Patents by Inventor Toshiaki Yoshikawa

Toshiaki Yoshikawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6219125
    Abstract: An electrode plate, suitable for constituting a liquid crystal device, includes a light-transmissive substrate, a plurality of first electrodes disposed on the light-transmissive substrate and a plurality of second electrodes disposed on the first electrodes. Each first electrode comprises a layer of metal nitride and is electrically connected with an associated second electrode, and each second electrode comprises a transparent electrode. The electrode plate is effective in improving an adhesiveness between the first electroded and the light-transmissive substrate and an antioxidizing property of the first electrodes while ensuring a good electrical connection state between the first electrodes and the second electrodes.
    Type: Grant
    Filed: July 23, 1997
    Date of Patent: April 17, 2001
    Assignee: Canon Kabushiki Kaisha
    Inventors: Junri Ishikura, Makoto Kameyama, Hiroyuki Tokunaga, Toshiaki Yoshikawa
  • Patent number: 6208400
    Abstract: An electrode plate, suitable for constituting a liquid crystal device, includes at least a light-transmissive substrate, a plurality of metal electrodes disposed on the light-transmissive substrate and with spacings therebetween, and an insulating layer disposed at the spacings. Each of the metal electrodes includes a first layer, disposed on the light-transmissive substrate comprising a metal or alloy selected from the group consisting of titanium, chronium, molybdenum, tungsten, aluminum, tantalum and nickel, a second layer comprising copper or silver dispersed on the first layer; and a third layer comprising a metal or alloy selected from the group consisting of molybdenum, tantalum, tungsten, titanium, chromium, nickel, aluminum and zinc and disposed on the second layer.
    Type: Grant
    Filed: March 11, 1997
    Date of Patent: March 27, 2001
    Assignee: Canon Kabushiki Kaisha
    Inventors: Makoto Kameyama, Hiroyuki Suzuki, Toshiaki Yoshikawa, Junri Ishikura
  • Patent number: 6184964
    Abstract: An electrode plate, suitable for constituting a liquid crystal device, includes at least a light-transmissive substrate, a plurality of metal electrodes disposed on the light-transmissive substrate and with spacings therebetween, and an insulating layer disposed at the spacings. Each of the metal electrodes includes a first layer, disposed on the light-transmissive substrate comprising a metal or alloy selected from the group consisting of titanium, chronium, molybdenum, tungsten, aluminum, tantalum and nickel, a second layer comprising copper or silver dispersed on the first layer; and a third layer comprising a metal or alloy selected from the group consisting of molybdenum, tantalum, tungsten, titanium, chromium, nickel, aluminum and zinc and disposed on the second layer.
    Type: Grant
    Filed: June 9, 1999
    Date of Patent: February 6, 2001
    Assignee: Canon Kabushiki Kaisha
    Inventors: Makoto Kameyama, Hiroyuki Suzuki, Toshiaki Yoshikawa, Junri Ishikura
  • Patent number: 6162366
    Abstract: An etching process includes the steps of: preparing an etchant containing ferric chloride and an anticorrosive agent for Cu, and etching with said etchant a multi-layer metal structure including a Cu layer and an Ni layer. The etchant may preferably further contain ferrous chloride. The etching process is effective in making etching rates of the respective substantially equal, thus suppressing occurrence of burr portions of the Ni layers.
    Type: Grant
    Filed: December 22, 1998
    Date of Patent: December 19, 2000
    Assignee: Canon Kabushiki Kaisha
    Inventors: Junri Ishikura, Toshiaki Yoshikawa
  • Patent number: 6128057
    Abstract: A display apparatus includes a planar optical modulation device having a transparent substrate and a plurality of pixels disposed thereon so as to be each capable of optical modulation thereat, and a masking member disposed on the transparent substrate and including spacings. The making member includes a layer of a metal compound containing C, O and a metal element. The masking member is effective in reducing a degree of reflection of external light (from a viewer side) while maintaining a sufficient light-interrupting property, thus resulting in a display apparatus exhibiting good display performances.
    Type: Grant
    Filed: March 4, 1997
    Date of Patent: October 3, 2000
    Assignee: Canon Kabushiki Kaisha
    Inventors: Hiroyuki Suzuki, Mitsuharu Sawamura, Makoto Kameyama, Toshiaki Yoshikawa
  • Patent number: 6106907
    Abstract: An electrode plate is formed by a substrate and a plurality of patterned electrodes formed on the substrate. Each patterned electrode has a laminate structure including a first layer of nickel metal formed on the substrate and a second layer of copper formed thereon. The electrode plate may be prepared by a process including a step of etching such a multilayer metal electrode-forming film formed on a substrate by spraying an etchant downwardly and uniformly onto the substrate while rotating the substrate at a rotation speed sufficient to allow quick liberation of the etchant from the substrate. The metal electrodes can be formed with a good adhesion onto the substrate and with good accuracies of width and thickness. By incorporating the electrode plate as a pair of substrates sandwiching a liquid crystal, a liquid crystal device showing free from transmission delay and rounding of voltage waveforms can be provided.
    Type: Grant
    Filed: June 20, 1997
    Date of Patent: August 22, 2000
    Assignee: Canon Kabushiki Kaisha
    Inventors: Toshiaki Yoshikawa, Makoto Kameyama, Junri Ishikura
  • Patent number: 6015594
    Abstract: A film-forming method and apparatus for forming a deposited film on a substrate employing plasma generated by a raw material gas for film formation in a film-forming chamber involves several steps. The method includes arranging a deposition preventive member in the film-forming chamber so that the deposition preventive member prevents a film from being deposited on an inner wall of the chamber during film formation. A heater and a cooler are alternately arranged on a face of the deposition preventive member. Prior to commencing film deposition, the deposition preventive member is heated using the heater. During film formation, the deposition preventive member is cooled by the cooler to prevent the deposition preventive member from releasing contaminants.
    Type: Grant
    Filed: June 7, 1995
    Date of Patent: January 18, 2000
    Assignee: Canon Kabushiki Kaisha
    Inventor: Toshiaki Yoshikawa
  • Patent number: 5720808
    Abstract: In a method for forming a diamond film by a high-frequency plasma CVD method, an inductive coupling discharge is used and the frequency of a high-frequency wave is set in the range of from 40 to 250 MHz, whereby a starting gas containing carbon is decomposed in a plasma state and a diamond film is formed on a substrate.
    Type: Grant
    Filed: July 14, 1995
    Date of Patent: February 24, 1998
    Assignee: Canon Kabushiki Kaisha
    Inventors: Keiji Hirabayashi, Toshiaki Yoshikawa
  • Patent number: 5449444
    Abstract: A film-forming method for forming a deposited film on a prescribed substrate by sputtering a target for film formation with plasma generated using a sputtering gas in a film-forming chamber, characterized by comprising: arranging a deposition preventive member in said film-forming chamber such that said deposition preventive member circumscribes a plasma region wherein said plasma is generated; subjecting said deposition preventive member to heat treatment prior to commencing film formation; and performing the film formation while applying a predetermined bias voltage to said deposition preventive member and cooling said deposition preventive member to form a deposited film on said substrate maintained at a desired temperature. An apparatus which is suitable for practicing said film-forming method.
    Type: Grant
    Filed: February 24, 1994
    Date of Patent: September 12, 1995
    Assignee: Canon Kabushiki Kaisha
    Inventor: Toshiaki Yoshikawa
  • Patent number: 4989544
    Abstract: In an apparatus for forming a deposited film on a substrate by the hybrid excitation chemical vapor deposition method, said apparatus comprising a substantially enclosed reaction vessel having means for holding said substrate thereon, a plasma generating means and means for irradiating light through a light introducing window provided with said reaction vessel to the surface of said substrate in said reaction vessel; the improvement that at least part of the circumferential side wall of said reaction vessel is hermetically constituted by an insulating member having an external cathode electrode member on the outer surface thereof, said external cathode electrode member being electrically connected to a high frequency power source, an internal electrode member to serve as the anode is installed in said reaction vessel at a position opposite to said external cathode electrode member, said internal electrode member being electrically grounded, said means for holding the substrate is positioned below said interna
    Type: Grant
    Filed: January 24, 1990
    Date of Patent: February 5, 1991
    Assignee: Canon Kabushiki Kaisha
    Inventor: Toshiaki Yoshikawa
  • Patent number: D299511
    Type: Grant
    Filed: June 22, 1987
    Date of Patent: January 24, 1989
    Assignee: Daiwa Seiko, Inc.
    Inventors: Yasuhisa Kameda, Toshiaki Yoshikawa
  • Patent number: D307785
    Type: Grant
    Filed: March 15, 1988
    Date of Patent: May 8, 1990
    Assignee: Daiwa Seico, Inc.
    Inventor: Toshiaki Yoshikawa
  • Patent number: D309340
    Type: Grant
    Filed: May 2, 1988
    Date of Patent: July 17, 1990
    Assignee: Daiwa Seiko, Inc.
    Inventors: Yasuhisa Kameda, Toshiaki Yoshikawa
  • Patent number: D309650
    Type: Grant
    Filed: May 2, 1988
    Date of Patent: July 31, 1990
    Assignee: Daiwa Seiko, Inc.
    Inventors: Yasuhisa Kameda, Toshiaki Yoshikawa
  • Patent number: D314808
    Type: Grant
    Filed: July 19, 1988
    Date of Patent: February 19, 1991
    Assignee: Daiwa Seiko, Inc.
    Inventor: Toshiaki Yoshikawa
  • Patent number: D316443
    Type: Grant
    Filed: December 19, 1988
    Date of Patent: April 23, 1991
    Assignee: Daiwa Seiko, Inc.
    Inventors: Toshiaki Yoshikawa, Akihisa Shiozaki
  • Patent number: D324716
    Type: Grant
    Filed: December 20, 1989
    Date of Patent: March 17, 1992
    Assignee: Daiwa Seiko, Inc.
    Inventor: Toshiaki Yoshikawa
  • Patent number: D324719
    Type: Grant
    Filed: September 6, 1989
    Date of Patent: March 17, 1992
    Assignee: Daiwa Seiko, Inc.
    Inventors: Akihisa Shiozaki, Toshiaki Yoshikawa
  • Patent number: D400960
    Type: Grant
    Filed: September 23, 1997
    Date of Patent: November 10, 1998
    Assignee: Daiwa Seiko, Inc.
    Inventors: Toshiaki Yoshikawa, Yasuhiro Takigasaki, Yuuji Ohtake
  • Patent number: D403395
    Type: Grant
    Filed: September 23, 1997
    Date of Patent: December 29, 1998
    Assignee: Daiwa Seiko, Inc.
    Inventors: Toshiaki Yoshikawa, Shinji Murakami, Muneaki Tsukihiji