer, wherein the antireflective coating composition comprises a polymer comprising at least one recurring unit with a chromophore group and one recurring unit with a hydroxyl and/or a carboxyl group, a vinyl ether terminated crosslinking agent, and optionally, a photoacid generator and/or an acid and/or a thermal acid generator. The invention further relates to a process for using such a composition.
    Type: Application
    Filed: March 25, 2004
    Publication date: September 29, 2005
    Inventors: Yu Sui, Hengpeng Wu, Wenbing Kang, Mark Neisser, Tomohide Katayama, Shuji Ding-Lee, Aritaka Hishida, Joseph Oberlander, Medhat Toukhy