Patents by Inventor Wolfgang Emer
Wolfgang Emer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20190056670Abstract: A projection objective having a number of adjustable optical elements is optimized with respect to a number of aberrations by specifying a set of parameters describing imaging properties of the objective, each parameter in the set having an absolute value at each of a plurality of field points in an image plane of the projection objective. At least one of the optical elements is adjusted such that for each of the parameters in the set, the field maximum of its absolute value is minimized.Type: ApplicationFiled: June 22, 2018Publication date: February 21, 2019Inventor: Wolfgang Emer
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Publication number: 20180299787Abstract: A method for measuring an angularly resolved intensity distribution in a reticle plane (24) of a projection exposure apparatus (10). The apparatus includes an illumination system (16), irradiating a reticle (22) arranged in the reticle plane (24) and having a first pupil plane (20). All planes of the projection exposure apparatus which are conjugate thereto are further pupil planes, and the reticle plane (24) and all planes which are conjugate thereto are field planes. The method includes: arranging a spatially resolving detection module (44) in the region of one of the field planes (24, 30) such that the detection module is at a smaller distance from this field plane than from the closest pupil plane (20), radiating electromagnetic radiation (21) onto an optical module (42) from the illumination system, and determining an angularly resolved intensity distribution of the radiation from a signal recorded by the detection module.Type: ApplicationFiled: March 9, 2018Publication date: October 18, 2018Inventors: Wolfgang EMER, Dirk HELLWEG
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Patent number: 10018918Abstract: A projection objective having a number of adjustable optical elements is optimized with respect to a number of aberrations by specifying a set of parameters describing imaging properties of the objective, each parameter in the set having an absolute value at each of a plurality of field points in an image plane of the projection objective. At least one of the optical elements is adjusted such that for each of the parameters in the set, the field maximum of its absolute value is minimized.Type: GrantFiled: July 13, 2017Date of Patent: July 10, 2018Assignee: Carl Zeiss SMT GmbHInventor: Wolfgang Emer
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Patent number: 9915871Abstract: A method for measuring an angularly resolved intensity distribution in a reticle plane (24) of a projection exposure apparatus (10). The apparatus includes an illumination system (16), irradiating a reticle (22) arranged in the reticle plane (24) and having a first pupil plane (20). All planes of the projection exposure apparatus which are conjugate thereto are further pupil planes, and the reticle plane (24) and all planes which are conjugate thereto are field planes. The method includes: arranging a spatially resolving detection module (44) in the region of one of the field planes (24, 30) such that the detection module is at a smaller distance from this field plane than from the closest pupil plane (20), radiating electromagnetic radiation (21) onto an optical module (42) from the illumination system, and determining an angularly resolved intensity distribution of the radiation from a signal recorded by the detection module.Type: GrantFiled: July 10, 2015Date of Patent: March 13, 2018Assignee: Carl Zeiss SMT GmbHInventors: Wolfgang Emer, Dirk Hellweg
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Publication number: 20180024440Abstract: A projection objective having a number of adjustable optical elements is optimized with respect to a number of aberrations by specifying a set of parameters describing imaging properties of the objective, each parameter in the set having an absolute value at each of a plurality of field points in an image plane of the projection objective. At least one of the optical elements is adjusted such that for each of the parameters in the set, the field maximum of its absolute value is minimized.Type: ApplicationFiled: July 13, 2017Publication date: January 25, 2018Inventor: Wolfgang Emer
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Patent number: 9753375Abstract: An illumination optical unit for projection lithography illuminates an illumination field with illumination light of a primary light source. The illumination optical unit has a raster arrangement to predefine a shape of the illumination field, a transfer optical unit for the superimposing transfer of the illumination light toward the illumination field, and an illumination angle variation device which deflects the illumination light with different deflection angles. The illumination angle variation device has at least one displaceable illumination angle variation unit to generate a deflection angle for the illumination light.Type: GrantFiled: July 10, 2014Date of Patent: September 5, 2017Assignee: Carl Zeiss SMT GmbHInventors: Axel Scholz, Michael Patra, Frank Schlesener, Manfred Maul, Wolfgang Emer, Stefanie Hilt
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Patent number: 9715177Abstract: A projection objective having a number of adjustable optical elements is optimized with respect to a number of aberrations by specifying a set of parameters describing imaging properties of the objective, each parameter in the set having an absolute value at each of a plurality of field points in an image plane of the projection objective. At least one of the optical elements is adjusted such that for each of the parameters in the set, the field maximum of its absolute value is minimized.Type: GrantFiled: August 6, 2014Date of Patent: July 25, 2017Assignee: Carl Zeiss SMT GmbHInventor: Wolfgang Emer
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Patent number: 9429495Abstract: Methods for measuring the image quality of a projection objective include providing a measuring structure on an image-side of the projection objective, providing an immersion fluid between the projection objective and the measuring structure, directing light through the projection objective and the immersion fluid to the measuring structure while shielding the measuring structure from the immersion fluid, detecting light transmitted by the measuring structure, and determining an image quality of the projection objective based on the detected light.Type: GrantFiled: August 11, 2014Date of Patent: August 30, 2016Assignee: Carl Zeiss SMT GmbHInventors: Markus Mengel, Ulrich Wegmann, Albrecht Ehrmann, Wolfgang Emer, Reiner Clement, Ludo Mathijssen
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Publication number: 20160011520Abstract: A method for measuring an angularly resolved intensity distribution in a reticle plane (24) of a projection exposure apparatus (10). The apparatus includes an illumination system (16), irradiating a reticle (22) arranged in the reticle plane (24) and having a first pupil plane (20). All planes of the projection exposure apparatus which are conjugate thereto are further pupil planes, and the reticle plane (24) and all planes which are conjugate thereto are field planes. The method includes: arranging a spatially resolving detection module (44) in the region of one of the field planes (24, 30) such that the detection module is at a smaller distance from this field plane than from the closest pupil plane (20), radiating electromagnetic radiation (21) onto an optical module (42) from the illumination system, and determining an angularly resolved intensity distribution of the radiation from a signal recorded by the detection module.Type: ApplicationFiled: July 10, 2015Publication date: January 14, 2016Inventors: Wolfgang EMER, Dirk HELLWEG
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Patent number: 9081294Abstract: A method for measuring an angularly resolved intensity distribution in a reticle plane (24) of a projection exposure apparatus (10). The apparatus includes an illumination system (16), irradiating a reticle (22) arranged in the reticle plane (24) and having a first pupil plane (20). All planes of the projection exposure apparatus which are conjugate thereto are further pupil planes, and the reticle plane (24) and all planes which are conjugate thereto are field planes. The method includes: arranging a spatially resolving detection module (44) in the region of one of the field planes (24, 30) such that the detection module is at a smaller distance from this field plane than from the closest pupil plane (20), radiating electromagnetic radiation (21) onto an optical module (42) from the illumination system, and determining an angularly resolved intensity distribution of the radiation from a signal recorded by the detection module.Type: GrantFiled: July 5, 2013Date of Patent: July 14, 2015Assignee: Carl Zeiss SMT GmbHInventors: Wolfgang Emer, Dirk Hellweg
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Publication number: 20150015862Abstract: An illumination optical unit for projection lithography illuminates an illumination field with illumination light of a primary light source. The illumination optical unit has a raster arrangement to predefine a shape of the illumination field, a transfer optical unit for the superimposing transfer of the illumination light toward the illumination field, and an illumination angle variation device which deflects the illumination light with different deflection angles. The illumination angle variation device has at least one displaceable illumination angle variation unit to generate a deflection angle for the illumination light.Type: ApplicationFiled: July 10, 2014Publication date: January 15, 2015Inventors: Axel Scholz, Michael Patra, Frank Schlesener, Manfred Maul, Wolfgang Emer, Stefanie Hilt
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Publication number: 20140347647Abstract: A projection objective having a number of adjustable optical elements is optimized with respect to a number of aberrations by specifying a set of parameters describing imaging properties of the objective, each parameter in the set having an absolute value at each of a plurality of field points in an image plane of the projection objective. At least one of the optical elements is adjusted such that for each of the parameters in the set, the field maximum of its absolute value is minimized.Type: ApplicationFiled: August 6, 2014Publication date: November 27, 2014Inventor: Wolfgang Emer
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Publication number: 20140347654Abstract: Methods for measuring the image quality of a projection objective include providing a measuring structure on an image-side of the projection objective, providing an immersion fluid between the projection objective and the measuring structure, directing light through the projection objective and the immersion fluid to the measuring structure while shielding the measuring structure from the immersion fluid, detecting light transmitted by the measuring structure, and determining an image quality of the projection objective based on the detected light.Type: ApplicationFiled: August 11, 2014Publication date: November 27, 2014Inventors: Markus Mengel, Ulrich Wegmann, Albrecht Ehrmann, Wolfgang Emer, Reiner Clement, Ludo Mathijssen
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Patent number: 8823948Abstract: Methods for measuring the image quality of a projection objective include providing a measuring structure on an image-side of the projection objective, providing an immersion fluid between the projection objective and the measuring structure, directing light through the projection objective and the immersion fluid to the measuring structure while shielding the measuring structure from the immersion fluid, detecting light transmitted by the measuring structure, and determining an image quality of the projection objective based on the detected light.Type: GrantFiled: June 14, 2013Date of Patent: September 2, 2014Assignee: Carl Zeiss SMT GmbHInventors: Markus Mengel, Ulrich Wegmann, Albrecht Ehrmann, Wolfgang Emer, Reiner Clement, Ludo Mathijssen
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Publication number: 20140009764Abstract: A method for measuring an angularly resolved intensity distribution in a reticle plane (24) of a projection exposure apparatus (10). The apparatus includes an illumination system (16), irradiating a reticle (22) arranged in the reticle plane (24) and having a first pupil plane (20). All planes of the projection exposure apparatus which are conjugate thereto are further pupil planes, and the reticle plane (24) and all planes which are conjugate thereto are field planes. The method includes: arranging a spatially resolving detection module (44) in the region of one of the field planes (24, 30) such that the detection module is at a smaller distance from this field plane than from the closest pupil plane (20), radiating electromagnetic radiation (21) onto an optical module (42) from the illumination system, and determining an angularly resolved intensity distribution of the radiation from a signal recorded by the detection module.Type: ApplicationFiled: July 5, 2013Publication date: January 9, 2014Inventors: Wolfgang EMER, Dirk HELLWEG
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Publication number: 20130293869Abstract: Methods for measuring the image quality of a projection objective include providing a measuring structure on an image-side of the projection objective, providing an immersion fluid between the projection objective and the measuring structure, directing light through the projection objective and the immersion fluid to the measuring structure while shielding the measuring structure from the immersion fluid, detecting light transmitted by the measuring structure, and determining an image quality of the projection objective based on the detected light.Type: ApplicationFiled: June 14, 2013Publication date: November 7, 2013Inventors: Markus Mengel, Ulrich Wegmann, Albrecht Ehrmann, Wolfgang Emer, Reiner Clement, Ludo Mathijssen
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Patent number: 8488127Abstract: A measuring system for the optical measurement of an optical imaging system, which is provided to image a pattern arranged in an object surface of the imaging system in an image surface of the imaging system, comprises an object-side structure carrier having an object-side measuring structure, to be arranged on the object side of the imaging system; an image-side structure carrier having an image-side measuring structure, to be arranged on the image side of the imaging system; the object-side measuring structure and the image-side measuring structure being matched to each other in such a way that, when the object-side measuring structure is imaged onto the image-side measuring structure with the aid of the imaging system, a superposition pattern is produced; and a detector for the locally resolving acquisition of the superposition pattern. The imaging system is designed as an immersion system for imaging with the aid of an immersion liquid.Type: GrantFiled: August 5, 2010Date of Patent: July 16, 2013Assignee: Carl Zeiss SMT GmbHInventors: Markus Mengel, Ulrich Wegmann, Albrecht Ehrmann, Wolfgang Emer, Reiner Clement, Ludo Mathijssen
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Patent number: 8134716Abstract: A method and apparatus for spatially resolved wavefront measurement on a test specimen, a method and apparatus for spatially resolved scattered light determination, a diffraction structure support and a coherent structure support therefor, and also an objective or other radiation exposure device manufactured using such a method, and an associated manufacturing method. An embodiment involves carrying out, for the wavefront measurement, a first shearing measuring operation, which includes a plurality of individual measurements with at least two first shearing directions and spatially resolved detection of shearing interferograms generated, and an analogous second shearing measuring operation with at least one second shearing direction, the at least one second shearing direction being non-parallel to at least one first shearing direction. From the shearing interferograms detected, it is possible e.g.Type: GrantFiled: March 17, 2006Date of Patent: March 13, 2012Assignee: Carl Zeiss SMT GmbHInventors: Wolfgang Emer, Helmut Haidner, Ulrich Wegmann
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Publication number: 20110216303Abstract: A projection objective having a number of adjustable optical elements is optimized with respect to a number of aberrations by specifying a set of parameters describing imaging properties of the objective, each parameter in the set having an, absolute value at each of a plurality of field points in an image plane of the projection objective. At least one of the optical elements is adjusted such that for each of the parameters in the set, the field maximum of its absolute value is minimized.Type: ApplicationFiled: May 17, 2011Publication date: September 8, 2011Applicant: CARL ZEISS SMT GMBHInventor: Wolfgang EMER
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Patent number: 7965377Abstract: A projection objective having a number of adjustable optical elements is optimized with respect to a number of aberrations by specifying a set of parameters describing imaging properties of the objective, each parameter in the set having an absolute value at each of a plurality of field points in an image plane of the projection objective. At least one of the optical elements is adjusted such that for each of the parameters in the set, the field maximum of its absolute value is minimized.Type: GrantFiled: April 1, 2008Date of Patent: June 21, 2011Assignee: Carl Zeiss SMT GmbHInventor: Wolfgang Emer