Patents by Inventor Woody Chung

Woody Chung has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Gas flow distribution receptacles, plasma generator systems, and methods for performing plasma stripping processes
    Patent number: 9209000
    Abstract: Systems, system components, and methods for plasma stripping are provided. In an embodiment, a gas flow distribution receptacle may have a rounded section that includes an inner surface defining a reception cavity, an outer surface forming an enclosed end, and a centerpoint on the outer surface having a longitudinal axis extending therethrough and through the reception cavity. First and second rings of openings provide flow communication with the plasma chamber. The second ring of openings are disposed between the first ring and the centerpoint, and each opening of the second ring of openings extends between the inner and outer surfaces at a second angle relative to the longitudinal axis that is less than the first angle and has a diameter that is substantially identical to a diameter of an adjacent opening and smaller than the diameters of an opening of the first ring of openings.
    Type: Grant
    Filed: January 3, 2012
    Date of Patent: December 8, 2015
    Assignee: Novellus Systems, Inc.
    Inventors: Huatan Qiu, Woody Chung, Anirban Guha, David Cheung
  • GAS FLOW DISTRIBUTION RECEPTACLES, PLASMA GENERATOR SYSTEMS, AND METHODS FOR PERFORMING PLASMA STRIPPING PROCESSES
    Publication number: 20120097331
    Abstract: Systems, system components, and methods for plasma stripping are provided. In an embodiment, a gas flow distribution receptacle may have a rounded section that includes an inner surface defining a reception cavity, an outer surface forming an enclosed end, and a centerpoint on the outer surface having a longitudinal axis extending therethrough and through the reception cavity. First and second rings of openings provide flow communication with the plasma chamber. The second ring of openings are disposed between the first ring and the centerpoint, and each opening of the second ring of openings extends between the inner and outer surfaces at a second angle relative to the longitudinal axis that is less than the first angle and has a diameter that is substantially identical to a diameter of an adjacent opening and smaller than the diameters of an opening of the first ring of openings.
    Type: Application
    Filed: January 3, 2012
    Publication date: April 26, 2012
    Applicant: NOVELLUS SYSTEMS, INC.
    Inventors: Huatan Qiu, Woody Chung, Anirban Guha, David Cheung
  • Gas flow distribution receptacles, plasma generator systems, and methods for performing plasma stripping processes
    Patent number: 8110068
    Abstract: Systems, system components, and methods for plasma stripping are provided. In an embodiment, a gas flow distribution receptacle may have a rounded section that includes an inner surface defining a reception cavity, an outer surface forming an enclosed end, and a centerpoint on the outer surface having a longitudinal axis extending therethrough and through the reception cavity. First and second rings of openings provide flow communication with the plasma chamber. The second ring of openings are disposed between the first ring and the centerpoint, and each opening of the second ring of openings extends between the inner and outer surfaces at a second angle relative to the longitudinal axis that is less than the first angle and has a diameter that is substantially identical to a diameter of an adjacent opening and smaller than the diameters of an opening of the first ring of openings.
    Type: Grant
    Filed: March 20, 2008
    Date of Patent: February 7, 2012
    Assignee: Novellus Systems, Inc.
    Inventors: Huatan Qiu, Woody Chung, Anirban Guha, David Cheung
  • GAS FLOW DISTRIBUTION RECEPTACLES, PLASMA GENERATOR SYSTEMS, AND METHODS FOR PERFORMING PLASMA STRIPPING PROCESSES
    Publication number: 20090236313
    Abstract: Systems, system components, and methods for plasma stripping are provided. In an embodiment, a gas flow distribution receptacle may have a rounded section that includes an inner surface defining a reception cavity, an outer surface forming an enclosed end, and a centerpoint on the outer surface having a longitudinal axis extending therethrough and through the reception cavity. First and second rings of openings provide flow communication with the plasma chamber. The second ring of openings are disposed between the first ring and the centerpoint, and each opening of the second ring of openings extends between the inner and outer surfaces at a second angle relative to the longitudinal axis that is less than the first angle and has a diameter that is substantially identical to a diameter of an adjacent opening and smaller than the diameters of an opening of the first ring of openings.
    Type: Application
    Filed: March 20, 2008
    Publication date: September 24, 2009
    Applicant: NOVELLUS SYSTEMS, INC.
    Inventors: Huatan QIU, Woody CHUNG, Anirban GUHA, David CHEUNG