Patents by Inventor Vincent De Heyn

Vincent De Heyn has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7405914
    Abstract: An electrostatic discharge (ESD) protection circuit for the protection of an electronic circuit from an ESD event. The electronic circuit, in operation, is provided with a supply voltage and a reference voltage (typically electrical ground) via voltage terminals and/or power supply buses. The protection circuit includes two bipolar transistors in series, where the transistors are coupled between the supply voltage terminal/bus and the reference voltage terminal/bus. The bases of the transistors are coupled via a connection including two resistors in series, where the connection point between the two resistors is coupled with the connection point between the two transistors.
    Type: Grant
    Filed: May 28, 2004
    Date of Patent: July 29, 2008
    Assignees: Interuniversitair Microelektronica Centrum (IMEC), AMI Semiconductor
    Inventors: Koen Reynders, Mahmud Zubeidat, Vincent De Heyn
  • Patent number: 7181352
    Abstract: A method and system for evaluating the current-voltage characteristics of devices where negative resistance behavior is observed. More particularly the present invention relates to a method and system for evaluating accurately the electrical overstress or ESD performance of semiconductor devices during the voltage transition region (positive to negative). The method comprises applying a signal comprising at least two amplitudes within the pulse. By suitably adjusting the amplitude of the first level, such that it is high enough to trigger the device-under-test, and subsequently applying one or more levels within the same signal while keeping the device-under-test in the on-state, the device IV characteristics can be comprehensively extracted, without being limited by the system loadline.
    Type: Grant
    Filed: April 2, 2004
    Date of Patent: February 20, 2007
    Assignee: Interuniversitaire Microelektronica Centrum (IMEC) vzw
    Inventors: Natarajan Mahadeva Iyer, Steven Thijs, Vesselin K. Vassilev, Tom Daenen, Vincent De Heyn
  • Publication number: 20050002141
    Abstract: An electrostatic discharge (ESD) protection circuit for the protection of an electronic circuit from an ESD event. The electronic circuit, in operation, is provided with a supply voltage and a reference voltage (typically electrical ground) via voltage terminals and/or power supply buses. The protection circuit includes two bipolar transistors in series, where the transistors are coupled between the supply voltage terminal/bus and the reference voltage terminal/bus. The bases of the transistors are coupled via a connection including two resistors in series, where the connection point between the two resistors is coupled with the connection point between the two transistors.
    Type: Application
    Filed: May 28, 2004
    Publication date: January 6, 2005
    Applicants: Interuniversitair Microelektronica Centrum (IMEC vzw), AMI Semiconductor
    Inventors: Koen Reynders, Mahmud Zubeidat, Vincent De Heyn
  • Publication number: 20040239346
    Abstract: A method and system for evaluating the current-voltage characteristics of devices where negative resistance behavior is observed. More particularly the present invention relates to a method and system for evaluating accurately the electrical overstress or ESD performance of semiconductor devices during the voltage transition region (positive to negative). The method comprises applying a signal comprising at least two amplitudes within the pulse. By suitably adjusting the amplitude of the first level, such that it is high enough to trigger the device-under-test, and subsequently applying one or more levels within the same signal while keeping the device-under-test in the on-state, the device IV characteristics can be comprehensively extracted, without being limited by the system loadline.
    Type: Application
    Filed: April 2, 2004
    Publication date: December 2, 2004
    Inventors: Natarajan Mahadeva Iyer, Steven Thijs, Vesselin K. Vassilev, Tom Daenen, Vincent De Heyn
  • Patent number: 6707110
    Abstract: Electrostatic discharge protection device comprising a first highly p-doped region with a base contact, a first highly n-doped region with a collector contact, a second highly n-doped region with an emitter contact and located between the first highly p-doped region and the second highly n-doped region, the first highly p-doped region and the second highly n-doped region being applied in a weakly p-doped region which a has a lateral overlap extending towards the first highly n-doped region, the lateral overlap having a width, the first highly n-doped region being applied in a weakly n-doped region, the weakly p-doped region and the weakly n-doped region being applied in a more weakly n-doped region, and a highly n-doped buried layer located underneath the more weakly n-doped region and extending below at least a portion of the weakly n-doped region and at least a portion of the weakly p-doped region.
    Type: Grant
    Filed: April 25, 2002
    Date of Patent: March 16, 2004
    Assignees: Interuniversitair Microelektronica Centrum, Alcatel SA
    Inventors: Vincent De Heyn, Guido Groeseneken, Louis Vacaresse, Geert Gallopyn, Hugo Van Hove
  • Publication number: 20030006464
    Abstract: Electrostatic discharge protection device comprising a first highly p-doped region with a base contact, a first highly n-doped region with a collector contact, a second highly n-doped region with an emitter contact and located between the first highly p-doped region and the second highly n-doped region, the first highly p-doped region and the second highly n-doped region being applied in a weakly p-doped region which a has a lateral overlap extending towards the first highly n-doped region, the lateral overlap having a width, the first highly n-doped region being applied in a weakly n-doped region, the weakly p-doped region and the weakly n-doped region being applied in a more weakly n-doped region, and a highly n-doped buried layer located underneath the more weakly n-doped region and extending below at least a portion of the weakly n-doped region and at least a portion of the weakly p-doped region.
    Type: Application
    Filed: April 25, 2002
    Publication date: January 9, 2003
    Inventors: Vincent De Heyn, Guido Groeseneken, Louis Vacaresse, Geert Gallopyn, Hugo Van Hove