Patents by Inventor Tooru Hachisuka

Tooru Hachisuka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9650191
    Abstract: Such a vapor-deposited barrier film is provided that has a vapor-deposited layer having uniform film quality, a high film density and high barrier performance in the initial stage. The vapor-deposited barrier film contains a substrate having on at least one surface thereof at least one layer of a vapor-deposited layer (a). The vapor-deposited layer (a) contains a metal oxide, has a thickness of from 10 to 500 nm, and has an average value of an elemental ratio of oxygen (O) and the metal (oxygen (O)/metal) of 1.20 or more and 1.90 or less and a difference between the maximum value and the minimum value of the (oxygen (O)/metal) of 0.35 or less on analysis of the vapor-deposited layer in the depth direction thereof by an X-ray photoelectron spectroscopy (ESCA) method.
    Type: Grant
    Filed: March 29, 2012
    Date of Patent: May 16, 2017
    Assignee: MITSUBISHI PLASTICS, INC.
    Inventors: Shigeto Kimura, Tooru Hachisuka, Koji Yamauchi, Shigenobu Yoshida
  • Patent number: 9199436
    Abstract: In the gas-barrier laminate having an inorganic thin layer formed on at least one surface of a substrate having a polyethylene naphthalate layer, provided by the present invention is a gas-barrier laminate having not only high water vapor barrier property and oxygen barrier property abut also excellent adhesion between the substrate and the inorganic thin layer. The said gas-barrier laminate, comprising: a substrate comprising a polyethylene naphthalate layer; a layer formed from a composition comprising an acryl polyol and an isocyanate compound on at least one surface of the substrate; and an inorganic thin layer, arranged in the stated order.
    Type: Grant
    Filed: July 27, 2012
    Date of Patent: December 1, 2015
    Assignee: MITSUBISHI PLASTICS, INC.
    Inventors: Yasushi Sasaoka, Chiharu Okawara, Tooru Hachisuka
  • Publication number: 20140154517
    Abstract: In the gas-barrier laminate having an inorganic thin layer formed on at least one surface of a substrate having a polyethylene naphthalate layer, provided by the present invention is a gas-barrier laminate having not only high water vapor barrier property and oxygen barrier property abut also excellent adhesion between the substrate and the inorganic thin layer. The said gas-barrier laminate, comprising: a substrate comprising a polyethylene naphthalate layer; a layer formed from a composition comprising an acryl polyol and an isocyanate compound on at least one surface of the substrate; and an inorganic thin layer, arranged in the stated order.
    Type: Application
    Filed: July 27, 2012
    Publication date: June 5, 2014
    Applicant: Mitsubishi Plastics, Inc.
    Inventors: Yasushi Sasaoka, Chiharu Okawara, Tooru Hachisuka
  • Patent number: 8658278
    Abstract: Provided is a film which can be industrially coated easily and exhibits excellent gas barrier performance without being subjected to a high-temperature heat treatment. The film exhibits good gas barrier performance immediately after the production, and maintains the excellent gas barrier performance while exhibiting excellent hot water resistance and printing resistance.
    Type: Grant
    Filed: August 30, 2006
    Date of Patent: February 25, 2014
    Assignee: Mitsubishi Plastics, Inc.
    Inventors: Chiharu Okawara, Shigenobu Yoshida, Tooru Hachisuka, Motoyoshi Takemura
  • Publication number: 20140030510
    Abstract: Such a vapor-deposited barrier film is provided that has a vapor-deposited layer having uniform film quality, a high film density and high barrier performance in the initial stage. The vapor-deposited barrier film contains a substrate having on at least one surface thereof at least one layer of a vapor-deposited layer (a). The vapor-deposited layer (a) contains a metal oxide, has a thickness of from 10 to 500 nm, and has an average value of an elemental ratio of oxygen (O) and the metal (oxygen (O)/metal) of 1.20 or more and 1.90 or less and a difference between the maximum value and the minimum value of the (oxygen (O)/metal) of 0.35 or less on analysis of the vapor-deposited layer in the depth direction thereof by an X-ray photoelectron spectroscopy (ESCA) method.
    Type: Application
    Filed: March 29, 2012
    Publication date: January 30, 2014
    Applicant: Mitsubishi Plastics, Inc.
    Inventors: Shigeto Kimura, Tooru Hachisuka, Koji Yamauchi, Shigenobu Yoshida
  • Publication number: 20140017468
    Abstract: A film which can be industrially coated easily and exhibits excellent gas barrier performance without being subjected to a high-temperature heat treatment, good gas barrier performance immediately after the production, and maintains the excellent gas barrier performance while exhibiting excellent hot water resistance and printing resistance; a gas barrier laminated film including a resin layer on an inorganic thin film formed on at least one surface of a support film, the resin layer being formed by applying: (1) an aqueous dispersion containing polyvinyl alcohol (a), an ethylene-unsaturated carboxylic acid copolymer (b), and inorganic particles (c); (2) an aqueous dispersion containing an ethylene-unsaturated carboxylic acid copolymer (b), inorganic particles (c), and/or a cross-linking agent (d); or (3) an aqueous dispersion containing polyvinyl alcohol (a), an ethylene-unsaturated carboxylic acid copolymer (b), inorganic particles (c), and cross-linking agent (d), to the inorganic thin film surface; and a
    Type: Application
    Filed: September 17, 2013
    Publication date: January 16, 2014
    Applicant: MITSUBISHI PLASTICS, INC.
    Inventors: Chiharu OKAWARA, Shigenobu Yoshida, Tooru Hachisuka, Motoyoshi Takemura
  • Publication number: 20130295359
    Abstract: Provided are a gas-barrier laminate film which shows good productivity, has high transparency, exhibits high-level gas-barrier properties and has excellent adhesion strength between the constituent layers therein, and which curls little; and a method for producing the film. The gas-barrier laminate film has, on at least one surface of a substrate film thereof, an inorganic thin layer formed by a vacuum vapor deposition, an inorganic thin layer formed by a chemical vapor deposition, and an inorganic thin layer formed by a vacuum vapor deposition in that order thereon, wherein the thickness of the inorganic thin layer formed by vacuum vapor deposition is from 0.1 nm to 500 nm, and the carbon content in the inorganic thin layer formed by chemical vapor deposition is from 0.5 at % to less than 20 at %, and the thickness of the layer is less than 20 nm.
    Type: Application
    Filed: November 2, 2011
    Publication date: November 7, 2013
    Applicant: Mitsubishi Plastics, Inc.
    Inventors: Koji Yamauchi, Shigenobu Yoshida, Tooru Hachisuka, Shigeto Kimura
  • Publication number: 20120125437
    Abstract: A solar cell module including a thin-film solar cell element protected with a novel gas barrier film is provided. The solar cell module includes a laminate obtained by laminating a gas barrier film on a layer including at least a solar cell element. The gas barrier film is obtained by laminating at least a substrate film, weather-resistant coating layer, and inorganic thin film layer. The weather-resistant coating layer is made of at least one of (a) a material obtained by crosslinking modified polyvinyl alcohol, (b) a material obtained by crosslinking polycaprolactone polyol and/or a material obtained by crosslinking polycarbonate polyol, and (c) an acrylic polymer having at least one group selected from the group consisting of an UV-stabilizing group, UV-absorbing group, and cycloalkyl group. The solar cell element is a thin-film solar cell element.
    Type: Application
    Filed: January 30, 2012
    Publication date: May 24, 2012
    Applicants: MITSUBISHI CHEMICAL CORPORATION, MITSUBISHI PLASTICS, INC.
    Inventors: Chiharu OKAWARA, Shigenobu Yoshida, Tooru Hachisuka, Hiromu Watanabe
  • Patent number: 8124236
    Abstract: The present invention relates to a gas-barrier laminate for hydrothermal treatment which comprises a base plastic film, a coating layer formed on at least one surface of the base plastic film, an inorganic thin film formed on a surface of the coating layer which is made of a metal compound, and a heat-sealable plastic film laminated on the inorganic thin film or the base plastic film, wherein the inorganic thin film before laminating the heat-sealable plastic film thereon has a rubbing strength of not less than 20 times as measured under a load of 70 g, and the coating layer has a hardness of 0.15 to 0.40 GPa. The laminate of the present invention is excellent in interlaminar bonding property, hardly undergoes breakage of the inorganic thin film owing to the hydrothermal treatment, and can maintain an excellent gas-barrier property even after subjected to the hydrothermal treatment.
    Type: Grant
    Filed: July 12, 2006
    Date of Patent: February 28, 2012
    Assignee: Mitsubishi Plastics, Inc.
    Inventors: Chiharu Okawara, Shigenobu Yoshida, Tooru Hachisuka
  • Patent number: 8092917
    Abstract: A gas-barrier laminate comprises a plastic substrate (A), an inorganic thin film (B) formed on at least one surface of the plastic substrate (A), and a polyester-based resin layer (C) formed by applying a coating material containing a polyester-based resin on a surface of the inorganic thin film (B), wherein the polyester-based resin has a glass transition temperature of 50 to 70° C., a molecular weight of 1500 to 15000 and a hydroxyl value of 10 to 60 mg KOH/g, and the gas-barrier laminate has an oxygen permeability of not more than 5 cc/m2/day/atm and a water vapor permeability of not more than 5 g/m2/day.
    Type: Grant
    Filed: June 28, 2004
    Date of Patent: January 10, 2012
    Assignee: Mitsubishi Plastics, Inc.
    Inventors: Shigenobu Yoshida, Tooru Hachisuka, Chiharu Okawara
  • Publication number: 20110129654
    Abstract: A gas-barrier laminate, containing a plastic substrate, an inorganic thin film on at least one surface of the plastic substrate, and a coating layer on a surface of the inorganic thin film is provided. The coating layer comprises at least one resin selected from the group consisting of a polyester resin, an urethane resin, an acrylic resin, an alkoxysilyl group-containing resin, an oxazoline group-containing resin and copolymer resins thereof and a hardness of the coating layer is from 0.1 to 0.5 GPa as measured at 23° C. in atmospheric air by a nano-indentation hardness testing method. When the gas-barrier laminate is further laminated on the coating layer with an unstretched polypropylene film having a thickness of 60 ?m and the further obtained laminate subjected to a hydrothermal treatment at 120° C. for 30 min, an oxygen permeability of the further laminate is not more than 50 fmol/m2/s/Pa.
    Type: Application
    Filed: February 7, 2011
    Publication date: June 2, 2011
    Applicant: MITSUBISHI PLASTICS, INC.
    Inventors: Shigenobu YOSHIDA, Chiharu Okawara, Tooru Hachisuka
  • Patent number: 7910213
    Abstract: A gas-barrier laminate with a plastic substrate, an inorganic thin film formed on at least one surface of the plastic substrate, and a coating layer formed by applying a coating material on a surface of the inorganic thin film, wherein said coating layer contains a polyester-based resin having a molecular weight of 3000 to 15000 and a polyurethane-based resin having a molecular weight of 8000 to 30000 at a weight ratio of 5/95 to 95/5, and said gas-barrier laminate has an oxygen permeability of not more than 25 fmol/m2/s/Pa; and a gas-barrier laminate comprising a plastic substrate, an inorganic thin film formed on at least one surface of the plastic substrate, and a coating layer formed by applying a coating material on a surface of the inorganic thin film, wherein the gas-barrier laminate exhibits an oxygen permeability of not more than 50 fmol/m2/s/Pa as measured with respect to a gas-barrier film obtained by laminating an unstretched polypropylene film having a thickness of 60 ?m on the coating layer of t
    Type: Grant
    Filed: March 23, 2005
    Date of Patent: March 22, 2011
    Assignee: Mitsubishi Plastics, Inc.
    Inventors: Shigenobu Yoshida, Chiharu Okawara, Tooru Hachisuka
  • Publication number: 20110045301
    Abstract: Provided is a weather-resistant gas barrier film capable of keeping a high delamination strength and an excellent gas barrier property in a high-temperature high-humidity environment and in a UV radiation environment. The gas barrier film comprises a substrate film, a weather-resistant coating layer formed on at least one surface thereof, and an inorganic thin film layer formed on the surface of the coating layer, wherein the weather-resistant coating layer is selected from (1) a weather-resistant coating layer that contains an acrylic copolymer having at least one group selected from a UV-stabilizing group, a UV-absorbing group and a cycloalkyl group, (2) a weather-resistant coating layer formed by crosslinking a polycaprolactone-polyol and/or a polycarbonate-polyol as the essential ingredient, and (3) a weather-resistant coating layer formed by crosslinking a modified polyvinyl alcohol; and also provided is a method for producing the gas barrier film.
    Type: Application
    Filed: January 27, 2009
    Publication date: February 24, 2011
    Applicant: Mitsubishi Plastics, Inc.
    Inventors: Chiharu Okawara, Shigenobu Yoshida, Tooru Hachisuka
  • Patent number: 7678448
    Abstract: The gas barrier film of the present invention is a gas barrier film comprising a base material, and an inorganic thin film composed of a silicon oxide film formed on one or both surfaces of the base material, wherein radical density of the Pb center of the silicon oxide film observed by an electron spin resonance method (ESR method) is from 1×1016 to 1×1019 spins/cm3, or a gas barrier film comprising a base material, an inorganic thin film containing silicon oxide and the other metal component formed on one or both surfaces of the base material, wherein radical density of the Pb center of the silicon oxide in the inorganic thin film observed by an ESR method is from 13×1014 to 3×1017 spins/mol, and a laminate wherein at least one paper and/or plastic film is laminated on the gas barrier film.
    Type: Grant
    Filed: January 26, 2005
    Date of Patent: March 16, 2010
    Assignee: Mitsubishi Plastics, Inc.
    Inventors: Tooru Hachisuka, Shigenobu Yoshida, Chiharu Okawara, Yoshinori Kobayashi, Kenji Ito, Hisashi Togashi, Kouichi Hirata
  • Publication number: 20100035050
    Abstract: The present invention relates to a gas-barrier laminate for hydrothermal treatment which comprises a base plastic film, a coating layer formed on at least one surface of the base plastic film, an inorganic thin film formed on a surface of the coating layer which is made of a metal compound, and a heat-sealable plastic film laminated on the inorganic thin film or the base plastic film, wherein the inorganic thin film before laminating the heat-sealable plastic film thereon has a rubbing strength of not less than 20 times as measured under a load of 70 g, and the coating layer has a hardness of 0.15 to 0.40 GPa. The laminate of the present invention is excellent in interlaminar bonding property, hardly undergoes breakage of the inorganic thin film owing to the hydrothermal treatment, and can maintain an excellent gas-barrier property even after subjected to the hydrothermal treatment.
    Type: Application
    Filed: July 12, 2006
    Publication date: February 11, 2010
    Applicant: MITSUBISHI PLASTICS, INC.
    Inventors: Chiharu Okawara, Shigenobu Yoshida, Tooru Hachisuka
  • Patent number: 7615287
    Abstract: The gas barrier film having a thermoplastic polymer film, and an inorganic thin film provided on at least one surface of the thermoplastic polymer film, which gas barrier film is formed by applying, to the inorganic thin film, a solution which contains at least one ion species selected from the group consisting of alkali metal ions, alkaline earth metal ions, and ammonium ions and originating from a low-molecular-weight electrolyte having a molecular weight of 1,000 or less and which has a total ion concentration of the ion species of 1×10?5 mol/L or more and less than 10 mol/L and a solution concentration less than a saturation concentration.
    Type: Grant
    Filed: November 29, 2004
    Date of Patent: November 10, 2009
    Assignee: Mitsubishi Plastics, Inc.
    Inventors: Chiharu Okawara, Shigenobu Yoshida, Tooru Hachisuka
  • Publication number: 20090274894
    Abstract: There is provided a gas-barrier laminate composed of a base film and an inorganic thin film layer formed on the base film which considerably enhanced in gas-barrier property and gelbo flex resistance. The present invention relates to a gas-barrier laminate comprising a base film containing at least one compound selected from the group consisting of polyvinyl alcohol and an ethylene-vinyl alcohol copolymer, and an anchor coat layer and an inorganic thin film layer successively formed on one surface of the base film in this order, wherein the base film is in the form of a biaxially stretched film having a variation in thickness of 3.5 ?m or less and a crystallinity of 30% or more.
    Type: Application
    Filed: April 13, 2007
    Publication date: November 5, 2009
    Applicant: Mitsubishi Plastics, Inc.
    Inventors: Shigenobu Yoshida, Chiharu Okawara, Tooru Hachisuka
  • Publication number: 20090214854
    Abstract: Provided is a film which can be industrially coated easily and exhibits excellent gas barrier performance without being subjected to a high-temperature heat treatment. The film exhibits good gas barrier performance immediately after the production, and maintains the excellent gas barrier performance while exhibiting excellent hot water resistance and printing resistance.
    Type: Application
    Filed: August 30, 2006
    Publication date: August 27, 2009
    Applicant: MITSUBISHI PLASTICS, INC.
    Inventors: Chiharu Okawara, Shigenobu Yoshida, Tooru Hachisuka, Motoyoshi Takemura
  • Publication number: 20090022981
    Abstract: Provided is a laminated film which exhibits high gas barrier performance immediately after the production and has excellent adhesive strength between constitutional layers, while maintaining the excellent gas barrier performance. The laminated film has at least one constitutional unit layer on an inorganic thin film formed at least on one surface of a base film. The constitutional unit layer is composed of an anchor coat layer having a thickness of 0.1 to 10 nm and an inorganic thin film formed on the anchor coat layer. A method for producing the laminated film is also provided.
    Type: Application
    Filed: September 19, 2006
    Publication date: January 22, 2009
    Applicant: Mitsubishi Plastics, Inc.
    Inventors: Shigenobu Yoshida, Chiharu Okawara, Motoyoshi Takemura, Tooru Hachisuka
  • Publication number: 20080254266
    Abstract: The gas barrier film of the present invention is a gas barrier film comprising a base material, and an inorganic thin film composed of a silicon oxide film formed on one or both surfaces of the base material, wherein radical density of the Pb center of the silicon oxide film observed by an electron spin resonance method (ESR method) is from 1×1016 to 1×1019 spins/cm3, or a gas barrier film comprising a base material, an inorganic thin film containing silicon oxide and the other metal component formed on one or both surfaces of the base material, wherein radical density of the Pb center of the silicon oxide in the inorganic thin film observed by an ESR method is from 13×1014 to 3×1017 spins/mol, and a laminate wherein at least one paper and/or plastic film is laminated on the gas barrier film.
    Type: Application
    Filed: January 26, 2005
    Publication date: October 16, 2008
    Applicants: Mitsubishi Plastics, INC., National Institute of Advanced Industrial Science and Technology
    Inventors: Tooru Hachisuka, Shigenobu Yoshida, Chiharu Okawara, Yoshinori Kobayashi, Kenji Ito, Hisashi Togashi, Kouichi Hirata