Patents by Inventor Wayne Martin Moreau

Wayne Martin Moreau has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7736833
    Abstract: Multilayered resist structures including bilayer and top surface imaging which utilize tuned underlayers functioning as ARCs, planarizing layers, and etch resistant hard masks whose properties such as optical, chemical and physical properties are tailored to give a multilayer resist structure exhibiting high resolution, residue free lithography and methods of preparing these materials.
    Type: Grant
    Filed: October 2, 2007
    Date of Patent: June 15, 2010
    Assignee: International Business Machines Corporation
    Inventors: Marie Angelopoulos, Katherina E. Babich, Douglas Charles LaTulipe, Qinghuang Lin, David R. Medeiros, Wayne Martin Moreau, Karen E. Petrillo, John P. Simons
  • Patent number: 7709177
    Abstract: Multilayered resist structures including bilayer and top surface imaging which utilize tuned underlayers functioning as ARCs, planarizing layers, and etch resistant hard masks whose properties such as optical, chemical and physical properties are tailored to give a multilayer resist structure exhibiting high resolution, residue free lithography and methods of preparing these materials.
    Type: Grant
    Filed: October 2, 2007
    Date of Patent: May 4, 2010
    Assignee: International Business Machines Corporation
    Inventors: Marie Angelopoulos, Katherina E. Babich, Douglas Charles LaTulipe, Qinghuang Lin, David R. Medeiros, Wayne Martin Moreau, Karen E. Petrillo, John P. Simons
  • Patent number: 7638266
    Abstract: A barrier layer for fabricating at least one of a device and a mask includes a polymeric photoacid generator formed between a substrate and a resist layer. The barrier layer may be used, for example, in forming a resist image, and forming a patterned material feature on a substrate.
    Type: Grant
    Filed: August 12, 2004
    Date of Patent: December 29, 2009
    Assignee: International Business Machines Corporation
    Inventors: Marie Angelopoulos, Gregory Breyta, Wu-Song Huang, Robert Neal Lang, Wenjie Li, David R. Medeiros, Wayne Martin Moreau, Karen Elizabeth Petrillo
  • Patent number: 7485964
    Abstract: A dielectric material formed by contacting a low dielectric constant polymer with liquid or supercritical carbon dioxide, under thermodynamic conditions which maintain the carbon dioxide in the liquid or supercritical state, wherein a porous product is formed. Thereupon, thermodynamic conditions are changed to ambient wherein carbon dioxide escapes from the pores and is replaced with air.
    Type: Grant
    Filed: April 6, 2006
    Date of Patent: February 3, 2009
    Assignee: International Business Machines Corporation
    Inventors: John M. Cotte, Kenneth John McCullough, Wayne Martin Moreau, Kevin Petrarca, John P. Simons, Charles J. Taft, Richard Volant
  • Publication number: 20080124649
    Abstract: Multilayered resist structures including bilayer and top surface imaging which utilize tuned underlayers functioning as ARCs, planarizing layers, and etch resistant hard masks whose properties such as optical, chemical and physical properties are tailored to give a multilayer resist structure exhibiting high resolution, residue free lithography and methods of preparing these materials.
    Type: Application
    Filed: October 2, 2007
    Publication date: May 29, 2008
    Inventors: Marie Angelopoulos, Katherina E. Babich, Douglas Charles LaTulipe, Qinghuang Lin, David R. Medeiros, Wayne Martin Moreau, Karen E. Petrillo, John P. Simons
  • Publication number: 20080124650
    Abstract: Multilayered resist structures including bilayer and top surface imaging which utilize tuned underlayers functioning as ARCs, planarizing layers, and etch resistant hard masks whose properties such as optical, chemical and physical properties are tailored to give a multilayer resist structure exhibiting high resolution, residue free lithography and methods of preparing these materials.
    Type: Application
    Filed: October 2, 2007
    Publication date: May 29, 2008
    Inventors: Marie Angelopoulos, Katherina E. Babich, Douglas Charles Latulipe, Qinghuang Lin, David R. Medeiros, Wayne Martin Moreau, Karen E. Petrillo, John P. Simons
  • Patent number: 7361444
    Abstract: Disclosed are multilayered resist structures including bilayer and top surface imaging which utilize tuned underlayers functioning as ARCs, planarizing layers, and etch resistant hard masks whose properties such as optical, chemical and physical properties are tailored to give a multilayer resist structure exhibiting high resolution, residue free lithography and methods of preparing these materials.
    Type: Grant
    Filed: February 23, 1999
    Date of Patent: April 22, 2008
    Assignee: International Business Machines Corporation
    Inventors: Marie Angelopoulos, Katherina E. Babich, Douglas Charles LaTulipe, Qinghuang Lin, David R. Medeiros, Wayne Martin Moreau, Karen E. Petrillo, John P. Simons
  • Patent number: 7332436
    Abstract: A composition which includes liquid or supercritical carbon dioxide and an acid having a pKa of less than about 4. The composition is employed in a process of removing residue from a precision surface, such as a semiconductor sample, in which the precision surface is contacted with the composition under thermodynamic conditions consistent with the retention of the liquid or supercritical carbon dioxide in the liquid or supercritical state.
    Type: Grant
    Filed: October 15, 2004
    Date of Patent: February 19, 2008
    Assignee: International Business Machines Corporation
    Inventors: John Michael Cotte, Dario L. Goldfarb, Pamela Jones, Kenneth John McCullough, Wayne Martin Moreau, Keith R. Pope, John P. Simons, Charles J. Taft
  • Patent number: 7168224
    Abstract: The present invention includes a packaged coated workpiece. The packaged coated workpiece has: (1) a workpiece coated with a resist film sensitive to optical radiation, particulates or chemical contaminants; (2) an inner barrier sealed to enclose the coated workpiece and optionally a first getter agent, to produce a sealed first enclosure; and (3) an outer barrier sealed to enclose the sealed first enclosure and optionally a second getter agent, provided that the packaged coated workpiece has at least one getter agent, to produce a packaged coated workpiece suitable for storage for a period of at least one week without substantial loss of sensitivity, resolution or performance. The present invention also includes a process for preparing a packaged coated workpiece and a method of increasing the storage time of a coated workpiece to at least one week without substantial loss of sensitivity, resolution or performance.
    Type: Grant
    Filed: November 15, 2002
    Date of Patent: January 30, 2007
    Assignee: International Business Machines Corporation
    Inventors: Marie Angelopoulos, Wu-Song Huang, Ranee Wai-Ling Kwong, David Robert Medeiros, Wayne Martin Moreau, Karen Elizabeth Petrillo, Herman Russell Wendt, Christopher Karl Magg
  • Patent number: 7056837
    Abstract: A dielectric material formed by contacting a low dielectric constant polymer with liquid or supercritical carbon dioxide, under thermodynamic conditions which maintain the carbon dioxide in the liquid or supercritical state, wherein a porous product is formed. Thereupon, thermodynamic conditions are changed to ambient wherein carbon dioxide escapes from the pores and is replaced with air.
    Type: Grant
    Filed: June 6, 2003
    Date of Patent: June 6, 2006
    Assignee: International Business Machines Corporation
    Inventors: John M. Cotte, Kenneth John McCullough, Wayne Martin Moreau, Kevin Petrarca, John P. Simons, Charles J. Taft, Richard Volant
  • Patent number: 6953042
    Abstract: The present invention provides an apparatus for cleaning a workpiece with a cleaning medium that is maintained at a single fluid phase. The apparatus comprises means for providing the cleaning medium; a pressurizable cleaning vessel for receiving the cleaning medium and the workpiece; and means for maintaining a single fluid phase of the cleaning medium in the cleaning vessel. The present invention further provides a process for cleaning the workpiece with cleaning medium under conditions such that the workpiece is exposed to a single fluid phase of the cleaning medium. The present invention further includes a process for a storage media that includes instructions for controlling a processor for the process of the present invention. The storage media comprises means for controlling the processor to control contacting conditions of the workpiece and the cleaning medium such that the workpiece is exposed to a single fluid phase of the cleaning medium.
    Type: Grant
    Filed: November 15, 2002
    Date of Patent: October 11, 2005
    Assignee: International Business Machines Corporation
    Inventors: Jesse Stephen Jur, Kenneth J. McCullough, Wayne Martin Moreau, John Patrick Simons, Charles Jesse Taft
  • Patent number: 6892741
    Abstract: The present invention provides an apparatus for cleaning a workpiece with a cleaning medium that is maintained at a single fluid phase. The apparatus comprises means for providing the cleaning medium; a pressurizable cleaning vessel for receiving the cleaning medium and the workpiece; and means for maintaining a single fluid phase of the cleaning medium in the cleaning vessel. The present invention further provides a process for cleaning the workpiece with cleaning medium under conditions such that the workpiece is exposed to a single fluid phase of the cleaning medium. The present invention further includes a process for a storage media that includes instructions for controlling a processor for the process of the present invention. The storage media comprises means for controlling the processor to control contacting conditions of the workpiece and the cleaning medium such that the workpiece is exposed to a single fluid phase of the cleaning medium.
    Type: Grant
    Filed: January 21, 2004
    Date of Patent: May 17, 2005
    Assignee: International Business Machines Corporation
    Inventors: Jesse Stephen Jur, Kenneth J. McCullough, Wayne Martin Moreau, John Patrick Simons, Charles Jesse Taft
  • Patent number: 6890855
    Abstract: A process of removing residue from an etched precision surface. In this process the etched precision surface is contacted with a composition which includes liquid or supercritical carbon dioxide and a fluoride-generating species.
    Type: Grant
    Filed: June 27, 2001
    Date of Patent: May 10, 2005
    Assignee: International Business Machines Corporation
    Inventors: John Michael Cotte, Kenneth John McCullough, Wayne Martin Moreau, Keith R. Pope, John P. Simons, Charles J. Taft
  • Patent number: 6838015
    Abstract: A composition which includes liquid or supercritical carbon dioxide and an acid having a pKa of less than about 4. The composition is employed in a process of removing residue from a precision surface, such as a semiconductor sample, in which the precision surface is contacted with the composition under thermodynamic conditions consistent with the retention of the liquid or supercritical carbon dioxide in the liquid or supercritical state.
    Type: Grant
    Filed: September 4, 2001
    Date of Patent: January 4, 2005
    Assignee: International Business Machines Corporation
    Inventors: John Michael Cotte, Dario L. Goldfarb, Pamela Jones, Kenneth John McCullough, Wayne Martin Moreau, Keith R. Pope, John P. Simons, Charles J. Taft
  • Patent number: 6834671
    Abstract: A check valve for micro electro mechanical structure devices (MEMS), and in particular pertains to a check valve which is adapted to be employed in connection with micro electro mechanical structure devices which are intended to be employed with supercritical fluids constituting working fluids. In a preferred embodiment, the check valve is equipped with a bypass channel including a freely moveable plug structure which, in the open position of the valve enables the ingress of supercritical fluids under high superatmospheric pressures, and subsequent to the filling of the system, let down to atmospheric pressure, causes the plug to be moved into a permanent valve-closed position.
    Type: Grant
    Filed: December 22, 2003
    Date of Patent: December 28, 2004
    Assignee: International Business Machines Corporation
    Inventors: John Michael Cotte, Kenneth John McCullough, Wayne Martin Moreau, John P. Simons, Charles J. Taft, Richard P. Volant
  • Publication number: 20040149317
    Abstract: The present invention provides an apparatus for cleaning a workpiece with a cleaning medium that is maintained at a single fluid phase. The apparatus comprises means for providing the cleaning medium; a pressurizable cleaning vessel for receiving the cleaning medium and the workpiece; and means for maintaining a single fluid phase of the cleaning medium in the cleaning vessel. The present invention further provides a process for cleaning the workpiece with cleaning medium under conditions such that the workpiece is exposed to a single fluid phase of the cleaning medium. The present invention further includes a process for a storage media that includes instructions for controlling a processor for the process of the present invention. The storage media comprises means for controlling the processor to control contacting conditions of the workpiece and the cleaning medium such that the workpiece is exposed to a single fluid phase of the cleaning medium.
    Type: Application
    Filed: January 21, 2004
    Publication date: August 5, 2004
    Applicant: International Business Machines Corporation
    Inventors: Jesse Stephen Jur, Kenneth J. McCullough, Wayne Martin Moreau, John Patrick Simons, Charles Jesse Taft
  • Publication number: 20040134538
    Abstract: A check valve for micro electro mechanical structure devices (MEMS), and in particular pertains to a check valve which is adapted to be employed in connection with micro electro mechanical structure devices which are intended to be employed with supercritical fluids constituting working fluids. In a preferred embodiment, the check valve is equipped with a bypass channel including a freely moveable plug structure which, in the open position of the valve enables the ingress of supercritical fluids under high superatmospheric pressures, and subsequent to the filling of the system, let down to atmospheric pressure, causes the plug to be moved into a permanent valve-closed position.
    Type: Application
    Filed: December 22, 2003
    Publication date: July 15, 2004
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: John Michael Cotte, Kenneth John McCullough, Wayne Martin Moreau, John P. Simons, Charles J. Taft, Richard P. Volant
  • Patent number: 6739346
    Abstract: A process and apparatus for cleaning filters prior to recycling or disposal. In this process and apparatus liquid or supercritical carbon dioxide contacts the plugged pores of a filter under conditions in which carbon dioxide remains in the liquid or supercritical state.
    Type: Grant
    Filed: July 29, 2002
    Date of Patent: May 25, 2004
    Assignee: International Business Machines Corporation
    Inventors: John Michael Cotte, Kenneth John McCullough, Wayne Martin Moreau, Keith R. Pope, John P. Simons, Charles J. Taft
  • Publication number: 20040045866
    Abstract: The present invention includes a packaged coated workpiece. The packaged coated workpiece has: (1) a workpiece coated with a resist film sensitive to optical radiation, particulates or chemical contaminants; (2) an inner barrier sealed to enclose the coated workpiece and optionally a first getter agent, to produce a sealed first enclosure; and (3) an outer barrier sealed to enclose the sealed first enclosure and optionally a second getter agent, provided that the packaged coated workpiece has at least one getter agent, to produce a packaged coated workpiece suitable for storage for a period of at least one week without substantial loss of sensitivity, resolution or performance. The present invention also includes a process for preparing a packaged coated workpiece and a method of increasing the storage time of a coated workpiece to at least one week without substantial loss of sensitivity, resolution or performance.
    Type: Application
    Filed: November 15, 2002
    Publication date: March 11, 2004
    Applicant: International Business Machines Corporation
    Inventors: Marie Angelopoulos, Wu-Song Huang, Ranee Wai-Ling Kwong, David Robert Medeiros, Wayne Martin Moreau, Karen Elizabeth Petrillo, Herman Russell Wendt, Christopher Karl Magg
  • Patent number: 6685853
    Abstract: The present invention is an admixture of an electrically conductive material and an energy sensitive material resulting in a conductive energy sensitive composition. The structures are useful for lithography in microelectronic fabrication to avoid the effects of charging on resists from electron beams. The compositions are also useful in applications of scanning electron metrology and static dissipation.
    Type: Grant
    Filed: July 12, 2000
    Date of Patent: February 3, 2004
    Assignee: International Business Machines Corporation
    Inventors: Marie Angelopoulos, Edward D. Babich, Inna V. Babich, Kuang-Jung Chen, Wayne Martin Moreau, David E. Seeger