Abstract: The purpose of the present invention is to provide a recipe creation device, with the goal of using past recipe data in order to highly efficiently create recipes. As an embodiment with which to achieve this goal, there is provided a recipe creation device comprising an arithmetic processing device that, on the basis of design data for a semiconductor element, establishes measurement conditions or inspection conditions by a semiconductor measurement device or a semiconductor inspection device, wherein the arithmetic processing device is configured to be able to access a database in which the measurement conditions or inspection conditions, and the pattern information of the semiconductor element, are stored in associated form, and the measurement conditions or inspection conditions are selected through a search using pattern information of the semiconductor element.

Abstract: The purpose of the present invention is to provide a recipe creation device, with the goal of using past recipe data in order to highly efficiently create recipes. As an embodiment with which to achieve this goal, there is provided a recipe creation device comprising an arithmetic processing device that, on the basis of design data for a semiconductor element, establishes measurement conditions or inspection conditions by a semiconductor measurement device or a semiconductor inspection device, wherein the arithmetic processing device is configured to be able to access a database in which the measurement conditions or inspection conditions, and the pattern information of the semiconductor element, are stored in associated form, and the measurement conditions or inspection conditions are selected through a search using pattern information of the semiconductor element.

Abstract: A template creation device for a sample observation device for creating a template for image processing using design data includes a storage unit for storing process information in which information concerning a plurality of process processings is defined, and a template creation unit for processing the design data using the process information and creating the template for the image processing.

Abstract: An object of the present invention is to improve the capability of lifting a substrate with the polishing performance of the substrate maintained. A polishing apparatus 100 includes a polishing table 110 to which a polishing pad 108 for polishing a substrate 102 is attached, a liquid feeding section configured to feed a liquid 109 to a polishing surface of the polishing pad 108, a top ring 116 configured to suck and convey the substrate 102 from the polishing surface, the substrate 102 being disposed on the polishing surface via the liquid 109 fed by the liquid feeding section, and a control section configured to inject a fluid (N2) into an internal area 109a of the liquid 109 interposed between the substrate 102 and the polishing pad 108.

Abstract: In order to provide a technique for performing global alignment (detecting position shift and rotation of a wafer) stably and automatically using an optical microscope, as a pattern for global alignment, multiple alignment pattern candidates are calculated (107), multiple data for matching are created for each alignment pattern (108), matching is performed with respect to the data for matching for each alignment pattern in descending order of appropriateness as an alignment pattern with an image (113) based on an image signal from the optical microscope (114), and the amount of position shift and the amount of rotation of the wafer are calculated (116) on the basis of the results of matching (115).

Abstract: The present invention relates to a setting method for an image capture area on the occasion of evaluation of a circuit pattern using a scanning charged particle microscope. A circuit pattern that is to be evaluated using an actual image or design data is determined, a plurality of image capture areas are set such that the circuit pattern to be evaluated is included in a section of the field of vision, and images are captured of the plurality of image capture areas. When setting the image capture areas, a permissible value for the distance between adjacent first and second images is set, and the positions of the image capture areas are optimized so as to correspond as closely as possible with the permissible value for distance. As a result, it is possible to improve the throughput of image capture of wide inspection areas that do not fit in the field of vision of the scanning charge particle microscope, and to efficiently carry out determination of an inspection area that may cause electrical failure.

Abstract: An object of the present invention is to improve the capability of lifting a substrate with the polishing performance of the substrate maintained. A polishing apparatus 100 includes a polishing table 110 to which a polishing pad 108 for polishing a substrate 102 is attached, a liquid feeding section configured to feed a liquid 109 to a polishing surface of the polishing pad 108, a top ring 116 configured to suck and convey the substrate 102 from the polishing surface, the substrate 102 being disposed on the polishing surface via the liquid 109 fed by the liquid feeding section, and a control section configured to inject a fluid (N2) into an internal area 109a of the liquid 109 interposed between the substrate 102 and the polishing pad 108.

Abstract: In order to provide a technique for performing global alignment (detecting position shift and rotation of a wafer) stably and automatically using an optical microscope, as a pattern for global alignment, multiple alignment pattern candidates are calculated (107), multiple data for matching are created for each alignment pattern (108), matching is performed with respect to the data for matching for each alignment pattern in descending order of appropriateness as an alignment pattern with an image (113) based on an image signal from the optical microscope (114), and the amount of position shift and the amount of rotation of the wafer are calculated (116) on the basis of the results of matching (115).

Abstract: There is provided a recipe generation apparatus and method for reducing the time required to reflect an optimal value and changed value in an input file by automatically reflecting a value obtained by optimizing an input file for recipe generation in the input file for recipe generation. This invention eliminates the inconvenience of manually reflecting changes in an input file for recipe generation by automatically reflecting changed values in the input file for recipe generation after editing a provisionally generated off-line recipe and achieves a reduction in processing time. This invention also provides a method for automatically generating an off-line recipe and a file for recipe generation from a recipe of a scanning electron microscope (see FIG. 3).

Abstract: There is provided a recipe generation apparatus and method for reducing the time required to reflect an optimal value and changed value in an input file by automatically reflecting a value obtained by optimizing an input file for recipe generation in the input file for recipe generation. This invention eliminates the inconvenience of manually reflecting changes in an input file for recipe generation by automatically reflecting changed values in the input file for recipe generation after editing a provisionally generated off-line recipe and achieves a reduction in processing time. This invention also provides a method for automatically generating an off-line recipe and a file for recipe generation from a recipe of a scanning electron microscope (see FIG. 3).