Patents by Inventor Toshihiko Koike
Toshihiko Koike has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11319641Abstract: The amount of wash water to be consumed in an electrodeposition coating facility and the amount of used wash water to be discharged that requires post-treatment are reduced. To achieve this object, an electrodeposition coating facility that includes a degreasing process section A, a post-degreasing rinse section B, a chemical conversion process section C, a post-chemical-conversion rinse section D, an electrodeposition coating section E, and a post-electrodeposition rinse section F is provided with a filtration process apparatus 4 and a wash water recycling line 5. The filtration process apparatus 4 performs a filtration process on wash water W after being used to wash an object to be coated 1 in the post-electrodeposition rinse section F.Type: GrantFiled: December 4, 2018Date of Patent: May 3, 2022Assignee: Taikisha Ltd.Inventors: Toshihiko Koike, Yasuhiko Sakota, Yoshikazu Hayashi
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Publication number: 20220057425Abstract: An airflow detection apparatus (1) an airflow detection apparatus (1) that detects an airflow in a painting booth, and includes a thread-like member (2) installed inside the painting booth, an image capture device (4) capable of generating image data obtained by capturing an image of the thread-like member (2), and a calculation device capable of performing calculation processing on the image data. The thread-like member (2) is installed in the painting booth in a mode in which at least a portion thereof is suspended. The calculation device specifies a portion corresponding to the thread-like member (2) in the image data, and detects an airflow based on a position of the portion.Type: ApplicationFiled: August 31, 2020Publication date: February 24, 2022Inventors: Toshihiko Koike, Tomoo Yamashita
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Patent number: 11235346Abstract: The facility includes a first connection mechanism connecting a filter unit to a floor discharging section to establish communication between an opening portion of the floor discharging section and an upper face opening portion of the filter unit and a second connection mechanism connecting the filter unit to an exhausting chamber to establish communication between an opening portion of the exhausting chamber and a side face opening portion of the filter unit. The first connection mechanism includes a seal portion that comes into contact with an entire circumference of an outer face of an upper end portion of the filter unit, thus preventing leakage of exhaust gas. The seal portion includes an introducing portion for introducing the upper end portion of the filter unit to the seal portion from a horizontal direction.Type: GrantFiled: August 27, 2020Date of Patent: February 1, 2022Assignee: Taikisha Ltd.Inventors: Kozo Ishida, Toshihiko Koike, Hisao Nakajima, Tomotaka Miwa, Hiroshi Iwakiri
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Patent number: 11226157Abstract: A paint drying device where leakage of air between a drying chamber and a driving section accommodating chamber is prevented reliably. In the paint drying device in which the drying chamber and the driving section accommodating chamber communicate with each other via a through hole through which a power transmission tool extends, there are provided an air feeding passage for feeding air present outside the drying chamber to the driving section accommodating chamber by an air feeding fan and an exhaust passage for discharging air in the driving section accommodating chamber to the outside of the drying chamber by an exhaust fan. An air amount adjustment device is provided for adjusting a ratio between an amount of air to be fed to the driving section accommodating chamber via the air feeding passage and an amount of air to be discharged from the driving section accommodating chamber via the exhaust passage.Type: GrantFiled: July 8, 2020Date of Patent: January 18, 2022Assignee: Taikisha Ltd.Inventors: Masayuki Goto, Toshihiko Koike, Hisao Nakajima
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Patent number: 11192132Abstract: A work facility that is capable of adjusting an air volume without a work defect and saving energy. The opening degree of an air volume adjusting damper corresponding to a filter booth for which the individual air volume measured by a corresponding individual flowmeter is the smallest among the respective individual air volumes for the filter booths is adjusted to a completely open state, whereas the opening degree of any other air volume adjusting damper is adjusted to such an opening degree that the individual air volume for the corresponding filter booth as measured by a corresponding individual flowmeter is equal to the smallest individual air volume, and a gas discharge fan is adjusted by a total air volume adjusting mechanism so that a total air volume measured by a total flowmeter is equal to a predetermined target total air volume.Type: GrantFiled: July 8, 2020Date of Patent: December 7, 2021Assignee: Taikisha Ltd.Inventors: Toshihiko Koike, Tomoo Yamashita
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Publication number: 20210245191Abstract: A work facility that is capable of adjusting an air volume without a work defect and saving energy. The opening degree of an air volume adjusting damper corresponding to a filter booth for which the individual air volume measured by a corresponding individual flowmeter is the smallest among the respective individual air volumes for the filter booths is adjusted to a completely open state, whereas the opening degree of any other air volume adjusting damper is adjusted to such an opening degree that the individual air volume for the corresponding filter booth as measured by a corresponding individual flowmeter is equal to the smallest individual air volume, and a gas discharge fan is adjusted by a total air volume adjusting mechanism so that a total air volume measured by a total flowmeter is equal to a predetermined target total air volume.Type: ApplicationFiled: July 8, 2020Publication date: August 12, 2021Inventors: Toshihiko Koike, Tomoo Yamashita
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Publication number: 20210247137Abstract: A paint drying device where leakage of air between a drying chamber and a driving section accommodating chamber is prevented reliably. In the paint drying device in which the drying chamber and the driving section accommodating chamber communicate with each other via a through hole through which a power transmission tool extends, there are provided an air feeding passage for feeding air present outside the drying chamber to the driving section accommodating chamber by an air feeding fan) and an exhaust passage for discharging air in the driving section accommodating chamber to the outside of the drying chamber by an exhaust fan. An air amount adjustment device is provided for adjusting a ratio between an amount of air to be fed to the driving section accommodating chamber via the air feeding passage and an amount of air to be discharged from the driving section accommodating chamber via the exhaust passage.Type: ApplicationFiled: July 8, 2020Publication date: August 12, 2021Inventors: Masayuki Goto, Toshihiko Koike, Hisao Nakajima
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Publication number: 20210246566Abstract: The amount of wash water to be consumed in an electrodeposition coating facility and the amount of used wash water to be discharged that requires post-treatment are reduced. To achieve this object, an electrodeposition coating facility that includes a degreasing process section A, a post-degreasing rinse section B, a chemical conversion process section C, a post-chemical-conversion rinse section D, an electrodeposition coating section E, and a post-electrodeposition rinse section F is provided with a filtration process apparatus 4 and a wash water recycling line 5. The filtration process apparatus 4 performs a filtration process on wash water W after being used to wash an object to be coated 1 in the post-electrodeposition rinse section F.Type: ApplicationFiled: December 4, 2018Publication date: August 12, 2021Applicant: Taikisha Ltd.Inventors: Toshihiko KOIKE, Yasuhiko SAKOTA, Yoshikazu HAYASHI
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Patent number: 10821472Abstract: In a coating pretreatment facility using microbubbles, an arrangement is made to make it possible to form the facility compact and to reduce the initial cost and the running cost of the facility. A preliminary cleansing water supplying passage 33 is provided for supplying cleansing waters W1, W2 used in cleansing of a coating subject article B in flushing sections 3, 4 following a degreasing section 2 as preliminary cleansing water W3 for use in preliminary cleansing of the coating subject article B in a preliminary cleansing section 1. A microbubble generator device 34 is provided for causing the preliminary cleansing water W3 used in the preliminary cleansing of the coating subject article B in the preliminary cleansing section 1 to contain microbubbles.Type: GrantFiled: April 28, 2017Date of Patent: November 3, 2020Assignee: Taikisha Ltd.Inventors: Toshihiko Koike, Yasuhiko Sakota, Yoshikazu Hayashi
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Publication number: 20190193107Abstract: In a coating pretreatment facility using microbubbles, an arrangement is made to make it possible to form the facility compact and to reduce the initial cost and the running cost of the facility. A preliminary cleansing water supplying passage 33 is provided for supplying cleansing waters W1, W2 used in cleansing of a coating subject article B in flushing sections 3, 4 following a degreasing section 2 as preliminary cleansing water W3 for use in preliminary cleansing of the coating subject article B in a preliminary cleansing section 1. A microbubble generator device 34 is provided for causing the preliminary cleansing water W3 used in the preliminary cleansing of the coating subject article B in the preliminary cleansing section 1 to contain microbubbles.Type: ApplicationFiled: April 28, 2017Publication date: June 27, 2019Inventors: Toshihiko Koike, Yasuhiko Sakota, Yoshikazu Hayashi
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Patent number: 7071028Abstract: A semiconductor device in which a semiconductor chip (3) is mounted on a substrate (2), comprising a substrate having electrodes (7, 8) for substrate-to-substrate connection disposed on both sides of the substrate and connected via a through hole (9), a semiconductor chip having an electrode connected to a wiring pattern arranged on the substrate and having a flat-cut face opposite to the face where the electrode is provided, a bump (4) for substrate-to-substrate connection provided on the electrode for substrate-to-substrate connection and having a flat-cut face opposite to the face facing the substrate, a sealing resin body (5) provided on the substrate, used for sealing the semiconductor chip and the bump for substrate-to-substrate, and having a flat-cut face opposite to the face facing the substrate, wherein the flat-cut face (3a) of the semiconductor chip, the flat-cut face (4a) of the bump for substrate-to-substrate, and the flat-cut face (5a) or the sealing resin body are flush with one another, and thType: GrantFiled: June 14, 2002Date of Patent: July 4, 2006Assignee: Sony CorporationInventors: Toshihiko Koike, Manabu Honda, Masuo Kato
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Publication number: 20040036164Abstract: A semiconductor device in which a semiconductor chip (3) is mounted on a substrate (2), comprising a substrate having electrodes (7, 8) for substrate-to-substrate connection disposed on both sides of the substrate and connected via a through hole (9), a semiconductor chip having an electrode connected to a wiring pattern arranged on the substrate and having a flat-cut face opposite to the face where the electrode is provided, a bump (4) for substrate-to-substrate connection provided on the electrode for substrate-to-substrate connection and having a flat-cut face opposite to the face facing the substrate, a sealing resin body (5) provided on the substrate, used for sealing the semiconductor chip and the bump for substrate-to-substrate, and having a flat-cut face opposite to the face facing the substrate, wherein the flat-cut face (3a) of the semiconductor chip, the flat-cut face (4a) of the bump for substrate-to-substrate, and the flat-cut face (5a) or the sealing resin body are flush with one another, and thType: ApplicationFiled: September 9, 2003Publication date: February 26, 2004Inventors: Toshihiko Koike, Manabu Honda, Masuo Kato
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Patent number: 6139708Abstract: The invention relates to a system for treating a surface of an article with a liquid material by dipping. This system includes (a) a major tank having therein the liquid material for dipping the article thereinto; and (b) a circulatory mechanism for circulating the liquid material through the major tank. The circulatory mechanism is arranged to make a flow of the liquid material through the major tank such that the majority of the flow is in one direction that is substantially along the longitudinal direction of the major tank. Thus, contaminants and/or bubbles are not distributed over the entire major tank, but are effectively promptly removed from the major tank. The flow of the liquid material may include a first flow of the liquid material in the major tank and a second flow that is lower than the first flow in position. The first and second flows run substantially in parallel with each other, before the first and second flows reach a downstream end thereof in the major tank.Type: GrantFiled: August 7, 1998Date of Patent: October 31, 2000Assignees: Nissan Motor Co., Ltd., Taikisha Ltd.Inventors: Hiromi Nonomura, Hirokazu Sugiyama, Yasuo Takamizu, Shigeyoshi Okada, Toshihiko Koike
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Patent number: 4069051Abstract: A light-sensitive silver halide photographic element containing an inorganic bismuth compound in the emulsion layer and/or constitutive layer and a method for developing said element after imagewise exposure is described.Type: GrantFiled: April 26, 1976Date of Patent: January 17, 1978Assignee: Konishiroku Photo Industry Co., Ltd.Inventors: Akira Horikoshi, Kenro Sakamoto, Toshihiko Koike, Yosuke Sadahiro, Toyohiko Kato