Patents by Inventor Toshihiko Takakura

Toshihiko Takakura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6448995
    Abstract: An image read/write head (A) includes: a substrate (4) having a first widthwise side portion (4c), a second widthwise side portion (4d), and an upper surface carrying a row of light-receiving elements (2) longitudinally of the substrate; an elongate case (1) mounted to the upper surface of the substrate (4) to enclose the light-receiving elements (2); a transparent cover (19) mounted to an upper surface of the case (1) for contact with a document to be fed; a light source (3) disposed in the case for illuminating the document; a lens (5) disposed in the case for causing an image of the document (D) illuminated by the light source (3) to be formed on the light-receiving elements (2); and a row of printing elements (8) carried by the an upper surface of the substrate at an excess portion which is provided by extending the first side portion (4c) beyond a lower edge of the case (1) by a predetermined amount.
    Type: Grant
    Filed: November 28, 2000
    Date of Patent: September 10, 2002
    Assignee: Rohm Co., Ltd.
    Inventors: Hisayoshi Fujimoto, Hiroaki Onishi, Toshihiko Takakura, Norihiro Imamura
  • Patent number: 6420227
    Abstract: A plurality of first contact holes reaching an n+-type semiconductor area used as the source of a MISFET employed in a logic-DRAM mixture LSI and a plurality of second contact holes reaching another n+-type semiconductor area used as the drain of the MISFET are bored through an insulation layer created over a gate electrode of the MISFET. A conductive film on the same layer as a bit line shunts the n+-type semiconductor area used as the source through the first contact holes. Another conductive film shunts the n+-type semiconductor area used as the drain through the second contact holes.
    Type: Grant
    Filed: March 3, 2000
    Date of Patent: July 16, 2002
    Assignee: Hitachi, Ltd.
    Inventors: Makoto Yoshida, Katsuyuki Asaka, Toshihiko Takakura
  • Patent number: 6376822
    Abstract: An image reading apparatus is provided which includes a cold-cathode tube as a light source for illuminating a document sheet, an inverter for providing the light source with driving power. A connection cable is used for electrically connecting the light source to the inverter. The image reading apparatus also includes three kinds of rows of light receiving elements arranged in the primary scanning direction for detecting the light reflected on the document sheet. A lens array is provided for focusing the reflected light at the respective rows of light receiving elements. The light receiving elements are mounted on a printed circuit board. The light source, the inverter, the lens array and the printed circuit board are supported by a single case of the image reading apparatus.
    Type: Grant
    Filed: July 31, 2000
    Date of Patent: April 23, 2002
    Assignee: Rohm Co., Ltd.
    Inventors: Hisayoshi Fujimoto, Hiroaki Onishi, Toshihiko Takakura, Norihiro Imamura
  • Patent number: 6365887
    Abstract: An image reading apparatus is provided which includes a cold-cathode tube as a light source for illuminating a document sheet, an inverter for providing the light source with driving power. A connection cable is used for electrically connecting the light source to the inverter. The image reading apparatus also includes three kinds of rows of light receiving elements arranged in the primary scanning direction for detecting the light reflected on the document sheet. A lens array is provided for focusing the reflected light at the respective rows of light receiving elements. The light receiving elements are mounted on a printed circuit board. The light source, the inverter, the lens array and the printed circuit board are supported by a single case of the image reading apparatus.
    Type: Grant
    Filed: July 31, 2000
    Date of Patent: April 2, 2002
    Assignee: Rohm Co., Ltd.
    Inventors: Hisayoshi Fujimoto, Hiroaki Onishi, Toshihiko Takakura, Norihiro Imamura
  • Publication number: 20020030213
    Abstract: A plurality of first contact holes reaching an n+-type semiconductor area used as the source of a MISFET employed in a logic-DRAM mixture LSI and a plurality of second contact holes reaching another n+-type semiconductor area used as the drain of the MISFET are bored through an insulation layer created over a gate electrode of the MISFET. A conductive film on the same layer as a bit line shunts the n+-type semiconductor area used as the source through the first contact holes. Another conductive film shunts the n+-type semiconductor area used as the drain through the second contact holes.
    Type: Application
    Filed: November 20, 2001
    Publication date: March 14, 2002
    Inventors: Makoto Yoshida, Katsuyuki Asaka, Toshihiko Takakura
  • Patent number: 6339214
    Abstract: An image sensor unit for reading documents includes a casing elongated in the primary scanning direction, a light source, at least a pair of mirrors held in facing relation for alternately reflecting light, a lens unit for focusing light reflected on the document, and a sensor for receiving the light focused by the lens unit. For reducing the vertical dimension of the image sensor unit, the paired mirrors are spaced from each other in the secondary scanning direction within the casing.
    Type: Grant
    Filed: August 6, 1999
    Date of Patent: January 15, 2002
    Assignee: Rohm Co., Ltd.
    Inventors: Toshihiko Takakura, Hisayoshi Fujimoto
  • Patent number: 6329680
    Abstract: A plurality of first contact holes reaching an n+-type semiconductor area used as the source of a MISFET employed in a logic-DRAM mixture LSI and a plurality of second contact holes reaching another n+-type semiconductor area used as the drain of the MISFET are bored through an insulation layer created over a gate electrode of the MISFET. A conductive film on the same layer as a bit line shunts the n+-type semiconductor area used as the source through the first contact holes. Another conductive film shunts the n+-type semiconductor area used as the drain through the second contact holes.
    Type: Grant
    Filed: January 7, 2000
    Date of Patent: December 11, 2001
    Assignee: Hitachi, Ltd.
    Inventors: Makoto Yoshida, Katsuyuki Asaka, Toshihiko Takakura
  • Publication number: 20010028506
    Abstract: A lens array unit includes first and second lens arrays cooperative with each other. The first lens array is provided with a plurality of first convex lenses and a first transparent holder formed integral with the first lenses. Each of the first lenses has first and second lens surfaces. The second lens array is provided with a plurality of second convex lenses and a second transparent holder formed integral with the second lenses Each of the second lenses has third and fourth lens surfaces. The second lens array is attached to the first lens array so that the third lens surfaces face the second lens surfaces. The lens array unit further includes a light shield mounted on the first lens array. The light shield is formed with a plurality of through-holes each facing the relevant one of the first lens surfaces.
    Type: Application
    Filed: April 3, 2001
    Publication date: October 11, 2001
    Inventors: Hisayoshi Fujimoto, Toshihiko Takakura, Norihiro Imamura, Minori Torama
  • Publication number: 20010024327
    Abstract: A lens array is provided with a plurality of lenses and a holder formed integral with the lenses. Each of the lenses includes a non-flat first lens surface and a flat second lens surface. The holder includes a first surface adjacent to the first lens surface and a second surface adjacent to the second lens surface. The second surface is formed with a plurality of recesses in each of which a light shielding layer is provided.
    Type: Application
    Filed: March 21, 2001
    Publication date: September 27, 2001
    Inventors: Hisayoshi Fujimoto, Toshihiko Takakura
  • Patent number: 6259082
    Abstract: An image reading apparatus is provided which includes light source for irradiating a document sheet with light, an elongated light-leading member through which light emitted from the light source propagates. The light-leading member is provided with a head surface, a bottom surface, a first side surface and a second side surface. The image reading apparatus further includes a row of image sensor chips for detecting light reflected on the document sheet, and an insulating circuit board for carrying the image sensor chips. The light source is also mounted on the circuit board. The cross section of the light-leading member is pentagonal, parabolic, or elliptic.
    Type: Grant
    Filed: July 30, 1998
    Date of Patent: July 10, 2001
    Assignee: Rohm Co., Ltd.
    Inventors: Hisayoshi Fujimoto, Hiroaki Onishi, Toshihiko Takakura, Norihiro Imamura
  • Patent number: 6195183
    Abstract: An image reading apparatus includes a light source for irradiating a document sheet with light, a row of red light receiving elements arranged in a primary scanning direction for detecting a red component of the light reflected on the document sheet, a row of green light receiving elements arranged in the primary scanning direction for detecting a green component of the reflected light, and a row of blue light receiving elements arranged in the primary scanning direction for detecting a blue component of the reflected light. The row of red light receiving elements, the row of green light receiving elements and the row of blue light receiving elements are displaced from each other in a secondary scanning direction which is perpendicular to the primary scanning direction.
    Type: Grant
    Filed: July 14, 1998
    Date of Patent: February 27, 2001
    Assignee: Rohm Co., Ltd.
    Inventors: Hisayoshi Fujimoto, Hiroaki Onishi, Toshihiko Takakura, Norihiro Imamura
  • Patent number: 6133565
    Abstract: An image reading apparatus is provided which includes a cold-cathode tube as a light source for illuminating a document sheet, an inverter for providing the light source with driving power. A connection cable is used for electrically connecting the light source to the inverter. The image reading apparatus also includes three kinds of rows of light receiving elements arranged in the primary scanning direction for detecting the light reflected on the document sheet. A lens array is provided for focusing the reflected light at the respective rows of light receiving elements. The light receiving elements are mounted on a printed circuit board. The light source, the inverter, the lens array and the printed circuit board are supported by a single case of the image reading apparatus.
    Type: Grant
    Filed: August 11, 1998
    Date of Patent: October 17, 2000
    Assignee: Rohm Co., Ltd.
    Inventors: Hisayoshi Fujimoto, Hiroaki Onishi, Toshihiko Takakura, Norihiro Imamura
  • Patent number: 6118114
    Abstract: An image sensor is provided for reading images on an image carrying paper irradiated by light emitted from a light source. The image sensor includes a plurality of image sensor chips for receiving reflected light from the image carrying paper for output of image signals in accordance with the luminous energy of the reflected light. The image sensor also includes a light detector for receiving light directly from the light source for output of a detection signal in accordance with the luminous energy of the directly received light.
    Type: Grant
    Filed: April 23, 1998
    Date of Patent: September 12, 2000
    Assignee: Rohm Co., Ltd.
    Inventors: Hisayoshi Fujimoto, Hiroaki Onishi, Toshihiko Takakura, Norihiro Imamura
  • Patent number: 5847744
    Abstract: A thin-film type thermal print head has a resistor layer formed over an insulative substrate, a conductor layer having a specified planar pattern overlapping the resistor layer, a portion of the resistor layer serving as a heat-emitting part which is not covered by the conductor layer, and a protective layer formed over the heat-emitting part and at least a portion of the conductor layer adjacent to the heat-emitting part. The protective layer may be formed as a conductive layer with resistance greater than that of the heat-emitting part such that static electricity which may be generated by the friction with printing paper can quickly escape to the conductor layer. The protective layer may also include a wear-resisting layer of a prior art type between the conductive layer and the conductor layer, a portion of the conductive layer being preferably connected to the conductor layer. The conductive layer is preferably a mixed layer of SiC and ZrB.sub.2 containing ZrB.sub.
    Type: Grant
    Filed: February 7, 1996
    Date of Patent: December 8, 1998
    Assignee: Rohm Co., Ltd.
    Inventors: Hideaki Hoki, Toshihiko Takakura, Haruhiko Yamashita, Kunio Motoyama, Mitsuhiko Fukuda, Yasuzo Matsuo
  • Patent number: 5680170
    Abstract: A thermal printhead according to the present invention includes an insulating head substrate (8) having an obverse surface (8a), a reverse surface (8b), a first longitudinal edge surface (8c) and a second longitudinal edge surface (8d). The surface (8a) of the head substrate (8) is formed with an array of heating dots (10a) along the first longitudinal edge surface (8c), a common electrode pattern (11) electrically connected to the array of heating dots (10a) adjacent to the first longitudinal edge surface (8c) and individual electrodes (12) extending away from the common electrode pattern (11) and being electrically connected to the respective heating dots (10a). The heating dots (10a) are selectively heated by drive elements. The common electrode pattern (11) is electrically connected to an auxiliary electrode layer (14) which covers at least the first longitudinal edge surface (8c), reverse surface (8b) and second longitudinal edge surface (8d) of the heat substrate (8).
    Type: Grant
    Filed: January 16, 1996
    Date of Patent: October 21, 1997
    Assignee: Rohm Co. Ltd.
    Inventors: Hideo Taniguchi, Toshihiko Takakura, Hideaki Hoki, Masatoshi Nakanishi
  • Patent number: 5514524
    Abstract: A method of making thermal printheads is provided which comprises the steps of: (a) preparing a master substrate having plural rows of unit head regions; (b) forming a head glaze member in each unit head region in each row so that an edge of the head glaze member of the unit head region aligned with that of the head glaze member of any other unit region in the same row; (c) half-cutting the master substrate along the edge of the head glaze member of the unit head region with a half-cutting dicing blade which has an inclined edge face for partially cutting the head glaze member to provide a glaze corner; and (d) forming an array of heating dots along the glaze corner; wherein at least one blade positioning mark is formed on the master substrate before the half-cutting step (c); and the half-cutting dicing blade is positionally set in the half-cutting step (c) by referring to the blade positioning mark.
    Type: Grant
    Filed: November 21, 1994
    Date of Patent: May 7, 1996
    Assignee: Rohm Co., Ltd.
    Inventors: Hiroaki Ohnishi, Toshihiko Takakura, Toshiyuki Fujita
  • Patent number: 5200348
    Abstract: A semiconductor device employing a new isolation process is disclosed, wherein an isolation area is a region in which a burying material is buried in a deep groove formed in a semiconductor body with a substantially constant width by anisotropic dry etching, semiconductor elements are formed in selected ones of semiconductor regions isolated by the isolation area, and others of the semiconductor regions, with no semiconductor element formed therein, have their whole surface covered with a thick oxide film which is produced by the local oxidation of the semiconductor body.The new isolation process is well-suited for a bipolar type semiconductor device, wherein the deep groove is formed so as to reach a semiconductor substrate through an N.sup.+ -type buried layer, and a thick oxide film formed simultaneously with the aforementioned thick oxide film isolates the base region and collector contact region of a bipolar transistor.
    Type: Grant
    Filed: December 3, 1991
    Date of Patent: April 6, 1993
    Assignee: Hatachi, Ltd.
    Inventors: Akihisa Uchida, Daisuke Okada, Toshihiko Takakura, Katsumi Ogiue, Yoichi Tamaki, Masao Kawamura
  • Patent number: 5141888
    Abstract: A bipolar type of semiconductor integrated circuit device is provided with U-shaped grooves which are formed by cutting a main surface of a semiconductor body to form isolation regions between bipolar transistors. A silicon oxide film can be formed in the U-shaped grooves by thermal oxidation simultaneously with the formation of a silicon oxide film used to form isolation regions between each collector contact region and base region. No separate step is needed for forming the silicon oxide film between the collector contact region and the base region. The thickness of the silicon oxide film can be controlled, and has a sufficient thickness even at its two edges, i.e., at its boundaries with the U-shaped grooves, so that the bipolar transistors exhibit good electrical characteristics. Namely, the collector resistance thereof does not increase, and the breakdown voltage at the pn junction between the collector region and the base region does not decrease.
    Type: Grant
    Filed: January 18, 1991
    Date of Patent: August 25, 1992
    Assignee: Hitachi, Ltd.
    Inventors: Mikinori Kawaji, Toshihiko Takakura, Akihisa Uchida, Shigeo Kuroda, Yoichi Tamaki, Takeo Shiba, Kazuhiko Sagara, Masao Kawamura
  • Patent number: 5084402
    Abstract: A semiconductor device employing a new isolation process is disclosed, wherein an isolation area is a region in which a burying material is buried in a deep groove formed in a semiconductor body with a substantially constant width by anisotropic dry etching, semiconductor elements are formed in selected ones of semiconductor regions isolated by the isolation area, and others of the semiconductor regions, with no semiconductor element formed therein, have their whole surface covered with a thick oxide film which is produced by the local oxidation of the semiconductor body.The new isolation process is well-suited for a bipolar type semiconductor device, wherein the deep groove is formed so as to reach a semiconductor substrate through an N.sup.+ -type buried layer, and a thick oxide film formed simultaneously with the aforementioned thick oxide film isolates the base region and collector contact region of a bipolar transistor.
    Type: Grant
    Filed: May 17, 1989
    Date of Patent: January 28, 1992
    Assignee: Hitachi, Ind.
    Inventors: Akihisa Uchida, Daisuke Okaka, Toshihiko Takakura, Katsumi Ogiue, Yoichi Tamaki, Masao Kawamura
  • Patent number: 5011788
    Abstract: A bipolar type of semiconductor integrated circuit device is provided with U-shaped grooves which are formed by cutting a main surface of a semiconductor body to form isolation regions between bipolar transistors. A silicon oxide film can be formed in the U-shaped grooves by thermal oxidation simultaneously with the formation of a silicon oxide film used to form isolation regions between each collector contact region and base region. No separate step is needed for forming the silicon oxide film between the collector contact region and the base region. The thickness of the silicon oxide film can be controlled, and has a sufficient thickness even at its two edges, i.e., at its boundaries with the U-shaped grooves, so that the bipolar transistors exhibit good electrical characteristics. Namely, the collector resistance thereof does not increase, and the breakdown voltage at the pn junction between the collector region and the base region does not decrease.
    Type: Grant
    Filed: December 15, 1988
    Date of Patent: April 30, 1991
    Assignee: Hitachi, Ltd.
    Inventors: Mikinori Kawaji, Toshihiko Takakura, Akihisa Uchida, Shigeo Kuroda, Yoichi Tamaki, Takeo Shiba, Kazuhiko Sagara, Masao Kawamura