Patents by Inventor Will DelHagen

Will DelHagen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patterning of Nanostructures
    Publication number: 20160079060
    Abstract: A technique for forming nanostructures including introducing a plurality of molecular-size scale and/or nanoscale building blocks to a region near a substrate and simultaneously scanning a pattern on the substrate with an energy beam, wherein the energy beam causes a change in at least one physical property of at least a portion of the building blocks, such that a probability of the portion of the building blocks adhering to the pattern scanned by the energy beam is increased, and wherein the building blocks adhere to the pattern to form the structure. The energy beam and at least a portion of the building blocks may interact by electrostatic interaction to form the structure.
    Type: Application
    Filed: June 30, 2015
    Publication date: March 17, 2016
    Applicant: Massachusetts Institute of Technology
    Inventors: Joseph M. Jacobson, David Kong, Vikas Anant, Ashley Salomon, Saul Griffith, Will DelHagen, Vikrant Agnihotri
  • Patterning of nanostructures
    Patent number: 9070556
    Abstract: A technique for forming nanostructures including introducing a plurality of molecular-size scale and/or nanoscale building blocks to a region near a substrate and simultaneously scanning a pattern on the substrate with an energy beam, wherein the energy beam causes a change in at least one physical property of at least a portion of the building blocks, such that a probability of the portion of the building blocks adhering to the pattern scanned by the energy beam is increased, and wherein the building blocks adhere to the pattern to form the structure. The energy beam and at least a portion of the building blocks may interact by electrostatic interaction to form the structure.
    Type: Grant
    Filed: January 20, 2015
    Date of Patent: June 30, 2015
    Assignee: Massachusetts Institute of Technology
    Inventors: Joseph M. Jacobson, David Kong, Vikas Anant, Ashley Salomon, Saul Griffith, Will DelHagen, Vikrant Agnihotri
  • Patterning of Nanostructures
    Publication number: 20150132928
    Abstract: A technique for forming nanostructures including introducing a plurality of molecular-size scale and/or nanoscale building blocks to a region near a substrate and simultaneously scanning a pattern on the substrate with an energy beam, wherein the energy beam causes a change in at least one physical property of at least a portion of the building blocks, such that a probability of the portion of the building blocks adhering to the pattern scanned by the energy beam is increased, and wherein the building blocks adhere to the pattern to form the structure. The energy beam and at least a portion of the building blocks may interact by electrostatic interaction to form the structure.
    Type: Application
    Filed: January 20, 2015
    Publication date: May 14, 2015
    Applicant: MASSACHUSETTS INSTITUTE OF TECHNOLOGY
    Inventors: Joseph M. Jacobson, David Kong, Vikas Anant, Ashley Salomon, Saul Griffith, Will DelHagen, Vikrant Agnihotri
  • Patterning of nanostructures
    Patent number: 8937001
    Abstract: A technique for forming nanostructures including a definition of a charge pattern on a substrate and introduction of charged molecular scale sized building blocks (MSSBBs) to a region proximate the charge pattern so that the MSSBBs adhere to the charge pattern to form the feature.
    Type: Grant
    Filed: January 10, 2012
    Date of Patent: January 20, 2015
    Assignee: Massachusetts Institute of Technology
    Inventors: Joseph M. Jacobson, David Kong, Vikas Anant, Ashley Salomon, Saul Griffith, Will DelHagen, Vikrant Agnihotri
  • Patterning of Nanostructures
    Publication number: 20120108041
    Abstract: A technique for forming nanostructures including a definition of a charge pattern on a substrate and introduction of charged molecular scale sized building blocks (MSSBBs) to a region proximate the charge pattern so that the MSSBBs adhere to the charge pattern to form the feature.
    Type: Application
    Filed: January 10, 2012
    Publication date: May 3, 2012
    Applicant: MASSACHUSETTS INSTITUTE OF TECHNOLOGY
    Inventors: Joseph M. Jacobson, David Kong, Vikas Anant, Ashley Salomon, Saul Griffith, Will DelHagen, Vikrant Agnihotri
  • Patterning of nanostructures
    Patent number: 8093144
    Abstract: A technique for forming nanostructures including a definition of a charge pattern on a substrate and introduction of charged molecular scale sized building blocks (MSSBBs) to a region proximate the charge pattern so that the MSSBBs adhere to the charge pattern to form the feature.
    Type: Grant
    Filed: May 23, 2003
    Date of Patent: January 10, 2012
    Assignee: Massachusetts Institute of Technology
    Inventors: Joseph M. Jacobson, David Kong, Vikas Anant, Ashley Salomon, Saul Griffith, Will DelHagen, Vikrant Agnihotri
  • Patterning of nanostructures
    Publication number: 20040033679
    Abstract: A technique for forming nanostructures including a definition of a charge pattern on a substrate and introduction of charged molecular scale sized building blocks (MSSBBs) to a region proximate the charge pattern so that the MSSBBs adhere to the charge pattern to form the feature.
    Type: Application
    Filed: May 23, 2003
    Publication date: February 19, 2004
    Applicant: Massachusetts Institute of Technology
    Inventors: Joseph M. Jacobson, David Kong, Vikas Anant, Ashley Salomon, Saul Griffith, Will DelHagen, Vikrant Agnihotri