Abstract: A second communications server obtains adjustment information of an adjustment unit in an exposure apparatus and information related to image forming quality (such as wavefront aberration) of a projection optical system under an exposure condition that serves as a reference, via a first communications server, and then calculates an optimal adjustment amount of the adjustment unit under a target exposure condition based on the information. In addition, the second communications server obtains adjustment information of the adjustment and actual measurement data of image forming quality of the projection optical system via the first communications server, and then calculates the optimal adjustment amount of the adjustment unit under the target exposure condition based on the information. And, the second communications server controls the adjustment unit in the exposure apparatus via the first communications server, based on the calculations results.

Abstract: An exposure method of forming pattern on object via projection optical system, including deciding optimal adjustment amount of adjustment device which adjusts image forming property of the projection optical system to optimize the image forming property under pattern to be formed and exposure condition of the pattern, based on information related to wavefront aberration of the projection optical system, Zernike Sensitivity Chart corresponding to the pattern and the exposure condition, wavefront aberration variation table that denotes relation between adjustment amount of the adjustment device and change in coefficients of terms in the Zernike polynomial, and restraint condition with respect to the adjustment amount of the adjustment device, and exposing the pattern on the object under the exposure condition via the projection optical system of which the image forming property is adjusted by the adjustment device based on the decided optimal adjustment amount.

Abstract: The evaluation method comprises a step (S11) of setting an aberration polynomial that generally expresses the aberration of the imaging optical system as a function of the image plane coordinates and pupil coordinates, a measurement step (S12) of measuring the wavefront aberration of the imaging optical system for a plurality of points in the image plane of the imaging optical system, an approximation step (S13) of approximating a specified polynomial as a function of the pupil coordinates to the wavefront aberration obtained in the measurement step, and a step (S14) of determining the coefficients of the respective terms of the aberration-polynomial on the basis of the coefficients of the respective terms in the specified polynomial obtained in the approximation step.

Abstract: There is disclosed a polarization-modulating element for modulating a polarization state of incident light into a predetermined polarization state, the polarization-modulating element being made of an optical material with optical activity and having a circumferentially varying thickness profile.

Abstract: An illumination optical system for, when installed in an exposure system, realizing a suitable illumination condition by varying the polarized state of the illumination light according to the pattern characteristics of the mask while suppressing the loss of the intensity of the light. The illumination optical system has a light source unit for supplying a linearly polarized light for illuminating surfaces to be illuminated therewith, and a polarized state changing device for changing the polarized state of the illuminating light from a predetermined polarized state to a nonpolarized state and vice versa. The polarized state changing device is arranged in the optical path between the light source unit and the surfaces to be illuminated. The polarized state changing device can be removed from the illumination optical path and has a depolarizer for selectively depolarizing the incident linearly polarized light.

Abstract: A second communications server obtains adjustment information of an adjustment unit in an exposure apparatus and information related to image forming quality (such as wavefront aberration) of a projection optical system under an exposure condition that serves as a reference, via a first communications server, and then calculates an optimal adjustment amount of the adjustment unit under a target exposure condition based on the information. In addition, the second communications server obtains adjustment information of the adjustment and actual measurement data of image forming quality of the projection optical system via the first communications server, and then calculates the optimal adjustment amount of the adjustment unit under the target exposure condition based on the information. And, the second communications server controls the adjustment unit in the exposure apparatus via the first communications server, based on the calculations results.

Abstract: A production method for a projection optical system capable of efficiently manufacturing a projection optical system having excellent optical characteristics with residual aberration favorably suppressed, the method comprising: a step for assembling a projection optical system; a step for measuring wavefront aberration; a step for calculating respective components of wavefront aberration by making the measurement result correspond to a Zernike function; and first and second adjusting steps for adjusting optical members in the projection optical system corresponding to respective components of the wavefront aberration obtained in the wavefront aberration calculating step. Prior to the second adjusting step, a performance prediction step for predicting performance after adjustment in the second adjusting step; and a judging step for judging based on the performance predicted in the performance prediction step are implemented.

Abstract: The evaluation method comprises a step (S11) of setting an aberration polynomial that generally expresses the aberration of the imaging optical system as a function of the image plane coordinates and pupil coordinates, a measurement step (S12) of measuring the wavefront aberration of the imaging optical system for a plurality of points in the image plane of the imaging optical system, an approximation step (S13) of approximating a specified polynomial as a function of the pupil coordinates to the wavefront aberration obtained in the measurement step, and a step (S14) of determining the coefficients of the respective terms of the aberration-polynomial on the basis of the coefficients of the respective terms in the specified polynomial obtained in the approximation step.

Abstract: A fabrication method for a projection optical system is capable of easily determining the corrected surface form as a desired continuous surface provided to a correcting member for correcting residual aberration. The fabrication includes: a measurement step of measuring aberration remaining in the projection optical system; a hypothesis step of hypothesizing a corrected surface form to be provided to the correcting member based on predetermined functions; a calculation step of calculating wavefront information of a light beam which passes through each of a plurality of regions on the correcting member having the corrected surface form hypothesized in the hypothesis step; and an evaluation step of evaluating the remaining aberration in the projection optical system when the hypothesized corrected surface form hypothesized in the hypothesis step is provided to the correcting member based on the measurement result in the measurement step and on the wavefront information calculated in the calculation step.

Abstract: The invention includes a process which provides a projection system which projects an image of a predetermined pattern formed on a reticle to a photosensitive substrate; a setting process which sets a correction member which corrects residual aberration in the projection system at a predetermined position between a reticle setting position where the reticle is arranged and a substrate setting position where the photosensitive substrate is set; and a process which corrects degradation of optical characteristics of the projection system caused by setting the correction member at the predetermined position. Furthermore, the correction process includes a first adjusting process which adjusts at least one of the reticle setting position and the substrate setting position.

Abstract: A fabrication method for a projection optical system is capable of easily determining the corrected surface form as a desired continuous surface provided to a correcting member for correcting residual aberration. The fabrication includes: a measurement step of measuring aberration remaining in the projection optical system; a hypothesis step of hypothesizing a corrected surface form to be provided to the correcting member based on predetermined functions; a calculation step of calculating wavefront information of a light beam which passes through each of a plurality of regions on the correcting member having the corrected surface form hypothesized in the hypothesis step; and an evaluation step of evaluating the remaining aberration in the projection optical system when the hypothesized corrected surface form hypothesized in the hypothesis step is provided to the correcting member based on the measurement result in the measurement step and on the wavefront information calculated in the calculation step.

Abstract: Projection optical systems are provided for use in an exposure apparatus that have a numerical aperture greater than 0.63, a reduced field curvature of pupil at the aperture stop and are able to maintain imaging performance. Further, the present invention avoids degradation in the imaging performance when the numerical aperture is changed.

Abstract: A projection optical system for projecting an image of a reticle onto a wafer wherein the first optical element in the projection optical system is a deformable mirror. The deformable mirror deforms into a surface having an aspherical shape. The projection optical system has a reduction ratio in the range of -1/8X to -1/20X.

Abstract: A projection exposure system, which is used to transfer a pattern from a reticle or mask onto a substrate, incorporates a projection optical system that is capable of maintaining the same performance as that which can be found in an ideal environment, even when the actual use environment (e.g. atmospheric pressure and temperature) is not ideal. In addition, the projection optical system is able to recover the same performance as in an ideal environment through relatively minor adjustment of its projection optical system even when atmospheric pressure significantly changes due to, e.g., a change in location and altitude where the system is used.

Abstract: A projection exposure system, which is used to transfer a pattern from a reticle or mask onto a substrate, incorporates a projection optical system that is capable of maintaining the same performance as that which can be found in an ideal environment, even when the actual use environment (e.g. atmospheric pressure and temperature) is not ideal. In addition, the projection optical system is able to recover the same performance as in an ideal environment through relatively minor adjustment of its projection optical system even when atmospheric pressure significantly changes due to, e.g., a change in location and altitude where the system is used.