Patents by Inventor Tomoya Tanaka

Tomoya Tanaka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7037371
    Abstract: After distributing a nonmetal element in a region in the vicinity of a surface portion of a semiconductor layer, a metal film is deposited on the semiconductor layer. Next, a semiconductor-metal compound layer is epitaxially grown in the surface portion of the semiconductor layer by causing a reaction between an element included in the semiconductor layer and a metal included in the metal film through annealing carried out on the metal film.
    Type: Grant
    Filed: October 3, 2000
    Date of Patent: May 2, 2006
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Shin Hashimoto, Takenobu Kishida, Kyoko Egashira, Yoshifumi Hata, Toru Nishiwaki, Tomoya Tanaka
  • Patent number: 7029254
    Abstract: There are provided a shaft adapted for introduction into a tubular member made of refractory material and an expander provided on a leading edge of the shaft. The expander has both ends provided with a repairing material container and a seat plate. With the repairing material container having monolithic refractory material loaded therein confronted to a damaged portion in an inner wall of the tubular member, the expander is expanded by a driving motor to push the repairing material container toward the damaged portion while pushing the seat plate in contact with a wall surface opposite to the damaged portion in behind. Thus, the monolithic refractory material is filled and deposited in the damaged portion under remote control.
    Type: Grant
    Filed: October 10, 2002
    Date of Patent: April 18, 2006
    Assignee: Plibrico Japan Company Ltd.
    Inventors: Keisuke Gozu, Tomoya Tanaka, Katsumi Nonaka
  • Publication number: 20050265107
    Abstract: In a memory cell array in a hierarchical bit line mode in which sub-arrays in a virtual ground line mode are arranged in a column direction, data is read out at high speed, preventing fluctuation in wiring capacity of a main bit line. In each sub-array, one of a source electrode or a drain electrode in each of the memory cells in the same column is connected to a common first bit line, and the other thereof is connected to a second bit line. The first bit lines of one half of the sub-arrays positioned in the same column are connected to the first main bit line through selection transistors and the second bit lines thereof are connected to the second main bit line through selection transistors, and the first bit lines of the other half of the sub-arrays positioned in the same column are connected to the second main bit line through selection transistors and the second bit lines thereof are connected to the first main bit line through selection transistors.
    Type: Application
    Filed: May 31, 2005
    Publication date: December 1, 2005
    Applicant: SHARP KABUSHIKI KAISHA
    Inventor: Tomoya Tanaka
  • Publication number: 20050178328
    Abstract: The object of the present invention is provide a film forming method and a film forming apparatus for suppressing mixing of an organic type foreign material into a film forming chamber when forming a film, thereby reducing a defect density after a film formation. In order to achieve the object, the film forming apparatus comprises a load lock for placing a cassette for holding a wafer, a film forming chamber for forming a thin film on the wafer, and an arm for conveying the wafer from the load lock to the film forming chamber, wherein a mass spectrograph for measuring a partial pressure of an organic substance under an atmosphere in the load lock is placed in the load lock. In the film forming method, an atmosphere in the load lock in which a cassette holding the wafer is placed is firstly exhausted. In this exhaust, the exhaust is performed until a partial pressure of the organic substance under the atmosphere in the load lock reaches 7.5×10?5 mTorr or less.
    Type: Application
    Filed: February 2, 2005
    Publication date: August 18, 2005
    Applicant: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
    Inventors: Hiroki Imamura, Tomoya Tanaka, Yoshinori Takamori
  • Publication number: 20030067087
    Abstract: There are provided a shaft adapted for introduction into a tubular member made of refractory material and an expander provided on a leading edge of the shaft. The expander has both ends provided with a repairing material container and a seat plate. With the repairing material container having monolithic refractory material loaded therein confronted to a damaged portion in an inner wall of the tubular member, the expander is expanded by a driving motor to push the repairing material container toward the damaged portion while pushing the seat plate in contact with a wall surface opposite to the damaged portion in behind. Thus, the monolithic refractory material is filled and deposited in the damaged portion under remote control.
    Type: Application
    Filed: October 10, 2002
    Publication date: April 10, 2003
    Applicant: Pilbrico Japan Company Ltd.
    Inventors: Keisuke Gozu, Tomoya Tanaka, Katsumi Nonaka
  • Patent number: 6355232
    Abstract: A skin protective agent which comprises as a sole ceramide component the erythro (2S, 3R) type of a ceramide and has a remarkably excellent water-barrier ability.
    Type: Grant
    Filed: June 21, 1999
    Date of Patent: March 12, 2002
    Assignee: Takasago International Corporation
    Inventors: Teruhisa Kaneko, Tomoya Tanaka, Masaaki Nagase
  • Patent number: 6024503
    Abstract: A photograph developing apparatus includes a main processing tank and a sub-tank which is connected to the main processing tank. The sub-tank is provided with a filter, a sensor, and the like in order to filter processing solution and feed the filtered processing solution back to the main processing tank. The sub-tank has a lid for covering the top of the sub-tank. The lid has an evaporation prevention block which is extended to a point below the surface of the processing solution. Cavity portions are formed in the evaporation prevention block at least at positions corresponding to the filter and the sensor. Alternatively, evaporation of the processing solution is suppressed through employment of an evaporation prevention block which floats on the surface of the processing solution. In this case as well, cavity portions are formed in the block at least at positions corresponding to the filter and the sensor.
    Type: Grant
    Filed: September 24, 1998
    Date of Patent: February 15, 2000
    Assignee: Noritsu Koki Co,. Ltd.
    Inventors: Tsukasa Nakano, Tomoya Tanaka, Takafumi Kimura, Yoshifumi Nakamura, Junichi Miyai
  • Patent number: 5864727
    Abstract: A rack which can completely expel air remaining in treating solution passages. The rack has a rack body formed with a downward feed path and an upward feed path. A rack plate is provided on the outer side of each feed path. Each plate has treating solution passages extending in a width direction of the plate, and nozzles for blowing treating solution fed into the treating solution passages into the feed paths. An air reservoir is formed in the longitudinal central portion of each treating solution passage. An air vent passage is connected to the top of each air reservoir. If there is any air remaining in the treating solution passages when the rack body is set, such air can be urged into the air reservoirs by treating solution flowing into the treating solution passages and expelled from the air vent passages.
    Type: Grant
    Filed: July 28, 1997
    Date of Patent: January 26, 1999
    Assignee: Noritsu Koki Co., Ltd.
    Inventors: Hisashi Omori, Tomoya Tanaka
  • Patent number: 5136388
    Abstract: A method of evaluating the characteristics of a solid state image sensor measures the unit cell output values of the sensor and assigns the output values to a predetermined rank, and counts the number of unit cells cumulatively in each rank, and then, by regarding the frequency distribution profile of the unit cell output values obtained in such way as the intrinsic electrical characteristics of the sensor, judges the picture quality of the sensor by using this frequency distribution profile.
    Type: Grant
    Filed: September 22, 1989
    Date of Patent: August 4, 1992
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Yoshikazu Sano, Takumi Yamaguchi, Tomoya Tanaka