Patents by Inventor Wilhelmus Theodorus Anthonius Johannes Van Den Einden

Wilhelmus Theodorus Anthonius Johannes Van Den Einden has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200301269
    Abstract: A method for manufacturing a membrane assembly for EUV lithography, the method including: providing a stack having a planar substrate and at least one membrane layer, wherein the planar substrate includes an inner region and a border region around the inner region; and selectively removing the inner region of the planar substrate. The membrane assembly includes: a membrane formed from the at least one membrane layer; and a border holding the membrane, the border formed from the border region of the planar substrate. The stack is provided with a mechanical protection material configured to mechanically protect the border region during the selectively removing the inner region of the planar substrate.
    Type: Application
    Filed: June 10, 2020
    Publication date: September 24, 2020
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Johan Hendrik KLOOTWIJK, Wilhelmus Theodorus Anthonius Johannes VAN DEN EINDEN
  • Patent number: 10712657
    Abstract: A method for manufacturing a membrane assembly for EUV lithography, the method including: providing a stack having a planar substrate and at least one membrane layer, wherein the planar substrate includes an inner region and a border region around the inner region; and selectively removing the inner region of the planar substrate. The membrane assembly includes: a membrane formed from the at least one membrane layer; and a border holding the membrane, the border formed from the border region of the planar substrate. The stack is provided with a mechanical protection material configured to mechanically protect the border region during the selectively removing the inner region of the planar substrate.
    Type: Grant
    Filed: July 4, 2016
    Date of Patent: July 14, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Johan Hendrik Klootwijk, Wilhelmus Theodorus Anthonius Johannes Van Den Einden
  • Publication number: 20190056654
    Abstract: Methods of manufacturing a pellicle for a lithographic apparatus including a method involving depositing at least one graphene layer on a planar surface of a substrate. The substrate has a first substrate portion and a second substrate portion. The method further includes removing the first substrate portion to form a freestanding membrane from the at least one graphene layer. The freestanding membrane is supported by the second substrate portion.
    Type: Application
    Filed: October 11, 2016
    Publication date: February 21, 2019
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Mária PÉTER, Erik Achilles ABEGG, Adrianus Johannes Maria GIESBERS, Johan Hendrik KLOOTWIJK, Maxim Aleksandrovich NASALEVICH, Wilhelmus Theodorus Anthonius Johannes VAN DEN EINDEN, Willem Joan VAN DER ZANDE, Pieter-Jan VAN ZWOL, Johannes Petrus Martinus Bernardus VERMEULEN, David Ferdinand VLES, Willem-Pieter VOORTHUIJZEN
  • Publication number: 20180373170
    Abstract: Methods of manufacturing a membrane assembly where, in one arrangement, a stack includes a planar substrate and at least one membrane layer. The planar substrate includes an inner region, a border region around the inner region, a bridge region around the border region and an edge region around the bridge region. The inner region and a first portion of the bridge region are removed. The membrane assembly after removal has: a membrane formed from the at least one membrane layer, a border holding the membrane, the border formed from the border region, an edge section around the border, the edge section formed from the edge region, a bridge between the border and the edge section, the bridge formed from the at least one membrane layer and a second portion of the bridge region. The method further involves separating the edge section from the border by cutting or breaking the bridge.
    Type: Application
    Filed: December 2, 2016
    Publication date: December 27, 2018
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Paul JANSSEN, Johan Hendrik KLOOTWIJK, Wilhelmus Theodorus Anthonius Johannes VAN DEN EINDEN, Alexandar Nikolov ZDRAVKOV
  • Publication number: 20180203345
    Abstract: A method for manufacturing a membrane assembly for EUV lithography, the method including: providing a stack having a planar substrate and at least one membrane layer, wherein the planar substrate includes an inner region and a border region around the inner region; and selectively removing the inner region of the planar substrate. The membrane assembly includes: a membrane formed from the at least one membrane layer; and a border holding the membrane, the border formed from the border region of the planar substrate. The stack is provided with a mechanical protection material configured to mechanically protect the border region during the selectively removing the inner region of the planar substrate.
    Type: Application
    Filed: July 4, 2016
    Publication date: July 19, 2018
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Johan Hendrik KLOOTWIJK, Wilhelmus Theodorus Anthonius Johannes VAN DEN EINDEN
  • Patent number: 9778574
    Abstract: An apparatus comprising at least one sealing aperture (40) comprising a hollow part (41), having an inner surface (42), extending at an interface between different zones (50;60) of the apparatus; and a member (43) positioned in the hollow part configured to substantially transmit EUV radiation and to substantially filter non-EUV radiation at the interface; wherein the inner surface of the hollow part has a surface treatment configured to increase absorption of the non-EUV radiation that is transferred by the member to the hollow part.
    Type: Grant
    Filed: November 4, 2014
    Date of Patent: October 3, 2017
    Assignee: ASML Netherlands B.V.
    Inventors: Sander Catharina Reinier Derks, Eric Willem Felix Casimiri, Marcel Mathijs Theodore Dierichs, Sumant Sukdew Ramanujan Oemrawsingh, Wilhelmus Theodorus Anthonius Johannes Van Den Einden, Johannes Fransiscus Maria Velthuis, Alexander Nikolov Zdravkov, Wassim Zein Eddine