Patents by Inventor Toshifumi Honda

Toshifumi Honda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220074868
    Abstract: An inspection device includes an illumination optical system that irradiates a sample to be inspected with light having a predetermined wavelength, a detection optical system that includes a photoelectric conversion unit, collects reflected light or scattered light from the sample irradiated with the light, and guides the collected reflected or scattered light to the photoelectric conversion unit, and a data processing unit that extracts positional information of a foreign substance or a defect on the sample by processing an output signal from the photoelectric conversion unit that detects the reflected light or scattered light. The light collection optical system includes a polarized light transmission control unit that changes transmission characteristics according to polarization characteristics of the collected reflected light or scattered light.
    Type: Application
    Filed: December 27, 2018
    Publication date: March 10, 2022
    Inventors: Toshifumi Honda, Shunichi Matsumoto, Eiji Arima, Yuta Urano
  • Patent number: 11143598
    Abstract: A defect inspection apparatus includes: an illumination unit configured to illuminate an inspection object region of a sample with light emitted from a light source; a detection unit configured to detect scattered light in a plurality of directions, which is generated from the inspection object region; a photoelectric conversion unit configured to convert the scattered light detected by the detection unit into an electrical signal; and a signal processing unit configured to process the electrical signal converted by the photoelectric conversion unit to detect a defect in the sample. The detection unit includes a lens array configured to divide an image to form a plurality of images on the photoelectric conversion unit. The signal processing unit is configured to synthesize electrical signals corresponding to the plurality of formed images to detect a defect in the sample.
    Type: Grant
    Filed: October 14, 2020
    Date of Patent: October 12, 2021
    Assignee: HITACHI HIGH-TECH CORPORATION
    Inventors: Toshifumi Honda, Shunichi Matsumoto, Masami Makuuchi, Yuta Urano, Keiko Oka
  • Patent number: 11143600
    Abstract: The invention includes a pulse oscillated light source, an illumination unit that guides light output from the light source to a sample, a scanning unit that controls a position at which the sample is scanned by the illumination unit, a light converging unit that converges light reflected from the sample, a first photoelectric conversion unit that outputs an electric signal corresponding to the light converged by the light converging unit, an AD conversion unit that converts the electric signal output from the first photoelectric conversion unit into a digital signal in synchronization with pulse oscillation of the light source, a linear restoration unit that processes a digital signal converted by the AD conversion unit in synchronization with a pulse oscillation output by the AD conversion unit and corrects nonlinearity of the first photoelectric conversion unit, a defect detection unit that detects a defect of the sample based on an output of the linear restoration unit, and a processing unit that obtains
    Type: Grant
    Filed: February 16, 2018
    Date of Patent: October 12, 2021
    Assignee: HITACHI HIGH-TECH CORPORATION
    Inventors: Toshifumi Honda, Masami Makuuchi, Shunichi Matsumoto, Akira Hamamatsu, Nobuhiro Obara
  • Patent number: 11041815
    Abstract: An inspection information generation device includes a design information acquirer configured to acquire design information of a sample to be inspected, a candidate region extractor configured to use the design information to extract multiple candidate regions, an image capturer configured to capture images of the multiple candidate regions, a similarity calculator configured to use the images of the multiple candidate regions to calculate a similarity or distance between the multiple candidate regions, and a region determiner configured to use the similarity or the distance to determine, as inspection information, at least one reference region corresponding to a region to be inspected.
    Type: Grant
    Filed: May 23, 2016
    Date of Patent: June 22, 2021
    Assignee: HITACHI HIGH-TECH CORPORATION
    Inventors: Takahiro Urano, Toshifumi Honda, Takashi Hiroi, Nobuaki Hirose
  • Patent number: 10955361
    Abstract: As a technique to improve processing efficiency of defect inspection by quickly adjusting a position of a detection system, provided is a defect inspection apparatus including: a stage that moves with a sample and a pattern substrate placed thereon; an illumination optical system that irradiates an object on the stage from a direction inclined from the normal direction of the pattern substrate; a first detection optical system that detects scattered light in the normal direction; a second detection optical system that detects scattered light in a direction different from the scattered light detected by the first detection optical system; a signal processing unit that processes both scattered light signals; and a control unit.
    Type: Grant
    Filed: July 18, 2017
    Date of Patent: March 23, 2021
    Assignee: HITACHI HIGH-TECH CORPORATION
    Inventors: Yuta Urano, Toshifumi Honda, Akio Yazaki, Yukihiro Shibata, Hideki Fukushima, Yasuhiro Yoshitake
  • Patent number: 10948424
    Abstract: In a defect inspection device that irradiates a surface of a sample or a surface of a pattern chip with an illumination light shaped to extend in a first direction, and detects a scattered light generated from the surface of the sample or the surface of the pattern chip by the illumination light to detect a defect on the surface of the sample, the pattern chip has a dot pattern area in which multiple dots are arrayed in multiple rows and multiple columns, a minimum interval between the dots corresponding to the lines aligned in the first direction among the multiple dots arrayed in the dot pattern area in a second direction orthogonal to the first direction is smaller than a width of the illumination light, and a minimum interval between the multiple dots arrayed in the dot pattern area is larger than a resolution of the detection optical system.
    Type: Grant
    Filed: March 2, 2016
    Date of Patent: March 16, 2021
    Assignee: HITACHI HIGH-TECH CORPORATION
    Inventors: Yuta Urano, Yukihiro Shibata, Toshifumi Honda, Yasuhiro Yoshitake, Hideki Fukushima
  • Publication number: 20210025829
    Abstract: A defect inspection apparatus includes: an illumination unit configured to illuminate an inspection object region of a sample with light emitted from a light source; a detection unit configured to detect scattered light in a plurality of directions, which is generated from the inspection object region; a photoelectric conversion unit configured to convert the scattered light detected by the detection unit into an electrical signal; and a signal processing unit configured to process the electrical signal converted by the photoelectric conversion unit to detect a defect in the sample. The detection unit includes a lens array configured to divide an image to form a plurality of images on the photoelectric conversion unit. The signal processing unit is configured to synthesize electrical signals corresponding to the plurality of formed images to detect a defect in the sample.
    Type: Application
    Filed: October 14, 2020
    Publication date: January 28, 2021
    Applicant: HITACHI HIGH-TECH CORPORATION
    Inventors: Toshifumi HONDA, Shunichi MATSUMOTO, Masami MAKUUCHI, Yuta URANO, Keiko OKA
  • Publication number: 20200393388
    Abstract: An inspection device capable of inspecting a foreign matter even during rotation acceleration/deceleration of an object under inspection.
    Type: Application
    Filed: February 28, 2018
    Publication date: December 17, 2020
    Applicant: Hitachi High-Tech Corporation
    Inventors: Masami Makuuchi, Toshifumi Honda, Nobuhiro Obara, Shunichi Matsumoto, Akira Hamamatsu
  • Patent number: 10861145
    Abstract: A defect class that can identify true information or false information regarding a defect of an inspection target is received, it is determined whether or not the number of true information and the number of false information are insufficient to set a defect extraction parameter of a predetermined region, a feature amount of the defect is extracted in a region other than the predetermined region when it is determined that the number of true information and the number of false information are insufficient, the feature amounts are totalized by adding the feature amount of the defect extracted in a region other than the predetermined region to the feature amount of the defect extracted in the predetermined region, and the totalized feature amount of the defect is displayed for adjustment of the defect extraction parameters.
    Type: Grant
    Filed: September 27, 2016
    Date of Patent: December 8, 2020
    Assignee: HITACHI HIGH-TECH CORPORATION
    Inventors: Toshifumi Honda, Takahiro Urano, Hisashi Hatano, Hironori Sakurai
  • Publication number: 20200371047
    Abstract: The invention includes a pulse oscillated light source, an illumination unit that guides light output from the light source to a sample, a scanning unit that controls a position at which the sample is scanned by the illumination unit, alight converging unit that converges light reflected from the sample, a first photoelectric conversion unit that outputs an electric signal corresponding to the light converged by the light converging unit, an AD conversion unit that converts the electric signal output from the first photoelectric conversion unit into a digital signal in synchronization with pulse oscillation of the light source, a linear restoration unit that processes a digital signal converted by the AD conversion unit in synchronization with a pulse oscillation output by the AD conversion unit and corrects nonlinearity of the first photoelectric conversion unit, a defect detection unit that detects a defect of the sample based on an output of the linear restoration unit, and a processing unit that obtains a
    Type: Application
    Filed: February 16, 2018
    Publication date: November 26, 2020
    Inventors: Toshifumi Honda, Masami Makuuchi, Shunichi Matsumoto, Akira Hamamatsu, Nobuhiro Obara
  • Patent number: 10830706
    Abstract: A defect inspection apparatus includes: an illumination unit configured to illuminate an inspection object region of a sample with light emitted from a light source; a detection unit configured to detect scattered light in a plurality of directions, which is generated from the inspection object region; a photoelectric conversion unit configured to convert the scattered light detected by the detection unit into an electrical signal; and a signal processing unit configured to process the electrical signal converted by the photoelectric conversion unit to detect a defect in the sample. The detection unit includes an imaging unit configured to divide an aperture and form a plurality of images on the photoelectric conversion unit. The signal processing unit is configured to synthesize electrical signals corresponding to the plurality of formed images to detect a defect in the sample.
    Type: Grant
    Filed: February 16, 2018
    Date of Patent: November 10, 2020
    Assignee: HITACHI HIGH-TECH CORPORATION
    Inventors: Toshifumi Honda, Shunichi Matsumoto, Masami Makuuchi, Yuta Urano, Keiko Oka
  • Patent number: 10816484
    Abstract: The present invention aims at providing a defect inspection technique capable of setting parameters used for detecting a defect with a less burden to a user. A defect inspection device according to the present invention receives multiple reference values input by the user and calculates a defect extraction condition so as to optimize an evaluation value calculated with the use of the reference values, the number of actual reports, and the number of false reports.
    Type: Grant
    Filed: October 23, 2019
    Date of Patent: October 27, 2020
    Assignee: HITACHI HIGH-TECH CORPORATION
    Inventors: Toshifumi Honda, Takahiro Urano, Mamoru Kobayashi, Hisashi Hatano, Hironori Sakurai
  • Publication number: 20200256807
    Abstract: The present invention addresses the problem of a film formation process in that a minute defect that an inspection before film formation (pre-inspection) has failed to detect becomes a larger film swelling due to film formation, and that, since the film swelling cannot be distinguished from an on-film defect, the film swelling is detected during an inspection after the film formation (post-inspection) as being an on-film defect that is on the film. In order to prevent the erroneous determination of the on-film defect, the sensitivity of the post-inspection has been reduced so that a film swelling due to a minute defect would not be detected.
    Type: Application
    Filed: September 11, 2017
    Publication date: August 13, 2020
    Inventors: Takanori KONDO, Toshifumi HONDA, Akira HAMAMATSU, Hideo OTA, Yoshio KIMOTO
  • Publication number: 20200256804
    Abstract: A defect inspection apparatus includes: an illumination unit configured to illuminate an inspection object region of a sample with light emitted from a light source; a detection unit configured to detect scattered light in a plurality of directions, which is generated from the inspection object region; a photoelectric conversion unit configured to convert the scattered light detected by the detection unit into an electrical signal; and a signal processing unit configured to process the electrical signal converted by the photoelectric conversion unit to detect a defect in the sample. The detection unit includes an imaging unit configured to divide an aperture and form a plurality of images on the photoelectric conversion unit. The signal processing unit is configured to synthesize electrical signals corresponding to the plurality of formed images to detect a defect in the sample.
    Type: Application
    Filed: February 16, 2018
    Publication date: August 13, 2020
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Toshifumi HONDA, Shunichi MATSUMOTO, Masami MAKUUCHI, Yuta URANO, Keiko OKA
  • Publication number: 20200182804
    Abstract: As a technique to improve processing efficiency of defect inspection by quickly adjusting a position of a detection system, provided is a defect inspection apparatus including: a stage that moves with a sample and a pattern substrate placed thereon; an illumination optical system that irradiates an object on the stage from a direction inclined from the normal direction of the pattern substrate; a first detection optical system that detects scattered light in the normal direction; a second detection optical system that detects scattered light in a direction different from the scattered light detected by the first detection optical system; a signal processing unit that processes both scattered light signals; and a control unit.
    Type: Application
    Filed: July 18, 2017
    Publication date: June 11, 2020
    Inventors: Yuta URANO, Toshifumi HONDA, Akio YAZAKI, Yukihiro SHIBATA, Hideki FUKUSHIMA, Yasuhiro YOSHITAKE
  • Patent number: 10642164
    Abstract: Provided is a defect detection device including an illumination unit including a condenser lens and a plurality of light beam synthesis units, and a detection unit detecting scattered light generated on a sample by the illumination unit. The condenser lens condenses a plurality of light beams, emitted onto the sample and having substantially the same wavelength and substantially the same polarization, on the sample. The plurality of light beam synthesis units bring the plurality of light beams close to each other and make the light beams have light paths parallel to the optical axis of the condenser lens.
    Type: Grant
    Filed: September 25, 2017
    Date of Patent: May 5, 2020
    Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Yuko Otani, Kazuo Aoki, Toshifumi Honda, Nobuhiko Kanzaki
  • Publication number: 20200057003
    Abstract: The present invention aims at providing a defect inspection technique capable of setting parameters used for detecting a defect with a less burden to a user. A defect inspection device according to the present invention receives multiple reference values input by the user and calculates a defect extraction condition so as to optimize an evaluation value calculated with the use of the reference values, the number of actual reports, and the number of false reports (refer to FIG. 8).
    Type: Application
    Filed: October 23, 2019
    Publication date: February 20, 2020
    Inventors: Toshifumi Honda, Takahiro Urano, Mamoru Kobayashi, Hisashi Hatano, Hironori Sakurai
  • Patent number: 10466181
    Abstract: The present invention aims at providing a defect inspection technique capable of setting parameters used for detecting a defect with a less burden to a user. A defect inspection device according to the present invention receives multiple reference values input by the user and calculates a defect extraction condition so as to optimize an evaluation value calculated with the use of the reference values, the number of actual reports, and the number of false reports (refer to FIG. 8).
    Type: Grant
    Filed: March 30, 2016
    Date of Patent: November 5, 2019
    Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Toshifumi Honda, Takahiro Urano, Mamoru Kobayashi, Hisashi Hatano, Hironori Sakurai
  • Patent number: 10401300
    Abstract: A defect observation method for observing a defect on a sample detected by another inspection device with a scanning electron microscope including the steps of: optically detecting the defect using the position information for the defect: illuminating the sample including the defect with an illumination intensity pattern having periodic intensity variation in two dimensions by irradiating a plurality of illumination light beams onto the surface of the sample while phase modulating the light beams in a single direction and successively moving the light beams in small movements in a direction different from the single direction, imaging the surface of the sample that is illuminated by the illumination intensity pattern having periodic intensity variation in two dimensions and includes the defect detected by the other inspection device, and detecting the defect detected by the other inspection device from the image obtained through the imaging of the surface of the sample.
    Type: Grant
    Filed: May 27, 2015
    Date of Patent: September 3, 2019
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Yuko Otani, Yuta Urano, Toshifumi Honda
  • Publication number: 20190206047
    Abstract: A defect class that can identify true information or false information regarding a defect of an inspection target is received, it is determined whether or not the number of true information and the number of false information are insufficient to set a defect extraction parameter of a predetermined region, a feature amount of the defect is extracted in a region other than the predetermined region when it is determined that the number of true information and the number of false information are insufficient, the feature amounts are totalized by adding the feature amount of the defect extracted in a region other than the predetermined region to the feature amount of the defect extracted in the predetermined region, and the totalized feature amount of the defect is displayed for adjustment of the defect extraction parameters.
    Type: Application
    Filed: September 27, 2016
    Publication date: July 4, 2019
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Toshifumi HONDA, Takahiro URANO, Hisashi HATANO, Hironori SAKURAI