Abstract: A gasket includes a thick portion providing a first face seal and a thin portion providing a second face seal. A fluid coupling has an annular gasket housing recess that includes a wide portion for housing the thick portion of the gasket and a narrow portion for housing the thin portion of the gasket.

Abstract: A substrate processing apparatus includes an inner tube configured to accommodate a plurality of substrates and having a first opening portion; an outer tube surrounding the inner tube; a movable wall movably provided in the inner tube or between the inner tube and the outer tube and having a second opening portion; a gas supply part configured to supply a processing gas into the inner tube; an exhaust part provided outside the movable wall and configured to exhaust the processing gas supplied into the inner tube through the first opening portion and the second opening portion; and a pressure detection part configured to detect a pressure inside the inner tube.

Abstract: A first on-off valve 2 and a second on-off valve 3 each are a two-port valve. A first passage block 5 is provided with a first on-off valve-corresponding inflow passage 11 and a first on-off valve-corresponding outflow passage 12. A second passage block 6 is provided with a second on-off valve-corresponding inflow passage 14 and a second on-off valve-corresponding outflow passage 15. The second on-off valve-corresponding outflow passage 15 is in communication with an upstream side portion of the first on-off valve-corresponding outflow passage 12 via a communicating passage 13 formed in the first passage block 5. An orifice 20 is provided between the second on-off valve-corresponding outflow passage 15 and the communicating passage 13.

Abstract: A substrate processing apparatus includes: a process container configured to receive a substrate therein; a pressure detection part configured to measure an internal pressure of the process container; an exhaust-side valve installed in an exhaust pipe configured to exhaust an interior of the process container; a gas storage tank connected to the process container through a first gas supply pipe; a gas amount measuring part configured to measure an amount of gas stored in the gas storage tank; and a control valve installed in the first gas supply pipe and configured to control the internal pressure of the process container by changing an opening degree of the control valve based on the internal pressure of the process container which is detected by the pressure detection part and by controlling a flow path cross section through which the gas is supplied from the gas storage tank to the process container.

Abstract: There is provided a pressure measuring device including: a first pressure gauge connected to a processing chamber configured to process a process target and configured to measure an internal pressure of the processing chamber when the process target is being processed; a second pressure gauge connected to the processing chamber; and a first switching valve configured to disconnect the second pressure gauge from the processing chamber when the process target is being processed inside the processing chamber.

Abstract: A processing apparatus includes a processing container, a manifold having an injector supporting part, the injector supporting part being disposed at a lower end of the processing container, extending along an inner wall surface in the processing container and having an insertion hole, and a gas introduction part having a gas flow passage within the gas introduction part to communicate with the insertion hole and an outside of the processing container so that a gas flows in the gas flow passage, an injector inserted and fixed into the insertion hole, the injector entirely extending in a linear manner along the wall surface and having an opening communicating with the gas flow passage at a location where the injector is inserted into the insertion hole, and a gas supplying pipe communicating with and connected to an outer end of the gas flow passage of the gas introduction part.

Abstract: A pipe joint for preventing fine particles generated when a male threaded member and a female threaded member are threadedly engaged with each other from entering a fluid passage thus maintaining a high degree of cleanliness. Joint members are joined to each other by a male threaded member formed on one joint member and a female threaded member formed on the other joint member. A cover portion which covers outer peripheral surfaces of abutting portions of both joint members is formed on the male threaded member.

Abstract: A pipe joint includes first and second joint members having fluid channels communicating with each other, an annular gasket to be interposed between abutting end surfaces of the both joint members, and a nut configured to couple the joint members. The nut is provided with an inner surface treated layer. The inner surface treated layer includes a Co (cobalt)-P (phosphorous) alloy metal coating provided on an inner surface of the nut and a fluorine coating provided on the surface of the alloy metal coating.

Abstract: A method for using a system, which includes a film formation apparatus for forming a high-dielectric constant thin film on target substrates together and a gas supply apparatus for supplying a process gas. The method includes a preparatory stage of determining a set pressure range of pressure inside a vaporizing chamber for a liquid material cooled at a set temperature. The preparatory stage includes obtaining a first limit value of pressure at which vaporization of the liquid material starts being inhibited due to an increase in the pressure, obtaining a second limit value of pressure at which vaporization of the liquid material starts being unstable and the pressure starts pulsating movement due to a decrease in the pressure, and determining the set pressure range to be defined by an upper limit lower than the first limit value and a lower limit higher than the second limit value.

Abstract: Rails 20 corresponding to lines A, B, C are provided in parallel on a bass plate 1, and coupling members 21, 22 are slidably mounted on each of the rails 20. Each of fluid controllers 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14 is mounted generally on two of these coupling members 21, 22.

Abstract: There is provided a gas supply apparatus 10 which does not necessitate installation of a pressure type flow controller for each processing reactor and which enables a compact construction of the flow controller. The gas supply apparatus 10 includes gas supply sources 11a, 11b, gas introduction pipes 13a, 13b, a main gas pipe 15, and branch pipes 21a, 21b. A pressure type flow controller 30 is provided for the main gas pipe 15 and the branch pipes 21a, 21b. The pressure type flow controller 30 includes a pressure detector 17 provided in the main gas pipe 15, and control valves 23a, 23b and orifices 22a, 22b, both provided in the branch pipes 21a, 21b. An arithmetic circuit 40 determines a flow rate Qc based on a detected pressure P1 from the pressure detector 17, and an arithmetic control circuit 58 controls the control valves 23a, 23b based on a set flow rate signal Qs from a flow rate setting circuit 52 and on the flow rate Qc from the arithmetic circuit 40.

Abstract: The flow rate controller controlling a flow rate of gas supplied through a gas passage includes: a main gas pipe; a flow rate detecting unit detecting the flow rate of gas supplied through the main gas pipe and outputting a flow rate signal; a flow rate control valve mechanism controlling a flow rate; a conversion data storage unit storing a plurality of pieces of conversion data corresponding to a plurality of gaseous species, to indicate a relationship between a flow rate instruction signal input from outside and a target flow rate; and a flow rate control main body which selects the corresponding conversion data from the conversion data based on a gaseous species selection signal input from outside, calculates the target flow rate based on the flow rate instruction signal, and controls the flow rate control valve mechanism based on the target flow rate and the flow rate signal.

Abstract: Provided is a joint which can decrease the number of kinds of parts. A bolt 5 has a shaft portion 14 which is constituted of a distal end portion on which male threads 14a are formed and a remaining portion 14b on which male threads are not formed. First and second joint members 2, 3 have the same shape. A shaft insertion hole 15 which is disposed on an abutting end surface side of the joint member and a threaded hole 16 which is communicated with the shaft insertion hole 15 and extends to an end surface of the joint member on a side opposite to an abutting end surface of the joint member are formed in the first and second joint members 2, 3.

Abstract: Provided is a pipe joint which can prevent fine particles generated when a male threaded member and a female threaded member are threadedly engaged with each other from entering a fluid passage thus maintaining a high degree of cleanliness. Joint members 2, 3 are joined to each other by a male threaded member 6 formed on one joint member 2 and a female threaded member 7 formed on the other joint member 3. A cover portion 16 which covers outer peripheral surfaces of abutting portions of both joint members 2, 3 is formed on the male threaded member 6.

Abstract: A disclosed gas supplying apparatus includes a pressure controller that reduces a primary pressure thereby providing a secondary pressure greater than a process pressure at which a predetermined process is performed and less than the atmospheric pressure in a secondary pipe; a pressure sensor that measures a pressure in the secondary pipe; a first open/close valve provided in the secondary pipe; an open/close valve controller that opens or closes the first open/close valve; a pressure comparator that compares the pressure measured by the pressure sensor in the secondary pipe with a first set pressure that is greater than the process pressure by a predetermined pressure; and a controller that outputs a signal to the open/close valve controller thereby closing the first open/close valve, when the pressure comparator determines that the pressure in the secondary pipe is less than the first set pressure.

Abstract: A pipe joint which does not generate fine particles even though being repeatedly mounted and demounted is provided. A pipe joint includes first and second joint members having fluid channels communicating with each other, an annular gasket to be interposed between abutting end surfaces of the both joint members, and a nut configured to couple the joint members. The nut is provided with an inner surface treated layer. The inner surface treated layer includes a Co (cobalt)-P (phosphorous) alloy metal coating provided on an inner surface of the nut and a fluorine coating provided on the surface of the alloy metal coating.

Abstract: A method for using a system, which includes a film formation apparatus for forming a high-dielectric constant thin film on target substrates together and a gas supply apparatus for supplying a process gas. The method includes a preparatory stage of determining a set pressure range of pressure inside a vaporizing chamber for a liquid material cooled at a set temperature. The preparatory stage includes obtaining a first limit value of pressure at which vaporization of the liquid material starts being inhibited due to an increase in the pressure, obtaining a second limit value of pressure at which vaporization of the liquid material starts being unstable and the pressure starts pulsating movement due to a decrease in the pressure, and determining the set pressure range to be defined by an upper limit lower than the first limit value and a lower limit higher than the second limit value.

Abstract: Fluorine gas generators are connected with semiconductor manufacturing apparatuses through a gas supplying system including a storage tank that can store a predetermined quantity of fluorine gas generated in the on-site fluorine gas generators. When one or more of the on-site fluorine gas generators are stopped, fluorine gas is supplied to the semiconductor manufacturing apparatuses from the storage tank storing a predetermined quantity of fluorine gas, so as to keep the operations of the semiconductor manufacturing apparatuses. Thereby obtained is a semiconductor manufacturing plant in which fluorine gas generated in the fluorine gas generators can be safely and stably supplied to the semiconductor manufacturing apparatuses, and with superior cost performance.

Abstract: A vaporizer for generating a process gas from a liquid material includes a container defining a process space of the vaporizer, and an injector having a spray port configured to spray the liquid material in an atomized state downward in the container. A lower block is disposed below the spray port inside the container such that a run-up space for the atomized liquid material is defined between the spray port and the lower block, and an annular space continuous to the run-up space is defined between an inner surface of the container and the lower block. First and second heaters are respectively provided to the container and the lower block, and configured to heat the atomized liquid material flowing through the annular space to generate the process gas. A gas delivery passage is connected to the container to output the process gas from the annular space.

Abstract: A rotary valve (1) includes a valve body (2) formed with a chamber communication passage (24) for flowing a main fluid and a vent communication passage (25) for discharging the main fluid and a cylindrical valve member (3) rotatably held in the valve body (2) and formed with a main passage (31) for flowing the main fluid. The cylindrical valve member (3) is rotated to switch the connection of the main passage (31) between the chamber communication passage (24) and the vent communication passage (25). The rotary switching valve (1) further includes a purge gas passage for passing purge gas in a clearance (11) between the valve body (2) and the cylindrical valve member (3), the purge gas being supplied to the clearance (11) to prevent the main fluid from leaking out of the main passage (31).