Abstract: The plasma reactor of the invention is intended for treating the surfaces of objects such as semiconductor wafers and large display panels, or the like, with plasma. The main part of the plasma reactor is an array of RF antenna cells, which are deeply immersed into the interior of the working chamber. Each antenna cell has a ferromagnetic core with a heat conductor and a coil wound onto the core. The core and coil are sealed in the protective cap. Deep immersion of the antenna cells having the structure of the invention provides high efficiency of plasma excitation, while the arrangement of the plasma cells and possibility of their individual adjustment provide high uniformity of plasma distribution and possibility of adjusting plasma parameters, such as plasma density, in a wide range.

Abstract: Methods and apparatus for improved inductively coupled plasma sources are disclosed. A remote linear plasma source can have a plurality of coil segments operable to power intense localized radiofrequency plasma current channels along inner surfaces of a chamber. A plurality of localized intense plasma current channels within a single chamber provides a relatively large active plasma volume, improves efficiency, and provides for favorable residence time and feed gas distribution in a plasma source. In various embodiments, a remote plasma source operable to generate active species is useful for applications such as chamber cleaning, processing materials, ion, electron, and/or neutral beam sources, gaseous discharge lamps, fluorescent lighting, gaseous lasers, and others.

Abstract: A method and apparatus are provided for processing a substrate with a radiofrequency inductive plasma in the manufacture of a device. The inductive plasma is maintained with an inductive plasma applicator having one or more inductive coupling elements. There are thin windows between the inductive coupling elements and the interior of the processing chamber. Various embodiments have magnetic flux concentrators in the inductive coupling element and feed gas holes interspersed among the inductive coupling elements. The thin windows, magnetic flux concentrators, and interspersed feed gas holes are useful to effectuate uniform processing, high power transfer efficiency, and a high degree of coupling between the applicator and plasma. In some embodiments, capacitive current is suppressed using balanced voltage to power an inductive coupling element.

Abstract: Methods and apparatus to provide efficient and scalable RF inductive plasma processing are disclosed. In some aspects, the coupling between an inductive RF energy applicator and plasma and/or the spatial definition of power transfer from the applicator are greatly enhanced. The disclosed methods and apparatus thereby achieve high electrical efficiency, reduce parasitic capacitive coupling, and/or enhance processing uniformity. Various embodiments comprise a plasma processing apparatus having a processing chamber bounded by walls, a substrate holder disposed in the processing chamber, and an inductive RF energy applicator external to a wall of the chamber. The inductive RF energy applicator comprises one or more radiofrequency inductive coupling elements (ICEs). Each inductive coupling element has a magnetic concentrator in close proximity to a thin dielectric window on the applicator wall.

Abstract: A method and apparatus are provided for processing a substrate with a radiofrequency inductive plasma in the manufacture of a device. The inductive plasma is maintained with an inductive plasma applicator having one or more inductive coupling elements. There are thin windows between the inductive coupling elements and the interior of the processing chamber. Various embodiments have magnetic flux concentrators in the inductive coupling element and feed gas holes interspersed among the inductive coupling elements. The thin windows, magnetic flux concentrators, and interspersed feed gas holes are useful to effectuate uniform processing, high power transfer efficiency, and a high degree of coupling between the applicator and plasma. In some embodiments, capacitive current is suppressed using balanced voltage to power an inductive coupling element.

Abstract: An induction RF fluorescent light lamp capable of providing increased structural support and axial alignment for a power coupler located in a re-entrant cavity of a lamp envelope of the induction RF fluorescent light lamp, the lamp envelope with re-entrant cavity both covered on a partial vacuum side with phosphor and filled with a working gas mixture, the re-entrant cavity having an open entrance end and a closed innermost end, and a pliable spacer positioned between and in contact with both the innermost end of the power coupler and the innermost end of the re-entrant cavity, the pliable spacer having a shape that both provides structural support to prevent movement of the power coupler with respect to the re-entrant cavity and to provide axial alignment of the power coupler to the re-entrant cavity.

Abstract: The plasma reactor of the invention is intended for treating the surfaces of objects such as semiconductor wafers and large display panels, or the like, with plasma. The main part of the plasma reactor is an array of RF antenna cells, which are deeply immersed into the interior of the working chamber. Each antenna cell has a ferromagnetic core with a heat conductor and a coil wound onto the core. The core and coil are sealed in the protective cap. Deep immersion of the antenna cells having the structure of the invention provides high efficiency of plasma excitation, while the arrangement of the plasma cells and possibility of their individual adjustment provide high uniformity of plasma distribution and possibility of adjusting plasma parameters, such as plasma density, in a wide range.

Abstract: The plasma reactor of the invention is intended for treating the surfaces of objects such as semiconductor wafers and large display panels, or the like, with plasma. The main part of the plasma reactor is an array of RF antenna cells, which are deeply immersed into the interior of the working chamber. Each antenna cell has a ferromagnetic core with a heat conductor and a coil wound onto the core. The core and coil are sealed in the protective cap. Deep immersion of the antenna cells having the structure of the invention provides high efficiency of plasma excitation, while the arrangement of the plasma cells and possibility of their individual adjustment provide high uniformity of plasma distribution and possibility of adjusting plasma parameters, such as plasma density, in a wide range.

Abstract: A method and apparatus are provided for processing a substrate with a radiofrequency inductive plasma in the manufacture of a device. The inductive plasma is maintained with an inductive plasma applicator having one or more inductive coupling elements. There are thin windows between the inductive coupling elements and the interior of the processing chamber. Various embodiments have magnetic flux concentrators in the inductive coupling elements and feed gas holes interspersed among the inductive coupling elements. The thin windows, magnetic flux concentrators, and interspersed feed gas holes are useful to effectuate uniform processing, high power transfer efficiency, and a high degree of coupling between the applicator and plasma. In some embodiments, capacitive current is suppressed using balanced voltage to power an inductive coupling element.

Abstract: An induction RF fluorescent lamp configuration providing reduced EMI includes a lamp envelope with a re-entrant cavity both covered on a partial vacuum side with phosphor and filled with a working gas mixture, a tubular ferromagnetic core on the non-vacuum side said re-entrant cavity wound directly on the said core with two windings having different numbers of turns, a first active winding having one end connected to an RF ballast and the other end connected to local ground, and a second passive winding having one end grounded and the other end free.

Abstract: An induction RF fluorescent light lamp capable of providing increased structural support and axial alignment for a power coupler located in a re-entrant cavity of a lamp envelope of the induction RF fluorescent light lamp, the lamp envelope with re-entrant cavity both covered on a partial vacuum side with phosphor and filled with a working gas mixture, the re-entrant cavity having an open entrance end and a closed innermost end, and a pliable spacer positioned between and in contact with both the innermost end of the power coupler and the innermost end of the re-entrant cavity, the pliable spacer having a shape that both provides structural support to prevent movement of the power coupler with respect to the re-entrant cavity and to provide axial alignment of the power coupler to the re-entrant cavity.

Abstract: An induction RF fluorescent lamp configuration provides reduced EMI, including a lamp envelope with a re-entrant cavity both covered on the partial vacuum side with phosphor and filled with a working gas mixture, a tubular ferromagnetic core on the non-vacuum side said re-entrant cavity wound directly on the said core with two windings having different numbers of turns, a first active winding having one end connected to an RF ballast and the other end connected to local ground, and a second passive winding having one end grounded and the other end free.

Abstract: A lamp assembly adapted to operate as one of a total number of lamp assemblies that are connected together in series and connected to a ballast. The lamp assembly comprises an electrodeless, closed-loop, tubular lamp envelope enclosing mercury vapor and a buffer gas, and a transformer core disposed around a portion of the lamp envelope. An input winding is disposed on the transformer core so that it has a particular number of turns, Ninput. An auxiliary winding is disposed on the transformer core so that it has a particular number of turns, Nauxiliary. The auxiliary winding is adapted to connect to the ballast and to couple with the input winding. The ratio of the particular number of turns Ninput to the particular number of turns Nauxiliary is substantially proportional to the total number of lamp assemblies that are adapted to operate in series together.

Abstract: A method and apparatus are provided for processing a substrate with a radiofrequency inductive plasma in the manufacture of a device. The inductive plasma is maintained with an inductive plasma applicator having one or more inductive coupling elements. There are thin windows between the inductive coupling elements and the interior of the processing chamber. Various embodiments have magnetic flux concentrators in the inductive coupling elements and feed gas holes interspersed among the inductive coupling elements. The thin windows, magnetic flux concentrators, and interspersed feed gas holes are useful to effectuate uniform processing, high power transfer efficiency, and a high degree of coupling between the applicator and plasma. In some embodiments, capacitive current is suppressed using balanced voltage to power an inductive coupling element.

Abstract: Methods and apparatus to provide efficient and scalable RF inductive plasma processing are disclosed. In some aspects, the coupling between an inductive RF energy applicator and plasma and/or the spatial definition of power transfer from the applicator are greatly enhanced. The disclosed methods and apparatus thereby achieve high electrical efficiency, reduce parasitic capacitive coupling, and/or enhance processing uniformity. Various embodiments comprise a plasma processing apparatus having a processing chamber bounded by walls, a substrate holder disposed in the processing chamber, and an inductive RF energy applicator external to a wall of the chamber. The inductive RF energy applicator comprises one or more radiofrequency inductive coupling elements (ICEs). Each inductive coupling element has a magnetic concentrator in close proximity to a thin dielectric window on the applicator wall.

Abstract: A lamp assembly adapted to operate as one of a total number of lamp assemblies that are connected together in series and connected to a ballast. The lamp assembly comprises an electrodeless, closed-loop, tubular lamp envelope enclosing mercury vapor and a buffer gas, and a transformer core disposed around a portion of the lamp envelope. An input winding is disposed on the transformer core so that it has a particular number of turns, Ninput. An auxiliary winding is disposed on the transformer core so that it has a particular number of turns, Nauxiliary. The auxiliary winding is adapted to connect to the ballast and to couple with the input winding. The ratio of the particular number of turns Ninput to the particular number of turns Nauxiliary is substantially proportional to the total number of lamp assemblies that are adapted to operate in series together.

Abstract: A radio frequency (RF) power supply for an electrodeless lamp includes a pair of DC rails, an RF inverter having power input terminals connected between the rails, a first inductor arranged to inductively couple with an electrodeless lamp, first and second resonance capacitors that each connects a respective one of two input terminals of the first inductor to a same first rail of the pair of DC rails, and a second (ballasting) inductor connecting an output of the RF inverter to one of the two input terminals of the first inductor. Thus, the first inductor is connected in a symmetrical ?-filter and supplied by two equal but phase-opposite voltages whose sum is the lamp voltage. The inductance of the ballasting inductor is significantly reduced so that the RF efficiency of the power supply is 96%.

Abstract: An ion-beam source comprising: a plasma-generation unit for generating plasma and an ion-extraction unit for extraction and acceleration of ions from the aforementioned plasma, where the ion-extraction unit is made in the form of at least one grid under a negative potential. The plasma generating unit consists of a working chamber having a deeply immersed antenna cell. The cell contains a ferromagnetic core, a heat conductor with a heat sink, at least one inductive coil wound onto the ferromagnetic core, and a cap made from a dielectric material that sealingly covers the ferromagnetic core and the inductive coil.

Abstract: A radio frequency (RF) power supply for an electrodeless lamp includes a pair of DC rails, an RF inverter having power input terminals connected between the rails, a first inductor arranged to inductively couple with an electrodeless lamp, first and second resonance capacitors that each connects a respective one of two input terminals of the first inductor to a same first rail of the pair of DC rails, and a second (ballasting) inductor connecting an output of the RF inverter to one of the two input terminals of the first inductor. Thus, the first inductor is connected in a symmetrical ?-filter and supplied by two equal but phase-opposite voltages whose sum is the lamp voltage. The inductance of the ballasting inductor is significantly reduced so that the RF efficiency of the power supply is 96%.

Abstract: A method and apparatus are provided for processing a substrate with a radiofrequency inductive plasma in the manufacture of a device. The inductive plasma is maintained with an inductive plasma applicator having one or more inductive coupling elements. There are thin windows between the inductive coupling elements and the interior of the processing chamber. Various embodiments have magnetic flux concentrators in the inductive coupling elements and feed gas holes interspersed among the inductive coupling elements. The thin windows, magnetic flux concentrators, and interspersed feed gas holes are useful to effectuate uniform processing, high power transfer efficiency, and a high degree of coupling between the applicator and plasma. In some embodiments, capacitive current is suppressed using balanced voltage to power an inductive coupling element.