Patents by Inventor Vadim Banine

Vadim Banine has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8279397
    Abstract: A method and an optical arrangement for removing contamination on optical surfaces (26), which are arranged in a vacuum environment in an optical arrangement, preferably in a projection exposure apparatus (1) for EUV lithography. The method includes generating a residual gas atmosphere containing molecular hydrogen (18) and at least one inert gas (17) in the vacuum environment, generating inert gas ions (21) by ionization of the inert gas (17), preferably with EUV radiation (20), and generating atomic hydrogen (27) by acceleration of the inert gas ions (21) in the residual gas atmosphere, to remove the contamination.
    Type: Grant
    Filed: May 20, 2009
    Date of Patent: October 2, 2012
    Assignees: Carl Zeiss SMT GmbH, ASML Netherlands B.V.
    Inventors: Dirk Heinrich Ehm, Johannes Hubertus Josephina Moors, Bastiaan Theodoor Wolschrijn, Vadim Banine, Vladimir Vitalevitsch Ivanov
  • Publication number: 20120147350
    Abstract: A transmissive spectral purity filter configured to transmit extreme ultraviolet radiation includes a filter part having a plurality of apertures to transmit extreme ultraviolet radiation and to suppress transmission of a second type of radiation. The apertures may be manufactured in semiconductor material such as silicon by an anisotropic etching process. The semiconductor material is provided with a hydrogen-resistant layer, such as silicon nitride Si3N4, silicon dioxide SiO2, or silicon carbide SiC.
    Type: Application
    Filed: May 11, 2010
    Publication date: June 14, 2012
    Applicant: ASML NETHERLANDS B.V
    Inventors: Andrei Yakunin, Vadim Banine, Denis Glushkov
  • Publication number: 20090314931
    Abstract: A method and an optical arrangement for removing contamination on optical surfaces (26), which are arranged in a vacuum environment in an optical arrangement, preferably in a projection exposure apparatus (1) for EUV lithography. The method includes generating a residual gas atmosphere containing molecular hydrogen (18) and at least one inert gas (17) in the vacuum environment, generating inert gas ions (21) by ionization of the inert gas (17), preferably with EUV radiation (20), and generating atomic hydrogen (27) by acceleration of the inert gas ions (21) in the residual gas atmosphere, to remove the contamination.
    Type: Application
    Filed: May 20, 2009
    Publication date: December 24, 2009
    Applicants: Carl Zeiss SMT AG, ASML NETHERLANDS B.V.
    Inventors: Dirk Heinrich EHM, Johannes Hubertus Josephina MOORS, Bastiaan Theodoor WOLSCHRIJN, Vadim BANINE, Valdimir Vitalevitsch IVANOV
  • Publication number: 20070258086
    Abstract: The invention relates to a method and device of inspecting contamination particles on an object comprising a patterned structure. The device includes a radiation system for directing a radiation beam to the object. The object is configured to scatter the beam. The device also includes an optical system arranged to receive scattered radiation from the object, and a filter provided in the optical system. The filter is associated with the patterned structure so as to filter out radiation from the scattered radiation. The device also includes a detector arranged to detect a fraction of radiation that is transmitted by the filter. Accordingly, contamination particles may be detected quickly and accurately.
    Type: Application
    Filed: May 5, 2006
    Publication date: November 8, 2007
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Arno Bleeker, Vadim Banine, Johannes Onvlee, Jacques Van Der Donck, Michiel Oderwald
  • Publication number: 20070259275
    Abstract: An EUV mask includes, on top of a multi-layer mirror, a spectral purity enhancement layer, for application in an EUV lithographic apparatus. On top of the spectral purity enhancement layer, a patterned absorber layer is provided. The spectral purity enhancement layer includes a first spectral purity enhancement layer, but between the multi-layer mirror and first spectral purity enhancement layer there may be an intermediate layer or a second spectral purity enhancement layer and intermediate layer. The patterned absorber layer may also itself function as an anti-reflection (AR) coating. The AR effect of this absorber layer is a function of the aperture sizes in the pattern. The spectral purity of a mask may be enhanced, such that DUV radiation is diminished relatively stronger than EUV radiation.
    Type: Application
    Filed: May 5, 2006
    Publication date: November 8, 2007
    Applicant: ASML Netherlands B.V.
    Inventors: Maarten Marinus Johannes Van Herpen, Vadim Banine, Koen Schenau, Derk Klunder
  • Publication number: 20070158579
    Abstract: An optical apparatus includes an illumination system configured to form a pulsed radiation beam, an optical element with a surface on which the radiation beam is incident in operation, and a gas source arranged to supply a mixture of a first type of gas and a second type of gas to a space adjacent the surface. Particles of the first and second types of gas are capable of reacting with the surface, when activated by the radiation beam. The gas source is configured to generate a combination of surface occupation numbers of molecules of the first and second types of gas on the surface under operating conditions, at least prior to pulses of the radiation beam, the combination of surface occupation numbers lying in a range in which reactions of particles with the surface during pulses of the radiation beam are in majority reversed.
    Type: Application
    Filed: December 22, 2006
    Publication date: July 12, 2007
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Johannes Moors, Vadim Banine, Bastiaan Wolschrijn, Carolus Antonius Spee, Rik Jansen
  • Publication number: 20070152175
    Abstract: A radiation source generates short-wavelength radiation, such as extreme ultraviolet radiation, for use in lithography. Rotating electrodes are provided which dip into respective baths of liquid metal, for example, tin. An electrical discharge is produced between the electrodes to generate the radiation. Holes are provided in the electrodes and/or in a metal shielding plate around the electrodes to enable better pumping down to low pressure in the vicinity of the discharge to improve the conversion efficiency of the source. The holes in the electrodes improve cooling of the electrodes by causing stirring of the liquid metal, and by improving the thermal and electrical contact between the electrodes and the liquid metal. Improved electrical contact also reduces the time-constant of the discharge circuit, thereby further improving the conversion efficiency of the source.
    Type: Application
    Filed: December 29, 2005
    Publication date: July 5, 2007
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Johannes Moors, Vadim Banine, Johannes Christiaan Franken, Vladimir Ivanov, Konstantin Koshelev, Alexander Struycken
  • Publication number: 20070145296
    Abstract: A cleaning arrangement for a lithographic apparatus module may be provided in a collector. The cleaning arrangement includes a hydrogen radical source configured to provide a hydrogen radical containing gas to at least part of the module and a pump configured to pump gas through the module such that a flow speed of the hydrogen radical containing gas provided through at least part of the module is at least 1 m/s. The cleaning arrangement may also include a gas shutter configured to modulate a flow of the hydrogen radical containing gas to at least part of the module, a buffer volume of at least 1 m3 in communication with the module, and a pump configured to provide a gas pressure in the buffer volume between 0.001 mbar (0.1 Pa) and 1 mbar (100 Pa).
    Type: Application
    Filed: December 22, 2005
    Publication date: June 28, 2007
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Johannes Freriks, Vadim Banine, Vladimir Ivanov
  • Publication number: 20070145295
    Abstract: A cleaning arrangement is configured to clean an EUV optic of an EUV lithographic apparatus. The partial radical pressure ranges between 0.1-10 Pa. The cleaning arrangement can be configured inside a cleaning cocoon of the lithographic apparatus for offline cleaning. It can also be configured at particular positions inside the apparatus to clean nearby optics during production. In the pressure range of 0.1-10 Pa the penetration of atomic hydrogen into the optical devices is high, while the recombination to molecular hydrogen and hydrogen consumption is limited.
    Type: Application
    Filed: December 8, 2005
    Publication date: June 28, 2007
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Vadim Banine, Vladimir Ivanov, Johannes Josephina Moors, Bastiaan Wolschrijn, Derk Jan Klunder, Maarten Johannes Wilhelmus Van Herpen
  • Publication number: 20070146660
    Abstract: The invention relates to a lithographic apparatus that includes a system configured to condition a radiation beam or project a patterned radiation beam onto a target portion of a substrate. The system includes an optically active device configured to direct the radiation beam or the patterned radiation beam, respectively, and a support structure configured to support the optically active device. The apparatus further includes a gas supply for providing a background gas into the system. The radiation beam or patterned radiation beam react with the background gas to form a plasma that includes a plurality of ions. The support structure includes an element that includes a material that has a low sputtering yield, a high sputter threshold energy, or a high ion implantation yield, to reduce sputtering and the creation of sputtering products.
    Type: Application
    Filed: December 28, 2005
    Publication date: June 28, 2007
    Applicants: ASML NETHERLANDS B.V., CARL ZEISS SMT AG
    Inventors: Marc Lorenz Van Der Velden, Vadim Banine, Bastiaan Mertens, Johannes Josephina Moors, Markus Weiss, Bastiaan Wolschrijn, Michiel Nijkerk
  • Publication number: 20070146659
    Abstract: A lithographic apparatus includes a radiation system for providing a beam of radiation. The radiation system includes at least one of a contaminant trap for trapping material emanating from the radiation source and a collector for collecting the beam of radiation. The at least one of the contaminant trap and the collector includes an element arranged in the path of the radiation beam on which the material emanating from the radiation source can deposit during propagation of the radiation beam in the radiation system. At least a part of the element disposed in the path of the radiation beam has a surface that has a highly specular grazing incidence reflectivity to reduce the absorption of the radiation beam in a direction of propagation of the radiation beam substantially non-parallel to the surface of the element, so that a thermal load experienced by the element is reduced.
    Type: Application
    Filed: December 28, 2005
    Publication date: June 28, 2007
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Derk Jan Klunder, Levinus Bakker, Vadim Banine, Frank Jeroen Schuurmans, Dominik Vaudrevange, Maarten Marinus Wilhelmus Van Herpen
  • Publication number: 20070138414
    Abstract: A lithographic apparatus is disclosed. The apparatus includes a projection system configured to project a first radiation beam onto a target portion of a substrate, and at least one monitoring device for detecting contamination in a interior space. The monitoring device includes at least one dummy element having at least one contamination receiving surface. In an aspect of the invention, there is provided at least one dummy element which does not take part in transferring a radiation beam onto a target portion of a substrate, wherein it is monitored whether a contamination receiving surface of the dummy element has been contaminated.
    Type: Application
    Filed: December 20, 2005
    Publication date: June 21, 2007
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Lucas Stevens, Vadim Banine, Johannes Moors, Bastiaan Wolschrijn
  • Publication number: 20070140910
    Abstract: A system for detecting at least one contamination species in an interior space of a lithographic apparatus, including: at least one monitoring surface configured to be in contact with the interior space, a thermal controller configured to control the temperature of the monitoring surface to at least one detection temperature, and at least one detector configured to detect condensation of the at least one contamination species onto the monitoring surface.
    Type: Application
    Filed: December 20, 2005
    Publication date: June 21, 2007
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Vadim Banine, Levinus Bakker, Ralph Kurt, Johannes Moors, Lucas Stevens, Peter Zalm
  • Publication number: 20070131878
    Abstract: A lithographic apparatus includes a collector configured to collect radiation from a radiation source, the collector including a plurality of shells forming separate compartments, and a cleaning arrangement including a gas inlet and a gas outlet, the cleaning arrangement being configured to clean surfaces of the plurality of shells by guiding a gas flow from the inlet through the compartments to the outlet. The cleaning arrangement includes a distribution system configured to divide the gas flow into several sub flows, each of the sub flows corresponding to one or more of the compartments, and a control system configured to control the relative amount of the sub flows.
    Type: Application
    Filed: December 8, 2005
    Publication date: June 14, 2007
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Vadim Banine, Sonia Skelly, Derk Klunder, Maarten Marinus Wilhelmus Van Herpen
  • Publication number: 20070085984
    Abstract: A lithographic projection apparatus includes a radiation system configured to supply a beam of radiation; a mask table provided with a mask holder for holding a mask; a substrate table provided with a substrate holder for holding a substrate; a projection system configured to image an irradiated portion of the mask onto a target portion of the substrate, wherein the projection system is separated from the substrate table by an intervening space that is at least partially evacuated and is delimited at the location of the projection system by a solid surface from which the employed radiation is directed toward the substrate table; the intervening space contains a hollow tube located between the solid surface and the substrate table and situated around the path of the beam of radiation, the tube being configured such that beam of radiation focused by the projection system onto the substrate table does not intercept a wall of the hollow tube; a flushing system is configure to continually flush the inside of the h
    Type: Application
    Filed: October 18, 2005
    Publication date: April 19, 2007
    Applicant: ASML Netherlands B.V.
    Inventors: Vadim Banine, Vladimir Ivanov, Bastiaan Mertens, Johannes Hubertus Moors, Bastiaan Wolschrijn
  • Publication number: 20070069160
    Abstract: A collector assembly with a radiation collector, a cover plate and a support member connecting the radiation collector to the cover plate are provided. The cover plate is designed to cover an opening in a collector chamber. The collector chamber opening may be large enough to pass the radiation collector and the support member. The removed radiation collector can be cleaned with different cleaning procedures, which may be performed in a cleaning device. Such cleaning device may for example consist of the following: a circumferential hull designed to provide an enclosure volume for circumferentially enclosing at least the radiation collector; an inlet configured to provide at least one of a cleaning gas and a cleaning liquid to the enclosure volume to clean at least said radiation collector; and an outlet configured to remove said at least one of said cleaning gas and said cleaning liquid from the enclosure volume.
    Type: Application
    Filed: September 27, 2005
    Publication date: March 29, 2007
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Vadim Banine, Lambertus Wildenberg, Vladimir Krivtsun, Alexander Struycken, Johannes Ridder, Vladimir Ivanov, Josephus Smits
  • Publication number: 20070069162
    Abstract: A collector assembly with a radiation collector, a cover plate and a support member connecting the radiation collector to the cover plate are provided. The cover plate is designed to cover an opening in a collector chamber. The collector chamber opening may be large enough to pass the radiation collector and the support member. The removed radiation collector can be cleaned with different cleaning procedures, which may be performed in a cleaning device. Such cleaning device may for example consist of the following: a circumferential hull designed to provide an enclosure volume for circumferentially enclosing at least the radiation collector; an inlet configured to provide at least one of a cleaning gas and a cleaning liquid to the enclosure volume to clean at least said radiation collector; and an outlet configured to remove said at least one of said cleaning gas and said cleaning liquid from the enclosure volume.
    Type: Application
    Filed: September 27, 2006
    Publication date: March 29, 2007
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Vadim Banine, Vladimir Ivanov, Josephus Smits, Harm-Jan Voorma, Lambertus Adrianus Den Wildenberg, Vladimir Krivtsun, Alexander Struycken, Carolus Ida Antonius Spee, Klaas Timmer, Johannes Ridder
  • Publication number: 20070069159
    Abstract: A device for generating radiation source based on a discharge includes a cathode and an anode. A discharge is created in a material comprising an alloy of two or more substances.
    Type: Application
    Filed: September 22, 2006
    Publication date: March 29, 2007
    Applicant: ASML Netherlands B.V.
    Inventors: Vadim Banine, Vladimir Ivanov, Konstantin Koshelev, Robert Gayazov, Vladimir Krivtsun
  • Publication number: 20070062557
    Abstract: A method for cleaning elements of a lithographic apparatus, for example optical elements such as a collector mirror, includes providing a gas containing nitrogen; generating nitrogen radicals from at least part of the gas, thereby forming a radical containing gas; and providing at least part of the radical containing gas to the one or more elements of the apparatus. A lithographic apparatus includes a source and an optical element, and an electrical discharge generator arranged to generate a radio frequency discharge.
    Type: Application
    Filed: March 6, 2006
    Publication date: March 22, 2007
    Applicant: ASML Netherlands B.V.
    Inventors: Tatyana Rakhimova, Vadim Banine, Vladimir Ivanov, Konstantin Koshelev, Johannes Moors, Aleksander Kovalev, Dmitriy Lopaev
  • Publication number: 20070023706
    Abstract: A lithographic apparatus includes a radiation system including a radiation source for the production of a radiation beam, and a contaminant trap arranged in a path of the radiation beam. The contaminant trap includes a plurality of foils or plates defining channels which are arranged substantially parallel to the direction of propagation of said radiation beam. The foils or plates are oriented substantially radially with respect to an optical axis of the radiation beam. The contaminant trap is provided with a gas injector which is configured to inject gas at least at two different positions directly into at least one of the channels of the contaminant trap.
    Type: Application
    Filed: July 6, 2005
    Publication date: February 1, 2007
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Leonid Sjmaenok, Vadim Banine, Josephus Smits, Lambertus Van De Wildenberg, Alexander Schmidt, Arnoud Wassink, Eric Louis Verpalen, Antonius Van De Pas