Patents by Inventor Van Nguyen Truskett

Van Nguyen Truskett has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11036130
    Abstract: Methods and systems for dispensing fluid in imprint lithography, including selecting drop patterns, each associated with different target locations on a substrate and a selected volume for each drop of each drop pattern; selecting a plurality of subsets of nozzles of a dispenser, each subset configured to dispense drops corresponding to each drop pattern; for each drop pattern: dispensing the drops corresponding to the drop pattern from each subset of nozzles; obtaining an image of the drops from each subset of nozzles; and processing the image from each subset of nozzles to determine a positional error of the drops with respect to the target locations and a volumetric error of the drops with respect to the selected volume for each drop; and adjusting, based on the positional error and the volumetric error of the drops from each subset of nozzles for each drop pattern, dispense parameters of the dispenser.
    Type: Grant
    Filed: October 19, 2017
    Date of Patent: June 15, 2021
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Matthew C. Traub, Tom H. Rafferty, Whitney Longsine, Yeshwanth Srinivasan, Van Nguyen Truskett
  • Patent number: 10558117
    Abstract: According to a first aspect of the present invention, an imprint apparatus for contacting a mold with a resin applied to a substrate to perform patterning on the substrate is provided that comprises a dispenser configured to apply the resin to the substrate; and a resin supply unit configured to supply the resin to the dispenser, wherein the resin supply unit comprises a resin storage tank configured to store the resin; a pump configured to continuously circulate the resin between the resin storage tank and the dispenser, and a filter arranged at a flow path of circulated resin, configured to remove a foreign matter or a metal ion.
    Type: Grant
    Filed: May 20, 2015
    Date of Patent: February 11, 2020
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Van Nguyen Truskett, Matthew S. Shafran, Saul Lee, Yoshikazu Miyajima
  • Patent number: 10315814
    Abstract: A cap, a method of using a cap, and a system for using the cap. The cap is capable of being fitted to a bottle. The cap includes a transfer port; and a vent port. The vent port includes a membrane and a valve.
    Type: Grant
    Filed: August 4, 2017
    Date of Patent: June 11, 2019
    Assignee: Canon Kabushiki Kaisha
    Inventors: Van Nguyen Truskett, Colleen Lyons, Matthew C. Traub, Whitney Longsine, Tyler Mann, Steven C. Shackleton
  • Publication number: 20190121231
    Abstract: Methods and systems for dispensing fluid in imprint lithography, including selecting drop patterns, each associated with different target locations on a substrate and a selected volume for each drop of each drop pattern; selecting a plurality of subsets of nozzles of a dispenser, each subset configured to dispense drops corresponding to each drop pattern; for each drop pattern: dispensing the drops corresponding to the drop pattern from each subset of nozzles; obtaining an image of the drops from each subset of nozzles; and processing the image from each subset of nozzles to determine a positional error of the drops with respect to the target locations and a volumetric error of the drops with respect to the selected volume for each drop; and adjusting, based on the positional error and the volumetric error of the drops from each subset of nozzles for each drop pattern, dispense parameters of the dispenser.
    Type: Application
    Filed: October 19, 2017
    Publication date: April 25, 2019
    Inventors: Matthew C. Traub, Tom H. Rafferty, Whitney Longsine, Yeshwanth Srinivasan, Van Nguyen Truskett
  • Publication number: 20190086793
    Abstract: A fluid dispensing system, an imprint lithography system with a fluid dispensing system, a method of manufacturing an article with the fluid dispensing system. The fluid dispensing system comprising: a fluid dispenser and a heater. The fluid dispenser configured to dispense droplets of a fluid onto a substrate. The heater configured to maintain droplet temperature at greater than 23° C. Each of the droplets has a fluid volume that is less than 1.2 pL. The fluid dispenser is configured to have a drop placement accuracy for the imprint resist fluid that is less than a first threshold when the droplet fluid temperature is greater than 23° C. The drop placement accuracy is greater than the first threshold when the droplet fluid temperature is less than or equal to 23° C.
    Type: Application
    Filed: September 21, 2017
    Publication date: March 21, 2019
    Inventors: Colleen Lyons, Whitney Longsine, Matthew C. Traub, Van Nguyen Truskett
  • Publication number: 20190039792
    Abstract: A cap, a method of using a cap, and a system for using the cap. The cap is capable of being fitted to a bottle. The cap includes a transfer port; and a vent port. The vent port includes a membrane and a valve.
    Type: Application
    Filed: August 4, 2017
    Publication date: February 7, 2019
    Inventors: Van Nguyen Truskett, Colleen Lyons, Matthew C. Traub, Whitney Longsine, Tyler Mann, Steven C. Shackleton
  • Publication number: 20160339626
    Abstract: According to a first aspect of the present invention, an imprint apparatus for contacting a mold with a resin applied to a substrate to perform patterning on the substrate is provided that comprises a dispenser configured to apply the resin to the substrate; and a resin supply unit configured to supply the resin to the dispenser, wherein the resin supply unit comprises a resin storage tank configured to store the resin; a pump configured to continuously circulate the resin between the resin storage tank and the dispenser, and a filter arranged at a flow path of circulated resin, configured to remove a foreign matter or a metal ion.
    Type: Application
    Filed: May 20, 2015
    Publication date: November 24, 2016
    Inventors: Van Nguyen Truskett, Matthew S. Shafran, Saul Lee, Yoshikazu Miyajima
  • Publication number: 20160288374
    Abstract: A head cleaning method performed by a liquid discharge apparatus including a head configured to discharge a resist containing an acrylic monomer as a main component is provided. The method comprises using a cleaning solution to clean a discharge surface of the head and a vicinity of the discharge surface, wherein a difference between a dissolution parameter (SP value) of the cleaning solution and a dissolution parameter of the resist falls within a range of ±2.
    Type: Application
    Filed: March 30, 2015
    Publication date: October 6, 2016
    Inventors: Bharath Thiruvengadachari, Christopher J. Fleckenstein, Van Nguyen Truskett, Charles Scott Carden, Tsuyoshi Arai, Kensuke Tone
  • Patent number: 8480933
    Abstract: Systems and methods for calibrating a dispense head to provide substantially uniform droplets on a substrate are described.
    Type: Grant
    Filed: October 20, 2009
    Date of Patent: July 9, 2013
    Assignee: Molecular Imprints, Inc.
    Inventors: Van Nguyen Truskett, Stephen C. Johnson, Niyaz Khusnatdinov, Logan Simpson
  • Patent number: 8268220
    Abstract: Improved wetting characteristics together with improved release characteristics with respect to a substrate and an imprint lithography mold having imprinting material disposed therebetween.
    Type: Grant
    Filed: October 15, 2010
    Date of Patent: September 18, 2012
    Assignee: Molecular Imprints, Inc.
    Inventors: Frank Y. Xu, Pankaj B. Lad, Ian Matthew McMackin, Van Nguyen Truskett, Edward Brian Fletcher
  • Patent number: 7880872
    Abstract: The present invention features a method to determine relative spatial parameters between two coordinate systems, which may be a mold and a region of a substrate in which mold is employed to generate a pattern. The method includes sensing relative alignment between the two coordinate systems at multiple points and determines relative spatial parameters therebetween. The relative spatial parameters include a relative area and a relative shape.
    Type: Grant
    Filed: October 8, 2009
    Date of Patent: February 1, 2011
    Assignee: Molecular Imprints, Inc.
    Inventors: Pawan Kumar Nimmakayala, Tom H. Rafferty, Alireza Aghili, Byung-Jin Choi, Philip D. Schumaker, Daniel A. Babbs, Van Nguyen Truskett
  • Publication number: 20100112310
    Abstract: Systems and methods for providing identification patterns on substrates are described.
    Type: Application
    Filed: October 28, 2009
    Publication date: May 6, 2010
    Applicant: Molecular Imprints, Inc.
    Inventors: Van Nguyen Truskett, Gerard M. Schmid, Michael N. Miller, Douglas J. Resnick, Benjamin G. Eynon, JR., Byung-Jin Choi, Kosta S. Selinidis, Sidlgata V. Sreenivasan, Nicholas A. Stacey
  • Publication number: 20100112220
    Abstract: The present application describes methods and systems for setting up and characterizing fluid dispensing systems. The methods and systems characterize the fluid dispensing systems and associate the characterizations with the corresponding fluid dispensing systems.
    Type: Application
    Filed: October 29, 2009
    Publication date: May 6, 2010
    Applicant: MOLECULAR IMPRINTS, INC.
    Inventors: Jared L. Hodge, Van Nguyen Truskett, Logan Simpson, Bharath Thiruvengadachari, Stephen C. Johnson, Philip D. Schumaker
  • Publication number: 20100102471
    Abstract: Imprint lithography systems and methods for transporting and dispensing polymerizable material on a substrate are described. In one implementation, the transport system utilizes a dispense head, dispense guard, and a shielding block when dispensing the polymerizable material. In another implementation, the transport system comprises one or more filters positioned in an inline manifold for particle reduction or ion reduction.
    Type: Application
    Filed: October 22, 2009
    Publication date: April 29, 2010
    Applicant: MOLECULAR IMPRINTS, INC.
    Inventors: Van Nguyen Truskett, Steven C. Shackleton
  • Publication number: 20100104747
    Abstract: A dispense controller and a tool controller may aid in providing a drop pattern of fluid on a substrate. The dispense controller may provide dispense coordinates to a fluid dispense system based on the drop pattern. The tool controller may control movement of a stage and also provide synchronization pulses to the fluid dispense system. The fluid dispense system may provide the drop pattern of fluid on the substrate using the dispense coordinates and the synchronization pulses.
    Type: Application
    Filed: October 15, 2009
    Publication date: April 29, 2010
    Applicant: Molecular Imprints, Inc.
    Inventors: Van Nguyen Truskett, Philip D. Schumaker, Jared L. Hodge, Kang Luo, Bharath Thiruvengadachari
  • Publication number: 20100101493
    Abstract: Systems and methods for locating and eliminating and/or minimizing non-functional nozzles of dispense systems are described.
    Type: Application
    Filed: October 26, 2009
    Publication date: April 29, 2010
    Applicant: MOLECULAR IMPRINTS, INC.
    Inventors: Jared L. Hodge, Van Nguyen Truskett, Matthew S. Shafran, Bharath Thiruvengadachari
  • Publication number: 20100096470
    Abstract: Droplet volume on a substrate may be controlled using a capillary liquid bridge. Generally, droplets may be dispensed in a drop pattern on the substrate. A DV-substrate may be positioned in contact with the droplets and at a distance from the substrate forming a capillary liquid bridge. Separation of the DV-substrate disrupts the capillary liquid bridge with at least a portion of the droplet volume being transferred to the DV-substrate.
    Type: Application
    Filed: October 15, 2009
    Publication date: April 22, 2010
    Applicant: MOLECULAR IMPRINTS, INC.
    Inventor: Van Nguyen Truskett
  • Publication number: 20100098848
    Abstract: Systems and methods for calibrating a dispense head to provide substantially uniform droplets on a substrate are described.
    Type: Application
    Filed: October 20, 2009
    Publication date: April 22, 2010
    Applicant: Molecular Imprints, Inc.
    Inventors: Van Nguyen Truskett, Stephen C. Johnson, Niyaz Khusnatdinov, Logan Simpson
  • Publication number: 20100099047
    Abstract: A drop dispense apparatus may be manufactured utilizing an imprint lithography process. Exemplary methods for manufacturing a drop dispense apparatus are described.
    Type: Application
    Filed: October 19, 2009
    Publication date: April 22, 2010
    Applicant: MOLECULAR IMPRINTS, INC.
    Inventors: Van Nguyen Truskett, Douglas J. Resnick
  • Publication number: 20100098847
    Abstract: A fluid for dispensation on a substrate. In one implementation, the fluid comprises a set of fluid parameters to facilitate dispensation of the fluid from the system. In another implementation, the fluid comprises a set of fluid parameters specific to a polymerizable material.
    Type: Application
    Filed: October 16, 2009
    Publication date: April 22, 2010
    Applicant: MOLECULAR IMPRINTS, INC.
    Inventor: Van Nguyen Truskett