Patents by Inventor Wei-Cheng Chiang
Wei-Cheng Chiang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 11996481Abstract: A semiconductor device includes a semiconductor layer. A gate structure is disposed over the semiconductor layer. A spacer is disposed on a sidewall of the gate structure. A height of the spacer is greater than a height of the gate structure. A liner is disposed on the gate structure and on the spacer. The spacer and the liner have different material compositions.Type: GrantFiled: May 17, 2021Date of Patent: May 28, 2024Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Huan-Chieh Su, Chih-Hao Wang, Kuo-Cheng Chiang, Wei-Hao Wu, Zhi-Chang Lin, Jia-Ni Yu, Yu-Ming Lin, Chung-Wei Hsu
-
Patent number: 11984465Abstract: The present disclosure relates to a CMOS image sensor having a multiple deep trench isolation (MDTI) structure, and an associated method of formation. In some embodiments, the image sensor comprises a boundary deep trench isolation (BDTI) structure disposed at boundary regions of a pixel region surrounding a photodiode. The BDTI structure has a ring shape from a top view and two columns surrounding the photodiode with the first depth from a cross-sectional view. A multiple deep trench isolation (MDTI) structure is disposed at inner regions of the pixel region overlying the photodiode, the MDTI structure extending from the back-side of the substrate to a second depth within the substrate smaller than the first depth. The MDTI structure has three columns with the second depth between the two columns of the BDTI structure from the cross-sectional view. The MDTI structure is a continuous integral unit having a ring shape.Type: GrantFiled: August 9, 2022Date of Patent: May 14, 2024Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Wei Chuang Wu, Ching-Chun Wang, Dun-Nian Yaung, Feng-Chi Hung, Jen-Cheng Liu, Yen-Ting Chiang, Chun-Yuan Chen, Shen-Hui Hong
-
Patent number: 11976374Abstract: A method and device of removing and recycling metals from a mixing acid solution, includes adsorbing a mixing acid solution with a pH value of ?1 to 4 and a cobalt ion concentration of 100 to 1,000 mg/L by at least two cation resins in series setting to the cobalt ion concentration in the mixing acid solution is less than 10 mg/L, and then adjusting the pH value of the mixing acid solution after adsorption to meet a discharge standard, wherein the particle size of the at least two cation resins in series setting is 150˜1,200 ?m. After the cation resins are saturated by adsorption, regenerating the cation resins by sulfuric acid to form a cobalt sulfate solution, and then electrolytically treating the cobalt sulfate solution to obtain electrolytic cobalt and sulfuric acid electrolyte. The operation process is simple without complicated equipment, and it can effectively recycle metals from mixing acid solutions.Type: GrantFiled: September 10, 2020Date of Patent: May 7, 2024Assignee: MEGA UNION TECHNOLOGY INCORPORATEDInventors: Kuo-Ching Lin, Yung-Cheng Chiang, Shr-Han Shiu, Wei-Rong Tey, Yu-Hsuan Li
-
Patent number: 11948949Abstract: In some embodiments, the present disclosure relates to a device having a semiconductor substrate including a frontside and a backside. On the frontside of the semiconductor substrate are a first source/drain region and a second source/drain region. A gate electrode is arranged on the frontside of the semiconductor substrate and includes a horizontal portion, a first vertical portion, and a second vertical portion. The horizontal portion is arranged over the frontside of the semiconductor substrate and between the first and second source/drain regions. The first vertical portion extends from the frontside towards the backside of the semiconductor substrate and contacts the horizontal portion of the gate electrode structure. The second vertical portion extends from the frontside towards the backside of the semiconductor substrate, contacts the horizontal portion of the gate electrode structure, and is separated from the first vertical portion by a channel region of the substrate.Type: GrantFiled: July 15, 2022Date of Patent: April 2, 2024Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Chun-Yuan Chen, Ching-Chun Wang, Hsiao-Hui Tseng, Jen-Cheng Liu, Jhy-Jyi Sze, Shyh-Fann Ting, Wei Chuang Wu, Yen-Ting Chiang, Chia Ching Liao, Yen-Yu Chen
-
Patent number: 11942377Abstract: A semiconductor device includes a semiconductor substrate; a plurality of channel regions, including a p-type channel region and an n-type channel region, disposed over the semiconductor substrate; and a gate structure. The gate structure includes a gate dielectric layer disposed over the plurality of channel regions and a work function metal (WFM) structure disposed over the gate dielectric layer. The WFM structure includes an n-type WFM layer over the n-type channel region and not over the p-type channel region and further includes a p-type WFM layer over both the n-type WFM layer and the p-type channel region. The gate structure further includes a fill metal layer disposed over the WFM structure and in direct contact with the p-type WFM layer.Type: GrantFiled: February 28, 2022Date of Patent: March 26, 2024Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Lung-Kun Chu, Mao-Lin Huang, Wei-Hao Wu, Kuo-Cheng Chiang
-
Patent number: 11923392Abstract: The present disclosure relates to an integrated chip. The integrated chip includes an image sensing element disposed within a substrate. A gate structure is disposed along a front-side of the substrate. A back-side of the substrate includes one or more first angled surfaces defining a central diffuser disposed over the image sensing element. The back-side of the substrate further includes second angled surfaces defining a plurality of peripheral diffusers laterally surrounding the central diffuser. The plurality of peripheral diffusers are a smaller size than the central diffuser.Type: GrantFiled: January 4, 2021Date of Patent: March 5, 2024Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Keng-Yu Chou, Chun-Hao Chuang, Jen-Cheng Liu, Kazuaki Hashimoto, Ming-En Chen, Shyh-Fann Ting, Shuang-Ji Tsai, Wei-Chieh Chiang
-
Patent number: 8564222Abstract: The present invention relates to a lighting device controlling circuit module, comprising: a first bridge rectifier unit, a second bridge rectifier unit, a power factor correction unit, a controlling unit, a feedback unit, at least one switching unit, and at least one boost/buck unit. The lighting device controlling circuit module of the present invention can be made as an electronic chip for easily being integrated into an LED fluorescent lamp, therefore, a user can replace the traditional fluorescent lamp with the LED fluorescent lamp having the lighting device controlling circuit module so easily, and the user does not need to identify which two contacts of the LED fluorescent lamp are used as the power-inputting terminal before replacing the traditional fluorescent lamp by the LED fluorescent lamp.Type: GrantFiled: August 9, 2011Date of Patent: October 22, 2013Assignee: Shenzhen Tention Optoectronic Co., Ltd.Inventor: Wei-Cheng Chiang
-
Publication number: 20130038239Abstract: The present invention relates to a lighting device controlling circuit module, comprising: a first bridge rectifier unit, a second bridge rectifier unit, a power factor correction unit, a controlling unit, a feedback unit, at least one switching unit, and at least one boost/buck unit. The lighting device controlling circuit module of the present invention can be made as an electronic chip for easily being integrated into an LED fluorescent lamp, therefore, a user can replace the traditional fluorescent lamp with the LED fluorescent lamp having the lighting device controlling circuit module so easily, and the user does not need to identify which two contacts of the LED fluorescent lamp are used as the power-inputting terminal before replacing the traditional fluorescent lamp by the LED fluorescent lamp.Type: ApplicationFiled: August 9, 2011Publication date: February 14, 2013Applicant: SHENZHEN TENTION OPTOECTRONICS CO. LTD.Inventor: Wei-Cheng Chiang