Patents by Inventor Toshihiro Kobayashi

Toshihiro Kobayashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240234141
    Abstract: A semiconductor substrate includes a support substrate, a mask pattern located above the support substrate and including a mask portion, a seed portion locally located in a layer above the support substrate in a plan view, and a semiconductor part including a GaN-based semiconductor and located above the mask pattern to be in contact with the seed portion and the mask portion.
    Type: Application
    Filed: February 24, 2022
    Publication date: July 11, 2024
    Applicant: KYOCERA Corporation
    Inventors: Katsuaki MASAKI, Takeshi KAMIKAWA, Toshihiro KOBAYASHI, Yuichiro HAYASHI, Yuta AOKI
  • Patent number: 12020423
    Abstract: There is provided with an image processing apparatus. An obtaining unit obtains a first image serving as a read image of an inspection target medium having undergone printing, and a second image serving as a read image of a reference medium representing a target print result. An inspection unit inspects a defect on the inspection target medium based on the first image and the second image by performing inspection at inspection settings different between a print region and a peripheral region of the inspection target medium.
    Type: Grant
    Filed: December 6, 2022
    Date of Patent: June 25, 2024
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Toshiyuki Ishii, Toshihiro Kobayashi
  • Publication number: 20240203732
    Abstract: A main substrate, a seed portion (SD) located higher than the main substrate, and first and second semiconductor parts (8F and 8S) arranged side by side in a first direction (9Y direction) are provided. The first and second semiconductor parts are in contact with the seed portion, a longitudinal direction of the seed portion (SD) is the first direction (Y direction), and a hollow portion (VD) is located between the main substrate (1) and each of the first semiconductor part and the second semiconductor part.
    Type: Application
    Filed: April 14, 2022
    Publication date: June 20, 2024
    Applicant: KYOCERA Corporation
    Inventors: Katsuaki MASAKI, Takeshi KAMIKAWA, Toshihiro KOBAYASHI, Yuichiro HAYASHI, Yuki TANIGUCHI, Yuta AOKI
  • Publication number: 20240191391
    Abstract: A semiconductor substrate includes a main substrate, a mask pattern located above the main substrate and including a mask portion, and a first semiconductor part and a second semiconductor part located above the mask pattern and adjacent to each other, in which the first semiconductor part includes a first lower edge located on the mask portion and a first protruding portion protruding toward the second semiconductor part side farther than the first lower edge.
    Type: Application
    Filed: March 30, 2022
    Publication date: June 13, 2024
    Applicant: KYOCERA Corporation
    Inventors: Toshihiro KOBAYASHI, Takeshi KAMIKAWA, Yuta AOKI, Yuichiro HAYASHI
  • Publication number: 20240193908
    Abstract: Information processing that suppresses increased power consumption is disclosed. In one example, an information processing apparatus includes a hybrid sensor with photoelectric conversion units (PDs) that convert incident light, and a processor that acquires, based on outputs of the PDs, a luminance signal or an event signal based on a luminance change. The processor performs predetermined processing based on the luminance signal or the event signal. A request to read the luminance signal is made when the predetermined processing based on the event signal fails, and the predetermined processing based on the luminance signal following the request is then performed.
    Type: Application
    Filed: February 21, 2022
    Publication date: June 13, 2024
    Inventors: Toshihiro Kobayashi, Tsutomu Shimosato
  • Publication number: 20240136181
    Abstract: A semiconductor substrate includes a support substrate, a mask pattern located above the support substrate and including a mask portion, a seed portion locally located in a layer above the support substrate in a plan view, and a semiconductor part including a GaN-based semiconductor and located above the mask pattern to be in contact with the seed portion and the mask portion.
    Type: Application
    Filed: February 24, 2022
    Publication date: April 25, 2024
    Applicant: KYOCERA Corporation
    Inventors: Katsuaki MASAKI, Takeshi KAMIKAWA, Toshihiro KOBAYASHI, Yuichiro HAYASHI, Yuta AOKI
  • Publication number: 20240072198
    Abstract: A semiconductor substrate includes a heterogeneous substrate, a mask layer having an opening portion and a mask portion, a seed portion overlapping the opening portion, and a semiconductor layer including a GaN-based semiconductor and disposed on the seed portion and the mask portion. An upper surface of an effective portion of the semiconductor layer includes at least one low-level defective region with a size of 10 ?m in a first direction along a width direction of the opening portion and 10 ?m in a second direction orthogonal to the first direction, and a line defect is not measured by a CL method in the low-level defective region.
    Type: Application
    Filed: December 28, 2021
    Publication date: February 29, 2024
    Applicant: KYOCERA Corporation
    Inventors: Takeshi KAMIKAWA, Katsuaki MASAKI, Toshihiro KOBAYASHI, Yuichiro HAYASHI
  • Patent number: 11907710
    Abstract: A time period required for analyzing a source code is reduced without reducing analysis accuracy in a source code analysis apparatus that analyzes a source code with a dynamic analysis method. An analysis processing unit extracts, from a post-change source code, an influence function to which an input is given by a change function. An analysis necessity determination processing unit determines whether or not the function is the analysis target function, based on a range of an input value input to the change function and a function included in the influence function. The analysis processing unit performs an analysis of the analysis target function, which is included in the change function and the influence function. An analysis result processing unit outputs an analysis result of the post-change source code, which includes an analysis result of the analysis target function.
    Type: Grant
    Filed: November 1, 2019
    Date of Patent: February 20, 2024
    Assignee: MITSUBISHI ELECTRIC CORPORATION
    Inventors: Masaki Fujita, Toshihiro Kobayashi
  • Patent number: 11755318
    Abstract: Even when one refactoring operation cannot establish a target software structure, an appropriate refactoring operation establishes the target software structure. An improvement proposing device includes: a structure comparator to output, as an improvement object, a difference between a first software structure and a second software structure different in software structure from the first software structure; and an improvement plan examining unit to examine an improvement plan for each improvement portion in the improvement object, the improvement plan being a method for bringing the first software structure closer to the second software structure.
    Type: Grant
    Filed: July 2, 2020
    Date of Patent: September 12, 2023
    Assignee: MITSUBISHI ELECTRIC CORPORATION
    Inventors: Daiki Shima, Toshiki Kitajima, Toshihiro Kobayashi, Yuki Hikawa, Taishi Azuma
  • Patent number: 11630662
    Abstract: A software analysis device being capable of analyzing dependency between software components more comprehensively and with higher accuracy than a conventional technology is provided. The software analysis device comprising: a first analyzing unit that statically analyzes a structure of a source code of software and analyzes dependency between objects of the software; and a second analyzing unit that executes a program indicated by the source code to acquire first information regarding an operation of the objects and analyzes dependency between the objects based on the first information. The software analysis device analyzes dependency between the objects based on an analysis result of the first analyzing unit and an analysis result of the second analyzing unit.
    Type: Grant
    Filed: October 3, 2018
    Date of Patent: April 18, 2023
    Assignee: MITSUBISHI ELECTRIC CORPORATION
    Inventors: Taishi Azuma, Toshihiro Kobayashi, Yuki Hikawa
  • Publication number: 20230102455
    Abstract: There is provided with an image processing apparatus. An obtaining unit obtains a first image serving as a read image of an inspection target medium having undergone printing, and a second image serving as a read image of a reference medium representing a target print result. An inspection unit inspects a defect on the inspection target medium based on the first image and the second image by performing inspection at inspection settings different between a print region and a peripheral region of the inspection target medium.
    Type: Application
    Filed: December 6, 2022
    Publication date: March 30, 2023
    Inventors: Toshiyuki Ishii, Toshihiro Kobayashi
  • Patent number: 11588160
    Abstract: A gas and liquid separator includes a first separating portion configured to separate a liquid droplet from a first exhaust gas discharged from a negative electrode of a fuel cell, a first container accommodating the first separating portion, a first storage reservoir storing water flowing down from the first separating portion, a second container provided at a lower side of the first storage reservoir, a second storage reservoir provided at a lower portion of the second container, and a valve apparatus including a valve discharging water stored in the first storage reservoir, wherein a second exhaust gas discharged from a positive electrode flows in the second container, and water discharged from the first storage reservoir is stored in the second storage reservoir.
    Type: Grant
    Filed: May 26, 2020
    Date of Patent: February 21, 2023
    Assignee: AISIN CORPORATION
    Inventors: Katsuhiro Kajio, Toshihiro Kobayashi
  • Publication number: 20230034573
    Abstract: An eyeglasses lens measurement device measures an eyeglasses lens of eyeglasses. The eyeglasses lens measurement device includes a light source that emits a measurement light flux toward the eyeglasses lens, a transmissive display that transmits the measurement light flux from the light source and displays an index pattern formed by arranging a plurality of indexes, a detector that detects the measurement light flux passing through the eyeglasses lens and the transmissive display, and a controller. The controller is configured to control a display of the index pattern, acquire an optical characteristic of the eyeglasses lens, based on a detection result of the detector, and acquire lens information different from the optical characteristic of the eyeglasses lens, based on a detection result of the detector.
    Type: Application
    Filed: December 18, 2020
    Publication date: February 2, 2023
    Applicant: NIDEK CO., LTD.
    Inventors: Katsuyasu MIZUNO, Toshihiro KOBAYASHI, Yujiro TOCHIKUBO, Yuichi MATSUBARA
  • Patent number: 11551350
    Abstract: There is provided with an image processing apparatus. An obtaining unit obtains a first image serving as a read image of an inspection target medium having undergone printing, and a second image serving as a read image of a reference medium representing a target print result. An inspection unit inspects a defect on the inspection target medium based on the first image and the second image by performing inspection at inspection settings different between a print region and a peripheral region of the inspection target medium.
    Type: Grant
    Filed: February 11, 2021
    Date of Patent: January 10, 2023
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Toshiyuki Ishii, Toshihiro Kobayashi
  • Publication number: 20220376132
    Abstract: A method for manufacturing a semiconductor element of the present disclosure includes: a step of preparing a substrate; a first element forming step of forming a first semiconductor layer in a first region on a surface of the substrate; a first element separating step of separating the first semiconductor layer from the substrate; and a second element forming step of forming a second semiconductor layer in a second region on the surface of the substrate from which the first semiconductor layer is separated. Additionally, in the method for manufacturing a semiconductor element of the present disclosure, at least a portion of the second region overlaps the first region.
    Type: Application
    Filed: September 30, 2020
    Publication date: November 24, 2022
    Applicant: KYOCERA CORPORATION
    Inventors: Takehiro NISHIMURA, Yutaka KUBA, Katsuaki MASAKI, Kentaro MURAKAWA, Toshihiro KOBAYASHI
  • Publication number: 20220338452
    Abstract: An object of the present invention is to produce a mammalian organ having a complicated cellular composition composed of multiple kinds of cells, such as kidney, pancreas, thymus and hair, in the living body of a non-human animal. The inventors of the present invention applied the chimeric animal assay described above, to a novel solid organ production method. More specifically, the inventors has shown that a model mouse which is deficient of kidney, pancreas, thymus or hair due to the dysfunction of the metanephric mesenchyme that is differentiated into most of an adult kidney, is rescued by blastocyst complementation by the chimeric animal assay, and whereby a kidney, a pancreas, thymus or hair can be newly produced.
    Type: Application
    Filed: October 8, 2021
    Publication date: October 27, 2022
    Inventors: Hiromitsu NAKAUCHI, Toshihiro KOBAYASHI, Younsu LEE, Joichi USUI, Tomoyuki YAMAGUCHI, Sanae HAMANAKA
  • Publication number: 20220342664
    Abstract: A time period required for analyzing a source code is reduced without reducing analysis accuracy in a source code analysis apparatus that analyzes a source code with a dynamic analysis method. An analysis processing unit extracts, from a post-change source code, an influence function to which an input is given by a change function. An analysis necessity determination processing unit determines whether or not the function is the analysis target function, based on a range of an input value input to the change function and a function included in the influence function. The analysis processing unit performs an analysis of the analysis target function, which is included in the change function and the influence function. An analysis result processing unit outputs an analysis result of the post-change source code, which includes an analysis result of the analysis target function.
    Type: Application
    Filed: November 1, 2019
    Publication date: October 27, 2022
    Applicant: Mitsubishi Electric Corporation
    Inventors: Masaki FUJITA, Toshihiro KOBAYASHI
  • Patent number: 11471043
    Abstract: A subjective optometry apparatus has a projection optical system including a visual target presenting portion and an optical member to project a target light flux toward a subject eye, and causing the target light flux to be incident on the optical member with a deviation of the incident target light flux from an optical axis of the optical member, a housing accommodating the projection optical system, a presentation window for emitting the target light flux from the inside of the housing to the outside thereof, an eye refractive power measurement unit provided outside the housing, and holding means integrally connecting the housing to the eye refractive power measurement unit to hold the eye refractive power measuring unit. When using the eye refractive power measuring unit, a distance from the presentation window to the eye refractive power measurement unit in an optical path is equal to or less than 180 mm.
    Type: Grant
    Filed: June 6, 2018
    Date of Patent: October 18, 2022
    Assignee: NIDEK CO., LTD.
    Inventors: Toshihiro Kobayashi, Yukito Hirayama, Ryoji Suzuki, Kazunori Shibata, Daisuke Baba
  • Publication number: 20220269502
    Abstract: Even when one refactoring operation cannot establish a target software structure, an appropriate refactoring operation establishes the target software structure. An improvement proposing device includes: a structure comparator to output, as an improvement object, a difference between a first software structure and a second software structure different in software structure from the first software structure; and an improvement plan examining unit to examine an improvement plan for each improvement portion in the improvement object, the improvement plan being a method for bringing the first software structure closer to the second software structure.
    Type: Application
    Filed: July 2, 2020
    Publication date: August 25, 2022
    Applicant: Mitsubishi Electric Corporation
    Inventors: Daiki SHIMA, Toshiki KITAJIMA, Toshihiro KOBAYASHI, Yuki HIKAWA, Taishi AZUMA
  • Patent number: 11379224
    Abstract: A source code analysis unit identifies dependency strengths of one or more functions included in a source code. An influence analysis unit identifies one or more transfer functions that will each move to a different subsystem due to refactoring and identifies a dependency strength to be influenced by the refactoring, based on the dependency strengths that have been identified by the source code analysis unit with respect to the one or more transfer functions. A scale calculation unit calculates the scale of the refactoring, based on the dependency strength to be influenced, which has been identified by the influence analysis unit.
    Type: Grant
    Filed: February 16, 2017
    Date of Patent: July 5, 2022
    Assignee: MITSUBISHI ELECTRIC CORPORATION
    Inventors: Natsuko Fujii, Toshihiro Kobayashi, Yuki Hikawa, Takahiro Akimoto, Satoshi Maekawa, Toshiki Kitajima