Patents by Inventor Toshio Matsuura

Toshio Matsuura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9079808
    Abstract: A gas generator includes a holder made of metal having assembled thereto a cup filled with a gas generating agent and an igniter for burning the gas generating agent. The holder includes a body part, and an igniter fixing engagement part and a cup fixing engagement part projecting from the body part. These engagement parts are bent, so that the igniter and the cup are fixed by crimping to the holder. The engagement parts are both finish shaped by forging processing. A metal flow appearing in superficial layers of the engagement parts extends continuously from the body part through the engagement parts to return to the body part, without being divided in surfaces of the engagement parts.
    Type: Grant
    Filed: October 3, 2011
    Date of Patent: July 14, 2015
    Assignee: NIPPON KAYAKU KABUSHIKI KAISHA
    Inventors: Toshio Matsuura, Shigeru Maeda, Eiji Komatsu, Masahiro Kato, Kenichirou Yamashita
  • Publication number: 20130199400
    Abstract: A gas generator includes a holder made of metal having assembled thereto a cup filled with a gas generating agent and an igniter for burning the gas generating agent. The holder includes a body part, and an igniter fixing engagement part and a cup fixing engagement part projecting from the body part. These engagement parts are bent, so that the igniter and the cup are fixed by crimping to the holder. The engagement parts are both finish shaped by forging processing. A metal flow appearing in superficial layers of the engagement parts extends continuously from the body part through the engagement parts to return to the body part, without being divided in surfaces of the engagement parts.
    Type: Application
    Filed: October 3, 2011
    Publication date: August 8, 2013
    Applicant: NIPPON KAYAKU KABUSHIKI KAISHA
    Inventors: Toshio Matsuura, Shigeru Maeda, Eiji Komatsu, Masahiro Kato, Kenichirou Yamashita
  • Patent number: 7876118
    Abstract: Provided is a test apparatus that tests a device under test, comprising a pattern generating section that generates a test pattern for testing the device under test; a signal supplying section that supplies the device under test with a test signal corresponding to the test pattern; a trigger generating section that supplies a trigger signal to an external instrument connected to the device under test; and a synchronization control section that outputs, to the trigger generating section, a synchronization signal instructing generation of the trigger signal, based on at least a portion of the test pattern generated by the pattern generating section.
    Type: Grant
    Filed: February 5, 2009
    Date of Patent: January 25, 2011
    Assignee: Advantest Corporation
    Inventors: Satoshi Iwamoto, Shigeki Takizawa, Koichi Yatsuka, Toshio Matsuura
  • Publication number: 20100194421
    Abstract: Provided is a test apparatus that tests a device under test, comprising a pattern generating section that generates a test pattern for testing the device under test; a signal supplying section that supplies the device under test with a test signal corresponding to the test pattern; a trigger generating section that supplies a trigger signal to an external instrument connected to the device under test; and a synchronization control section that outputs, to the trigger generating section, a synchronization signal instructing generation of the trigger signal, based on at least a portion of the test pattern generated by the pattern generating section.
    Type: Application
    Filed: February 5, 2009
    Publication date: August 5, 2010
    Applicant: ADVANTEST CORPORATION
    Inventors: SATOSHI IWAMOTO, SHIGEKI TAKIZAWA, KOICHI YATSUKA, TOSHIO MATSUURA
  • Patent number: 6366341
    Abstract: At the time of transferring the pattern image of a mask onto a substrate, an exposure apparatus overlays peripheral portions of exposure areas with respect to a pattern image, which has previously been transferred onto the substrate, with each other, and transfers a predetermined pattern onto the substrate. This exposure apparatus comprises a dose adjusting device capable of adjusting the dose of exposure light at the overlying portion, a shape measuring unit for measuring the shape of the pattern image of the overlying portion formed on the substrate, and a control section for controlling the dose adjusting device based on the result of measurement by the shape measuring unit in such a way that the shape of the pattern image of the overlying portion formed on the substrate becomes an intended shape.
    Type: Grant
    Filed: August 10, 2000
    Date of Patent: April 2, 2002
    Assignee: Nikon Corporation
    Inventors: Akinori Shirato, Kazuhiko Hori, Toshio Matsuura
  • Patent number: 5995199
    Abstract: Positions of a plurality of marks formed in a correction mask are measured as first positions. A plurality of marks in the correction mask are transferred onto a photosensitive substrate, and transferred positions of the plurality of marks are determined as second positions. Subsequently, amounts of deviation of the first positions from the second positions are determined as correction data. After that, positions of a plurality of marks formed in an exposure mask are measured as third positions by a method similar to that used for measurement of the first positions, and the third positions are corrected on the basis of the correction data.
    Type: Grant
    Filed: June 18, 1997
    Date of Patent: November 30, 1999
    Assignee: Nikon Corporation
    Inventors: Tadaaki Shinozaki, Nobutaka Fujimori, Toshio Matsuura, Toshinobu Morioka
  • Patent number: 5985496
    Abstract: An exposure apparatus for exposing a photomask pattern onto a photosensitive substrate via a plurality of optical systems includes a source of illumination for irradiating the photomask pattern with beams of light adapted to pass through the pattern and optical systems onto the substrate. A scanning mechanism for synchronously scanning the photomask pattern with the beams of light is included to transfer the pattern to the substrate. A plurality of illumination intensity measuring devices is provided for substantially simultaneously measuring the illumination intensities of the beams of light passing through the optical systems.
    Type: Grant
    Filed: April 11, 1997
    Date of Patent: November 16, 1999
    Assignee: Nikon Corporatioin
    Inventors: Kei Nara, Toshio Matsuura
  • Patent number: 5973766
    Abstract: An exposure device sequentially transfers a pattern formed in a mask onto connected multiple regions present consecutively on a substrate through a projection optical system. The device includes a substrate stage moving in two dimensions and carrying the substrate in a movement coordinate system determined by a first axis and a mutually perpendicular second axis. A mark detecting sensor detects positions of alignment marks formed on the substrate. A magnification adjustment device corrects the magnification of the projection optical system. At least one calculating device is used to separately calculate extension amounts of the substrate in the direction of the first axis and in the direction of the second axis based on information relating to the positions of the alignment marks detected by the mark detecting sensor.
    Type: Grant
    Filed: May 14, 1997
    Date of Patent: October 26, 1999
    Assignee: Nikon Corporation
    Inventors: Toshio Matsuura, Nobutaka Fujimori, Toshinobu Morioka, Kei Nara
  • Patent number: 5912726
    Abstract: A projection exposure apparatus includes an illumination optical system for illuminating a plurality of partial areas on a mask. A plurality of projection optical systems each project images of the partial areas thus illuminated onto a photosensitive substrate. A mask table holds the mask. A position detector detects a position of the mask table. A substrate table holds the photosensitive substrate. A plurality of first reference marks are provided on the mask table; each of the plurality of first reference marks are disposed at a position corresponding to each of the plurality of projection optical systems. A plurality of second reference marks are provided on the substrate table; the second reference marks are substantially conjugate with the first reference marks with respect to the projection optical systems and are in a predetermined positional relation with the first reference marks in in-plane directions of the mask and the photosensitive substrate.
    Type: Grant
    Filed: September 3, 1997
    Date of Patent: June 15, 1999
    Assignee: Nikon Corporation
    Inventors: Manabu Toguchi, Kei Nara, Masaichi Murakami, Nobutaka Fujimori, Toshio Matsuura
  • Patent number: 5774240
    Abstract: An exposure apparatus for reproducing a mask pattern onto a photo-sensitive surface of a substrate uses holographic techniques. The apparatus includes support for holding a hologram recording plate at a predetermined position during both a recording operation and a reconstructing operation. A first illuminating optical system introduces a light beam from a coherent light source to a mask and irradiates a subject beam produced from the mask into the recording plate. A second illuminating optical system irradiates the light beam from a coherent light source as a reference beam into the recording plate, a carrier apparatus disposes during the reconstructing operation, a substrate at the position of the mask, in place of the mask. A third illuminating optical system for irradiates a conjugate beam with the reference beam into the recording plate, in which a hologram has been formed by the recording operation, to form an image of the hologram on the photo-sensitive surface of the substrate.
    Type: Grant
    Filed: May 16, 1995
    Date of Patent: June 30, 1998
    Assignee: Nikon Corporation
    Inventors: Akihiro Goto, Takashi Genma, Yutaka Ichihara, Nobutaka Magome, Naomasa Shiraishi, Toshio Matsuura, Hiroshi Shirasu, Masami Ebi
  • Patent number: 5617211
    Abstract: This invention relates to an exposure apparatus for synchronously scanning a mask and a photosensitive substrate with respect to a plurality of projection optical systems, thereby properly transferring an entire pattern area on the mask onto the photosensitive substrate. A plurality of sets of mask-side reference marks and substrate-side reference marks are arranged at positions corresponding to each other on the mask surface and the photosensitive substrate surface and at least at two positions conjugate with the plurality of projection optical systems. The displacement amount between an image of a mask-side reference mark or a substrate-side reference mark formed on the corresponding substrate-side reference mark or mask-side reference mark through the projection optical system and the position of the substrate-side reference mark and the mask-side reference mark is measured. The imaging characteristics of the plurality of projection optical systems are corrected in accordance with the displacement amount.
    Type: Grant
    Filed: August 16, 1995
    Date of Patent: April 1, 1997
    Assignee: Nikon Corporation
    Inventors: Kei Nara, Toshio Matsuura, Muneyasu Yokota, Yukio Kakizaki, Yoshio Fukami, Seiji Miyazaki, Tsuyoshi Narabe
  • Patent number: 5528390
    Abstract: An exposure apparatus for reproducing a mask pattern onto a photo-sensitive surface of a substrate using holographic techniques.
    Type: Grant
    Filed: June 5, 1995
    Date of Patent: June 18, 1996
    Assignee: Nikon Corporation
    Inventors: Akihiro Goto, Takashi Genma, Yutaka Ichihara, Nobutaka Magome, Naomasa Shiraishi, Toshio Matsuura, Hiroshi Shirasu, Masami Ebi
  • Patent number: 5523841
    Abstract: A plurality of interference length (distance) measuring means which are opposed to a movable mirror are aligned in the direction in which said movable mirror moves at an interval narrower than the length of the mirror surface. These interference length measuring means are switched according to movement of the movable mirror. Thus, the range within which distances from the mirror surface are measured can be made wider than the length of the mirror surface of the movable mirror.
    Type: Grant
    Filed: December 15, 1994
    Date of Patent: June 4, 1996
    Assignee: Nikon Corporation
    Inventors: Kei Nara, Toshio Matsuura
  • Patent number: 5504596
    Abstract: An exposure apparatus is used for reproducing a mask pattern of a semiconductor device or the like onto a photosensitive substrate using a holography. The holography is utilized also in a process for alignment between a mask pattern hologram and an exposure region of the substrate. The pattern hologram is recorded to a recording medium by interference between an object wave from the pattern and a reference wave, and a second hologram is formed to the medium by diffraction light from an alignment mark formed on the mask. Prior to reconstruction of the pattern image, reconstruction light from the second hologram, illuminated with a reconstruction wave, is irradiated onto the substrate arranged in place of the mask. A reproduction image of the alignment mark on the substrate surface illuminated with the reconstruction light is measured, and relative displacement between the medium and the substrate is detected from a result of the measurement.
    Type: Grant
    Filed: December 20, 1993
    Date of Patent: April 2, 1996
    Assignee: Nikon Corporation
    Inventors: Akihiro Goto, Takashi Gemma, Yutaka Ichihara, Nobutaka Magome, Naomasa Shiraishi, Hiroshi Shirasu, Toshio Matsuura
  • Patent number: 5442418
    Abstract: Prior to exposures, the imaging characteristics of a projection optical system to be used are determined by measuring the positions of plural projection points (evaluation points) within the projection area, on a photosensitive substrate, of the projection optical system. Then the positional aberrations between the evaluation points are determined in the area of image superposition or jointing, and correcting parameters are determined so as to minimize at least the component of the aberrations in a direction, perpendicular to an extending direction patterns of a reticle. The reticle or the photosensitive substrate is rotated or shifted according to thus determined correcting parameters. This exposure method achieves the superposition or jointing of patterns, or the superposition of the jointed parts thereof, in optimum manner, according to the structure (directionality) of the patterns or the imaging characteristics of the projection optical system employed.
    Type: Grant
    Filed: October 5, 1994
    Date of Patent: August 15, 1995
    Assignee: Nikon Corporation
    Inventors: Masaichi Murakami, Muneyasu Yokota, Toshio Matsuura, Atsuyuki Aoki
  • Patent number: 5295086
    Abstract: Method of making a spectral analysis of a free induction decay signal picked up by a pulse nuclear magnetic resonance spectrometer. The sine component and the cosine component of the signal which are .pi./2 out-of-phase are sampled. The resulting data is analyzed by the Sompi method extended to the complex domain. The Sompi method utilizes an autoregressive model.
    Type: Grant
    Filed: March 14, 1990
    Date of Patent: March 15, 1994
    Assignee: Jeol Ltd.
    Inventors: Mineo Kumazawa, Yuichi Imanishi, Toshio Matsuura
  • Patent number: 4801208
    Abstract: Alignment of a mask with a projection-type exposing apparatus and alignment of the mask with a substrate are provided. Plural exposure areas of the substrate are exposed by light of a predetermined wavelength, which is also used for alignment purposes to reduce alignment error due to aberration of a projection optical system. A first alignment mark is disposed in a first area between adjacent exposure areas of the substrate. The mask has a main area, a second area in which a second mark is disposed, and a third area in which a third mark is disposed, the second area being outside of the main area and the third area being inside the second area. An illuminating device has a first status in which the second and third areas are illuminated simultaneously and has a second status in which the third area is illuminated, a first area adjacent to one of the exposure areas also being illuminated when the illuminating device has the second status.
    Type: Grant
    Filed: August 29, 1986
    Date of Patent: January 31, 1989
    Assignee: Nikon Corporation
    Inventors: Kinya Katoh, Toshio Matsuura
  • Patent number: 4734746
    Abstract: An exposure method for photolithography comprises the steps of forming a pattern on a substrate by the use of a first exposure apparatus including a first imaging optical system having a reduction magnification 1/.beta.1 and an image circle of a diameter .phi.1, and forming a second pattern on the substrate on which the first pattern has been formed, by the use of a second exposure apparatus including a second imaging optical system having a reduction magnification 1/.beta.2 different from the reduction magnification 1/.beta.1 and an image circle of a diameter .phi.2, wherein when N is an integer, the conditions that .beta.1.times..phi.1=.beta.2.times..phi.2 and .phi.1=N.times..phi.2 are satisfied.
    Type: Grant
    Filed: May 12, 1987
    Date of Patent: March 29, 1988
    Assignee: Nippon Kogaku K. K.
    Inventors: Kazuo Ushida, Satoru Anzai, Kazuaki Suzuki, Toshio Matsuura, Kyoichi Suwa, Koichi Matsumoto
  • Patent number: 4723221
    Abstract: A process and an apparatus for positioning a substrate provided with at least an alignment mark (reference pattern) and other patterns irrelevant to the alignment such as circuit patterns, are featured by obtaining photoelectric signals corresponding to the pattern distribution in a scanning area extending over a determined length in a scan direction crossing said reference pattern at a determined angle and containing the reference pattern, identifying that a photoelectric signal satisfying at least a condition in the scan direction is generated by the reference pattern and aligning the substrate according to thus identified photoelectric signal.
    Type: Grant
    Filed: June 5, 1987
    Date of Patent: February 2, 1988
    Assignee: Nippon Kogaku K.K.
    Inventors: Toshio Matsuura, Satoru Shikata
  • Patent number: RE32795
    Abstract: An exposure apparatus for production of ICs of the type that includes a stage on which is placed a semiconductor wafer to be exposed by illumination light projecting means, and means for two-dimensionally moving the stage within a plane intersecting the illumination light at substantially right angles. The improvement comprises illumination detection means provided with a photo reception surface, and means for mounting the illumination detection means on the stage in such a manner that the photo reception surface and the surface of the semiconductor wafer on the stage to be exposed are at substantially equal height relative to the stage.
    Type: Grant
    Filed: August 11, 1986
    Date of Patent: December 6, 1988
    Assignee: Nikon Corporation
    Inventors: Toshio Matsuura, Kyoichi Suwa, Hisayuki Shimizu, Akikazu Tanimoto