Abstract: A circulating EFEM includes an introduction port for introducing a gas, a housing for circulating the introduced gas, and a discharge port for discharging the gas from the housing into a discharge pipe. The discharge port includes a box and a damper. The box is disposed to surround a discharge opening formed on the housing and connected to the discharge pipe. The damper is disposed inside the box to close and open the discharge port and adjusts a discharge amount of the gas via the discharge opening by at least partially moving in response to a differential pressure between the housing and the box.

Abstract: An EFEM includes first and second chambers, an airflow formation unit, a gas discharge port, and first and second nozzles. The first chamber introduces a replacement gas. The second chamber is connected with the first chamber via first and second communication sections. In the first communication section, a filter is disposed, and the replacement gas inflows from the first chamber. In the second communication section, the replacement gas outflows into the first chamber. The airflow formation unit produces a circulating airflow between the first and second chambers. The gas discharge port discharges an internal gas from the first or second chamber. The first nozzle discharges the replacement gas supplied from a replacement gas supply source into the first chamber through a first opening. The second nozzle discharges the replacement gas supplied from the source through a second opening.

Abstract: An EFEM includes first and second chambers, an airflow formation unit, and a gas discharge port. The first chamber includes a dry air introduction port. The second chamber is connected with a lower part of the first chamber and includes an openable door. The airflow formation unit produces a circulating airflow between the first and second chambers. The gas discharge port discharges a gas of the second chamber therefrom. The first and second chambers are connected via first and second communication sections. In the first communication section, a filter is disposed, and an airflow from the first chamber to the second chamber is generated. In the second communication section, a ventilation state is changed by a ventilation state switchable unit, and an airflow from the second chamber to the first chamber is generated.

Abstract: A circulating EFEM includes an introduction port for introducing a gas, a housing for circulating the introduced gas, and a discharge port for discharging the gas from the housing into a discharge pipe. The discharge port includes a box and a damper. The box is disposed to surround a discharge opening formed on the housing and connected to the discharge pipe. The damper is disposed inside the box to close and open the discharge port and adjusts a discharge amount of the gas via the discharge opening by at least partially moving in response to a differential pressure between the housing and the box.

Abstract: A circulating EFEM includes an introduction port for introducing a gas, a housing for circulating the introduced gas, and a discharge port for discharging the gas from the housing into a discharge pipe. The discharge port includes a box and a damper. The box is disposed to surround a discharge opening formed on the housing and connected to the discharge pipe. The damper is disposed inside the box to close and open the discharge port and adjusts a discharge amount of the gas via the discharge opening by at least partially moving in response to a differential pressure between the housing and the box.

Abstract: A controlling method for a wafer transportation part and a load port part on an EFEM includes a fixing step of fixing a container on an installation stand of the load port part, a first cleaning step of connecting a bottom nozzle of the load port part to multiple bottom holes formed on a bottom surface of the container and introducing a cleaning gas into the container and discharging a gas from the container via the nozzle, a connection step of connecting the container and the transportation room, and a wafer transportation step of transporting the wafer from the container to a processing room via the opening and the transportation room and transporting the wafer from the processing room to the container via the transportation room and the opening.

Abstract: A circulating EFEM includes an introduction port for introducing a gas, a housing for circulating the introduced gas, and a discharge port for discharging the gas from the housing into a discharge pipe. The discharge port includes a box and a damper. The box is disposed to surround a discharge opening formed on the housing and connected to the discharge pipe. The damper is disposed inside the box to close and open the discharge port and adjusts a discharge amount of the gas via the discharge opening by at least partially moving in response to a differential pressure between the housing and the box.

Abstract: A mini-environment apparatus includes a wafer transportation machine transporting a wafer, a wafer transportation room having the machine and passed by the wafer transported to a processing room, a circulating passage where a gas detoured from the transportation room flows, a blowing means forming a circulating current falling in the transportation room and rising in the passage, a current member arranged in a ceiling part of the transportation room and laminarizing the current and introducing this laminarized current into the transportation room, a particle removal filter arranged in either the ceiling part of the transportation room or the passage, and a chemical filter arranged in the passage detachably and separately from the removal filter. The chemical filter is arranged at a position lower than a lowest position where the wafer may pass through in the transportation room.

Abstract: An EFEM includes a wafer transportation part having a wafer transportation room passed by a wafer transported to a processing room and a load port part airtightly connecting a main opening formed on a container housing the wafer to the room. The transportation part includes a downward current forming device for forming a downward current in the room and a current plate arranged in the room and partly introducing the current into the container connected to the room via the opening. The load port part includes an installation stand for installing the container, a bottom nozzle for communicating with a bottom hole formed at a position distant from the opening more than a bottom surface middle on a bottom surface of the container, and a gas discharge passage for discharging a gas in the container to an outside thereof via the nozzle.

Abstract: An EFEM includes first and second chambers, an airflow formation unit, and a gas discharge port. The first chamber includes a dry air introduction port. The second chamber is connected with a lower part of the first chamber and includes an openable door. The airflow formation unit produces a circulating airflow between the first and second chambers. The gas discharge port discharges a gas of the second chamber therefrom. The first and second chambers are connected via first and second communication sections. In the first communication section, a filter is disposed, and an airflow from the first chamber to the second chamber is generated. In the second communication section, a ventilation state is changed by a ventilation state switchable unit, and an airflow from the second chamber to the first chamber is generated.

Abstract: An EFEM includes first and second chambers, an airflow formation unit, a gas discharge port, and first and second nozzles. The first chamber introduces a replacement gas. The second chamber is connected with the first chamber via first and second communication sections. In the first communication section, a filter is disposed, and the replacement gas inflows from the first chamber. In the second communication section, the replacement gas outflows into the first chamber. The airflow formation unit produces a circulating airflow between the first and second chambers. The gas discharge port discharges an internal gas from the first or second chamber. The first nozzle discharges the replacement gas supplied from a replacement gas supply source into the first chamber through a first opening. The second nozzle discharges the replacement gas supplied from the source through a second opening.

Abstract: A load port device includes an installation stand, an opening and closing part, a gas introduction part, and a gas discharge part. The installation stand installs a container whose side surface has a main opening for taking in and out a wafer. The opening and closing part opens and closes the main opening. The gas introduction part introduces a cleaning gas from the main opening into the container. The gas discharge part has a bottom nozzle capable of communicating with a bottom hole formed at a position distant from the main opening more than a bottom surface middle on a bottom surface of the container. The gas discharge part is capable of discharging a gas in the container to an outside of the container.

Abstract: A controlling method for a wafer transportation part and a load port part on an EFEM includes a fixing step of fixing a container on an installation stand of the load port part, a first cleaning step of connecting a bottom nozzle of the load port part to multiple bottom holes formed on a bottom surface of the container and introducing a cleaning gas into the container and discharging a gas from the container via the nozzle, a connection step of connecting the container and the transportation room, and a wafer transportation step of transporting the wafer from the container to a processing room via the opening and the transportation room and transporting the wafer from the processing room to the container via the transportation room and the opening.

Abstract: A mini-environment apparatus includes a wafer transportation machine transporting a wafer, a wafer transportation room having the machine and passed by the wafer transported to a processing room, a circulating passage where a gas detoured from the transportation room flows, a blowing means forming a circulating current falling in the transportation room and rising in the passage, a current member arranged in a ceiling part of the transportation room and laminarizing the current and introducing this laminarized current into the transportation room, a particle removal filter arranged in either the ceiling part of the transportation room or the passage, and a chemical filter arranged in the passage detachably and separately from the removal filter. The chemical filter is arranged at a position lower than a lowest position where the wafer may pass through in the transportation room.

Abstract: A load port device includes an installation stand, an opening and closing part, a gas introduction part, and a gas discharge part. The installation stand installs a container whose side surface has a main opening for taking in and out a wafer. The opening and closing part opens and closes the main opening. The gas introduction part introduces a cleaning gas from the main opening into the container. The gas discharge part has a bottom nozzle capable of communicating with a bottom hole formed at a position distant from the main opening more than a bottom surface middle on a bottom surface of the container. The gas discharge part is capable of discharging a gas in the container to an outside of the container.

Abstract: An EFEM includes a wafer transportation part having a wafer transportation room passed by a wafer transported to a processing room and a load port part airtightly connecting a main opening formed on a container housing the wafer to the room. The transportation part includes a downward current forming device for forming a downward current in the room and a current plate arranged in the room and partly introducing the current into the container connected to the room via the opening. The load port part includes an installation stand for installing the container, a bottom nozzle for communicating with a bottom hole formed at a position distant from the opening more than a bottom surface middle on a bottom surface of the container, and a gas discharge passage for discharging a gas in the container to an outside thereof via the nozzle.

Abstract: To suppress deformation of a portion to be clamped even when a load applied to the portion to be clamped is increased at the time of fixing a front opening unified pod (FOUP), a clamping arm pivotable between a retracting position and a clamping position about a rotational axis inclined relative to a bottom surface of the FOUP is arranged. The clamping arm is housed in a housing depression so that the clamping arm at the retracting position is situated below a surface of a mount base, and at the clamping position, protrudes from the surface of the mount base and becomes engageable with the portion to be clamped.

Abstract: Adjacent to an opening portion in an FISM system is provided an enclosure that encloses the operation space of a door and has a second opening portion opposed to the opening portion. A curtain nozzle is provided above the upper edge of the opening portion in the upper portion in the enclosure. A purge gas is supplied from the curtain nozzle along a direction from the upper edge to the lower edge of the opening portion. In addition, a gas outlet through which the purge gas flows from the interior of the enclosure out into the exterior is provided on the wall of the enclosure to which the purge gas flowing in the above described direction is directed, whereby an increase in the partial pressure of oxidizing gases in the interior of the FOUP is prevented.

Abstract: The substrate storage pod includes a pod case for housing a substrate, and an opening, a lid member which closes and seals the opening, a buffer space which is defined in the lid member, an air-supply port for supplying a replacement gas into the buffer space; and multiple holes which are arranged so as to establish communication between the buffer space and an inner plate of the lid member in a state of being fit-inserted to the opening of the pod case, for sending out the replacement gas into the hollow inner space, the replacement gas having been supplied into the buffer space, the inner plate facing the hollow inner space of the pod case. With this, pressure variation of the replacement gas in supply pipes is blocked, and hence replacement-gas flow in a stable laminar state free from disturbance can be obtained.

Abstract: The substrate storage pod includes an engagement portion in an outer side surface of a lid of the pod, and an insertion slot through which the engagement portion can be accessed from an external space; the insertion slot is formed in a flange portion arranged around the periphery of an opening in the pod and into which the lid can be fitted, and a latch mechanism supported so as to be slidable in a direction parallel to a flange side wall in a pod main body-surface of the flange portion. An engaging portion of the latch mechanism reaches the engagement portion via the insertion slot. The engagement portion is switched between an engaged state and a non-engaged state in response to movement of the latch mechanism.