Abstract: An electroplating jig which includes: a first insulator plate having an aperture; a second insulator plate sandwiching a body to be plated between the first insulator plate and the second insulator plate so that the body to be plated is faced outside from the aperture; and a conductive plate for conducting electric current supplied from outside to the body to be plated, the conductive plate being arranged between the first or second insulator plate and the body to be plated, wherein the conductive plate is formed using a conductive rubber contacting elastically with the body to be plated.

Abstract: An inspection device for a display device includes: an inspection circuit which judges a defect of each of pixels based on current which flows through an inspection interconnect connected with interconnects of the display device; and an inspection driver circuit which drives by supplying a necessary signal to the display device. The inspection circuit includes: a correction circuit which generates a first correction current which substantially cancels a first current which flows through the inspection interconnect when all the pixels are set to an off-state based on the first current; a detection circuit which detects a measured value for each pixel obtained by correcting a measured current which flows through the inspection interconnect by the first correction current each time the pixels are sequentially set to an on-state; and a defect judgment circuit which judges a defect of each of the pixels based on the measured value.

Abstract: The present invention can provide 1 which barrel plating apparatus where a plating barrel has permeable holes and slits in a size of order of micrometers on the wall thereof. The plating barrel is fabricated with porous plastic materials which have permeable holes and slits to the plating liquid and no piece materials to be plated are dropped thereof. Further advantage of the present invention is to provide a drain tool to drain the plating liquid L staying in the plating barrel.

Abstract: An electroplating apparatus is provided which includes a solution tank which has at least a bottom plate and a side plate and inside which electroplating solution is poured and a cathode plate and an anode plate which are horizontally placed so as to face each other in the electroplating solution in the solution tank, in which one plate of the cathode plate and the anode plate is an object to be electroplated and placed in a lower position than the other plate, in which an opening through which the cathode plate and the anode plate are inserted into the solution tank is provided in the side plate of the solution tank, and in which a shield plate which is detachable shields the opening of the solution tank.

Abstract: An electroplating apparatus including a first insulated plate which has an opening, a second insulated plate which holds an object to be electroplated between the first insulated plate and the second insulated plate in such a way that the object to be electroplated is exposed through the opening, an inner seal which is provided around a periphery of the opening between the first insulated plate and the object to be electroplated, a conductor which is provided between the first insulated plate and the second insulated plate surrounding the object to be electroplated so as to conduct electricity to the object to be electroplated, and an outer seal which is provided between the first insulated plate and the second insulated plate surrounding the conductor, in which a vacuum passage is formed inside the first insulated plate and/or the second insulated plate in order to make and keep air pressure in a space surrounded by the first insulated plate, the second insulated plate, the inner seal, and the outer seal, ne

Abstract: A transparent gas barrier laminated film includes at least two transparent gas barrier films, and a 1- to 30-?m-thick adhesive layer formed between the transparent gas barrier films.

Abstract: In order to measure a plating internal stress, the plating internal stress measurement program in a plating internal stress measurement system makes a computer function as: a plating condition input mechanism for inputting a plating condition; a calculation formula data memory mechanism that memorizes in advance film thickness calculation formula data for calculating a plating film thickness and stress calculation formula data for calculating a plating internal stress; a film thickness calculation mechanism for reading the film thickness calculation formula data and calculating the plating film thickness at each timing during plating; a stress calculation mechanism for reading the stress calculation formula data and calculating the plating internal stress at the each timing during the plating; a stress data memory mechanism for memorizing the plating internal stress; and a stress output mechanism for outputting the plating internal stress calculated at the each timing during the plating.

Abstract: The electrode cartridge for measuring an internal stress of a film of plating includes a cathode support, an anode support, a shield plate and an anode shell. The anode support supports an anode plate so that the anode plate is opposite to the cathode plate with a predetermined spacing. The shield plate is interposed between the cathode and anode plates. A through hole is made in the shield plate in such a manner that the through hole confronts a plating section and has a geometry which is reduced by a first predetermined scale factor relative to a geometry of the plating section. An opening is made in the anode shell in such a manner that the opening confronts the plating section and has a geometry which is magnified by a second predetermined scale factor relative to the geometry of the plating section.

Abstract: An inspection device for a display device includes: an inspection circuit which judges a defect of each of pixels based on current which flows through an inspection interconnect connected with interconnects of the display device; and an inspection driver circuit which drives by supplying a necessary signal to the display device. The inspection circuit includes: a correction circuit which generates a first correction current which substantially cancels a first current which flows through the inspection interconnect when all the pixels are set to an off-state based on the first current; a detection circuit which detects a measured value for each pixel obtained by correcting a measured current which flows through the inspection interconnect by the first correction current each time the pixels are sequentially set to an on-state; and a defect judgment circuit which judges a defect of each of the pixels based on the measured value.

Abstract: A self-propelled cleaning device having a cylindrical side cover has a suction body capable of moving transversely to the forward direction. The side cover is held by a base via a suspension. When cleaning corners of a room, the suction body moves by a wall and as the suction body moves to a corner, the movement amount of the suction body is changed. When an obstacle touches the cleaning device, the side cover moves, and the article touches a side cover switch, and the direction of the article is detected.

Abstract: The present invention can provide 1 which barrel plating apparatus where a plating barrel has permeable holes and slits in a size of order of micrometers on the wall thereof. The plating barrel is fabricated with porous plastic materials which have permeable holes and slits to the plating liquid and no piece materials to be plated are dropped thereoff. Further advantage of the present invention is to provide a drain tool to drain the plating liquid L staying in the plating barrel.

Abstract: To provide a cathode cartridge, which comprises a tabular cathode conductor 5, which has an open hole having a same shape to that of plated pats 2a of a plated base 2 as a negative plate, which has a plurality of a protruding portion that presses contact to a peripheral part 2d around the plated parts 2a, a first elastic thin board 3, which covers a rear side of the plated base 2 and has a recess 3a, a tabular rear wall insulator 6, which covers both a back side of the cathode conductor 5 and a back side of the first elastic thin board 3, and has a recess 6b, a tabular front side insulator 7, which has an aperture having the same shape to that of the plated parts 2a, which covers a front side of the cathode conductor 5, and has a recess 7b, into which the cathode conductor 5 gets just, and a second elastic thin board 4, which has an aperture (open hole) having the same shape to that of the plated parts 2a, which is sandwiched between the cathode conductor 5 to provide a cathode cartridge of testing device for

Abstract: The present invention provides a liquid tank which has a compact construction comprising a process bath, an agitation service bath, an agitation room, a liquid supply tunnel, and a liquid supply outlet.

Abstract: There is provided an experimental management apparatus and experimental management program for electroplating that can carry out an electroplating experiment more efficiently and can manage experimental data more efficiently. The electroplating experimental management apparatus has a computer body 1a, which includes a central processing unit 101, a program memory 102, and a data memory 103. The program memory 102 stores a predicted value calculation program 102a for working out a predicted value of an experimental result based upon a physical property data file 103a and an arithmetic expression data file 103b read out of the data memory 103; an experimental data management program 102b for obtaining experimental data; and a data analysis program 102c for working out experimental data at each point of time during experiment based upon analysis of the experimental data obtained by the experimental data management program 102b.

Abstract: An inspection method and device are provided. The inspection method includes charging a parasitic capacitor between the gate and the drain of an operating transistor by supplying a potential from an inspection device, measuring discharge current from the parasitic capacitor by using the inspection device by discharging the parasitic capacitor, and determining whether or not a defect exists in each of a plurality of pixels by using the inspection device based on a value of the discharge current.

Abstract: A cathode cartridge of a testing device for electroplating is provided, and includes a dummy plate 7 as a negative pole provided outside a tabular front insulator 6. The dummy plate includes an orifice a having the same shape as a plated part 2a of a plated base 2 as a negative plate. Protruding portions 4 press contact to a peripheral part of the plated base 2a. A tabular cathode conductor 4 connects with a direct voltage source not soaked in a plating solvent. A tabular rear insulator 5 covers rear sides of the plated base 2 and the cathode conductor 4, and has a recess, into which the plated base 2 and the cathode conductor 4 are retained. A tabular front insulator 6 having an orifice having the same shape as the plated base 2a covers a front side of the cathode conductor 4. An elastic thin board 9 is sandwiched between the plate base 2 and the tabular front insulator.

Abstract: An object of inspection is an active matrix substrate including a plurality of pixels, each of the plurality of pixels being connected with one of a plurality of signal lines, one of a plurality of scanning lines, and one of a plurality of voltage supply lines, and including a pixel select transistor connected with the one signal line and the one scanning line and an operating transistor, a gate of the operating transistor being connected with the pixel select transistor, a drain of the operating transistor being connected with the one voltage supply line, and a source of the operating transistor being in an open state.

Abstract: A cathode cartridge (N) for an electroplating tester includes a cathode conductor (10) that conducts electricity to a surface (Wa) to be plated of a silicon wafer (W) as an object to be plated, a first insulator (20) that covers a front side of the silicon wafer (W) and holds the cathode conductor (10), and a second insulator (30) that covers a back side of the silicon wafer (W) and holds the silicon wafer (W). Negative portions other than the surface (Wa) to be plated of the silicon wafer (W) are insulated from plating solution with a first O-ring (22) fitted in the first insulator (20) and a second O-ring (32) fitted in the second insulator (30).

Abstract: A cathode cartridge N for an electroplating tester includes a cathode conductor 10 that conducts electricity to a surface Wa to be plated of a silicon wafer W as an object to be plated, a first insulator 20 that covers a front side (the surface Wa to be plated) of the silicon wafer W and holds the cathode conductor 10, and a second insulator 30 that covers a back side (reverse to the surface Wa to be plated) of the silicon wafer W and holds the silicon wafer W. Negative portions other than the surface Wa to be plated of the silicon wafer W are insulated from plating solution with a first O-ring 22 fitted in the first insulator 20 and a second O-ring 32 fitted in the second insulator 30.

Abstract: A travelling section 30 for retaining the stick type cosmetic material is installed rotatably in an axial direction in an outer shell section 2 which is constituted by rotatably connecting a front cylinder 10 and a base cylinder 20. An outer circumferential surface 43 of a spiral cylinder 40 which is spirally engaged with a male screw section of the travelling section fits in a second slide surface provided on an inner circumferential surface of the base cylinder 20 which is one component of the outer shell section 2. Due to frictional force of this fit-in part, a cylindrical body and the spiral cylinder 40 are synchronously rotated. The travelling section 30 is engaged with an inner circumference of the front cylinder 10 and can slide only in an axial direction.