Patents by Inventor Tsutomu Takai

Tsutomu Takai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6139991
    Abstract: An electrolyte solution for a lithium secondary battery comprising a non-aqueous solvent, and an electrolyte and a carbonic ester derivative both dissolved therein, said carbonic ester derivative having the formula (I): ##STR1## wherein R.sup.1, R.sup.2 and R.sup.3 independently represent an alkyl group having 1 to 12 carbon atoms, a cycloalkyl group having 3 to 6 carbon atoms, or an aryl group having 6 to 12 carbon atoms, provided that R.sup.2 may be a hydrogen atom and provided that R.sup.1 and R.sup.2 may be connected through a methylene group to form a cycloalkyl group having 3 to 6 carbon atoms.
    Type: Grant
    Filed: August 21, 1998
    Date of Patent: October 31, 2000
    Assignee: Ube Industries, Ltd.
    Inventors: Toshikazu Hamamoto, Atsuo Hitaka, Yukio Nakada, Koji Abe, Tsutomu Takai
  • Patent number: 4806987
    Abstract: A projection-exposing apparatus comprises a projecting optical system for projecting an image of a reticle having a predetermined pattern onto a wafer, and a stage for causing a relative shifting movement between a position of the wafer and a position of the reticle. A first exposure is effected for projecting and exposing the reticle image pattern from the projection optical system in a first area on the wafer and then the stage is shifted by a predetermined amount to effect second exposure for projecting and exposing the reticle image pattern in a second area positioned adjacent to the first area on the wafer thereby the reticle image being projected and exposed onto different areas on the same wafer. The stage causes the relative shifting movement between the reticle and the wafer in such a manner that the reticle image pattern obtained by the first exposure and the reticle image pattern obtained by the second exposure are overlapped with each other on the wafer by a predetermined amount.
    Type: Grant
    Filed: December 21, 1987
    Date of Patent: February 21, 1989
    Assignee: Nikon Corporation
    Inventors: Takashi Mori, Koichi Matsumoto, Tsutomu Takai, Masaichi Murakami, Kyoichi Suwa