Abstract: A resist composition which is stable relative to solvents used in immersion lithography processes and displays excellent sensitivity and resist pattern profile, and a method of forming a resist pattern that uses such a resist composition are provided. The resist composition is in accordance with predetermined parameters, or is a positive resist composition comprising a resin component (A) which contains an acid dissociable, dissolution inhibiting group and displays increased alkali solubility under the action of acid, an acid generator component (B), and an organic solvent (C), wherein the component (A) contains a structural unit (a1) derived from a (meth)acrylate ester containing an acid dissociable, dissolution inhibiting group, but contains no structural units (a0), including structural units (a0-1) containing an anhydride of a dicarboxylic acid and structural units (a0-2) containing a phenolic hydroxyl group.

Abstract: A composition for formation of an antireflection film having an excellent etching resistant characteristic and ability to prevent reflection of short-wavelength light (absorption ability of short-wavelength light) as well as excellent time dependent stability, and an antireflection film in which the same is used, are provided. A composition for formation of an antireflection film including a siloxane compound having a light-absorbing group and a crosslinking group, the siloxane compound being blocked with a capping group, is provided. By thus blocking the siloxane compound with a capping group, time dependent stability can be improved without deteriorating etching resistance, and ability to prevent reflection.

Abstract: A resist composition which is stable relative to solvents used in immersion lithography processes and displays excellent sensitivity and resist pattern profile, and a method of forming a resist pattern that uses such a resist composition are provided. The resist composition is in accordance with predetermined parameters, or is a positive resist composition comprising a resin component (A) which contains an acid dissociable, dissolution inhibiting group and displays increased alkali solubility under the action of acid, an acid generator component (B), and an organic solvent (C), wherein the component (A) contains a structural unit (a1) derived from a (meth)acrylate ester containing an acid dissociable, dissolution inhibiting group, but contains no structural units (a0), including structural units (a0-1) containing an anhydride of a dicarboxylic acid and structural units (a0-2) containing a phenolic hydroxyl group.

Abstract: The invention discloses a chemical-amplification positive-working photoresist composition of the crosslinked type used for photolithographic patterning works in the manufacture of electronic devices. While the composition comprises a film-forming resinous ingredient capable of being imparted with increased alkali-solubility in the presence of an acid and a radiation-sensitive acid-generating compound, optionally, with further admixture of an aliphatic amine compound and an acid compound, the inventive photoresist composition is characterized by the unique resinous ingredient which consists of four types of monomeric units including hydroxystyrene units, styrene units, monomeric units having acid-dissociable solubility-reducing groups and crosslinking units. The acid-dissociable solubility-reducing group is not conventional tert-butoxycarbonyloxy group but characteristically a 1-alkylcyclohexyl group or a polycyclic saturated aliphatic hydrocarbon group.

Abstract: The invention discloses a chemical-amplification positive-working photoresist composition of the crosslinked type used for photolithographic patterning works in the manufacture of electronic devices. While the composition comprises a film-forming resinous ingredient capable of being imparted with increased alkali-solubility in the presence of an acid and a radiation-sensitive acid-generating compound, optionally, with further admixture of an aliphatic amine compound and an acid compound, the inventive photoresist composition is characterized by the unique resinous ingredient which consists of four types of monomeric units including hydroxystyrene units, styrene units, monomeric units having acid-dissociable solubility-reducing groups and crosslinking units. The acid-dissociable solubility-reducing group is not conventional tert-butoxycarbonyloxy group but characteristically a 1-alkylcyclohexyl group or a polycyclic saturated aliphatic hydrocarbon group.

Abstract: An imaging apparatus for endoscopes includes an endoscope; a TV camera head incorporating, at least, a solid-state image sensor; and a TV photographic adapter incorporating at least one part of an optical system for forming an image obtained by the endoscope on the solid-state image sensor. At least one of the TV camera head and the TV photographic adapter is hermetically sealed by dampproof members so that autoclaving treatment can be received.

Abstract: An optical system for endoscopes which comprises a stop having a variable aperture and is configured so as to produce spherical aberration for preventing an image surface thereof from being shifted in a direction opposite to the object side by narrowing the aperture of the stop, whereby the optical system is free from insufficiency in brightness and degradation in resolution thereof on a side farther from the optical system within a depth of field thereof, and has another side of the depth of field brought close to the optical system.

Abstract: The measuring endoscope includes a device for producing interference fringes, a device for projecting the interference fringes onto a surface of an object to be measured, a device for scanning the interference fringes, an imaging device for reading vibrations of brightness on the surface of the object to be measured which are caused by the scanning of the interference fringes and a processing device capable of determining depths of concavities and heights of convexities on the surface the measured object by calculating data output from the imaging device. This measuring endoscope makes it possible to determine accurately the location of internal diseases within organs of human bodies, defects in gas pipes and so on.

Abstract: An objective optical system for endoscopes comprising, in the order from the object side, a front negative lens unit, an aperture stop, a positive lens unit comprising at least one positive lens component, and an infrared cut filter arranged immediately before said aperture stop, said objective optical system being adapted so as to allow rays to be incident on said filter at heights lower than the outside circumference of said filter.