Patents by Inventor Wei-Lun Hsia

Wei-Lun Hsia has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10276493
    Abstract: A semiconductor structure includes a conductive feature on a substrate. A plurality of first dielectric layers are disposed on the conductive feature, and stress directions of at least two of the first dielectric layers are different from one another. A first hole penetrates through the plurality of the first dielectric layers to expose the conductive feature. A first conductive plug conformally covers the first hole and is electrically connected to the conductive feature. A first insulating plug on the first conductive plug fills the first hole.
    Type: Grant
    Filed: August 1, 2017
    Date of Patent: April 30, 2019
    Assignee: VANGUARD ENTERNATIONAL SEMICONDUCTOR CORPORATION
    Inventors: Wei-Lun Hsia, Chun-Hsien Lin, Hsiao-Ying Yang
  • Publication number: 20190043801
    Abstract: A semiconductor structure includes a conductive feature on a substrate. A plurality of first dielectric layers are disposed on the conductive feature, and stress directions of at least two of the first dielectric layers are different from one another. A first hole penetrates through the plurality of the first dielectric layers to expose the conductive feature. A first conductive plug conformally covers the first hole and is electrically connected to the conductive feature. A first insulating plug on the first conductive plug fills the first hole.
    Type: Application
    Filed: August 1, 2017
    Publication date: February 7, 2019
    Applicant: Vanguard International Semiconductor Corporation
    Inventors: Wei-Lun HSIA, Chun-Hsien LIN, Hsiao-Ying YANG
  • Publication number: 20120000796
    Abstract: A measurement device measuring a solution and including a reference voltage generating unit, a plurality of sensing units, a reading unit and a processing unit is disclosed. The reference voltage generating unit is disposed in the solution to generate a reference voltage. The sensing units are disposed in the solution to generate a plurality of output signals relating to the reference voltage. The reading unit outputs a reading signal according to one of the output signals. The processing unit generates a measuring signal according to the reading signals.
    Type: Application
    Filed: June 16, 2011
    Publication date: January 5, 2012
    Applicant: National Yunlin University of Science and Technology
    Inventors: Jung-Chuan Chou, Wei-Lun Hsia, Chien-Cheng Chen
  • Publication number: 20090266712
    Abstract: A calcium ion sensor is provided. The calcium ion sensor includes a metal oxide semiconductor field effect transistor, a sensing unit including a substrate, a ruthenium dioxide membrane formed thereon and a calcium ion sensing membrane formed on the ruthenium dioxide membrane, and a conductive wire connecting the metal oxide semiconductor field effect transistor and the sensing unit. The invention also provides a method for fabricating a calcium ion sensor, and a sensing system including the sensor.
    Type: Application
    Filed: January 6, 2009
    Publication date: October 29, 2009
    Applicant: NATIONAL YUNLIN UNIVERSITY OF SCIENCE AND TECHNOLOGY
    Inventors: Jung-Chuan Chou, Hsiao-Fang Sung, Wei-Lun Hsia, Ya-Ping Huang