Abstract: An apparatus for producing holes in dielectric workpieces in the form of thin sheets and substrates, in particular of glass or glass-like materials and semiconductors is provided. The apparatus includes individual high-voltage electrodes that are symmetrically arranged on an electrode holder around the hole to be produced in the workpiece. The apparatus also includes individual counter electrodes that are arranged on a counter electrode holder. The electrodes and counter electrodes can be connected in a permutating manner to a high-voltage source for the discharge of high-voltage flashovers.

Abstract: A method and apparatus for producing a multiplicity of holes in thin sheet-like workpieces of dielectric material or semiconductors is provided. The perforation points are marked by HF coupling points and caused to soften using HF energy in order to obtain dielectric breakdowns. The breakdowns are then widened into holes.

Abstract: An apparatus for producing holes in dielectric workpieces in the form of thin sheets and substrates, in particular of glass or glass-like materials and semiconductors is provided. The apparatus includes individual high-voltage electrodes that are symmetrically arranged on an electrode holder around the hole to be produced in the workpiece. The apparatus also includes individual counter electrodes that are arranged on a counter electrode holder. The electrodes and counter electrodes can be connected in a permutating manner to a high-voltage source for the discharge of high-voltage flashovers.

Abstract: Methods and apparatuses for producing a multiplicity of holes in thin workpieces made of glass or glass-like materials and semiconductors are provided. The method includes directing multiple laser beams onto predetermined perforation points of the workpiece in a wavelength range between 1600 and 200 nm and with a radiation intensity that causes local non-thermal destruction of the workpiece material along respective filamentary channels. Subsequently, the filamentary channels are widened to the desired diameter of the holes.

Abstract: A large-area display device, in particular multimedia façade, comprises at least one transparent element, in which the transparent element comprises at least one transparent substrate on which one or more lighting elements is/are arranged.

Abstract: In order to improve the energy balance of an HID lamp, the quartz burner, preferably the inside thereof, is coated with a UV reflecting layer system by alternatingly applying amorphous thin layers made at least of titanium oxide and silicon oxide having the respective general stoichiometry TiOy and SiOx by means of a plasma impulse chemical vapor deposition (PICVD) method at a high power density and increased substrate temperatures ranging from 100° to 400° C., using small growth rates ranging from 1 nm/sec to 100 nm/sec so as to form an interference layer system having a thickness of less than 1200 nm and a minimized UV-active defective spot rate ranging from 0.1 to 1 percent.

Abstract: There are now provided thin-film solar cells and method of making. The devices comprise a low-cost, low thermal stability substrate with a semiconductor body deposited thereon by a deposition gas. The deposited body is treated with a conversion gas to provide a microcrystalline silicon body. The deposition gas and the conversion gas are subjected to a pulsed electromagnetic radiation to effectuate deposition and conversion.

Abstract: In order to improve the energy balance of an HID lamp, the quartz burner, preferably the inside thereof, is coated with a UV reflecting layer system by alternatingly applying amorphous thin layers made at least of titanium oxide and silicon oxide having the respective general stoichiometry TiOy and SiOx by means of a plasma impulse chemical vapor deposition (PICVD) method at a high power density and increased substrate temperatures ranging from 100° to 400° C., using small growth rates ranging from 1 nm/sec to 100 nm/sec so as to form an interference layer system having a thickness of less than 1200 nm and a minimized UV-active defective spot rate ranging from 0.1 to 1 percent.

Abstract: The device for simultaneous multi-sided coating of a substrate, especially a lens, by microwave plasma chemical vapor deposition has a reaction chamber with microwave windows and microwave guides with microwave launch sites for guiding microwaves into the reaction chamber through the windows; dielectric tuning elements at the microwave launch sites to influence the microwave field distribution and at least one substrate holder arranged so that surfaces to be coated are oriented perpendicularly to plasma propagation directions. The respective shapes of the dielectric tuning elements are adapted to corresponding shapes of the surfaces, so that inhomogeneities in plasma distributions in the plasmas formed in the reaction chamber are corrected and coatings formed on the surfaces have a uniform thickness. Coated surfaces on opposite sides of a lens have a uniformity of ±1%.

Abstract: The method for coating plural surfaces on multiple sides of a substrate, especially a lens, includes launching microwave outputs into a microwave reactor at respective microwave launch sites; selecting respective microwave outputs to be greater than or equal to thresholds at which corresponding plasmas having a reduced permeability to microwave radiation arise in the microwave reactor; setting distances between the plural surfaces and microwave launch sites greater than microwave penetrations depths in the plasmas; placing respective dielectric tuning elements in microwave fields formed from the microwave outputs at the launch sites; and adapting the shapes of the dielectric tuning elements to the plural surfaces to be coated, so that plasma inhomogeneities are corrected and coatings with a uniformity of ±1% are formed on the plural surfaces.

Abstract: There are now provided thin-film solar cells and method of making. The devices comprise a low-cost, low thermal stability substrate with a semiconductor body deposited thereon by a deposition gas. The deposited body is treated with a conversion gas to provide a microcrystalline silicon body. The deposition gas and the conversion gas are subjected to a pulsed electromagnetic radiation to effectuate deposition and conversion.

Abstract: The invention provides that for each surface of a substrate (2) to be coated, a plasma is injected into a coating reactor (1) used for carrying out microwave PCVD methods, and the surface to be coated is perpendicularly orientated with regard to the direction of spreading of the corresponding plasma Dielectric compensating elements (4a, b) are introduced into the vicinity of the microwave injection points (3) and correct for non-homogeneities resulting in the distribution of plasma thicknesses by altering the microwave field distribution.

Abstract: This invention relates to optical, preferably ophthalmic lenses with a body made of plastic, in particular for spectacle glasses, and the plastic incorporates cycloolefinic polymers and the plastic body is coated with a transparent coating resistant to corrosion. Another object of this invention is a process for the production of these lenses. The lenses according to the invention are especially resistant to greases, sweat and/or solvents.

Abstract: The invention concerns a plasma CVD system (in particular a plasma pulse CVD system) with an array of microwave antennas. According to the invention, in order to improve the homogeneity of the layer, interference is prevented by controlling adjacent antennas in a chronologically offset manner. To that end, microcapsules are provided within the macrocapsules of the plasma pulse CVD process. Additionally, the uniformity of the layer deposition at the interfaces between adjacent modules can be optimized by radio-frequency excitation by means of suitable electrodes, magnetic fields or the configuration of the gas inlets. The surface coated in an operating cycle can thus be scaled as required.