Patents by Inventor Vibhu Jindal

Vibhu Jindal has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200249559
    Abstract: Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and production systems therefor are disclosed. The EUV mask blanks comprise a substrate; a multilayer stack of reflective layers on the substrate; a capping layer on the multilayer stack of reflecting layers; and an absorber layer on the capping layer, the absorber layer made from carbon and antimony.
    Type: Application
    Filed: January 30, 2020
    Publication date: August 6, 2020
    Inventors: Shuwei Liu, Vibhu Jindal
  • Publication number: 20200249560
    Abstract: Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and production systems therefor are disclosed. The EUV mask blanks comprise a substrate; a multilayer stack of reflective layers on the substrate; a capping layer on the multilayer stack of reflecting layers; and an absorber layer on the capping layer, the absorber layer made from tantalum and antimony.
    Type: Application
    Filed: January 30, 2020
    Publication date: August 6, 2020
    Inventors: Shuwei Liu, Vibhu Jindal
  • Publication number: 20200249557
    Abstract: Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and production systems therefor are disclosed. The EUV mask blanks comprise a substrate; a multilayer stack of reflective layers on the substrate; a capping layer on the multilayer stack of reflecting layers; and an absorber layer on the capping layer, the absorber layer made from tellurium, germanium and antimony.
    Type: Application
    Filed: January 30, 2020
    Publication date: August 6, 2020
    Inventors: Shuwei Liu, Vibhu Jindal, Halbert Chong
  • Publication number: 20200241409
    Abstract: Physical vapor deposition target assemblies, PVD chambers including target assemblies and methods of manufacturing EUV mask blanks using such target assemblies are disclosed. The target assembly includes a target shield adjacent the target and surrounding the peripheral edges of the target, the target shield comprising an insulating material and a non-insulating outer peripheral fixture to secure the target shield to the assembly.
    Type: Application
    Filed: January 23, 2020
    Publication date: July 30, 2020
    Applicant: Applied Materials, Inc.
    Inventors: Wen Xiao, Sanjay Bhat, Shuwei Liu, Vibhu Jindal
  • Publication number: 20200218145
    Abstract: Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and production systems therefor are disclosed. The EUV mask blanks comprise a multilayer stack of absorber layers on the capping layer, the multilayer stack of absorber layers including a plurality of absorber layer pairs.
    Type: Application
    Filed: March 17, 2020
    Publication date: July 9, 2020
    Applicant: Applied Materials, Inc.
    Inventor: Vibhu Jindal
  • Publication number: 20200201167
    Abstract: Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and production systems therefor are disclosed. The EUV mask blanks comprise a substrate; a multilayer stack of reflective layers on the substrate; a capping layer on the multilayer stack of reflecting layers; and an absorber layer on the capping layer, the absorber layer made from amorphous tantalum nitride formed by non-reactive sputtering.
    Type: Application
    Filed: December 19, 2019
    Publication date: June 25, 2020
    Applicant: Applied Materials, Inc.
    Inventors: Shuwei Liu, Chang Ke, Wen Xiao, Vibhu Jindal
  • Patent number: 10685821
    Abstract: Physical vapor deposition target assemblies and methods of manufacturing such target assemblies are disclosed. An exemplary target assembly comprises a flow pattern including a plurality of arcs and bends fluidly connected to an inlet end and an outlet end.
    Type: Grant
    Filed: August 18, 2017
    Date of Patent: June 16, 2020
    Assignee: Applied Materials, Inc.
    Inventors: Sanjay Bhat, Vibhu Jindal, Vishwas Kumar Pandey
  • Publication number: 20200133114
    Abstract: Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and production systems therefor are disclosed. The EUV mask blanks comprise a substrate having a first side and a second side; a backside coating layer comprising an alloy of tantalum and nickel on the first side of the substrate; a multilayer stack of reflective layers on the second side of the substrate, the multilayer stack of reflective layers including a plurality of reflective layers including reflective layer pairs; a capping layer on the multilayer stack of reflecting layers; and an absorber layer on the capping layer.
    Type: Application
    Filed: October 24, 2019
    Publication date: April 30, 2020
    Inventors: Vibhu Jindal, Madhavi R. Chandrachood, Vikash Banthia
  • Publication number: 20200133111
    Abstract: Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and production systems therefor are disclosed. The EUV mask blanks comprise a substrate; a multilayer stack of reflective layers on the substrate; a capping layer on the multilayer stack of reflecting layers; and an absorber layer including an alloy of tantalum and copper on the capping layer.
    Type: Application
    Filed: October 24, 2019
    Publication date: April 30, 2020
    Inventors: Shuwei Liu, Vibhu Jindal, Abbas Rastegar
  • Publication number: 20200051797
    Abstract: A physical vapor deposition (PVD) chamber and a method of operation thereof are disclosed. Chambers and methods are described that provide a chamber comprising one or more of contours that reduce particle defects, temperature control and or measurement and and/or voltage particle traps to reduce processing defects.
    Type: Application
    Filed: August 9, 2019
    Publication date: February 13, 2020
    Inventors: Sanjay Bhat, Vibhu Jindal, Kamatchigobinath Manoharan
  • Publication number: 20200044152
    Abstract: Embodiments of methods for depositing doped transition metal oxides are provided herein. In some embodiments, a method of depositing a doped transition metal oxide layer includes: sputtering a first target comprising a transition metal while providing a source of oxygen atoms; sputtering a second target comprising a dopant element; and forming a doped transition metal oxide layer on a substrate from the sputtered transition metal, oxygen atoms, and dopant element. The first target can be formed from a transition metal or a transition metal oxide.
    Type: Application
    Filed: July 29, 2019
    Publication date: February 6, 2020
    Inventors: MINRUI YU, ANINDITA SEN, VIBHU JINDAL, MICHEL FREI, MAHENDRA PAKALA, MEHUL NAIK, NICOLAS BREIL, MICHAEL CHUDZIK
  • Publication number: 20200026178
    Abstract: Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and production systems therefor are disclosed. The EUV mask blanks comprise a substrate; a multilayer stack of reflective layers on the substrate; a capping layer on the multilayer stack of reflecting layers; and an absorber layer on the capping layer, the absorber layer made from an alloy of tantalum and nickel.
    Type: Application
    Filed: July 16, 2019
    Publication date: January 23, 2020
    Inventors: Vibhu Jindal, Hui Ni Grace Fong, Binni Varghese, Shuwei Liu, Abbas Rastegar
  • Publication number: 20200012183
    Abstract: Extreme ultraviolet (EUV) mask blanks, methods for their manufacture, and production systems therefor are disclosed. The method for forming an EUV mask blank comprises placing a substrate in a multi-cathode physical vapor deposition chamber, the chamber comprising at least three targets, a first molybdenum target adjacent a first side of a silicon target and a second molybdenum target adjacent a second side of the silicon target.
    Type: Application
    Filed: July 3, 2019
    Publication date: January 9, 2020
    Inventors: Sai Abhinand, Shuwei Liu, Hui Ni Grace Fong, Ke Chang, Vibhu Jindal
  • Publication number: 20190382881
    Abstract: A deposition system, and a method of operation thereof are disclosed. The deposition system comprises a cathode assembly comprising a rotating magnet assembly including a plurality of outer peripheral magnets surrounding an inner peripheral magnet.
    Type: Application
    Filed: June 18, 2019
    Publication date: December 19, 2019
    Inventors: Vibhu Jindal, Sanjay Bhat
  • Publication number: 20190382879
    Abstract: A deposition system and a method of operation thereof are disclosed. A PVD chamber is disclosed comprising a plurality of cathode assemblies, a rotating shield below the plurality of cathode assemblies to expose one of the plurality cathode assemblies through the shroud and through a shield hole of the shield, the shield comprising a top surface including a raised peripheral frame. A shield mount sized and shaped to engage with the raised peripheral frame to secure the shield mount to the shield secures the shield mount to the shield.
    Type: Application
    Filed: June 18, 2019
    Publication date: December 19, 2019
    Applicant: Applied Materials, Inc.
    Inventors: Vibhu Jindal, Sanjay Bhat
  • Patent number: 10504705
    Abstract: Magnetrons for plasma sputter chambers, plasma sputter chambers including magnetrons and methods of processing a substrate such as an EUV mask blank in a plasma sputter chamber are disclosed. The magnetron comprises a plurality of elongate magnets arranged in a pattern where there is an unbalance ratio greater than 1 and less than 3.
    Type: Grant
    Filed: September 15, 2017
    Date of Patent: December 10, 2019
    Assignee: Applied Materials, Inc.
    Inventors: Sirisha Behara, Sanjay Bhat, Vibhu Jindal
  • Publication number: 20190088456
    Abstract: Magnetrons for plasma sputter chambers, plasma sputter chambers including magnetrons and methods of processing a substrate such as an EUV mask blank in a plasma sputter chamber are disclosed. The magnetron comprises a plurality of elongate magnets arranged in a pattern where there is an unbalance ratio greater than 1 and less than 3.
    Type: Application
    Filed: September 15, 2017
    Publication date: March 21, 2019
    Inventors: Sirisha Behara, Sanjay Bhat, Vibhu Jindal
  • Publication number: 20190057851
    Abstract: Physical vapor deposition target assemblies and methods of manufacturing such target assemblies are disclosed. An exemplary target assembly comprises a flow pattern including a plurality of arcs and bends fluidly connected to an inlet end and an outlet end.
    Type: Application
    Filed: August 18, 2017
    Publication date: February 21, 2019
    Inventors: Sanjay Bhat, Vibhu Jindal, Vishwas Kumar Pandey
  • Publication number: 20190057849
    Abstract: Physical vapor deposition processing chambers and methods of processing a substrate such as an EUV mask blank in a physical vapor deposition chamber are disclosed. An electric field and a magnetic field are utilized to deflect particles from a substrate being processed in the chamber.
    Type: Application
    Filed: August 18, 2017
    Publication date: February 21, 2019
    Inventors: Vibhu Jindal, Sanjay Bhat, Majeed A. Foad
  • Publication number: 20180031965
    Abstract: Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and production systems therefor are disclosed. The EUV mask blanks comprise a an absorber layer on the capping layer, the absorber layer made from an alloy of at least two absorber materials.
    Type: Application
    Filed: July 18, 2017
    Publication date: February 1, 2018
    Inventor: Vibhu Jindal