Patents by Inventor Wayne Martin Moreau
Wayne Martin Moreau has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 6683008Abstract: A process of removing photoresist, previously subjected to ion implantation, from the surface of a workpiece. The process involves contacting the workpiece with a composition which includes liquid or supercritical carbon dioxide and between about 2% and about 20% of an alkanol having the structural formula CxX2x+1OH, where X is fluorine, hydrogen or mixtures thereof; and x is an integer of 1 to 8, said percentages being by volume, based on the total weight of the composition.Type: GrantFiled: November 19, 2002Date of Patent: January 27, 2004Assignee: International Business Machines CorporationInventors: John Michael Cotte, Kenneth John McCullough, Wayne Martin Moreau, Keith R. Pope, John P. Simons, Charles J. Taft
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Patent number: 6653233Abstract: A process of providing a semiconductor device with electrical interconnection capability wherein a sacrificial material is introduced into topographical features of the semiconductor device prior to chemical mechanical polishing so that debris formed during chemical mechanical polishing is incapable of falling into topographical features present on the semiconductor device. The sacrificial material is thereupon removed by liquid or supercritical carbon dioxide.Type: GrantFiled: June 27, 2001Date of Patent: November 25, 2003Assignee: International Business Machines CorporationInventors: John Michael Cotte, Kenneth John McCullough, Wayne Martin Moreau, Keith R. Pope, John P. Simons, Charles J. Taft, Richard P. Volant
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Publication number: 20030211312Abstract: A dielectric material formed by contacting a low dielectric constant polymer with liquid or supercritical carbon dioxide, under thermodynamic conditions which maintain the carbon dioxide in the liquid or supercritical state, wherein a porous product is formed. Thereupon, thermodynamic conditions are changed to ambient wherein carbon dioxide escapes from the pores and is replaced with air.Type: ApplicationFiled: June 6, 2003Publication date: November 13, 2003Applicant: International Business Machines CorporationInventors: John M. Cotte, Kenneth John McCullough, Wayne Martin Moreau, Kevin Petrarca, John P. Simons, Charles J. Taft, Richard Volant
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Process and apparatus for contacting a precision surface with liquid or supercritical carbon dioxide
Publication number: 20030196679Abstract: A process and apparatus for the processing of a precision surface. The process and apparatus includes contacting of a precision surface in a process chamber with liquid or supercritical carbon dioxide in which sonic waves are generated.Type: ApplicationFiled: April 18, 2002Publication date: October 23, 2003Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: John Michael Cotte, Emily E. Fisch, Kenneth John McCullough, Wayne Martin Moreau, Harald Okorn-Schmidt, Keith R. Pope, John P. Simons, William A. Syverson, Charles J. Taft -
Patent number: 6622507Abstract: An electromechanical device having a size no larger than about 10 microns utilizing a working fluid in the high pressure liquid or supercritical fluid state. A process of preparing the electromechanical device involves the introduction of the liquid or supercritical fluid therein which permits the retention of the working fluid in the liquid or supercritical state after introduction.Type: GrantFiled: July 26, 2001Date of Patent: September 23, 2003Assignee: International Business Machines CorporationInventors: John Michael Cotte, Kenneth John McCullough, Wayne Martin Moreau, John P. Simons, Charles J. Taft, Richard P. Volant
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Patent number: 6579464Abstract: Fixtures and methods for clamping workpieces in a workplace to enable the optimized exposure thereof to a stream or flow of a supercritical fluid. Provided is a rotatably indexable chuck or locator mounting the workpiece and enabling orientating the latter in specific static pitch position within a high pressure vessel in order to subject the workpiece to a full frontal exposure to the supercritical fluid stream within the vessel. This mounting arrangement facilitates an optimum positioning of the workpiece being processed in the flow path of the supercritical fluid stream while oriented in selectively indexed rotational positions.Type: GrantFiled: July 12, 2001Date of Patent: June 17, 2003Assignee: International Business Machines CorporationInventors: John Michael Cotte, Matteo Flotta, Kenneth John McCullough, Wayne Martin Moreau, John P. Simons, Charles J. Taft
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Patent number: 6558475Abstract: The present invention provides an apparatus for cleaning a workpiece with a cleaning medium that is maintained at a single fluid phase. The apparatus includes means for providing the cleaning medium; a pressurizable cleaning vessel for receiving the cleaning medium and the workpiece; and means for maintaining a single fluid phase of the cleaning medium in the cleaning vessel. The present invention further provides a process for cleaning the workpiece with cleaning medium under conditions such that the workpiece is exposed to a single fluid phase of the cleaning medium. The present invention further includes a process for a storage media that includes instructions for controlling a processor for the process of the present invention. The storage media includes means for controlling the processor to control contacting conditions of the workpiece and the cleaning medium such that the workpiece is exposed to a single fluid phase of the cleaning medium.Type: GrantFiled: April 10, 2000Date of Patent: May 6, 2003Assignee: International Business Machines CorporationInventors: Jesse Stephen Jur, Kenneth J. McCullough, Wayne Martin Moreau, John Patrick Simons, Charles Jesse Taft
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Publication number: 20030066544Abstract: The present invention provides an apparatus for cleaning a workpiece with a cleaning medium that is maintained at a single fluid phase. The apparatus comprises means for providing the cleaning medium; a pressurizable cleaning vessel for receiving the cleaning medium and the workpiece; and means for maintaining a single fluid phase of the cleaning medium in the cleaning vessel. The present invention further provides a process for cleaning the workpiece with cleaning medium under conditions such that the workpiece is exposed to a single fluid phase of the cleaning medium. The present invention further includes a process for a storage media that includes instructions for controlling a processor for the process of the present invention. The storage media comprises means for controlling the processor to control contacting conditions of the workpiece and the cleaning medium such that the workpiece is exposed to a single fluid phase of the cleaning medium.Type: ApplicationFiled: November 15, 2002Publication date: April 10, 2003Applicant: International Business Machines CorporationInventors: Jesse Stephen Jur, Kenneth J. McCullough, Wayne Martin Moreau, John Patrick Simons, Charles Jesse Taft
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Patent number: 6543617Abstract: The present invention includes a packaged coated workpiece. The packaged coated workpiece has: (1) a workpiece coated with a resist film sensitive to optical radiation, particulates or chemical contaminants; (2) an inner barrier sealed to enclose the coated workpiece and optionally a first getter agent, to produce a sealed first enclosure; and (3) an outer barrier sealed to enclose the sealed first enclosure and optionally a second getter agent, provided that the packaged coated workpiece has at least one getter agent, to produce a packaged coated workpiece suitable for storage for a period of at least one week without substantial loss of sensitvity, resolution or performance. The present invention also includes a process for preparing a packaged coated workpiece and a method of increasing the storage time of a coated workpiece to at least one week without substantial loss of sensitivity, resolution or performance.Type: GrantFiled: March 9, 2001Date of Patent: April 8, 2003Assignee: International Business Machines CorporationInventors: Marie Angelopoulos, Wu-Song Huang, Ranee Wai-Ling Kwong, David Robert Medeiros, Wayne Martin Moreau, Karen Elizabeth Petrillo, Herman Russell Wendt, Christopher Karl Magg
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Publication number: 20030045117Abstract: A composition which includes liquid or supercritical carbon dioxide and an acid having a pKa of less than about 4. The composition is employed in a process of removing residue from a precision surface, such as a semiconductor sample, in which the precision surface is contacted with the composition under thermodynamic conditions consistent with the retention of the liquid or supercritical carbon dioxide in the liquid or supercritical state.Type: ApplicationFiled: September 4, 2001Publication date: March 6, 2003Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: John Michael Cotte, Dario L. Goldfarb, Pamela Jones, Kenneth John McCullough, Wayne Martin Moreau, Keith R. Pope, John P. Simons, Charles J. Taft
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Publication number: 20030019528Abstract: A check valve for micro electro mechanical structure devices (MEMS), and in particular pertains to a check valve which is adapted to be employed in connection with micro electro mechanical structure devices which are intended to be employed with supercritical fluids constituting working fluids. In a preferred embodiment, the check valve is equipped with a bypass channel including a freely moveable plug structure which, in the open position of the valve enables the ingress of supercritical fluids under high superatmospheric pressures, and subsequent to the filling of the system, let down to atmospheric pressure, causes the plug to be moved into a permanent valve-closed position.Type: ApplicationFiled: July 26, 2001Publication date: January 30, 2003Applicant: IBM CorporationInventors: John Michael Cotte, Kenneth John McCullough, Wayne Martin Moreau, John P. Simons, Charles J. Taft, Richard P. Volant
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Publication number: 20030019540Abstract: An electromechanical device having a size no larger than about 10 microns utilizing a working fluid in the high pressure liquid or supercritical fluid state. A process of preparing the electromechanical device involves the introduction of the liquid or supercritical fluid therein which permits the retention of the working fluid in the liquid or supercritical state after introduction.Type: ApplicationFiled: July 26, 2001Publication date: January 30, 2003Applicant: IBM CorporationInventors: John Michael Cotte, Kenneth John McCullough, Wayne Martin Moreau, John P. Simons, Charles J. Taft, Richard P. Volant
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Publication number: 20030019782Abstract: The present invention includes a packaged coated workpiece. The packaged coated workpiece has: (1) a workpiece coated with a resist film sensitive to optical radiation, particulates or chemical contaminants; (2) an inner barrier sealed to enclose the coated workpiece and optionally a first getter agent, to produce a sealed first enclosure; and (3) an outer barrier sealed to enclose the sealed first enclosure and optionally a second getter agent, provided that the packaged coated workpiece has at least one getter agent, to produce a packaged coated workpiece suitable for storage for a period of at least one week without substantial loss of sensitvity, resolution or performance. The present invention also includes a process for preparing a packaged coated workpiece and a method of increasing the storage time of a coated workpiece to at least one week without substantial loss of sensitivity, resolution or performance.Type: ApplicationFiled: March 9, 2001Publication date: January 30, 2003Applicant: IBM CorporationInventors: Marie Angelopoulos, Wu-Song Huang, Ranee Wai-Ling Kwong, David Robert Medeiros, Wayne Martin Moreau, Karen Elizabeth Petrillo, Herman Russell Wendt, Christopher Karl Magg
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Publication number: 20030010363Abstract: Fixtures and methods for clamping workpieces in a workplace to enable the optimized exposure thereof to a stream or flow of a supercritical fluid. Provided is a rotatably indexable chuck or locator mounting the workpiece and enabling orientating the latter in specific static pitch position within a high pressure vessel in order to subject the workpiece to a full frontal exposure to the supercritical fluid stream within the vessel. This mounting arrangement facilitates an optimum positioning of the workpiece being processed in the flow path of the supercritical fluid stream while oriented in selectively indexed rotational positions.Type: ApplicationFiled: July 12, 2001Publication date: January 16, 2003Applicant: IBM CorporationInventors: John Michael Cotte, Matteo Flotta, Kenneth John McCullough, Wayne Martin Moreau, John P. Simons, Charles J. Taft
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Publication number: 20030008129Abstract: A dielectric material formed by contacting a low dielectric constant polymer with liquid or supercritical carbon dioxide, under thermodynamic conditions which maintain the carbon dioxide in the liquid or supercritical state, wherein a porous product is formed. Thereupon, thermodynamic conditions are changed to ambient wherein carbon dioxide escapes from the pores and is replaced with air.Type: ApplicationFiled: June 27, 2001Publication date: January 9, 2003Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: John M. Cotte, Kenneth John McCullough, Wayne Martin Moreau, Kevin Petrarca, John P. Simons, Charles J. Taft, Richard Volant
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Publication number: 20030003762Abstract: A process of removing residue from an etched precision surface. In this process the etched precision surface is contacted with a composition which includes liquid or supercritical carbon dioxide and a fluoride-generating species.Type: ApplicationFiled: June 27, 2001Publication date: January 2, 2003Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: John Michael Cotte, Kenneth John McCullough, Wayne Martin Moreau, Keith R. Pope, John P. Simons, Charles J. Taft
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Publication number: 20030000556Abstract: A process and apparatus for cleaning filters prior to recycling or disposal. In this process and apparatus liquid or supercritical carbon dioxide contacts the plugged pores of a filter under conditions in which carbon dioxide remains in the liquid or supercritical state.Type: ApplicationFiled: July 29, 2002Publication date: January 2, 2003Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: John Michael Cotte, Kenneth John McCullough, Wayne Martin Moreau, Keith R. Pope, John P. Simons, Charles J. Taft
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Publication number: 20030003746Abstract: A process of providing a semiconductor device with electrical interconnection capability wherein a sacrificial material is introduced into topographical features of the semiconductor device prior to chemical mechanical polishing so that debris formed during chemical mechanical polishing is incapable of falling into topographical features present on the semiconductor device. The sacrificial material is thereupon removed by liquid or supercritical carbon dioxide.Type: ApplicationFiled: June 27, 2001Publication date: January 2, 2003Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: John Michael Cotte, Kenneth John McCullough, Wayne Martin Moreau, Keith R. Pope, John P. Simons, Charles J. Taft, Richard P. Volant
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Patent number: 6479018Abstract: Detection of an evolving or diffusing gaseous substance emanating from an irradiated or thermolyzed layer of polymeric composition in semiconductor processing or similar processes is disclosed. The evolving or diffusing gaseous substance is detected by spatially disposing from the irradiated or thermolyzed layer a detector layer that includes a compound having leaving groups that are sensitive to the gaseous substance being detected.Type: GrantFiled: January 16, 2001Date of Patent: November 12, 2002Assignee: International Business Machines CorporationInventors: James Patrick Collins, Laird Chandler MacDowell, Wayne Martin Moreau, Michael Santarelli
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Patent number: 6457480Abstract: A process and apparatus for cleaning filters prior to recycling or disposal. In this process and apparatus liquid or supercritical carbon dioxide contacts the plugged pores of a filter under conditions in which carbon dioxide remains in the liquid or supercritical state.Type: GrantFiled: June 27, 2001Date of Patent: October 1, 2002Assignee: International Business Machines CorporationInventors: John Michael Cotte, Kenneth John McCullough, Wayne Martin Moreau, Keith R. Pope, John P. Simons, Charles J. Taft