Patents by Inventor Tomoyuki Tachikawa

Tomoyuki Tachikawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10597543
    Abstract: There is provided a method for repairing or reinforcing a structure. The method includes the steps of: providing an adhesive sheet comprising an adhesive layer comprising at least a curable resin composition whose curing is promoted by irradiation with ionizing radiation and a curing aid which generates a basic substance by irradiation with ionizing radiation; attaching the adhesive sheet to a surface of the structure; and curing the adhesive layer of the adhesive sheet in a state where the adhesive layer is exposed.
    Type: Grant
    Filed: April 3, 2015
    Date of Patent: March 24, 2020
    Assignee: DAI NIPPON PRINTING CO., LTD.
    Inventors: Kentaro Hoshi, Takahisa Taniguchi, Tomoyuki Tachikawa
  • Publication number: 20190010361
    Abstract: An adhesive sheet set including a pair of adhesive sheets respectively including an adhesive layer capable of being cured and adhered by being in contact with each other, and a method for producing a product using the same. An adhesive sheet set including a first adhesive sheet and a second adhesive sheet, wherein the first adhesive sheet includes a first separator and a first adhesive layer provided on one surface of the first separator, the second adhesive sheet includes a second separator and a second adhesive layer provided on one surface of the second separator, and the first adhesive sheet and the second adhesive sheet are configured to be cured and adhered by the first adhesive layer and the second adhesive layer being in contact with each other.
    Type: Application
    Filed: October 7, 2016
    Publication date: January 10, 2019
    Applicant: DAI NIPPON PRINTING CO., LTD.
    Inventors: Kentaro HOSHI, Anri TAKARABE, Tomoyuki TACHIKAWA
  • Publication number: 20170120547
    Abstract: There is provided a method for repairing or reinforcing a structure. The method includes the steps of: providing an adhesive sheet comprising an adhesive layer comprising at least a curable resin composition whose curing is promoted by irradiation with ionizing radiation and a curing aid which generates a basic substance by irradiation with ionizing radiation; attaching the adhesive sheet to a surface of the structure; and curing the adhesive layer of the adhesive sheet in a state where the adhesive layer is exposed.
    Type: Application
    Filed: April 3, 2015
    Publication date: May 4, 2017
    Applicant: DAI NIPPON PRINTING CO., LTD.
    Inventors: Kentaro HOSHI, Takahisa TANIGUCHI, Tomoyuki TACHIKAWA
  • Patent number: 7914976
    Abstract: The present invention provides a method for manufacturing an EL element including an organic EL layer forming process of forming an organic EL layer on a substrate, on which at least an electrode layer is formed; a peeling layer forming process of forming a peeling layer on the organic EL layer; a photoresist layer forming process of forming a photoresist layer on the peeling layer, a photoresist layer patterning process of patterning the photoresist layer by exposing and developing; an organic EL layer developing process of removing the organic EL layer of a part not covered with the photoresist layer; and a peeling layer peeling process of removing the photoresist layer laminated thereon by peeling off the peeling layer.
    Type: Grant
    Filed: April 8, 2009
    Date of Patent: March 29, 2011
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Tomoyuki Tachikawa, Norihito Ito
  • Patent number: 7736921
    Abstract: An EL element capable of: preventing the state in which number of excessive layers are laminated on each light emitting part formed in a pattern at the time of forming the light emitting parts using the photolithography method; executing the peeling treatment easily and quickly in the excessive layer peeling process; and preventing generation of color mixture or pixel narrowing derived from the elution of the patterned light emitting part into the light emitting layer coating solution to be coated later, at the end part thereof, at the time of coating a light emitting layer coating solution. In order to achieve the above mentioned object, the present invention provides a method for manufacturing an electroluminescent element using a photolithography method.
    Type: Grant
    Filed: January 23, 2004
    Date of Patent: June 15, 2010
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Tomoyuki Tachikawa, Norihito Ito
  • Patent number: 7718352
    Abstract: There is provided a process for producing an EL element by photolithography, which process can produce an EL element having improved luminescence efficiency. The production process comprises the steps of removing a photoresist from photoresist layer-covered parts of an electroluminescent layer and cleaning the surface of the electroluminescent layer parts from which the photoresist has been removed.
    Type: Grant
    Filed: April 18, 2007
    Date of Patent: May 18, 2010
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Tomoyuki Tachikawa, Norihito Itoh, Keisuke Hashimoto
  • Publication number: 20090191486
    Abstract: The main object of the present invention is to provide a method for manufacturing an EL element, capable of preferably carrying out the peeling operation at the time of peeling off an unnecessary layer such as a photoresist layer. In order to achieve the object, the present invention provides a method for manufacturing an EL element comprising: an organic EL layer forming process of forming an organic EL layer on a substrate, on which at least an electrode layer is formed; a peeling layer forming process of forming a peeling layer on the organic EL layer; a photoresist layer forming process of forming a photoresist layer on the peeling layer; a photoresist layer patterning process of patterning the photoresist layer by exposing and developing; an organic EL layer developing process of removing the organic EL layer of a part not covered with the photoresist layer; and a peeling layer peeling process of removing the photoresist layer laminated thereon by peeling off the peeling layer.
    Type: Application
    Filed: April 8, 2009
    Publication date: July 30, 2009
    Inventors: Tomoyuki Tachikawa, Norihito Ito
  • Patent number: 7534557
    Abstract: The present invention provides a method for manufacturing an EL element, capable of preferably carrying out the peeling operation at the time of peeling off an unnecessary layer such as a photoresist layer. This object is achieved by providing a method for manufacturing an EL element comprising: an organic EL layer forming process of forming an organic EL layer on a substrate, on which at least an electrode layer is formed; a peeling layer forming process of forming a peeling layer on the organic EL layer; a photoresist layer forming process of forming a photoresist layer on the peeling layer; a photoresist layer patterning process of patterning the photoresist layer by exposing and developing; an organic EL layer developing process of removing the organic EL layer of a part not covered with the photoresist layer; and a peeling layer peeling process of removing the photoresist layer laminated thereon by peeling off the peeling layer.
    Type: Grant
    Filed: May 8, 2003
    Date of Patent: May 19, 2009
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Tomoyuki Tachikawa, Norihito Ito
  • Patent number: 7396637
    Abstract: A main object of the present invention is to provide a method for manufacturing an EL element which can avoid a state which plural unnecessary layers are laminated on each pattern-formed light-emitting portion when the light-emitting portions are formed by photolithography and thus enables quick and easy peeling treatment in the peeling process of the unnecessary layers.
    Type: Grant
    Filed: November 2, 2006
    Date of Patent: July 8, 2008
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Norihito Itou, Tomoyuki Tachikawa
  • Patent number: 7396269
    Abstract: The main object of the present invention is to provide a method for manufacturing an EL element, capable of preventing deterioration of the element characteristic by the developing agent or the rinsing agent, while providing the advantages of the photolithography method of high light emitting efficiency and taking out efficiency, the manufacturing process simplicity, and the highly sophisticated pattern formation. In order to achieve the above mentioned object, the present invention provides a method for manufacturing an organic EL element comprising at least a patterned organic light emitting layer, wherein the patterning is conducted by etching with a protecting layer pattern laminated on an organic light emitting layer.
    Type: Grant
    Filed: April 24, 2003
    Date of Patent: July 8, 2008
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Tomoyuki Tachikawa, Toru Miyake, Shinichi Handa, Norihito Ito
  • Publication number: 20080096129
    Abstract: A process of producing an electroluminescent element is provided. The production process comprises repeating at least twice a step of forming an electroluminescent layer comprising a buffer layer and a luminescent layer by patterning using a photolithographic process, thereby producing an electroluminescent element comprising a patterned electroluminescent layer. The method includes the steps of forming a first pattern part comprising a first buffer layer as the lowermost layer, and coating a solution for forming a second buffer layer in a region including the first pattern part. The first buffer layer is immiscible with the solution for forming the second buffer layer.
    Type: Application
    Filed: December 7, 2007
    Publication date: April 24, 2008
    Applicant: Dai Nippon Printing Co., Ltd.
    Inventors: Norihito ITOH, Tomoyuki Tachikawa, Kiyoshi Itoh
  • Patent number: 7329479
    Abstract: A process of producing an electroluminescent element is provided. The production process comprises repeating at least twice a step of forming an electroluminescent layer comprising a buffer layer and a luminescent layer by patterning using a photolithographic process, thereby producing an electroluminescent element comprising a patterned electroluminescent layer. The method includes the steps of forming a first pattern part comprising a first buffer layer as the lowermost layer, and coating a solution for forming a second buffer layer in a region including the first pattern part. The first buffer layer is immiscible with the solution for forming the second buffer layer.
    Type: Grant
    Filed: June 16, 2005
    Date of Patent: February 12, 2008
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Norihito Itoh, Tomoyuki Tachikawa, Kiyoshi Itoh
  • Publication number: 20070287106
    Abstract: There is provided a process for producing an EL element by photolithography, which process can produce an EL element having improved luminescence efficiency. The production process comprises the steps of removing a photoresist from photoresist layer-covered parts of an electroluminescent layer and cleaning the surface of the electroluminescent layer parts from which the photoresist has been removed.
    Type: Application
    Filed: April 18, 2007
    Publication date: December 13, 2007
    Applicant: Dai Nippon Printing Co., Ltd.
    Inventors: Tomoyuki Tachikawa, Norihito Itoh, Keisuke Hashimoto
  • Patent number: 7294452
    Abstract: Disclosed are a light emitting element that, in the formation of a plurality of luminescent layers, can effectively suppress color mixing in each luminescent layer and loss in dissolution of the luminescent layer per se, and a process for producing the same. The light emitting element comprising a plurality of luminescent layers formed by photolithography is produced by a process which comprises: forming a first electrode on a surface of a base material; forming a first luminescent layer on the first electrode; conducting treatment for rendering the first luminescent layer in its exposed area insoluble in a coating liquid for second luminescent layer formation; forming the second luminescent layer on the first electrode; repeating the steps a plurality of times to form a plurality of luminescent layers on the first electrode; and forming a second electrode on the plurality of luminescent layers.
    Type: Grant
    Filed: April 6, 2005
    Date of Patent: November 13, 2007
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Tomoyuki Tachikawa, Norihito Itoh
  • Publication number: 20070172773
    Abstract: A main object of the present invention is to provide a method for manufacturing an EL element which can avoid a state which plural unnecessary layers are laminated on each pattern-formed light-emitting portion when the light-emitting portions are formed by photolithography and thus enables quick and easy peeling treatment in the peeling process of the unnecessary layers.
    Type: Application
    Filed: November 2, 2006
    Publication date: July 26, 2007
    Inventors: Norihito Itou, Tomoyuki Tachikawa
  • Patent number: 7147992
    Abstract: A main object of the present invention is to provide a method for manufacturing an EL element which can avoid a state which plural unnecessary layers are laminated on each pattern-formed light-emitting portion when the light-emitting portions are formed by photolithography and thus enables quick and easy peeling treatment in the peeling process of the unnecessary layers.
    Type: Grant
    Filed: January 8, 2003
    Date of Patent: December 12, 2006
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Norihito Itou, Tomoyuki Tachikawa
  • Publication number: 20060024524
    Abstract: The present invention provides a device capable of obtaining stable luminescence with a long life by preventing the insulating layer loss by in an etching process and thus preventing the short circuit defect in the device as well as providing the advantages of the photolithographic process, and a method for producing the same. There are provided an electroluminescent device comprising a first electrode layer, an insulating layer, an electroluminescent layer, and a second electrode layer on a substrate, wherein at least one layer of the electroluminescent layer is formed into a predetermined pattern by photolithography, and the insulating layer comprises an inorganic material having 2.5 or more etching selectivity to an organic compound in the dry etching process, or an organopolysiloxane comprising a hydrolysis-condensation product or a hydrolysis-cocondensation product of one or more kinds of specific silicon compounds, and a method for manufacturing the same.
    Type: Application
    Filed: July 21, 2005
    Publication date: February 2, 2006
    Inventor: Tomoyuki Tachikawa
  • Publication number: 20060008742
    Abstract: There is provided a production process of an electroluminescent element, which, even when a buffer layer patterned by a photolithographic process is formed, luminescence failure derived from cross contamination or a variation in film thickness does not take place and can realize high production efficiency. The production process comprises repeating at least twice the step of forming an electroluminescent layer comprising a buffer layer and a luminescent layer by patterning using a photolithographic process, thereby producing an electroluminescent element comprising a patterned electroluminescent layer, and comprises the steps of forming a first pattern part comprising a first buffer layer as the lowermost layer; and coating a solution for second buffer layer formation in a region including said first pattern part, the first buffer layer being immiscible with said solution for second buffer layer formation.
    Type: Application
    Filed: June 16, 2005
    Publication date: January 12, 2006
    Applicant: DAI NIPPON PRINTING CO., LTD.
    Inventors: Norihito Itoh, Tomoyuki Tachikawa, Kiyoshi Itoh
  • Publication number: 20050255256
    Abstract: Disclosed are a light emitting element that, in the formation of a plurality of luminescent layers, can effectively suppress color mixing in each luminescent layer and loss in dissolution of the luminescent layer per se, and a process for producing the same. The light emitting element comprising a plurality of luminescent layers formed by photolithography is produced by a process which comprises: forming a first electrode on a surface of a base material; forming a first luminescent layer on the first electrode; conducting treatment for rendering the first luminescent layer in its exposed area insoluble in a coating liquid for second luminescent layer formation; forming the second luminescent layer on the first electrode; repeating the steps a plurality of times to form a plurality of luminescent layers on the first electrode; and forming a second electrode on the plurality of luminescent layers.
    Type: Application
    Filed: April 6, 2005
    Publication date: November 17, 2005
    Applicant: Dai Nippon Printing Co., Ltd.
    Inventors: Tomoyuki Tachikawa, Norihito Itoh
  • Publication number: 20050153058
    Abstract: The main object of the present invention is to provide a method for manufacturing an EL element, capable of preferably carrying out the peeling operation at the time of peeling off an unnecessary layer such as a photoresist layer. In order to achieve the object, the present invention provides a method for manufacturing an EL element comprising: an organic EL layer forming process of forming an organic EL layer on a substrate, on which at least an electrode layer is formed; a peeling layer forming process of forming a peeling layer on the organic EL layer; a photoresist layer forming process of forming a photoresist layer on the peeling layer; a photoresist layer patterning process of patterning the photoresist layer by exposing and developing; an organic EL layer developing process of removing the organic EL layer of a part not covered with the photoresist layer; and a peeling layer peeling process of removing the photoresist layer laminated thereon by peeling off the peeling layer.
    Type: Application
    Filed: May 8, 2003
    Publication date: July 14, 2005
    Inventors: Tomoyuki Tachikawa, Norihito Ito