Patents by Inventor Toshiyuki TERASAWA

Toshiyuki TERASAWA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Process for producing sputtering target and sputtering target
    Patent number: 10737352
    Abstract: A process for producing a sputtering target in which a target material is diffusion-bonded to a top face of a backing plate material, the process comprising: a step of heating the top face of the target material by a hot plate while pressing from above thereby diffusion-bonding the target material to the backing plate material in such a manner that the step is performed at a center part prior to an outer peripheral part of the top face.
    Type: Grant
    Filed: June 19, 2019
    Date of Patent: August 11, 2020
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Mikio Takigawa, Toshiyuki Terasawa
  • PROCESS FOR PRODUCING SPUTTERING TARGET AND SPUTTERING TARGET
    Publication number: 20190299324
    Abstract: A process for producing a sputtering target in which a target material is diffusion-bonded to a top face of a backing plate material, the process comprising: a step of heating the top face of the target material by a hot plate while pressing from above thereby diffusion-bonding the target material to the backing plate material in such a manner that the step is performed at a center part prior to an outer peripheral part of the top face.
    Type: Application
    Filed: June 19, 2019
    Publication date: October 3, 2019
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Mikio TAKIGAWA, Toshiyuki TERASAWA
  • Process for producing sputtering target and sputtering target
    Patent number: 10369656
    Abstract: A process for producing a sputtering target in which a target material is diffusion-bonded to a top face of a backing plate material, the process comprising: a step of heating the top face of the target material by a hot plate while pressing from above thereby diffusion-bonding the target material to the backing plate material in such a manner that the step is performed at a center part prior to an outer peripheral part of the top face.
    Type: Grant
    Filed: July 10, 2017
    Date of Patent: August 6, 2019
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Mikio Takigawa, Toshiyuki Terasawa
  • PROCESS FOR PRODUCING SPUTTERING TARGET AND SPUTTERING TARGET
    Publication number: 20180304400
    Abstract: A process for producing a sputtering target in which a target material is diffusion-bonded to a top face of a backing plate material, the process comprising: a step of heating the top face of the target material by a hot plate while pressing from above thereby diffusion-bonding the target material to the backing plate material in such a manner that the step is performed at a center part prior to an outer peripheral part of the top face.
    Type: Application
    Filed: July 10, 2017
    Publication date: October 25, 2018
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Mikio TAKIGAWA, Toshiyuki TERASAWA