Patents by Inventor Toshihiko Tanaka

Toshihiko Tanaka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7372062
    Abstract: A defect inspection device which inspects for surface defects in substrates, and which includes an illumination section that irradiates the substrate with illumination light having a variable incident angle, and a light-receiving section that receives light from the substrate irradiated with illumination light from the illumination section with a variable detection angle. The light-receiving section receives diffracted light emitted in substantially the same direction as the direction of incidence of the illumination light from the illumination section.
    Type: Grant
    Filed: October 20, 2006
    Date of Patent: May 13, 2008
    Assignee: Olympus Corporation
    Inventor: Toshihiko Tanaka
  • Publication number: 20080094616
    Abstract: A surface defect inspection apparatus in accordance with the present invention is a surface defect inspection apparatus 500 which includes a tested object 40 a multi-layer film is formed on the surface thereof, and an illumination portion 5 which irradiates an illumination light 6b generated by the illumination lamp 41 onto the tested object 40 so that the image of the tested object irradiated with the illumination light 6b to detect a surface defect of the tested object 40 is visually observable by an observer 49. A wavelength distribution of the illumination light 6b is corrected so that the light intensity is substantially constant with respect to the wavelength sensitivity characteristics of the human eye. In accordance with the present invention, in a case of inspecting a tested object formed with a multi-layer film, even with a difference in film thickness in lower layers, unevenness in brightness or color of the surface hardly occurs, whereby it is possible to improve the detection accuracy of defects.
    Type: Application
    Filed: November 26, 2007
    Publication date: April 24, 2008
    Applicant: Olympus Corporation
    Inventor: Toshihiko Tanaka
  • Patent number: 7361530
    Abstract: Productivity of a semiconductor integrated circuit device is improved. According to how many times the photomask is used, a photomask having an opaque pattern made of metal and a photomask having an opaque pattern made of a resist film are properly used, and thereby an exposure treatment is performed.
    Type: Grant
    Filed: March 7, 2007
    Date of Patent: April 22, 2008
    Assignee: Renesas Technology Corporation
    Inventors: Tsuneo Terasawa, Toshihiko Tanaka, Ko Miyazaki, Norio Hasegawa, Kazutaka Mori
  • Publication number: 20080022678
    Abstract: A control system for a supercharged internal combustion engine provided with a main exhaust passage (20) extending through a turbocharger turbine (21) and further through a catalyst (23, 24) to open to the outside air, an exhaust bypass passage (25) by passing the turbocharger turbine by branching from the main exhaust passage at the upstream side of the turbine and merging with the main exhaust passage before reaching the catalyst at the turbine downstream side, and an exhaust bypass valve (26) provided at the exhaust bypass passage, the control system for a supercharged internal combustion engine controlling the ignition timing in accordance with at least one of the engine warmup state and the catalyst warmup state until warmup of the internal combustion engine and warmup of the catalyst are completed and further controlling the opening degree of the exhaust bypass valve based on the control of the ignition timing, is provided.
    Type: Application
    Filed: May 19, 2006
    Publication date: January 31, 2008
    Applicants: TOYOTA JIDOSHA KABUSHIKI KAISHA, DENSO CORPORATION
    Inventors: Yasuyuki Irisawa, Hirofumi Kubota, Toshihiko Tanaka
  • Patent number: 7289660
    Abstract: An image data file management system according to the present invention includes a plurality of inspection sections which acquire an image of a subject and acquire various kinds of inspection results by performing image processing with respect to image data of the subject, and an image server which stores respective sets of the image data acquired by the respective inspection sections in association with information of the subject.
    Type: Grant
    Filed: August 8, 2002
    Date of Patent: October 30, 2007
    Assignee: Olympus Optical Co., Ltd.
    Inventors: Yasutada Miura, Toshihiko Tanaka
  • Publication number: 20070229452
    Abstract: A liquid crystal display (LCD) 1 according to an embodiment of the present invention includes a liquid crystal panel having a TFT substrate 2, a CF substrate 25, and a liquid crystal layer 14 interposed between the two substrates; a TFT ambient light photosensor having a semiconductor layer 19L for detecting external light; a photodetector unit LS1 having a capacitor Cw in which a predetermined reference voltage is charged and a voltage charged by leakage current of the TFT ambient light photosensor is lowered; and an ambient light photosensor reader unit Re1 for reading a voltage charged in the capacitor for a predetermined read period. The photodetector unit is disposed on a first surface of the TFT substrate 2 that is in contact with the liquid crystal layer, and the surface of the photodetector unit except for the semiconductor layer 19L and its periphery is covered by a light-shielding layer 21.
    Type: Application
    Filed: March 30, 2007
    Publication date: October 4, 2007
    Applicant: EPSON IMAGING DEVICES CORP.
    Inventors: Yutaka Sano, Takashi Kunimori, Toshihiko Tanaka, Masanori Yasumori
  • Publication number: 20070188441
    Abstract: A display 10 according to one embodiment of the invention includes a display panel having an active matrix substrate and a color filter substrate, a lighting unit for the display panel, ambient light photosensors 321 to 326, a controller that controls luminous intensity of the lighting unit based on outputs from the ambient light photosensors 321 to 326, and a spectral sensitivity adjustor provided at a position on the color filter substrate corresponding to the ambient light photosensors 321 to 326 in order to make the spectral sensitivity of the ambient light photosensors 321 to 326 match human visual sensitivity. The spectral sensitivity adjustor may be a color filter or a polarizing filter. The display thus structured automatically and stably controls on/off of its backlights depending on the brightness of the surroundings with a sensitivity corresponding to human visual sensitivity.
    Type: Application
    Filed: February 2, 2007
    Publication date: August 16, 2007
    Applicant: SANYO EPSON IMAGING DEVICES CORP.
    Inventors: Toshihiko Tanaka, Takashi Kunimori, Yutaka Sano, Masanori Yasumori
  • Publication number: 20070188743
    Abstract: Defect detection is performed with two settings, that is, setting of a focus position where a signal intensity obtained from a dot pattern is maximum and setting of a focus position where a signal intensity obtained from a hole pattern is maximum. In addition, defect detection is performed at a predetermined focus position previously set and for the detected defect, the focus position is changed at that position to find a focus position where the signal intensity is maximum. If the focus position is away from a signal light-receiving system, the defect is determined as dot-shaped. If the focus position is close to the signal light-receiving system, the defect is determined as hole-shaped. If the focus position is intermediate of them, the defect is determined as an elongated-shaped.
    Type: Application
    Filed: February 16, 2007
    Publication date: August 16, 2007
    Inventors: Toshihiko Tanaka, Tsuneo Terasawa, Yoshihiro Tezuka
  • Publication number: 20070155052
    Abstract: Productivity of a semiconductor integrated circuit device is improved. According to how many times the photomask is used, a photomask having an opaque pattern made of metal and a photomask having an opaque pattern made of a resist film are properly used, and thereby an exposure treatment is performed.
    Type: Application
    Filed: March 7, 2007
    Publication date: July 5, 2007
    Inventors: Tsuneo Terasawa, Toshihiko Tanaka, Ko Miyazaki, Norio Hasegawa, Kazutaka Mori
  • Publication number: 20070103893
    Abstract: A defect inspection device includes an illumination section that irradiates a specimen with illumination light having a variable incident angle, and a light-receiving section that receives light from the specimen irradiated with illumination light from the illumination section with a variable detection angle; the light-receiving section receiving the light emitted in substantially the same direction as the direction of incidence of the illumination light from the illumination section.
    Type: Application
    Filed: October 20, 2006
    Publication date: May 10, 2007
    Applicant: Olympus Corporation
    Inventor: Toshihiko Tanaka
  • Patent number: 7205222
    Abstract: Productivity of a semiconductor integrated circuit device is improved. According to how many times the photomask is used, a photomask having an opaque pattern made of metal and a photomask having an opaque pattern made of a resist film are properly used, and thereby an exposure treatment is performed.
    Type: Grant
    Filed: December 28, 2004
    Date of Patent: April 17, 2007
    Assignee: Renesas Technology Corp.
    Inventors: Tsuneo Terasawa, Toshihiko Tanaka, Ko Miyazaki, Norio Hasegawa, Kazutaka Mori
  • Publication number: 20070074145
    Abstract: To a cell library pattern which makes the basic constitution of a semiconductor circuit pattern, OPC processing is performed beforehand, and a semiconductor chip is produced using this cell library pattern. Since it is influenced by the pattern of the cell arranged to the circumference and the pattern arranged around other cells at this time, correction processing (optimization processing) is performed. The part of this correction processing is a portion in which a pattern faces between cell boundaries in the inside of the region specified from the cell boundary, and proximity effect correction is performed by making the width, the length, and the position of this portion into variables. Or proximity effect correction is performed by making a polygon into a variable. Or sizing is done and proximity effect correction is performed.
    Type: Application
    Filed: August 18, 2006
    Publication date: March 29, 2007
    Inventor: Toshihiko Tanaka
  • Publication number: 20070074146
    Abstract: A semiconductor chip is manufactured using a cell library pattern obtained by performing OPC (optical proximity correction) process at the time of a cell single arrangement to a cell library pattern which forms a basic structure of a semiconductor circuit pattern in advance. A plurality of cell libraries are arranged to design a mask pattern and a correction amount of OPC performed to the cell libraries is changed with taking into account the influence of a pattern of cell libraries arranged around a target cell. Further, a cell group with the same arrangement of surrounding cells including the target cell is extracted and is registered as a cell set, and a cell set with the same cell arrangement as that of the registered cell set is produced by copying without re-calculating OPC inside the cell set.
    Type: Application
    Filed: September 26, 2006
    Publication date: March 29, 2007
    Inventors: Toshihiko Tanaka, Osamu Suga, Tsuneo Terasawa, Tetsuya Higuchi, Hidenori Sakanashi, Hirokazu Nosato, Tetsuaki Matsunawa
  • Publication number: 20070046619
    Abstract: A liquid crystal display device 1 of the invention has a liquid crystal display panel in which a liquid crystal layer 14 is provided between a TFT substrate 2 and a CF substrate 25 that has a common electrode 26, a light sensing component LS1 with a TFT photosensor that senses external light, and an illuminating means controlled according to the output of the light sensing component. The light sensing component is deployed at the periphery of the TFT substrate's display area DA and uses a thin film transistor as photosensor. A capacitor C is connected between source and drain electrodes SL, DL for such TFT photosensor. One of the capacitor's terminals is connected to a standard voltage source VS via a switch element SW, and the other to the common electrode 26. Voltage that is always lower than the voltage applied to the common electrode by an amount corresponding to a reverse bias voltage is applied to the gate electrode GL for the TFT photosensor.
    Type: Application
    Filed: August 28, 2006
    Publication date: March 1, 2007
    Applicant: SANYO EPSON IMAGING DEVICES CORP.
    Inventors: Yutaka Sano, Takashi Kunimori, Masanori Yasumori, Toshihiko Tanaka
  • Patent number: 7171234
    Abstract: A high-frequency switch circuit is provided for switching a connection between a common transmission circuit and antenna side circuit in a plurality of transmitting and receiving systems. The high-frequency switch includes a connection between the antenna side circuit and a reception circuit in one of the plurality of transmitting and receiving systems, and a connection between the antenna side circuit and a reception circuit in the other of the plurality of transmitting and receiving systems, the high-frequency switch circuit comprising a first diode; a first distributed constant line; a second diode; a capacitor; a third diode; a second distributed constant line; and a fourth diode.
    Type: Grant
    Filed: March 28, 2005
    Date of Patent: January 30, 2007
    Assignees: Marino-Forum21, Tokyo Kyuei Co., Ltd., Hitachi Metals, Ltd.
    Inventors: Shigeru Kemmochi, Mitsuhiro Watanabe, Hiroyuki Tai, Tsuyoshi Taketa, Toshihiko Tanaka
  • Publication number: 20060273405
    Abstract: In a masking pattern (a) for patterning word and data lines, length is changed between adjacent word lines so as to be shifted from each other at their tips, and furthermore, the tip of each word line is cut obliquely. It is thus possible to prevent the resist pattern from separation and contact of adjacent patterns. Consequently, it is also possible to prevent break failures of patterned lines and short failures between those patterned lines.
    Type: Application
    Filed: August 16, 2006
    Publication date: December 7, 2006
    Inventors: Tomonori Sekiguchi, Toshihiko Tanaka, Toshiaki Yamanaka, Takeshi Sakata, Katsutaka Kimura
  • Patent number: 7146257
    Abstract: An electric power plant general control system for controlling power generating units. A generating unit (GU2) can operate part of the auxiliaries based on an automation command outputted from a unit computer (UC2) having a sequence function portion. The generating unit operates the remaining part of the auxiliaries based on an operation command outputted from an operation board (OB2) without a sequence function portion, the operation board disposed separately from the unit computer. A general automation computer (GAC) is connected with an upper system of the unit computer, and an operator command is inputted from an interactive apparatus (I/F4). The general control system is provided with a mock-up portion (Moc) equivalent to the sequence function portion disposed on the side of the auxiliaries controlled by the automation command outputted from the unit computer. The operation signal from the general automation computer is outputted to the unit computer and the operation board.
    Type: Grant
    Filed: March 28, 2003
    Date of Patent: December 5, 2006
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Toshihiko Tanaka, Hiroshi Fukuda, Jin Murata, Toshihiro Yamada
  • Publication number: 20060251348
    Abstract: A cam follower includes a shaft member which is cantilevered at one end and a slide bearing fitted onto the outer periphery of the other end of the shaft member. The slide bearing is composed of a cylindrical matrix made of an Fe-based sintered metal material having an Fe content of 90 wt % or more and a slide layer formed from the inner peripheral surface to the both end faces of the matrix. The slide layer is made of a slide material composition having a base material such as polyethylene resin blended with a lubricant such as silicone oil and a globular porous silica impregnated with this lubricant.
    Type: Application
    Filed: June 10, 2004
    Publication date: November 9, 2006
    Applicant: NTN CORPORATION
    Inventors: Masaki Egami, Seiji Shimizu, Toshihiko Tanaka
  • Patent number: 7130655
    Abstract: A high-frequency switch circuit is provided for switching a connection between a common transmission circuit and an antenna side circuit in a plurality of transmitting and receiving systems. The high-frequency switch includes a connection between the antenna side circuit and a reception circuit in one of the plurality of transmitting and receiving systems, and a connection between the antenna side circuit and a reception circuit in the other of the plurality of transmitting and receiving systems, the high-frequency switch circuit comprising a first diode, a second diode, and a distributed constant line, wherein a third diode is connected to the first and second diodes through the distributed constant line.
    Type: Grant
    Filed: March 28, 2005
    Date of Patent: October 31, 2006
    Assignees: Marino-Forum 21, Tokyo Kyuei Co., Ltd.
    Inventors: Shigeru Kemmochi, Mitsuhiro Watanabe, Hiroyuki Tai, Tsuyoshi Taketa, Toshihiko Tanaka
  • Patent number: 7125651
    Abstract: In order to suppress or prevent the occurrence of foreign matter in the manufacture of a semiconductor integrated circuit device by the use of a photo mask constituted in such a manner that a resist film is made to function as a light screening film, inspection or exposure treatment is carried out, when the photo mask 1PA1 has been mounted on a predetermined apparatus such as, e.g., an inspection equipment or aligner, in the state in which a mounting portion 2 of the predetermined apparatus is contacted with that region of a major surface of a mask substrate 1a of the photo mask 1PA1 in which a light shielding pattern 1b and a mask pattern 1mr, each formed of a resist film, on the major surface of the mask substrate 1a do not exist.
    Type: Grant
    Filed: October 1, 2003
    Date of Patent: October 24, 2006
    Assignee: Renesas Technology Corp.
    Inventors: Norio Hasegawa, Tsuneo Terasawa, Toshihiko Tanaka