Patents by Inventor Toshihiko Koike

Toshihiko Koike has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11319641
    Abstract: The amount of wash water to be consumed in an electrodeposition coating facility and the amount of used wash water to be discharged that requires post-treatment are reduced. To achieve this object, an electrodeposition coating facility that includes a degreasing process section A, a post-degreasing rinse section B, a chemical conversion process section C, a post-chemical-conversion rinse section D, an electrodeposition coating section E, and a post-electrodeposition rinse section F is provided with a filtration process apparatus 4 and a wash water recycling line 5. The filtration process apparatus 4 performs a filtration process on wash water W after being used to wash an object to be coated 1 in the post-electrodeposition rinse section F.
    Type: Grant
    Filed: December 4, 2018
    Date of Patent: May 3, 2022
    Assignee: Taikisha Ltd.
    Inventors: Toshihiko Koike, Yasuhiko Sakota, Yoshikazu Hayashi
  • Publication number: 20220057425
    Abstract: An airflow detection apparatus (1) an airflow detection apparatus (1) that detects an airflow in a painting booth, and includes a thread-like member (2) installed inside the painting booth, an image capture device (4) capable of generating image data obtained by capturing an image of the thread-like member (2), and a calculation device capable of performing calculation processing on the image data. The thread-like member (2) is installed in the painting booth in a mode in which at least a portion thereof is suspended. The calculation device specifies a portion corresponding to the thread-like member (2) in the image data, and detects an airflow based on a position of the portion.
    Type: Application
    Filed: August 31, 2020
    Publication date: February 24, 2022
    Inventors: Toshihiko Koike, Tomoo Yamashita
  • Patent number: 11235346
    Abstract: The facility includes a first connection mechanism connecting a filter unit to a floor discharging section to establish communication between an opening portion of the floor discharging section and an upper face opening portion of the filter unit and a second connection mechanism connecting the filter unit to an exhausting chamber to establish communication between an opening portion of the exhausting chamber and a side face opening portion of the filter unit. The first connection mechanism includes a seal portion that comes into contact with an entire circumference of an outer face of an upper end portion of the filter unit, thus preventing leakage of exhaust gas. The seal portion includes an introducing portion for introducing the upper end portion of the filter unit to the seal portion from a horizontal direction.
    Type: Grant
    Filed: August 27, 2020
    Date of Patent: February 1, 2022
    Assignee: Taikisha Ltd.
    Inventors: Kozo Ishida, Toshihiko Koike, Hisao Nakajima, Tomotaka Miwa, Hiroshi Iwakiri
  • Patent number: 11226157
    Abstract: A paint drying device where leakage of air between a drying chamber and a driving section accommodating chamber is prevented reliably. In the paint drying device in which the drying chamber and the driving section accommodating chamber communicate with each other via a through hole through which a power transmission tool extends, there are provided an air feeding passage for feeding air present outside the drying chamber to the driving section accommodating chamber by an air feeding fan and an exhaust passage for discharging air in the driving section accommodating chamber to the outside of the drying chamber by an exhaust fan. An air amount adjustment device is provided for adjusting a ratio between an amount of air to be fed to the driving section accommodating chamber via the air feeding passage and an amount of air to be discharged from the driving section accommodating chamber via the exhaust passage.
    Type: Grant
    Filed: July 8, 2020
    Date of Patent: January 18, 2022
    Assignee: Taikisha Ltd.
    Inventors: Masayuki Goto, Toshihiko Koike, Hisao Nakajima
  • Patent number: 11192132
    Abstract: A work facility that is capable of adjusting an air volume without a work defect and saving energy. The opening degree of an air volume adjusting damper corresponding to a filter booth for which the individual air volume measured by a corresponding individual flowmeter is the smallest among the respective individual air volumes for the filter booths is adjusted to a completely open state, whereas the opening degree of any other air volume adjusting damper is adjusted to such an opening degree that the individual air volume for the corresponding filter booth as measured by a corresponding individual flowmeter is equal to the smallest individual air volume, and a gas discharge fan is adjusted by a total air volume adjusting mechanism so that a total air volume measured by a total flowmeter is equal to a predetermined target total air volume.
    Type: Grant
    Filed: July 8, 2020
    Date of Patent: December 7, 2021
    Assignee: Taikisha Ltd.
    Inventors: Toshihiko Koike, Tomoo Yamashita
  • Publication number: 20210245191
    Abstract: A work facility that is capable of adjusting an air volume without a work defect and saving energy. The opening degree of an air volume adjusting damper corresponding to a filter booth for which the individual air volume measured by a corresponding individual flowmeter is the smallest among the respective individual air volumes for the filter booths is adjusted to a completely open state, whereas the opening degree of any other air volume adjusting damper is adjusted to such an opening degree that the individual air volume for the corresponding filter booth as measured by a corresponding individual flowmeter is equal to the smallest individual air volume, and a gas discharge fan is adjusted by a total air volume adjusting mechanism so that a total air volume measured by a total flowmeter is equal to a predetermined target total air volume.
    Type: Application
    Filed: July 8, 2020
    Publication date: August 12, 2021
    Inventors: Toshihiko Koike, Tomoo Yamashita
  • Publication number: 20210247137
    Abstract: A paint drying device where leakage of air between a drying chamber and a driving section accommodating chamber is prevented reliably. In the paint drying device in which the drying chamber and the driving section accommodating chamber communicate with each other via a through hole through which a power transmission tool extends, there are provided an air feeding passage for feeding air present outside the drying chamber to the driving section accommodating chamber by an air feeding fan) and an exhaust passage for discharging air in the driving section accommodating chamber to the outside of the drying chamber by an exhaust fan. An air amount adjustment device is provided for adjusting a ratio between an amount of air to be fed to the driving section accommodating chamber via the air feeding passage and an amount of air to be discharged from the driving section accommodating chamber via the exhaust passage.
    Type: Application
    Filed: July 8, 2020
    Publication date: August 12, 2021
    Inventors: Masayuki Goto, Toshihiko Koike, Hisao Nakajima
  • Publication number: 20210246566
    Abstract: The amount of wash water to be consumed in an electrodeposition coating facility and the amount of used wash water to be discharged that requires post-treatment are reduced. To achieve this object, an electrodeposition coating facility that includes a degreasing process section A, a post-degreasing rinse section B, a chemical conversion process section C, a post-chemical-conversion rinse section D, an electrodeposition coating section E, and a post-electrodeposition rinse section F is provided with a filtration process apparatus 4 and a wash water recycling line 5. The filtration process apparatus 4 performs a filtration process on wash water W after being used to wash an object to be coated 1 in the post-electrodeposition rinse section F.
    Type: Application
    Filed: December 4, 2018
    Publication date: August 12, 2021
    Applicant: Taikisha Ltd.
    Inventors: Toshihiko KOIKE, Yasuhiko SAKOTA, Yoshikazu HAYASHI
  • Patent number: 10821472
    Abstract: In a coating pretreatment facility using microbubbles, an arrangement is made to make it possible to form the facility compact and to reduce the initial cost and the running cost of the facility. A preliminary cleansing water supplying passage 33 is provided for supplying cleansing waters W1, W2 used in cleansing of a coating subject article B in flushing sections 3, 4 following a degreasing section 2 as preliminary cleansing water W3 for use in preliminary cleansing of the coating subject article B in a preliminary cleansing section 1. A microbubble generator device 34 is provided for causing the preliminary cleansing water W3 used in the preliminary cleansing of the coating subject article B in the preliminary cleansing section 1 to contain microbubbles.
    Type: Grant
    Filed: April 28, 2017
    Date of Patent: November 3, 2020
    Assignee: Taikisha Ltd.
    Inventors: Toshihiko Koike, Yasuhiko Sakota, Yoshikazu Hayashi
  • Publication number: 20190193107
    Abstract: In a coating pretreatment facility using microbubbles, an arrangement is made to make it possible to form the facility compact and to reduce the initial cost and the running cost of the facility. A preliminary cleansing water supplying passage 33 is provided for supplying cleansing waters W1, W2 used in cleansing of a coating subject article B in flushing sections 3, 4 following a degreasing section 2 as preliminary cleansing water W3 for use in preliminary cleansing of the coating subject article B in a preliminary cleansing section 1. A microbubble generator device 34 is provided for causing the preliminary cleansing water W3 used in the preliminary cleansing of the coating subject article B in the preliminary cleansing section 1 to contain microbubbles.
    Type: Application
    Filed: April 28, 2017
    Publication date: June 27, 2019
    Inventors: Toshihiko Koike, Yasuhiko Sakota, Yoshikazu Hayashi
  • Patent number: 7071028
    Abstract: A semiconductor device in which a semiconductor chip (3) is mounted on a substrate (2), comprising a substrate having electrodes (7, 8) for substrate-to-substrate connection disposed on both sides of the substrate and connected via a through hole (9), a semiconductor chip having an electrode connected to a wiring pattern arranged on the substrate and having a flat-cut face opposite to the face where the electrode is provided, a bump (4) for substrate-to-substrate connection provided on the electrode for substrate-to-substrate connection and having a flat-cut face opposite to the face facing the substrate, a sealing resin body (5) provided on the substrate, used for sealing the semiconductor chip and the bump for substrate-to-substrate, and having a flat-cut face opposite to the face facing the substrate, wherein the flat-cut face (3a) of the semiconductor chip, the flat-cut face (4a) of the bump for substrate-to-substrate, and the flat-cut face (5a) or the sealing resin body are flush with one another, and th
    Type: Grant
    Filed: June 14, 2002
    Date of Patent: July 4, 2006
    Assignee: Sony Corporation
    Inventors: Toshihiko Koike, Manabu Honda, Masuo Kato
  • Publication number: 20040036164
    Abstract: A semiconductor device in which a semiconductor chip (3) is mounted on a substrate (2), comprising a substrate having electrodes (7, 8) for substrate-to-substrate connection disposed on both sides of the substrate and connected via a through hole (9), a semiconductor chip having an electrode connected to a wiring pattern arranged on the substrate and having a flat-cut face opposite to the face where the electrode is provided, a bump (4) for substrate-to-substrate connection provided on the electrode for substrate-to-substrate connection and having a flat-cut face opposite to the face facing the substrate, a sealing resin body (5) provided on the substrate, used for sealing the semiconductor chip and the bump for substrate-to-substrate, and having a flat-cut face opposite to the face facing the substrate, wherein the flat-cut face (3a) of the semiconductor chip, the flat-cut face (4a) of the bump for substrate-to-substrate, and the flat-cut face (5a) or the sealing resin body are flush with one another, and th
    Type: Application
    Filed: September 9, 2003
    Publication date: February 26, 2004
    Inventors: Toshihiko Koike, Manabu Honda, Masuo Kato
  • Patent number: 6139708
    Abstract: The invention relates to a system for treating a surface of an article with a liquid material by dipping. This system includes (a) a major tank having therein the liquid material for dipping the article thereinto; and (b) a circulatory mechanism for circulating the liquid material through the major tank. The circulatory mechanism is arranged to make a flow of the liquid material through the major tank such that the majority of the flow is in one direction that is substantially along the longitudinal direction of the major tank. Thus, contaminants and/or bubbles are not distributed over the entire major tank, but are effectively promptly removed from the major tank. The flow of the liquid material may include a first flow of the liquid material in the major tank and a second flow that is lower than the first flow in position. The first and second flows run substantially in parallel with each other, before the first and second flows reach a downstream end thereof in the major tank.
    Type: Grant
    Filed: August 7, 1998
    Date of Patent: October 31, 2000
    Assignees: Nissan Motor Co., Ltd., Taikisha Ltd.
    Inventors: Hiromi Nonomura, Hirokazu Sugiyama, Yasuo Takamizu, Shigeyoshi Okada, Toshihiko Koike
  • Patent number: 4069051
    Abstract: A light-sensitive silver halide photographic element containing an inorganic bismuth compound in the emulsion layer and/or constitutive layer and a method for developing said element after imagewise exposure is described.
    Type: Grant
    Filed: April 26, 1976
    Date of Patent: January 17, 1978
    Assignee: Konishiroku Photo Industry Co., Ltd.
    Inventors: Akira Horikoshi, Kenro Sakamoto, Toshihiko Koike, Yosuke Sadahiro, Toyohiko Kato