Abstract: A structure for supporting a bellows (1) from the inside has a guiding track (8) provided inside the bellows and extending in the axial direction of the bellows. A moving member (10) is provided so as to be movable in the bellows' axial direction on the guiding track. The moving member and the bellows are connected by an intermediate supporting member (5).

Abstract: A gate valve apparatus of a vacuum processing system includes a surrounding wall that defines a transfer space and has a transfer port. A first valve seat is defined around the transfer port. A valve body is movable within the surrounding wall to open/close the transfer port. A first seal member is disposed on the valve body to engage with the first valve seat. A maintenance port is formed in the surrounding wall to perform maintenance of the first seal member. A second valve seat is defined around the maintenance port. A second seal member is disposed around the first seal member on the valve body to engage with the second valve seat. A maintenance cover is detachably attached outside to close the maintenance port. A driving mechanism drives the valve body within the surrounding wall.

Abstract: A transfer device 17 in a semiconductor processing system includes first and second actuation mechanisms 9A, 9having first and second support sections movable on first and second vertical planes, respectively, the latter being parallel with each other. First and second movable blocks 18A, 18B are supported on the first and second support sections so that they may be horizontally moved by the first and second actuation mechanisms. Disposed on the first and second movable blocks are first and second handling mechanism 19A, 19B capable of extension and contraction for handling a processing subject substrate W. A control section 20 controls the operation of the first and second actuation mechanisms so that the first and second movable blocks may not interfere with each other.

Abstract: A lid apparatus for opening/closing an opening (12) of a main body (8) includes a lid (14) with working and back faces. An arm (24) attaches the lid (14) to the main body (8) to be operable for opening/closing. The arm (24) includes a first axis (26) pivotally supporting the arm (24) on the main body (8) around the opening (12), and a second axis (34) swingably supporting the back face of the lid (14) on the arm (24). The second axis (34) is between the gravity center (C1) of the lid (14) and the first axis (26). A regulatory member (50) intervenes between the arm (24) and the back face of the lid (14), and regulates the distance therebetween, at a regulatory position between the first and second axes (26, 34), to set the working face of the lid (14) in parallel with the opening (12).

Abstract: Processing chambers (3A-3F) for applying a process to a substrate W housed therein are provided at a periphery of a conveying chamber 2. A conveying case (4) houses the substrate (W) in a state isolated from an outside atmosphere. The conveyance case (4) has a gate valve (30) and a transfer mechanism (22). A conveying mechanism (5) supports the conveyance case 4, and carries the conveyance case (4) to a position for conveying in/conveying out a substrate. The number of processing chambers connectable to a conveying chamber is not limited, and conveyance to the processing chamber can be executed while maintaining a predetermined ambience for an atmosphere of a substrate that is to be processed.

Abstract: A supporting mechanism (12A) is used for transferring a target substrate (W) in cooperation with a transfer arm (32), in a semiconductor processing system. The supporting mechanism includes first and second holding portions (38A to 38C, 40A to 40C) each configured to be moved up and down and transfer a substrate to and from the transfer arm. The first and second holding portions are configured to be moved relative to each other in a vertical direction without spatially interfering with each other, and support substrates at substantially the same horizontal coordinate position. The supporting mechanism further includes first and second drives (46, 48) configured to move the first and second holding portions up and down, and a controller (68) configured to control the first and second drives. The controller is arranged to control the first and second drives to alternatively support a substrate by the first and second holding portions.

Abstract: A semiconductor processing system, wherein a carrying base table 30 is installed in a carrying mechanism 26 for carrying a processed substrate W to a processing device, first and second holing arms 32A and 32B are slidably installed parallel with each other on the carrying base table 30, and the first and second support arms 32A and 32B having first and second holding surfaces 33A and 33B for holding the processed substrate W are substantially positioned on the same plate and operated so that the first and second holding surfaces 33A and 33B can be projected in the same direction relative to the carrying base table 30.

Abstract: An LCD substrate transfer apparatus includes an articulated arm unit attached to a support base, to be rotatable and stretchable/retractable within a horizontal plane. The articulated arm unit has a distal end arm, which reciprocates in a transfer direction upon stretching/retracting operation of the articulated arm unit. A support member is arranged on the distal end arm to support an LCD substrate. The support member is attached to the distal end arm to be reciprocatable in the transfer direction. A pair of temporary shelves for supporting the LCD substrate are disposed to sandwich the support member when the articulated arm unit and support member retract. The LCD substrate is placed on the temporary shelves, and only the articulated arm unit is rotated to switch the transfer directions.

Abstract: A system for conveying LCD glass substrates 100 traveling between processing devices 210, 220 and 230 and conveying LCD glass substrates. The conveyor system 100 includes an upper conveyor 110 for conveying LCD glass substrates in the feeding direction between processing devices, a lower conveyor 120 arranged so as to form a multi-storied structure together with the upper conveyor for conveying LCD glass substrates in the return direction between processing devices, and a vertical conveyor for vertically conveying LCD glass substrates from the upper conveyor to the lower conveyor or vice versa. The vertical conveyor is provided with a plurality of conveyor tables, of which each is able to support the a LCD glass substrate from the underside thereof and moving it up and down linking to each other. One conveyor table forms a part of the upper conveyor while the another conveyor table forms a part of the lower conveyor.

Abstract: A system for conveying LCD glass substrates 100 traveling between processing devices 210, 220 and 230 and conveying LCD glass substrates. The conveyor system 100 includes an upper conveyor 110 for conveying LCD glass substrates in the feeding direction between processing devices, a lower conveyor 120 arranged so as to form a multi-storied structure together with the upper conveyor for conveying LCD glass substrates in the return direction between processing devices, and a vertical conveyor for vertically conveying LCD glass substrates from the upper conveyor to the lower conveyor or vice versa. The vertical conveyor is provided with a plurality of conveyor tables, of which each is able to support the a LCD glass substrate from the underside thereof and moving it up and down linking to each other. One conveyor table forms a part of the upper conveyor while the another conveyor table forms a part of the lower conveyor.

Abstract: Two pairs of lifters 9A and two pairs of lifters 9B are arranged on a table 7 in a processing chamber 2. In a transporting chamber 3 communicating with the processing chamber 2, a transporting mechanism 10 of an articulated robot is provided with a catch plate 10E in a single stage arrangement. The elevation of a rotating spindle 10A of the transporting mechanism 10 allows the catch plate 10E to be moved up and down. By rising and falling the catch plate 10E while stopping the lifters 9A, 9B, it is possible to transfer a substrate between the catch plate 10E and the lifters 9A or between the catch plate 10E and the lifters 9B.

Abstract: In a semiconductor processing apparatus, an external transfer mechanism transfers substrates between a cassette for storing a plurality of target substrates by vertically arranging the substrates at first intervals, and a processing section for performing semiconductor processing for the substrates. The external transfer mechanism has first and second arms defining first and second support surfaces each of which can support one of the substrates and capable of vertically moving relative to each other. An interval adjuster is disposed to adjust an interval in a vertical direction between the first and second support surfaces by moving the first and second arms relative to each other. An arm driving base is disposed to move the first and second arms between a position at which the first and second arms oppose the cassette and a position at which the first and second arms oppose the processing section.

Abstract: A device for transferring a LCD substrate under a reduced pressure atmosphere comprises a first stage on which the LCD substrate is mounted such that the surface of the LCD substrate is substantially horizontal, a multi-joint arm mechanism for mounting the LCD substrate on a second stage of a delivery position after moving the first stage in substantially horizontal plane, a mechanism for pushing the LCD substrate on the first and second stages, and for positioning the LCD substrate at a home position.