Patents by Inventor Wataru Hoshino

Wataru Hoshino has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20080241742
    Abstract: A surface-treating agent for forming a resist pattern, includes: a compound represented by formula (1) as defined in the specification, wherein the surface-treating agent is used in a step between a formation of a first resist pattern on a first resist film and a formation of a second resist film on the first resist pattern to form a second resist pattern, and a pattern-forming method uses the surface-treating agent.
    Type: Application
    Filed: March 24, 2008
    Publication date: October 2, 2008
    Applicant: FUJIFILM CORPORATION
    Inventors: Wataru HOSHINO, Hideaki TSUBAKI, Masahiro YOSHIDOME
  • Publication number: 20080206668
    Abstract: A negative resist composition includes: (A) a compound having at least one episulfide structure (a three-membered ring structure comprising two C atoms and one S atom); (B) an alkali-soluble resin; and (C) a compound capable of generating an acid upon irradiation with actinic rays or radiation, and a pattern forming method using the composition.
    Type: Application
    Filed: February 25, 2008
    Publication date: August 28, 2008
    Applicant: FUJIFILM CORPORATION
    Inventors: Wataru HOSHINO, Kenji Wada
  • Publication number: 20080193878
    Abstract: A resist composition includes: (A) a resin containing a repeating unit having a specific secondary benzyl structure; and (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation, and a pattern forming method using the composition.
    Type: Application
    Filed: February 12, 2008
    Publication date: August 14, 2008
    Applicant: FUJIFILM CORPORATION
    Inventors: Masaomi MAKINO, Wataru HOSHINO, Kazuyoshi MIZUTANI