Patents by Inventor Tsuyoshi Matsuka

Tsuyoshi Matsuka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20050082515
    Abstract: Using a mixture of (BAYTRON P) of PEDT (polyethylene dioxythiophene) and PSS (polystyrene sulfonic acid) as a hole transportation material and using water and ethanol as polar solvents, a coating composition having a contact angle of 35 degrees or smaller with respect to an ITO layer is obtained. The coating composition is then poured for coating upon exposed surfaces of first electrodes (ITO) 4R, 4G and 4B enclosed by barrier walls 6. Thus applied coating composition uniformly spreads all over the first electrodes 4R, 4G and 4B. As the coating composition naturally dries at a room temperature for about fifteen seconds, the solvents are removed from the coating composition.
    Type: Application
    Filed: August 26, 2004
    Publication date: April 21, 2005
    Inventors: Mikio Masuichi, Tsuyoshi Matsuka, Yukihiro Takamura, Masafumi Kawagoe
  • Publication number: 20030155077
    Abstract: A substrate processing apparatus performing prescribed processing on a substrate is provided with a CD measuring unit serving as an inspection unit, an asher unit serving as a regenerative processing unit and a cleaning unit performing cleaning. After the substrate processing apparatus performs resist coating, exposure, development and the like on the substrate and terminates the development, a transport robot transfers the substrate to the CD inspection unit so that the CD inspection unit inspects whether or not the line width of a resist film formed through the development is within the range of a prescribed value. The transport robot transfers a substrate having a line width deviating from the prescribed value to the asher unit so that the asher unit regenerates the substrate by removing the resist film, the cleaning unit cleans the substrate and thereafter the substrate processing apparatus performs prescribed processing again.
    Type: Application
    Filed: January 24, 2003
    Publication date: August 21, 2003
    Applicant: Dainippon Screen Mfg. Co., Ltd.
    Inventors: Akihiro Hisai, Tsuyoshi Matsuka, Koji Kaneyama
  • Patent number: 5520857
    Abstract: A liquid agent evaporator includes a sealed container accommodating a liquid agent therein and having a generally flat upper internal face and a vapor outlet, a carrier gas feeder for feeding the carrier gas into the sealed container, and a carrier gas blower provided in the upper internal surface of the sealed container for blowing the carrier gas fed from the carrier gas feeder so that the blown carrier gas comes into contact with substantially the entirety of the upper internal surface of the sealed container. The carrier gas blower is provided, for example, at the center of the upper internal surface of the sealed container and blows the carrier gas radially at an initial velocity directed at least to the upper internal surface side of the sealed container. The carrier gas blower can include a gas blow tube which is communicated with a gas feed tube and has a plurality of gas outlets formed on the top face side of the gas blow tube.
    Type: Grant
    Filed: January 20, 1995
    Date of Patent: May 28, 1996
    Assignee: Dainippon Screen Mfg. Co., Ltd.
    Inventors: Tsuyoshi Matsuka, Akira Izumi, Tsutomu Takeuchi