Abstract: A three dimensional manufactured product is manufactured A speed of filing an uncured light curing resin in a space for a next layer is enhanced, to improve a manufacturing speed. One surface of a container housing a light curing resin is configured by a gas-permeable sheet that faces the light curing resin, and transmits irradiation light of a light irradiating apparatus, and a light transmitting plate disposed at an outer side of the container from the gas permeable member. A pressurizing chamber controllable in pressure by a pressure controlling apparatus is defined between the gas-permeable sheet and the light transmitting plate. At moving a manufacturing stage, an inside of the pressurizing chamber is de-pressurized to cause the gas-permeable sheet to perform concave surface deformation, and at a time of performing light irradiation, gas in the pressurizing chamber is caused to permeate into the light curing resin by pressurizing.

Abstract: There is provided that a curable composition containing a polymerizable compound, a photopolymerization initiator, and solvent, wherein the polymerizable compound contains at least a compound having one of an aromatic structure, an aromatic heterocyclic structure, and an alicyclic structure, the curable composition has viscosity of not less than 2 mPa·s and not more than 60 mPa·s at 23° C., in a state in which the solvent is removed, the curable composition has a viscosity of not less than 30 mPa·s and not more than 10,000 mPa·s at 23° C., and a content of the solvent with respect to the whole curable composition is not less than 70 vol % and not more than 95 vol %.

Abstract: A management system includes a plurality of resources configured to be electrically connected to an external power supply, and a management device configured to manage the resources. The management device includes a planning unit and a management unit. The planning unit is configured to determine a power balancing plan of each of the resources by using first information on a use schedule of each of the resources and second information indicating a magnitude of an environmental load in a process of generating electric power to be supplied by the external power supply. The management unit is configured to manage the resources to cause each of the resources to operate according to the power balancing plan or a modified power balancing plan in power balancing of the external power supply.

Abstract: An object is to provide a photo-curable composition having high dry etching resistance and high thermal stability. A photo-curable composition includes at least a polymerizable compound and a photopolymerization initiator, and further includes at least one of a flame retarder and a flame-retardant polymerizable compound.

Abstract: An object is to provide a photo-curable composition having high dry etching resistance and high thermal stability. A photo-curable composition includes at least a polymerizable compound (A) and a photopolymerization initiator (B), and further includes at least one of a flame retarder (E) and a flame-retardant polymerizable compound (F).

Abstract: A film forming method of forming a film made of a curable composition, includes an arranging step of arranging the curable composition on an underlayer of a substrate including a base member and the underlayer arranged on the base member, a contact step of bringing the curable composition and a mold into contact with each other after the arranging step, a curing step of curing the curable composition after the contact step, and a separation step of separating the curable composition and the mold after the curing step, wherein a gas filling a space between the underlayer and the mold exists in the contact step, and a solubility coefficient of the gas with respect to the underlayer is 0.5 kg/m3·atm or more and 10 kg/m3·atm or less.

Abstract: A substrate surface planarization method includes an arranging step of arranging a liquid curable composition onto a substrate surface having unevenness, a waiting step of waiting until the surface of the layer of the liquid curable composition becomes smooth, and a light exposure step of applying light to cure the layer of the liquid curable composition in this order. The arranging step includes a first arranging step of arranging a layer made of a first liquid curable composition (A1) containing at least a polymerizable compound (a1), and a second arranging step of arranging droplets of a second liquid curable composition (A2) containing at least a polymerizable compound (a2) onto the layer made of the first liquid curable composition (A1) by dropping the droplets discretely.

Abstract: A substrate surface planarization method includes an arranging step of arranging a liquid curable composition onto a substrate surface having unevenness, a waiting step of waiting until the surface of the layer of the liquid curable composition becomes smooth, and a light exposure step of applying light to cure the layer of the liquid curable composition in this order. The arranging step includes a first arranging step of arranging a layer made of a first liquid curable composition (A1) containing at least a polymerizable compound (a1), and a second arranging step of arranging droplets of a second liquid curable composition (A2) containing at least a polymerizable compound (a2) onto the layer made of the first liquid curable composition (A1) by dropping the droplets discretely.

Abstract: A method for manufacturing a cured product pattern of a curable composition includes the steps of, in sequence, depositing a droplet of the curable composition onto a substrate; bringing a mold having an uneven pattern formed in a surface thereof into contact with the curable composition; curing the curable composition; and releasing a cured product of the curable composition from the mold. The mold has a recess having a bottom surface and a stair structure arranged to form an opening surface that becomes wider from the bottom surface toward the surface of the mold. In the contact step, the curable composition comes into contact with the stair portion after a top of the droplet comes into contact with the bottom surface.

Abstract: Provided is a method of producing a cured product pattern, including: a first step (arranging step) of arranging a layer formed of a curable composition (?1?) that is the components of the curable composition (?1) except the component (D) serving as a solvent on a substrate; and a second step (applying step) of applying droplets of a curable composition (?2) discretely onto the layer formed of the curable composition (?1), the curable composition (?1) having a number concentration of particles each having a particle diameter of 0.07 ?m or more of less than 2,021 particles/mL, and the curable composition (?1?) having a surface tension larger than that of the curable composition (?2).

Abstract: A pattern forming method comprises dispensing a curable composition onto an underlayer of a substrate; bringing the curable composition into contact with a mold; irradiating the curable composition with light to form a cured film; and separating the cured film from the mold. The proportion of the number of carbon atoms relative to the total number of atoms in the underlayer is 80% or more. The dispensing step comprises a first dispensing step of dispensing a curable composition (A1) substantially free of a fluorosurfactant onto the underlayer, and a second dispensing step of dripping a droplet of a curable composition (A2) having a fluorosurfactant concentration in components excluding a solvent of 1.1% by mass or less onto the curable composition (A1) discretely.

Abstract: A film formation device for forming a film of a composition on the substrate by irradiating the composition on the substrate with light, includes an optical modulation unit for forming a distribution of an integrated light amount of the light on the substrate, and a control unit for controlling the optical modulation unit, in which the control unit controls the distribution of the integrated light amount of the optical modulation unit on the basis of residual film ratio characteristics of the composition and at least one of a curved shape of an imaging plane of an original template used in a subsequent process and a surface shape of a base film formed on the substrate.

Abstract: A robot system includes: a conveying device configured to convey a workpiece; a robot configured to execute an operation on the workpiece; and circuitry configured to: identify a current position of the workpiece and an object area occupied by an object; identify an interlock area that moves with the current position of the workpiece being conveyed by the conveying device; check an overlap between the interlock area and the object area; and control the robot to execute the operation based on the current position of the workpiece in response to determining that the interlock area does not overlap the object area.

Abstract: A molding apparatus includes a mechanism configured to apply a curable composition onto a substrate with irregularities, a pressing and releasing mechanism that presses or releases a mold (super straight) having a flat surface against the curable composition on the substrate, and a curing mechanism configured to cure the curable composition by light radiation, a first supply unit configured to supply a first gas to the curable-composition application mechanism, and a second supply unit configured to supply a second gas different from the first gas to the pressing and releasing mechanism.

Abstract: An imprint mold having an imprint surface that comes into contact with a curable composition on a substrate, the imprint mold includes a concavo-convex pattern formed on the imprint surface of the imprint mold, and a first step portion that has a first surface having a depth of 0.5 times or more and 2 times or less a depth of the concavo-convex pattern in an outer peripheral portion of an area where the concavo-convex pattern is formed.

Abstract: Pattern forming method includes, for each shot area group (SAG) in the following order: discretely dropping curable composition droplets to layer the droplets on a plurality of shot areas included in a certain SAG on substrate; waiting for a time of (mmax?m)×Td, where Td is a time for the dropping on one shot area, m is the number of shot areas included in the certain SAG, and mmax is the maximum value of m; and imprinting in order that the dropping is performed on the plurality of shot areas. The time Td and a time Ti for the imprinting on one shot area are equal to each other. The number of shot areas included in at least one SAG is different from the number of shot areas included in another at least one SAG. In the waiting, the dropping and the imprinting are not performed.

Abstract: An imprint mold includes a mesa portion projecting from a base material. The mesa portion includes a contact surface configured for contact with a curable composition made of an organic material, and a surface of a side wall at which the contact surface projects from the base material. A liquid repellent surface is formed on at least the surface of the side wall, the liquid repellent surface having a contact angle with respect to the curable composition being higher than a contact angle of the contact surface. The liquid repellent surface includes at least one type of compound selected from the group consisting of an oxide of an inorganic element, a fluoride of an inorganic element, and a nitride of an inorganic element.

Abstract: The present invention provides a photo-curable composition, and UV imprint method, that requires a small demolding force, wherein the photo-curable composition contains a polymerizable monomer (A), a polymerization initiator (B), and a fluorine-containing surfactant (C), and the photo-cured product of the photo-curable composition has a water contact angle of 74 degrees or less.

Abstract: A pattern forming method using a photo-nanoimprint process on each of a plurality of shot areas: a step (1) of laying a layer of a curable composition (A1); a step (2) of dispensing liquid droplets of a curable composition (A2) dropwise discretely onto the layer of (A1); a step (3) of sandwiching a layer obtained by partially mixing (A1) and (A2), between a mold and the substrate; a step (4) of irradiating the layer with light to cure the layer; and a step (5) of releasing the mold from the layer of (A1) and (A2), in which when steps from the step (3) to the step (5) are collectively called an imprinting step [Im], in a time period from an end of the step (2) to a beginning of the step [Im] in one shot, the step (2) or the step [Im] is performed on another shot area.

Abstract: A method for forming a pattern by using a photo-nanoimprint process includes performing, on each of a plurality of shot areas on a surface of a substrate: a step (1) of dispensing liquid droplets of a curable composition (A) dropwise discretely; a step (2) of bringing the curable composition (A) and a mold into contact with each other; a step (3) of irradiating the curable composition (A) with light; and a step (4) of releasing the mold from a cured product of the curable composition (A), in which when steps from the step (2) to the step (4) are collectively called an imprinting step (Im), before the imprinting step (Im) is performed on one shot area on which the step (1) has already been performed out of the plurality of shot areas, the step (1) is performed on another shot area selected from the plurality of shot areas.