Patents by Inventor Toshiyuki Yokosuka

Toshiyuki Yokosuka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10566172
    Abstract: A charged particle beam apparatus with reduced frequency of lens resetting operations and thus with improved throughput. The apparatus includes an electron source configured to generate an electron beam, an objective lens to which coil current is adapted to be applied to converge the electron beam on a sample, a focal position adjustment device configured to adjust the focal position of the electron beam, a detector configured to detect electrons from the sample, a display unit configured to display an image of the sample in accordance with a signal from the detector, a storage unit configured to store information on the hysteresis characteristics of the objective lens, and an estimation unit configured to estimate a magnetic field generated by the objective lens on the basis of the coil current, the amount of adjustment of the focal position by the focal position adjustment device, and the information on the hysteresis characteristics.
    Type: Grant
    Filed: November 8, 2018
    Date of Patent: February 18, 2020
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Tomohito Nakano, Toshiyuki Yokosuka, Yuko Sasaki, Minoru Yamazaki, Yuzuru Mochizuki
  • Publication number: 20200035449
    Abstract: A charged particle beam device includes an electron source which generates an electron beam, an objective lens which is applied with a coil current to converge the electron beam on a sample, a control unit which controls the current to be applied to the objective lens, a hysteresis characteristic storage unit which stores hysteresis characteristic information of the objective lens, a history information storage unit which stores history information related to the coil current, and an estimation unit which estimates a magnetic field generated by the objective lens on the basis of the coil current, the history information, and the hysteresis characteristic information.
    Type: Application
    Filed: June 10, 2019
    Publication date: January 30, 2020
    Inventors: Tomohito NAKANO, Toshiyuki YOKOSUKA, Yuko SASAKI, Minoru YAMAZAKI, Yuzuru MOCHIZUKI
  • Patent number: 10541103
    Abstract: The purpose of the present invention is to reduce the amount of charged particles that are lost by colliding with the interior of a column of a charged particle beam device, and detect charged particles with high efficiency. To achieve this purpose, proposed is a charged particle beam device provided with: an objective lens that focuses a charged particle beam; a detector that is disposed between the objective lens and a charged particle source; a deflector that deflects charged particles emitted from a sample such that the charged particles separate from the axis of the charged particle beam; and a plurality of electrodes that are disposed between the deflector and the objective lens and that form a plurality of electrostatic lenses for focusing the charged particles emitted from the sample on a deflection point of the deflector.
    Type: Grant
    Filed: December 10, 2014
    Date of Patent: January 21, 2020
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Yuzuru Mizuhara, Toshiyuki Yokosuka, Hideyuki Kazumi, Kouichi Kurosawa, Kenichi Myochin
  • Publication number: 20190348255
    Abstract: Provided is a scanning electron microscope. The scanning electron microscope is capable of removing a charge generated on a side wall of a deep hole or groove, and inspects and measures a bottom portion of the deep hole or groove with high accuracy.
    Type: Application
    Filed: January 17, 2017
    Publication date: November 14, 2019
    Inventors: Daisuke BIZEN, Natsuki TSUNO, Takafumi MIWA, Makoto SAKAKIBARA, Toshiyuki YOKOSUKA, Hideyuki KAZUMI
  • Patent number: 10446359
    Abstract: Provided is a charged particle beam device that enables, even if a visual field includes therein a plurality of regions having different secondary electron emission conditions, the setting of appropriate energy filter conditions adapted to each of these regions. The charged particle beam device is equipped with a detector for detecting charged particles obtained on the basis of scanning, over a sample, a charged particle beam emitted from a charged particle source, and an energy filter for filtering by energy the charged particles emitted from the sample. Index values are determined for the plurality of regions contained within the scanning region of the charged particle beam, and, for each of a plurality of energy filter conditions, differences are calculated between the plurality of index values and the reference index values that have been set for each of the plurality of regions.
    Type: Grant
    Filed: January 28, 2015
    Date of Patent: October 15, 2019
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Toshiyuki Yokosuka, Hideyuki Kazumi, Yuzuru Mizuhara, Hajime Kawano
  • Publication number: 20190180979
    Abstract: The scanning charged particle beam microscope according to the present application is characterized in that, in acquiring an image of the FOV (field of view), interspaced beam irradiation points are set, and then, a deflector is controlled so that a charged particle beam scan is performed faster when the charged particle beam irradiates a position on the sample between each of the irradiation points than when the charged particle beam irradiates a position on the sample corresponding to each of the irradiation points (a position on the sample corresponding to each pixel detecting a signal). This allows the effects from a micro-domain electrification occurring within the FOV to be mitigated or controlled.
    Type: Application
    Filed: February 14, 2019
    Publication date: June 13, 2019
    Inventors: Toshiyuki YOKOSUKA, Chahn LEE, Hideyuki KAZUMI, Hajime KAWANO, Shahedul HOQUE, Kumiko SHIMIZU, Hiroyuki TAKAHASHI
  • Publication number: 20190172676
    Abstract: A charged particle beam apparatus with reduced frequency of lens resetting operations and thus with improved throughput. The apparatus includes an electron source configured to generate an electron beam, an objective lens to which coil current is adapted to be applied to converge the electron beam on a sample, a focal position adjustment device configured to adjust the focal position of the electron beam, a detector configured to detect electrons from the sample, a display unit configured to display an image of the sample in accordance with a signal from the detector, a storage unit configured to store information on the hysteresis characteristics of the objective lens, and an estimation unit configured to estimate a magnetic field generated by the objective lens on the basis of the coil current, the amount of adjustment of the focal position by the focal position adjustment device, and the information on the hysteresis characteristics.
    Type: Application
    Filed: November 8, 2018
    Publication date: June 6, 2019
    Inventors: Tomohito NAKANO, Toshiyuki YOKOSUKA, Yuko SASAKI, Minoru YAMAZAKI, Yuzuru MOCHIZUKI
  • Patent number: 10290464
    Abstract: The present invention provides a charged particle beam device capable of predicting the three-dimensional structure of a sample, without affecting the charge of the sample. The present invention provides a charged particle beam device characterized in that a first distance between the peak and the bottom of a first signal waveform obtained on the basis of irradiation with a charged particle beam having a first landing energy, and a second distance between the peak and the bottom of a second signal waveform obtained on the basis of irradiation with a charged particle beam having a second landing energy different from the first landing energy are obtained, and the distance between the peak and the bottom at a landing energy (zero, for instance) different from the first and second landing energies is obtained on the basis of the extrapolation of the first distance and the second distance.
    Type: Grant
    Filed: August 15, 2016
    Date of Patent: May 14, 2019
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Toshiyuki Yokosuka, Chahn Lee, Hideyuki Kazumi, Manabu Hasegawa
  • Publication number: 20190103250
    Abstract: There is proposed a charged particle beam device that generates a first signal waveform on the basis of scanning, the number of scanning lines of which is one or more, the scanning intersecting an edge of a pattern on a sample, generates a second signal waveform for a first area that is wider than the one scanning line on the basis of scanning, the number of scanning lines of which is larger than that of scanning for generating the first signal waveform, then determines a deviation between the generated first and second signal waveforms, and thereby determines, from the deviation, correction data used at the time of dimensional measurement.
    Type: Application
    Filed: September 20, 2018
    Publication date: April 4, 2019
    Inventors: Toshiyuki YOKOSUKA, Chahn LEE, Hideyuki KAZUMI, Hajime KAWANO
  • Patent number: 10249474
    Abstract: The scanning charged particle beam microscope according to the present application is characterized in that, in acquiring an image of the FOV (field of view), interspaced beam irradiation points are set, and then, a deflector is controlled so that a charged particle beam scan is performed faster when the charged particle beam irradiates a position on the sample between each of the irradiation points than when the charged particle beam irradiates a position on the sample corresponding to each of the irradiation points (a position on the sample corresponding to each pixel detecting a signal). This allows the effects from a micro-domain electrification occurring within the FOV to be mitigated or controlled.
    Type: Grant
    Filed: June 9, 2017
    Date of Patent: April 2, 2019
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Toshiyuki Yokosuka, Chahn Lee, Hideyuki Kazumi, Hajime Kawano, Shahedul Hoque, Kumiko Shimizu, Hiroyuki Takahashi
  • Publication number: 20180182595
    Abstract: The present invention provides a charged particle beam device capable of predicting the three-dimensional structure of a sample, without affecting the charge of the sample. The present invention provides a charged particle beam device characterized in that a first distance between the peak and the bottom of a first signal waveform obtained on the basis of irradiation with a charged particle beam having a first landing energy, and a second distance between the peak and the bottom of a second signal waveform obtained on the basis of irradiation with a charged particle beam having a second landing energy different from the first landing energy are obtained, and the distance between the peak and the bottom at a landing energy (zero, for instance) different from the first and second landing energies is obtained on the basis of the extrapolation of the first distance and the second distance.
    Type: Application
    Filed: August 5, 2016
    Publication date: June 28, 2018
    Inventors: Toshiyuki YOKOSUKA, Chahn LEE, Hideyuki KAZUMI, Manabu HASEGAWA
  • Publication number: 20180012725
    Abstract: Provided is a charged particle beam device that enables, even if a visual field includes therein a plurality of regions having different secondary electron emission conditions, the setting of appropriate energy filter conditions adapted to each of these regions. The charged particle beam device is equipped with a detector for detecting charged particles obtained on the basis of scanning, over a sample, a charged particle beam emitted from a charged particle source, and an energy filter for filtering by energy the charged particles emitted from the sample. Index values are determined for the plurality of regions contained within the scanning region of the charged particle beam, and, for each of a plurality of energy filter conditions, differences are calculated between the plurality of index values and the reference index values that have been set for each of the plurality of regions.
    Type: Application
    Filed: January 28, 2015
    Publication date: January 11, 2018
    Applicant: Hitachi High-Technologies Corporation
    Inventors: Toshiyuki YOKOSUKA, Hideyuki KAZUMI, Yuzuru MIZUHARA, Hajime KAWANO
  • Publication number: 20170345613
    Abstract: The purpose of the present invention is to reduce the amount of charged particles that are lost by colliding with the interior of a column of a charged particle beam device, and detect charged particles with high efficiency. To achieve this purpose, proposed is a charged particle beam device provided with: an objective lens that focuses a charged particle beam; a detector that is disposed between the objective lens and a charged particle source; a deflector that deflects charged particles emitted from a sample such that the charged particles separate from the axis of the charged particle beam; and a plurality of electrodes that are disposed between the deflector and the objective lens and that form a plurality of electrostatic lenses for focusing the charged particles emitted from the sample on a deflection point of the deflector.
    Type: Application
    Filed: December 10, 2014
    Publication date: November 30, 2017
    Applicant: Hitachi High-Technologies Corporation
    Inventors: Yuzuru MIZUHARA, Toshiyuki YOKOSUKA, Hideyuki KAZUMI, Kouichi KUROSAWA, Kenichi MYOCHIN
  • Patent number: 9786468
    Abstract: An object of the invention is to provide a charged particle beam apparatus capable of performing high-precision measurement even on a pattern in which a width of edges is narrow and inherent peaks of the edges cannot be easily detected.
    Type: Grant
    Filed: February 5, 2014
    Date of Patent: October 10, 2017
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Toshiyuki Yokosuka, Chahn Lee, Hideyuki Kazumi
  • Publication number: 20170278671
    Abstract: The scanning charged particle beam microscope according to the present application is characterized in that, in acquiring an image of the FOV (field of view), interspaced beam irradiation points are set, and then, a deflector is controlled so that a charged particle beam scan is performed faster when the charged particle beam irradiates a position on the sample between each of the irradiation points than when the charged particle beam irradiates a position on the sample corresponding to each of the irradiation points (a position on the sample corresponding to each pixel detecting a signal). This allows the effects from a micro-domain electrification occurring within the FOV to be mitigated or controlled.
    Type: Application
    Filed: June 9, 2017
    Publication date: September 28, 2017
    Inventors: Toshiyuki YOKOSUKA, Chahn LEE, Hideyuki KAZUMI, Hajime KAWANO, Shahedul HOQUE, Kumiko SHIMIZU, Hiroyuki TAKAHASHI
  • Patent number: 9697987
    Abstract: The scanning charged particle beam microscope according to the present invention is characterized in that, in acquiring an image of the FOV (field of view), interspaced beam irradiation points are set, and then, a deflector is controlled so that a charged particle beam scan is performed faster when the charged particle beam irradiates a position on the sample between each of the irradiation points than when the charged particle beam irradiates a position on the sample corresponding to each of the irradiation points (a position on the sample corresponding to each pixel detecting a signal). This allows the effects from a micro-domain electrification occurring within the FOV to be mitigated or controlled.
    Type: Grant
    Filed: June 11, 2014
    Date of Patent: July 4, 2017
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Toshiyuki Yokosuka, Chahn Lee, Hideyuki Kazumi, Hajime Kawano, Shahedul Hoque, Kumiko Shimizu, Hiroyuki Takahashi
  • Patent number: 9640366
    Abstract: The present invention has for its object to provide a charged particle beam irradiation method and a charged particle beam apparatus which can suppress unevenness of electrification even when a plurality of different kinds of materials are contained in a pre-dosing area or degrees of density of patterns inside the pre-dosing area differs with positions. To accomplish the above object, a charged particle beam irradiation method and a charged particle beam apparatus are provided according to which the pre-dosing area is divided into a plurality of divisional areas and electrifications are deposited to the plural divisional areas by using a beam under different beam irradiation conditions.
    Type: Grant
    Filed: February 9, 2011
    Date of Patent: May 2, 2017
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Toshiyuki Yokosuka, Minoru Yamazaki, Hideyuki Kazumi, Kazutami Tago
  • Patent number: 9472376
    Abstract: An object of the invention is to provide a scanning electron microscope which forms an electric field to lift up, highly efficiently, electrons discharged from a hole bottom or the like even if a sample surface is an electrically conductive material. To achieve the above object, according to the invention, a scanning electron microscope including a deflector which deflects a scanning position of an electron beam, and a sample stage for loading a sample thereon, is proposed. The scanning electron microscope includes a control device which controls the deflector or the sample stage in such a way that before scanning a beam on a measurement target pattern, a lower layer pattern situated in a lower layer of the measurement target pattern undergoes beam irradiation on another pattern situated in the lower layer.
    Type: Grant
    Filed: February 18, 2013
    Date of Patent: October 18, 2016
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Toshiyuki Yokosuka, Chahn Lee, Hideyuki Kazumi, Hiroshi Makino, Yuzuru Mizuhara, Miki Isawa, Michio Hatano, Yoshinori Momonoi
  • Publication number: 20160240348
    Abstract: The scanning charged particle beam microscope according to the present invention is characterized in that, in acquiring an image of the FOV (field of view), interspaced beam irradiation points are set, and then, a deflector is controlled so that a charged particle beam scan is performed faster when the charged particle beam irradiates a position on the sample between each of the irradiation points than when the charged particle beam irradiates a position on the sample corresponding to each of the irradiation points (a position on the sample corresponding to each pixel detecting a signal). This allows the effects from a micro-domain electrification occurring within the FOV to be mitigated or controlled.
    Type: Application
    Filed: June 11, 2014
    Publication date: August 18, 2016
    Inventors: Toshiyuki YOKOSUKA, Chahn LEE, Hideyuki KAZUMI, Hajime KAWANO, Shahedul HOQUE, Kumiko SHIMIZU, Hiroyuki TAKAHASHI
  • Patent number: 9257259
    Abstract: Provided is an electron beam scanning method for forming an electric field for appropriately guiding electrons emitted from a pattern to the outside of the pattern, and also provided is a scanning electron microscope. When an electron beam for forming charge is irradiated to a sample, a first electron beam is irradiated to a first position (1) and a second position (2) having the center (104) of a pattern formed on the sample as a symmetrical point, and is then additionally irradiated to two central positions (3, 4) between the first and second irradiation position, the two central positions (3, 4) being on the same radius centered on the symmetrical point as are the first and second positions. Further, after that, the irradiation of the first electron beam to the central positions between existing scanning positions on the radius is repeated.
    Type: Grant
    Filed: June 8, 2011
    Date of Patent: February 9, 2016
    Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Kinya Kobayashi, Toshiyuki Yokosuka, Chahn Lee