Abstract: The invention is to simplify operations performed when imaging an electron diffraction pattern by using a transmission electron microscope. As a solution to the problem, a transmission electron microscope includes a detector to which an electron diffraction pattern is projected, a mask for zero-order wave configured to be inserted into and pulled out from between a sample and the detector, and a current detector configured to be inserted into and pulled out from a detection region of the zero-order waves in a state where the mask is inserted. An amount of current of electron beams emitted to the mask is measured in real time, and the measurement result is automatically reflected in settings of imaging conditions of an imaging camera provided in the transmission electron microscope.

Abstract: Provided is a transmission electron microscope capable of obtaining a hollow-cone dark-field image and visually displaying irradiation conditions thereof. The transmission electron microscope is provided with an irradiation unit for irradiating a specimen with an electron beam, an objective lens for causing the electron beam transmitted through the specimen to form an image, beam deflectors for deflecting the electron beam, said beam deflectors being positioned higher than a position where the specimen is to be placed, an objective movable aperture for passing only a portion of the electron beam transmitted through the specimen, and a deflection coil control unit.

Abstract: The present invention addresses a problem of providing a specimen holder capable of observing phenomena on the surface and in the inner part of a specimen, the phenomena being generated in different gas spaces, and a charged particle beam device provided with the specimen holder. In order to solve this problem, a specimen holder for a charged particle beam device which observes a specimen using a charged particle beam is configured such that the specimen holder includes a first gas injection nozzle capable of injecting a first gas to a first portion of a specimen, a second gas injection nozzle capable of injecting a second gas to a second portion of the specimen, the second portion being different from the first portion, and a partition part provided between the first gas injection nozzle and the second gas injection nozzle.

Abstract: The present invention addresses a problem of providing a specimen holder capable of observing phenomena on the surface and in the inner part of a specimen, the phenomena being generated in different gas spaces, and a charged particle beam device provided with the specimen holder. In order to solve this problem, a specimen holder for a charged particle beam device which observes a specimen using a charged particle beam is configured such that the specimen holder includes a first gas injection nozzle capable of injecting a first gas to a first portion of a specimen, a second gas injection nozzle capable of injecting a second gas to a second portion of the specimen, the second portion being different from the first portion, and a partition part provided between the first gas injection nozzle and the second gas injection nozzle.

Abstract: A charged particle beam device wherein a transmission image corresponding to an arbitrary diffraction spot or a diffraction pattern corresponding to a partial range in the transmission image are easily and automatically captured. A charged particle beam device having: an image-capturing unit for forming an image of a sample; a diaphragm disposed in the image-capturing unit, a plurality of openings having different sizes for transmitting an electron beam from the sample being formed in the diaphragm; a movement unit for varying the position of the diaphragm; and a display unit for displaying the formed image, wherein when the operator selects, e.g., a diffraction spot (A) on the display unit, the movement unit moves the diaphragm from the positional relationship between the diaphragm and the image in accordance with the position of the diffraction spot (A).

Abstract: An electron microscope for observation by illuminating an electron beam on a specimen, includes: an edge element disposed in a diffraction plane where a direct beam not diffracted by but transmitted through the specimen converges or a plane equivalent to the diffraction plane; and a control unit for controlling the electron beam or the edge element. The edge element includes a blocking portion for blocking the electron beam, and an aperture for allowing the passage of the electron beam. The aperture is defined by an edge of the blocking portion in a manner that the edge surrounds a convergence point of the direct beam in the diffraction plane. The control unit varies contrast of an observation image by shifting, relative to the edge, the convergence point of the direct beam along the edge while maintaining a predetermined distance between the convergence point of the direct beam and the edge.

Abstract: The present invention addresses a problem of providing a specimen holder capable of observing phenomena on the surface and in the inner part of a specimen, the phenomena being generated in different gas spaces, and a charged particle beam device provided with the specimen holder. In order to solve this problem, a specimen holder for a charged particle beam device which observes a specimen using a charged particle beam is configured such that the specimen holder includes a first gas injection nozzle capable of injecting a first gas to a first portion of a specimen, a second gas injection nozzle capable of injecting a second gas to a second portion of the specimen, the second portion being different from the first portion, and a partition part provided between the first gas injection nozzle and the second gas injection nozzle.

Abstract: An electron microscope for observation by illuminating an electron beam on a specimen, includes: an edge element disposed in a diffraction plane where a direct beam not diffracted by but transmitted through the specimen converges or a plane equivalent to the diffraction plane; and a control unit for controlling the electron beam or the edge element. The edge element includes a blocking portion for blocking the electron beam, and an aperture for allowing the passage of the electron beam. The aperture is defined by an edge of the blocking portion in a manner that the edge surrounds a convergence point of the direct beam in the diffraction plane. The control unit varies contrast of an observation image by shifting, relative to the edge, the convergence point of the direct beam along the edge while maintaining a predetermined distance between the convergence point of the direct beam and the edge.

Abstract: The purpose of the present invention is to provide a charged particle beam device and a sample holder for the charged particle beam device by which it is possible to form various environments, and perform in-situ observation and analysis without removing a sample from the charged particle beam device. In the present invention, inserting a detachable reverse side entry portion from a side facing a sample holding means, said portion being provided with a function for changing the state of a sample attached to the sample holding means, makes it possible to observe/analyze changes in the sample by a different process without removing the sample from the charged particle beam device by combining a reverse side entry portion having a different function with the sample holding means. The reverse side entry portion comprises two parts, and a tip thereof, which is one of the parts, is removable.

Abstract: A charged particle beam device wherein a transmission image corresponding to an arbitrary diffraction spot or a diffraction pattern corresponding to a partial range in the transmission image are easily and automatically captured. A charged particle beam device having: an image-capturing unit for forming an image of a sample; a diaphragm disposed in the image-capturing unit, a plurality of openings having different sizes for transmitting an electron beam from the sample being formed in the diaphragm; a movement unit for varying the position of the diaphragm; and a display unit for displaying the formed image, wherein when the operator selects, e.g., a diffraction spot (A) on the display unit, the movement unit moves the diaphragm from the positional relationship between the diaphragm and the image in accordance with the position of the diffraction spot (A).

Abstract: Provided are a device and a method allowing a crystal orientation to be adjusted with adequate throughput and high precision to observe a sample, regardless of the type of the sample or the crystal orientation. In the present invention, the method comprises: setting a fitting circular pattern (26) displayed overlaid so that a main spot (23) is positioned on the circumference thereof, on the basis of the diffraction spot brightness distribution in an electron diffraction pattern (22b) displayed on a display unit (13); setting a vector (28) displayed with the starting point at the center position (27) of the displayed circular pattern (26), and the end point at the location of the main spot (23) positioned on the circumference of the circular pattern (26); and adjusting the crystal orientation on the basis of the orientation and the magnitude of the displayed vector (28).

Abstract: Provided are a device and a method allowing a crystal orientation to be adjusted with adequate throughput and high precision to observe a sample, regardless of the type of the sample or the crystal orientation. In the present invention, the method comprises: setting a fitting circular pattern (26) displayed overlaid so that a main spot (23) is positioned on the circumference thereof, on the basis of the diffraction spot brightness distribution in an electron diffraction pattern (22b) displayed on a display unit (13); setting a vector (28) displayed with the starting point at the center position (27) of the displayed circular pattern (26), and the end point at the location of the main spot (23) positioned on the circumference of the circular pattern (26); and adjusting the crystal orientation on the basis of the orientation and the magnitude of the displayed vector (28).

Abstract: The purpose of the present invention is to provide a charged particle beam device and a sample holder for the charged particle beam device by which it is possible to form various environments, and perform in-situ observation and analysis without removing a sample from the charged particle beam device. In the present invention, inserting a detachable reverse side entry portion from a side facing a sample holding means, said portion being provided with a function for changing the state of a sample attached to the sample holding means, makes it possible to observe/analyze changes in the sample by a different process without removing the sample from the charged particle beam device by combining a reverse side entry portion having a different function with the sample holding means. The reverse side entry portion comprises two parts, and a tip thereof, which is one of the parts, is removable.

Abstract: An object of the invention is to provide an electron microscope which can easily and safely prepare a gas or liquid environment in the electron microscope and can observe a specimen in the environment and a reaction of the specimen at a high resolution and to provide a specimen holder for the electron microscope. In the electron microscope including specimen holding means (6) for holding a specimen (23), the specimen (23) is placed in a capillary (17) through which electron beams are transmittable, the electron microscope includes a supply device for supplying gas or liquid into the capillary (17) and a collection device for collecting the gas or the liquid, and the electron microscope obtains a specimen image of the specimen while flowing the gas or the liquid.

Abstract: Disclosed is a charged particle radiation apparatus capable of capturing a change in a sample due to gaseous atmosphere, light irradiation, heating or the like without exposing the sample to atmosphere. The present invention relates to a sample holder provided with a sample stage that is rotatable around a rotation axis perpendicular to an electron beam irradiation direction, the sample holder being capable of forming an airtight chamber around the sample stage. A sample is allowed to chemically react in any atmosphere, and three-dimensional analysis on the reaction is enabled. A sample liable to change in atmosphere can be three-dimensionally analyzed without exposing the sample to the atmosphere.

Abstract: An object of the invention is to provide an electron microscope which can easily and safely prepare a gas or liquid environment in the electron microscope and can observe a specimen in the environment and a reaction of the specimen at a high resolution and to provide a specimen holder for the electron microscope. In the electron microscope including specimen holding means (6) for holding a specimen (23), the specimen (23) is placed in a capillary (17) through which electron beams are transmittable, the electron microscope includes a supply device for supplying gas or liquid into the capillary (17) and a collection device for collecting the gas or the liquid, and the electron microscope obtains a specimen image of the specimen while flowing the gas or the liquid.

Abstract: The electron beam apparatus sample holding means has a diaphragm which is placed on upper and lower sides of a sample to form a cell for separating a gas atmosphere and a vacuum atmosphere of a sample chamber and sealing an ambient atmosphere of the sample; a gas supply means for supplying gas to an inside of the cell; and exhaust means for exhausting gas. The exhaust means includes a gas exhaust pipe provided in the inside of the cell and an openable/closable exhaust hole provided in a sidewall of the sample holding means so as to pass through the cell. The diaphragm is an amorphous film made of light elements which can transmit an electron beam, such as carbon films, oxide films, and nitride films.

Abstract: A sample holding apparatus for electron microscope includes: a sample holding assembly including an assembly of three components of an upper diaphragm holding part, a sample holding plate and a lower diaphragm holding part; and a holding part that holds the sample holding assembly replaceably. The sample holding assembly includes a cell defined between a diaphragm of the upper diaphragm holding part and a diaphragm of the lower diaphragm holding part, and a flow channel connected to the cell, in which a sample mounted at a protrusion of the sample holding plate is placed. The diaphragm of the upper diaphragm holding part, the sample and the diaphragm of the lower diaphragm holding part are disposed along an optical axis of an electron beam.

Abstract: A sample holding apparatus for electron microscope includes: a sample holding assembly including an assembly of three components of an upper diaphragm holding part, a sample holding plate and a lower diaphragm holding part; and a holding part that holds the sample holding assembly replaceably. The sample holding assembly includes a cell defined between a diaphragm of the upper diaphragm holding part and a diaphragm of the lower diaphragm holding part, and a flow channel connected to the cell, in which a sample mounted at a protrusion of the sample holding plate is placed. The diaphragm of the upper diaphragm holding part, the sample and the diaphragm of the lower diaphragm holding part are disposed along an optical axis of an electron beam.

Abstract: An object of the invention is to provide an electron beam device and a sample holding device for the electron beam device that can observe the reaction between a sample and a gas at high resolution while a gas atmosphere is maintained even by using thin diaphragms. To solve one of the problems described above, in an electron beam device having the function of separately exhausting an electron beam irradiation portion of an optical column, a sample chamber and an observation chamber, a gas supply means for supplying a gas to a sample and an exhaust means for exhausting a gas are provided to sample holding means, diaphragms are disposed above and below the sample to separate the gas atmosphere and vacuum of the sample chamber and to constitute a cell sealing the atmosphere around the sample, and a mechanism for spraying a gas is provided to the outside of the diaphragms. The gas sprayed outside the diaphragms has low electron beam scattering performance such as hydrogen, oxygen or nitrogen.