Abstract: A hermetic MEMS device (100) comprising a carrier (110) having a surface (111) including a device (101) and an attachment stripe (122), the stripe spaced from the device and surrounding the device; a metallic foil (102) having a central bulge portion (103) and a peripheral rim portion (104) meeting the stripe, the bulge cross section parallel to the carrier monotonically decreasing from the rim (104) towards the bulge apex (105); and the foil positioned over the carrier surface so that the bulge arches over the device and the rim forms a seal with the stripe.

Abstract: Microdisplay assemblies, methods of packaging microdisplays, and methods of testing microdisplays are disclosed. In accordance with one embodiment, a microdisplay assembly includes a support and a microdisplay disposed on the support. The microdisplay includes a semiconductor workpiece mounted to the support and an optical device region disposed over the semiconductor workpiece. A plurality of contacts is disposed over a portion of the semiconductor workpiece, wherein each of the plurality of contacts comprises a protruding feature.

Abstract: An integrated system comprising both imaging and computing capabilities comprises a light valve and a CPU, as well as other functional members for performing computing and imaging.

Abstract: Disclosed embodiments demonstrate batch processing methods for producing optical windows for micro-devices. The windows protect the active elements of the micro-device from contaminants, while allowing light to pass into and out of the hermetically sealed micro-device package. Windows may be batch produced, reducing the cost of production, by fusing multiple metal frames to a single sheet of glass. In order to allow windows to be welded atop packages, disclosed embodiments keep a lip of metal without any glass after the metal frames are fused to the sheet of glass. Several techniques may accomplish this goal, including grinding grooves in the glass to provide a gap that prevents fusion of the glass to the metal frames along the outside edges in order to form a lip. The disclosed batch processing techniques may allow for more efficient window production, taking advantage of the economy of scale.

Abstract: A system and method of providing a micromirror pixel 400 that is highly resistant to bright failure states. The micromirror 400 uses an asymmetric yoke 402 to ensure the mirror is only attracted to the address electrode in one rotation direction. The landing mechanism on the other side of the torsion binge axis also is altered to allow the pixel to over rotate in the “off” direction. The over rotation ensures that light reflected by the mirror when in the off direction will miss the projection lens pupil, allowing the corresponding pixel to remain dark in both an operational and failed state.

Abstract: A method of ensuring that border pixels of a micromirror device are set to the “off” position. The method is typically performed at the factory, during inspection of the micromirror device. The border pixels are electrostatically set to the “on” position, then switched so that they are set to the “off” position. A reset signal then results in their being in the “off” position, even those pixels that were previously stuck or torqued “on”.

Abstract: A method of ensuring that border pixels of a micromirror device are set to the “off” position. The method is typically performed at the factory, during inspection of the micromirror device. The border pixels are electrostatically set to the “on” position, then switched so that they are set to the “off” position. A reset signal then results in their being in the “off” position, even those pixels that were previously stuck or torqued “on”.

Abstract: A system and method of providing a micromirror pixel 400 that is highly resistant to bright failure states. The micromirror 400 uses an asymmetric yoke 402 to ensure the mirror is only attracted to the address electrode in one rotation direction. The landing mechanism on the other side of the torsion binge axis also is altered to allow the pixel to over rotate in the “off” direction. The over rotation ensures that light reflected by the mirror when in the off direction will miss the projection lens pupil, allowing the corresponding pixel to remain dark in both an operational and failed state.

Abstract: A system and method of providing a micromirror pixel 400 that is highly resistant to bright failure states. The micromirror 400 uses an asymmetric yoke 402 to ensure the mirror is only attracted to the address electrode in one rotation direction. The landing mechanism on the other side of the torsion binge axis also is altered to allow the pixel to over rotate in the “off” direction. The over rotation ensures that light reflected by the mirror when in the off direction will miss the projection lens pupil, allowing the corresponding pixel to remain dark in both an operational and failed state.

Abstract: An integrated circuit having an interconnect layer (104) that comprises a first barrier layer (106) and an aluminum-based layer (108) overlying the first barrier layer (106). An aluminum-nitride layer (112) is located on the surface of the aluminum-based layer (108). AlN layer (112) is formed by converting a native aluminum-oxide layer to AlN using a plasma with H2 and N2 supplied independently rather than supplied together in the form of ammonia.

Abstract: A method for forming a thin aluminum-nitride film (112). Solid hydrazine cyanurate is heated to produce in-situ hydrazine (N2H4). The in-situ hydrazine reacts with a previously deposited ailminum layer (108) to form aluminum-nitride (112).

Abstract: An integrated circuit having an interconnect layer (104) that comprises a first barrier layer (106) and an aluminum-based layer (108) overlying the first barrier layer (106). An aluminum-nitride layer (112) is located on the surface of the aluminum-based layer (108). AlN layer (112) is formed by converting a native aluminum-oxide layer to AlN using a plasma with H2 and N2 supplied independently rather than supplied together in the form of ammonia.

Abstract: A device having a thin metallic coating, such as tin which forms strong bonds to copper is provided on the bond pads of an integrated circuit having copper metallization; surface oxidation of the coating is self limiting and the oxides are readily removed, further the coated bond pad forms intermetallics at low temperatures making it both solderable and compatible with wire bonding. A low cost process for forming tin coated copper bonding pads is provided by electroless plating.

Abstract: A semiconductor assembly comprising a semiconductor chip having an active and a passive surface, said active surface including an integrated circuit and a plurality of bonding pads; said bonding pads having a metallization suitable for wire bonding; an array of interconnects of uniform height, each of said interconnects comprising a wire loop substantially perpendicular to said active surface, each of said loops having both wire ends attached to a bonding pad, respectively, and a major and a minor diameter, said loops being oriented parallel with regard to the plane of the opening and having constant offsets in both direction and magnitude of their apex relative to their bonding pad centers; said wire loops having sufficient elasticity to act as stress-absorbing springs; an electrically insulating substrate having first and second surfaces, a plurality of electrically conductive routing strips integral with said substrate, and a plurality of contact pads disposed on said first surface, with attachment materia