Patents by Inventor Wenshan PANG

Wenshan PANG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240282734
    Abstract: The present invention relates to an apparatus and method for wafer oxide removal and reflow treatment. In particular, the present invention relates to an apparatus for wafer oxide removal and reflow treatment, comprising: a heating plate, a sample plate for supporting a wafer sample above the heating plate, and an electron attachment pin plate above the sample plate, wherein the heating plate is configured to be capable of moving up and down, and contacting and heating the sample plate.
    Type: Application
    Filed: February 17, 2023
    Publication date: August 22, 2024
    Applicant: Air Products and Chemicals, Inc.
    Inventors: Liang Wu, Wenshan Pang, Lulu Qi, Xiang Yu, Leijian Yu, Jiong Chen, Gregory Khosrov Arslanian, Yuxiang Zhou
  • Publication number: 20230298807
    Abstract: A multilayer inductor comprises a plurality of magnetic layers and metal electrode tracks formed on the magnetic layers. A ceramic-inorganic material composite is placed in the magnetic core area in the pattern of coils formed by the metal electrode tracks. The ceramic-inorganic material composite comprises two or more first layers and second layers. The first layers comprise a ceramic material having a positive slope of the dielectric constant versus temperature curve. The second layers comprise an inorganic material having a negative slope of the dielectric constant versus temperature curve. The first layers and the second layers are stacked on each other in an alternating manner. The metal electrode tracks are arranged in such a way that the void space between two adjacent metal electrode tracks where no effective magnetic lines of force exist is minimized. The multilayer inductor enables stable device characteristics and enhances the inductive performance.
    Type: Application
    Filed: March 3, 2023
    Publication date: September 21, 2023
    Inventors: Jacken ZHANG, Yeat Shing CHIANG, Wenshan PANG