Patents by Inventor Wayne R. Poff

Wayne R. Poff has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for selectively etching integral cathode substrate and support utilizing increased etchant turbulence
    Patent number: 4849066
    Abstract: A method for preparing an integral cathode substrate and support includes the steps of placing formed metal parts on a pin holder, masking selected surface portions of the formed metal parts, etching the unmasked surface portions, and then removing the mask. The present method is an improvement over prior methods since the parts are arranged in a staggered array to increase the turbulence of the etchant during the etching step. The turbulence provides additional oxygen to increase the rate and uniformity of the etching.
    Type: Grant
    Filed: September 23, 1988
    Date of Patent: July 18, 1989
    Assignee: RCA Licensing Corporation
    Inventors: Samuel B. Deal, Donald W. Bartch, Wayne R. Poff
  • Method for selectively etching integral cathode substrate and support
    Patent number: 4441957
    Abstract: In a method for preparing an integral cathode substrate and support in which selected surface portions of a formed metal part are masked, the unmasked surface portions etched, and then the mask removed, the improvement wherein the masking step is conducted by pressing surface portions of an etch-resistant, compressible sheet against the selected surface portions of the part.
    Type: Grant
    Filed: November 25, 1980
    Date of Patent: April 10, 1984
    Assignee: RCA Corporation
    Inventors: Wayne R. Poff, Donald W. Bartch