Patents by Inventor Toshio Shinohara

Toshio Shinohara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6250952
    Abstract: The igniter connector comprises an insulating housing having a bead-receiving cavity open at one end, a partition in a center of a bottom wall of the cavity, a ferrite bead disposed in the bead-receiving cavity, and holes in the bottom wall of the bead-receiving cavity for insertion of pin terminals, the ferrite bead that is inserted in the bead-receiving cavity and secured in the insulating housing with the ferrite bead having a central opening through which the partition is passed when the ferrite bead is inserted in the bead-receiving cavity, a pair of electrical contacts having receptacle sections for electrical connection with the pin terminals are arranged in contact-receiving cavities disposed between the partition and the ferrite bead inserted in the bead-receiving cavity and wire-connecting sections for connection to electrical wires, and a cover member enclosing the bead-receiving cavity of the insulating housing is latched to the housing and has posts coaxially aligning the receptacle sections of t
    Type: Grant
    Filed: February 4, 2000
    Date of Patent: June 26, 2001
    Assignee: The Whitaker Corporation
    Inventors: Katsumi Shiga, Hiroshi Kitamura, Toshio Shinohara, Hidehisa Yamagami
  • Patent number: 6242629
    Abstract: When oganohalosilanes are prepared by charging a reactor with a contact mass containing a metallic silicon powder and a copper catalyst, and introducing an organohalide-containing gas into the reactor to effect the direct reaction, a poly(organo)phosphino compound is added to the contact mass. The invention is successful in producing organohalosilanes at a significantly improved production rate without reducing the selectivity of useful silane.
    Type: Grant
    Filed: September 7, 2000
    Date of Patent: June 5, 2001
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Susumu Ueno, Toshio Shinohara, Mikio Aramata, Yoichi Tanifuji, Tetsuya Inukai, Kazutoshi Fujioka
  • Patent number: 6239304
    Abstract: Organohalosilanes are prepared by the Rochow process of reacting metallic silicon particles with an organohalide in the presence of a copper catalyst. The metallic silicon particles, which are prepared by committing fragments of metallic silicon raw material, have a mean particle size of 10 &mgr;m to 10 mm and a surface oxygen quantity of at least 0.05 wt % and/or at least 0.001 g of oxygen/m2 of silicon surface area, which is given as the difference between the oxygen concentrations determined by in-metal oxygen analysis of the metallic silicon particles and the fragments, respectively. On analysis, the metallic silicon particles have been held for at least 3 hours in an air atmosphere at 25° C.
    Type: Grant
    Filed: May 23, 2000
    Date of Patent: May 29, 2001
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Mikio Aramata, Susumu Ueno, Akio Ohori, Hirofumi Fukuoka, Toshio Shinohara, Tetsuya Inukai
  • Patent number: 6218562
    Abstract: Organohalosilanes are prepared by the Rochow process of reacting metallic silicon particles with an organohalide in the presence of a copper catalyst. The metallic silicon particles, which are prepared by comminuting fragments of metallic silicon raw material, have a mean particle size of 10 &mgr;m to 10 mm and a surface oxygen quantity of up to 0.3 wt % which is given as the difference between the oxygen concentrations determined by in-metal oxygen analysis of the metallic silicon particles and the fragments, respectively.
    Type: Grant
    Filed: April 12, 2000
    Date of Patent: April 17, 2001
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Mikio Aramata, Akio Ohori, Masaaki Furuya, Susumu Ueno, Toshio Shinohara, Tetsuya Inukai
  • Patent number: 6215012
    Abstract: When oganohalosilanes are prepared by charging a reactor with a contact mass containing a metallic silicon powder and a copper catalyst, and introducing an organohalide-containing gas into the reactor to effect the direct reaction, a metal complex of an organophosphino compound is added to the contact mass. The invention is successful in producing organohalosilanes at a significantly improved production rate without reducing the selectivity of useful silane.
    Type: Grant
    Filed: September 7, 2000
    Date of Patent: April 10, 2001
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Susumu Ueno, Toshio Shinohara, Mikio Aramata, Yoichi Tanifuji, Tetsuya Inukai, Kazutoshi Fujioka
  • Patent number: 6156380
    Abstract: A contact mass for use in the synthesis of organohalosilanes is prepared by adding metallic copper particles to metallic silicon particles, and rubbing the particles against each other under high shear forces in a non-oxidizing atmosphere, thereby forming a metallic copper thin film on the surface of the metallic silicon particles in a spot pattern or entirely. The contact mass is capable of reducing the time required for activation and has an extended lifetime.
    Type: Grant
    Filed: October 5, 1999
    Date of Patent: December 5, 2000
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Mikio Aramata, Yoichi Tanifuji, Hisashi Konishi, Susumu Ueno, Tetsuya Inukai, Toshio Shinohara
  • Patent number: 5783647
    Abstract: Novel 1,1,2,2-tetramethylpropylperoxy esters are provided. They are useful as a polymerization initiator in polymerizing vinyl chloride, vinylidene chloride and vinyl acetate monomers, with the advantage of completing polymerization within a short time.
    Type: Grant
    Filed: December 4, 1995
    Date of Patent: July 21, 1998
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Takashi Kobayashi, Tadashi Amano, Hideshi Kurihara, Toshio Shinohara, Yoshitaka Okuno, Tohru Nishikawa
  • Patent number: 5728857
    Abstract: Silicon-containing peroxyester compounds, for example, represented by the following formula: ##STR1## useful as a polymerization initiator, which compounds can produce vinyl chloride polymers having a high quality in a high yield and in a short reaction time.
    Type: Grant
    Filed: March 7, 1997
    Date of Patent: March 17, 1998
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Takashi Kobayashi, Tadashi Amano, Hideshi Kurihara, Tomohisa Suzuki, Toshio Shinohara, Tohru Nishikawa
  • Patent number: 5597853
    Abstract: A silicone rubber composition comprising an organopolysiloxane and a reinforcing silica filler can be improved in crepe hardening and shelf stability by blending a specific compound as a wetter.
    Type: Grant
    Filed: November 7, 1994
    Date of Patent: January 28, 1997
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Kunio Itoh, Toshio Shinohara, Masaharu Takahashi
  • Patent number: 5473037
    Abstract: Disclosed is a method of producing dimethylpolysiloxanes through hydrolysis of dimethyldichlorosilane wherein a water solution containing a water-soluble oxygen-containing organic compound is introduced into dimethyldichlorosilane. Therein, linear dimethylpolysiloxanes alone having both ends blocked with chlorine atoms can be selectively produced by properly controlling the water content in the hydrolysis system and further by rendering the hydrolysis system acidic, and cyclic dimethylpolysiloxanes alone can also be selectively produced by properly controlling the water content in the hydrolysis system and optionally rendering the hydrolysis system acidic.
    Type: Grant
    Filed: August 17, 1994
    Date of Patent: December 5, 1995
    Assignee: Shin-Etsu Chemical Co. Ltd.
    Inventors: Kunio Itoh, Toshio Shinohara, Hiroaki Kizaki, Shoichi Tanaka, Yukinori Satou, Kazunobu Umemura
  • Patent number: 5466847
    Abstract: A process for preparing hexamethylcyclo-trisilazane by heating octamethylcyclotetra-silazane in the presence of a catalyst such as a Lewis acid or a sulfur compound of the following formula ##STR1## wherein M represents Ca, Mg, Al, Fe or NH.sub.4, R represents OH, a phenyl group or a substituted phenyl group, x is 0, 1 or 2 and y is 0, 1, 2 or 3 provided that x and y are not zero at the same time, and z is 0, 1, 2 or 3.
    Type: Grant
    Filed: October 28, 1994
    Date of Patent: November 14, 1995
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Toshio Shinohara, Akio Yokoo, Muneo Kudo, Motoaki Iwabuchi, Kazuyuki Matsumura
  • Patent number: 5403947
    Abstract: A method of producing dicyclopentyldichlorosilane which comprises reacting cyclopentene and dichlorosilane with each other by using a platinum catalyst and/or a rhodium catalyst in the presence of 1,3-diethinyl-1,1,3,3-tetramethyldisiloxane.
    Type: Grant
    Filed: June 27, 1994
    Date of Patent: April 4, 1995
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventor: Toshio Shinohara
  • Patent number: 5264601
    Abstract: N,O-bis(trimethylsilyl)acetamide is improved in thermal stability by adding about 0.01 to 5 mol % of a 2-mercaptobenzothiazole or a salt thereof thereto.
    Type: Grant
    Filed: July 29, 1992
    Date of Patent: November 23, 1993
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Toshio Shinohara, Muneo Kudo, Susumu Ueno, Masao Maruyama
  • Patent number: 5245066
    Abstract: Hexamethylcyclotrisilazane is prepared by reacting dimethyldichlorosilane with ammonia at a temperature between -20.degree. C. and 20.degree. C. Preferably, ammonia is blown into dimethyldichlorosilane at the temperature, and the reaction mixture is washed with 20% or higher alkaline water within one hour from the end of reaction for removing ammonium chloride by dissolving it in the water. Then hexamethylcyclotrisilazane of high purity is prepared in high yields. The method can be scaled up for commercial manufacture.
    Type: Grant
    Filed: August 21, 1992
    Date of Patent: September 14, 1993
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Toshio Shinohara, Akio Yokoo, Muneo Kudo, Kazuyuki Matsumura
  • Patent number: 5227504
    Abstract: A silylating agent comprising an N-(trialkylsilyl)benzanilide having the following general formula: ##STR1## wherein R.sup.1 is a lower alkyl group. This agent is reacted with a secondary amine to produce an N,N-dialkylaminotrialkylsilane. This process is free of formation of amine hydrochlorides as by-products. Therefore, the problem associated with disposal of such amine hydrochlorides and the problem of limitations on the use of the silane compound product due to mixing of such amine hydrochlorides can be obviated effectively.
    Type: Grant
    Filed: May 14, 1992
    Date of Patent: July 13, 1993
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Toshio Shinohara, Muneo Kudo, Kazuyuki Matsumura
  • Patent number: 5194627
    Abstract: An N-tert-butyldialkylsilylmaleimide represented by the following general formula: ##STR1## wherein R's represent C.sub.1 to C.sub.5 alkyl groups which may be the same or different and a method of producing the compound. Said N-tert-butyldialkylsilylmaleimide is useful as a silylating agent, which does not produce hydrogen chloride or the like as a by-product and therefore does not require to use a neutralizing agent additionally. Further this compound is useful as a compound which provides a maleimido group.
    Type: Grant
    Filed: May 14, 1992
    Date of Patent: March 16, 1993
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Toshio Shinohara, Motoaki Iwabuchi
  • Patent number: 5142080
    Abstract: Highly pure diethylaminotrimethylsilane can be manufactured in a high yield through the reaction between diethylamine and an N,O-bis(trimethylsilyl)acetamide represented by the following general formula: ##STR1## wherein X represents H or F.
    Type: Grant
    Filed: November 7, 1991
    Date of Patent: August 25, 1992
    Assignee: Shin-Etsu Chemical Company, Limited
    Inventors: Toshio Shinohara, Muneo Kudo, Kazuyuki Matsumura, Nobuyuki Suzuki
  • Patent number: 5136072
    Abstract: Thexyl (C.sub.1 -C.sub.4) alkyl dialkoxy silanes are proposed as a class of novel organosilicon compounds such as thexyl methyl dimethoxy silane and thexyl n-butyl dimethoxy silane. These silane compounds can be synthesized by several different routes. For example, thexyl methyl dimethoxy silane is prepared starting from methyl phenyl chlorosilane which is subjected to the hydrosilation reaction with 2,3-dimethyl-2-butene to introduce a thexyl group and the compound is converted by the reaction with hydrogen chloride into thexyl methyl dichlorosilane which is methoxylated by the reaction with methyl alcohol.
    Type: Grant
    Filed: November 26, 1991
    Date of Patent: August 4, 1992
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Toshio Shinohara, Motoaki Iwabuchi
  • Patent number: 5136073
    Abstract: Several thexyl trialkoxy silanes as a novel class of organosilicon compounds were synthesized by the reaction of dehydrochlorination condensation between thexyl trichlorosilane and an alcohol, e.g., methyl, ethyl, isopropyl and isobutyl alcohols, and characterized by the analytical data. These compounds are useful as an intermediate in the synthetic preparation of other organosilicon compounds, starting material of various silicones, surface-treatment agent of inorganic materials and additive in complex catalysts.
    Type: Grant
    Filed: November 22, 1991
    Date of Patent: August 4, 1992
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Toshio Shinohara, Muneo Kudo, Motoaki Iwabuchi
  • Patent number: 5130461
    Abstract: There is provided a novel organosilicon compound, 1,3-bis(p-hydroxybenzyl)-1,1,3,3-tetramethyldisiloxane. It is prepared by silylating 1,3-bis(p-methoxybenzyl)-1,1,3,3-tetramethyldisiloxane with trimethylsilyl iodide, followed by desilylation.
    Type: Grant
    Filed: June 5, 1991
    Date of Patent: July 14, 1992
    Assignee: Shin-Etsu Chemical Company Limited
    Inventors: Toshio Shinohara, Makoto Satoh