Patents by Inventor Waltherus W. Van Den Hoogenhof

Waltherus W. Van Den Hoogenhof has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7247854
    Abstract: A limiting device (9) for electromagnetic radiation (3; 5; 7) includes an essentially flat beam cross-section limiter (10) which partly or completely encloses at least one passage aperture (12; 13) for beams (5; 7) and is constructed so that it also includes at least one second beam cross-section limiter (14) which, in the active position, constitutes at least one longitudinal component extending at an angle to the first beam cross-section limiter (10).
    Type: Grant
    Filed: June 20, 2002
    Date of Patent: July 24, 2007
    Assignee: PANalytical BV
    Inventors: Jan Boldewijn, Waltherus W. van den Hoogenhof
  • Patent number: 7194067
    Abstract: An X-ray optical diaphragm (3; 4) which is provided with at least one passage opening (3a; 4a) for rays is constructed in such a manner that the edge zone (9; 10) of the X-ray optical diaphragm (3; 4) which faces the passage opening (3a; 4a) is angulated at least partly relative to the direction of propagation (7) of the rays.
    Type: Grant
    Filed: May 30, 2002
    Date of Patent: March 20, 2007
    Assignee: Panalytical B.V.
    Inventors: Waltherus W. Van den Hoogenhof, Hendrik A. Van Sprang
  • Publication number: 20040234035
    Abstract: A limiting device (9) for electromagnetic radiation (3; 5; 7) includes an essentially flat beam cross-section limiter (10) which partly or completely encloses at least one passage aperture (12; 13) for beams (5; 7) and is constructed so that it also includes at least one second beam cross-section limiter (14) which, in the active position, constitutes at least one longitudinal component extending at an angle to the first beam cross-section limiter (10).
    Type: Application
    Filed: June 18, 2004
    Publication date: November 25, 2004
    Inventors: Jan Boldewijn, Waltherus W van den Hoogenhof
  • Publication number: 20040126282
    Abstract: The partial evaporation of the sample liquid during X-ray analysis of liquids gives rise to problems, since the quantity of the sample liquid does not remain constant and evaporated gas is liable to invade the measuring paths in which it may lead to measurement falsifications. In order to solve this problem, there is provided a sample container for receiving a sample liquid, which container leaves open an opening at its top, and a cover is placed on the free surface of the sample liquid. The cover is not rigidly connected to the wall of the sample container and, therefore, allows pressure equalization. Evaporation phenomena are almost completely precluded as a result of the covering of the liquid surface.
    Type: Application
    Filed: September 8, 2003
    Publication date: July 1, 2004
    Inventor: Waltherus W. Van Den Hoogenhof
  • Patent number: 6310937
    Abstract: X-ray diffraction measurements are often carried out in a given atmosphere which may vary in respect of a variety of parameters, such as pressure, temperature, etc. Notably soft X-rays are very sensitive to atmospheric absorption. Therefore, the measured intensity is dependent not only on the material variables to be measured for the sample to be examined (10), but also on the varying absorption which thus constitutes a disturbing influencing of the X-rays in the X-ray optical path (16, 46, 50, 10, 52) from the X-ray source (7) to the detector (30). According to the invention a second X-ray optical path (54, 56, 58, 60) is established; this second path deviates from the first X-ray optical path and serves to carry out reference measurements, during or between the actual measurements, in order to determine the absorption of the atmosphere and to determine a correction factor for the X-ray intensity measured during the actual measurements.
    Type: Grant
    Filed: October 26, 1999
    Date of Patent: October 30, 2001
    Assignee: U.S. Philips Corporation
    Inventor: Waltherus W. Van Den Hoogenhof
  • Patent number: 5622525
    Abstract: Method of polishing a surface (5a) of copper or an alloy comprising mainly copper, in which a polishing means is moved across the surface while exerting a polishing pressure of approximately 500 g/cm.sup.2 for obtaining a plane and smooth polished surface without any defects. A composition of a polishing component comprising a colloidal suspension of SiO.sub.2 particles having an average particle size of between 20 and 50 nm in an alkali solution, demineralized water and a chemical activator is used as a polishing means.
    Type: Grant
    Filed: March 16, 1994
    Date of Patent: April 22, 1997
    Assignee: U.S. Philips Corporation
    Inventors: Jan Haisma, Peter W. De Haas, Dirk K. G. De Boer, Waltherus W. Van den Hoogenhof, Lambertus Postma
  • Patent number: 4379251
    Abstract: In a cathode-ray tube for displaying colored pictures comprising in an evacuated envelope means to generate a number of electron beams, a display screen comprising a number of regions luminescing in different colors, and color selection means comprising a large number of apertures which assign each electron beam to luminescent regions of one color, in which color selection means a magnetic quadrupole field is generated to form a magnetic quadrupole electron lens in each aperture, which luminescent regions have the shape of substantially parallel strips the longitudinal direction of which is substantially parallel to the defocusing direction of the quadrupole lens, characterized in that the apertures are elongate, substantially hexagonal and symmetrical relative to their longitudinal axes and are situated with their longitudinal axes in a number of parallel rows which extend substantially parallel to the strips and the apertures of two juxtaposed rows are shifted relative to each other, it is possible, in spit
    Type: Grant
    Filed: November 21, 1980
    Date of Patent: April 5, 1983
    Assignee: U.S. Philips Corporation
    Inventors: Marcel Brouha, Waltherus W. van den Hoogenhof, Peter C. van Loosdregt