Patents by Inventor Tomohisa Ohtaki

Tomohisa Ohtaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8710439
    Abstract: Provided is a charged particle beam apparatus or charged particle microscope capable of observing an observation target sample in an air atmosphere or a gas environment without making significant changes to the configuration of a conventional high vacuum charged particle microscope. In a charged particle beam apparatus configured such that a thin film (10) is used to separate a vacuum environment and an air atmosphere (or a gas environment), an attachment (121) capable of holding the thin film (10) and whose interior can be maintained at an air atmosphere or a gas environment is inserted into a vacuum chamber (7) of a high vacuum charged particle microscope. The attachment (121) is vacuum-sealed and fixed to a vacuum partition of the vacuum sample chamber. Image quality is further improved by replacing the atmosphere in the attachment with helium or a light-elemental gas that has a lower mass than atmospheric gases such as nitrogen or water vapor.
    Type: Grant
    Filed: March 2, 2012
    Date of Patent: April 29, 2014
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Yusuke Ominami, Sukehiro Ito, Tomohisa Ohtaki
  • Publication number: 20140021347
    Abstract: Provided is a charged particle beam apparatus or charged particle microscope capable of observing an observation target sample in an air atmosphere or a gas environment without making significant changes to the configuration of a conventional high vacuum charged particle microscope. In a charged particle beam apparatus configured such that a thin film (10) is used to separate a vacuum environment and an air atmosphere (or a gas environment), an attachment (121) capable of holding the thin film (10) and whose interior can be maintained at an air atmosphere or a gas environment is inserted into a vacuum chamber (7) of a high vacuum charged particle microscope. The attachment (121) is vacuum-sealed and fixed to a vacuum partition of the vacuum sample chamber. Image quality is further improved by replacing the atmosphere in the attachment with helium or a light-elemental gas that has a lower mass than atmospheric gases such as nitrogen or water vapor.
    Type: Application
    Filed: March 2, 2012
    Publication date: January 23, 2014
    Inventors: Yusuke Ominami, Sukehiro Ito, Tomohisa Ohtaki
  • Publication number: 20120211654
    Abstract: There is provided a scanning electron microscope capable of achieving a size reduction of the device while at the same time suppressing the increase in column temperature as well as maintaining performance, e.g., resolution, etc. With respect to a scanning electron microscope for observing a sample by irradiating the sample with an electron beam emitted from an electron source and focused by condenser lenses, and detecting secondary electrons from the sample, the condenser lenses comprise both an electromagnetic coil-type condenser lens and a permanent magnet-type condenser lens.
    Type: Application
    Filed: November 12, 2010
    Publication date: August 23, 2012
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Toru Iwaya, Sakae Kobori, Tomohisa Ohtaki, Haruhiko Hatano
  • Publication number: 20120127299
    Abstract: A scanning electron microscope includes a main scanning electron microscope unit having an electron optical column and a sample chamber, a controller over the main scanning electron microscope unit, a single housing that houses both the main scanning electron microscope unit and the controller, and a bottom plate disposed under the single housing, the main scanning electron microscope unit and the controller. A first leg member is attached to a bottom face of the bottom plate on a side of the controller with a first opening hole provided through the bottom plate on a side of the main scanning electron microscope unit, and a damper is fixed to a bottom face of the main scanning electron microscope unit and disposed through the first opening hole.
    Type: Application
    Filed: July 20, 2010
    Publication date: May 24, 2012
    Inventors: Tomohisa Ohtaki, Masahiko Ajima, Sukehiro Ito, Mitsuru Onuma, Akira Omachi
  • Publication number: 20090057558
    Abstract: An object of the invention is provide a scanning electron microscope including a permanent magnet forming a condenser lens with a variable value of probe current. To achieve the object, the scanning electron microscope including the permanent magnet forming the condenser lens as an embodiment of the invention, includes a mechanism for adjusting a distance between an electron source and an anode electrode. Further, the mechanism for adjusting the distance between the electron source and the anode electrode, includes a removable spacer arranged under a lower portion of the anode electrode.
    Type: Application
    Filed: August 19, 2008
    Publication date: March 5, 2009
    Inventors: Toru Iwaya, Kenichi Hirane, Tomohisa Ohtaki
  • Patent number: 7365323
    Abstract: In an environmental scanning electron microscope in which differential pumping for maintaining the pressure ratio between an electron optical system and a specimen chamber at a predetermined value is effected and a probe electric current is conditioned to meet a predetermined or more value so as to permit observation of uncooked food and moist specimens in low vacuum, there are provided three stages of objective apertures used as apertures for an objective lens for an electron beam in the electron optical system and used also as orifices for differential pumping for maintaining the pressure ratio between the electron optical system and the specimen chamber at a predetermined value. Then, a deflection fulcrum of the electron beam in the electron optical system is set at a mid stage of the three-stage objective aperture.
    Type: Grant
    Filed: February 15, 2006
    Date of Patent: April 29, 2008
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Tomohisa Ohtaki, Kenichi Hirane, Ryoichi Ishii, Haruhisa Takahata
  • Publication number: 20060219912
    Abstract: In an environmental scanning electron microscope in which differential pumping for maintaining the pressure ratio between an electron optical system and a specimen chamber at a predetermined value is effected and a probe electric current is conditioned to meet a predetermined or more value so as to permit observation of uncooked food and moist specimens in low vacuum, there are provided three stages of objective apertures used as apertures for an objective lens for an electron beam in the electron optical system and used also as orifices for differential pumping for maintaining the pressure ratio between the electron optical system and the specimen chamber at a predetermined value. Then, a deflection fulcrum of the electron beam in the electron optical system is set at a mid stage of the three-stage objective aperture.
    Type: Application
    Filed: February 15, 2006
    Publication date: October 5, 2006
    Inventors: Tomohisa Ohtaki, Kenichi Hirane, Ryoichi Ishii, Haruhisa Takahata
  • Patent number: D623211
    Type: Grant
    Filed: September 17, 2009
    Date of Patent: September 7, 2010
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Mitsuru Oonuma, Akira Omachi, Masahiko Ajima, Tomohisa Ohtaki
  • Patent number: D625749
    Type: Grant
    Filed: June 30, 2009
    Date of Patent: October 19, 2010
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Mitsuru Oonuma, Akira Omachi, Masahiko Ajima, Tomohisa Ohtaki
  • Patent number: D626579
    Type: Grant
    Filed: March 2, 2010
    Date of Patent: November 2, 2010
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Mitsuru Oonuma, Akira Omachi, Masahiko Ajima, Tomohisa Ohtaki
  • Patent number: D632323
    Type: Grant
    Filed: March 2, 2010
    Date of Patent: February 8, 2011
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Mitsuru Oonuma, Akira Omachi, Masahiko Ajima, Tomohisa Ohtaki
  • Patent number: D633537
    Type: Grant
    Filed: March 2, 2010
    Date of Patent: March 1, 2011
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Mitsuru Oonuma, Akira Omachi, Masahiko Ajima, Tomohisa Ohtaki
  • Patent number: D633538
    Type: Grant
    Filed: March 2, 2010
    Date of Patent: March 1, 2011
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Mitsuru Oonuma, Akira Omachi, Masahiko Ajima, Tomohisa Ohtaki
  • Patent number: D635167
    Type: Grant
    Filed: March 2, 2010
    Date of Patent: March 29, 2011
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Mitsuru Oonuma, Akira Omachi, Masahiko Ajima, Tomohisa Ohtaki
  • Patent number: D635168
    Type: Grant
    Filed: March 2, 2010
    Date of Patent: March 29, 2011
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Mitsuru Oonuma, Akira Omachi, Masahiko Ajima, Tomohisa Ohtaki